Abstract: Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate.
Type:
Grant
Filed:
April 26, 2002
Date of Patent:
January 25, 2005
Assignee:
The Regents of the University of California
Inventors:
Leisa B. Davenhall, James B. Rubin, Craig M. V. Taylor
Inventors:
Tim Maria Jose Van Hauwermeiren, Carol Smith, Merih Pasin, David Moore, Carl John Woolley, Christopher Gordon Hamilton, David Gordon, William John Davis, David John Wilford