Search Patents
  • Publication number: 20090104258
    Abstract: The invention relates to a cosmetic composition of a tocopheryl phosphate, especially in its dl or d form, or in the form of a cosmetically acceptable salt or ester thereof, as a cosmetic agent for preventing or slowing down the appearance of the effects of skin ageing, in particular of photoageing of the skin, said tocopheryl phosphate being at least partially encapsulated in lipid vesicles, in particular liposomes. It relates most particularly to the use of alpha-tocopheryl phosphate. It also relates to cosmetic compositions containing a tocopheryl phosphate, in particular an alpha-tocopheryl phosphate, at least partially incorporated into lipid vesicles, in particular liposomes, these compositions being in particular in the form of a serum or of a stable emulsion. The invention also relates to a cosmetic skincare process.
    Type: Application
    Filed: September 25, 2008
    Publication date: April 23, 2009
    Applicant: LVMH RECHERCHE
    Inventors: Marc Dumas, Emmanuelle Noblesse, Valerie Alard, Dominique Quiles, Eric Perrier
  • Patent number: 5952001
    Abstract: The present invention relates to the use of an .alpha.-tocopherol phosphate, especially in its dl or d form, or an ester thereof, of the general formula ##STR1## in which: R.sub.1 is a hydrogen atom, an alkyl radical having from 1 to 4 carbon atoms, such as the methyl or ethyl radical in particular, or an .alpha.-tocopheryl radical; and R.sub.2 is a hydrogen atom, an alkyl radical having from 1 to 4 carbon atoms, such as methyl or ethyl radical in particular, or an oxyethylene chain of the formula ##STR2## in which R.sub.3 and R.sub.4 independently are a hydrogen atom or a methyl radical and n is an integer greater than or equal to 1, or a salt thereof, for preparing a pharmaceutical, dermatological or cosmetic composition for the prevention or treatment of allergic manifestations such as skin allergy or bronchial asthma, or inflammatory manifestations, or for the prevention or treatment of the harmful effects of free radicals.
    Type: Grant
    Filed: May 30, 1995
    Date of Patent: September 14, 1999
    Assignee: LVMH Recherche
    Inventors: Alain Meybeck, Frederic Bonte, Christian Marechal
  • Patent number: 5656618
    Abstract: The present invention relates to the use of an .alpha.-tocopherol phosphate, especially in its dl or d form, or an ester thereof, of the general formula ##STR1## in which: R.sub.1 is a hydrogen atom, an alkyl radical having from 1 to 4 carbon atoms, such as the methyl or ethyl radical in particular, or an .alpha.-tocopheryl radical; and R.sub.2 is a hydrogen atom, an alkyl radical having from 1 to 4 carbon atoms, such as a methyl or ethyl radical in particular, or an oxyethylene chain of the formula ##STR2## in which R.sub.3 and R.sub.4 independently are a hydrogen atom or a methyl radical and n is an integer greater than or equal to 1, or a salt thereof, for preparing a pharmaceutical, dermatological or cosmetic composition for the prevention or treatment of allergic manifestations such as skin allergy or bronchial asthma, or inflammatory manifestations, or for the prevention or treatment of the harmful effects of free radicals.
    Type: Grant
    Filed: October 24, 1994
    Date of Patent: August 12, 1997
    Assignee: LVMH Recherche
    Inventors: Alain Meybeck, Frederic Bonte, Christian Marechal
  • Patent number: 5387579
    Abstract: The present invention relates to the use of an .alpha.-tocopherol phosphate, especially in its dl or d form, or an ester thereof, of the general formula ##STR1## in which: R.sub.1 is a hydrogen atom, an alkyl radical having from 1 to 4 carbon atoms, such as the methyl or ethyl radical in particular, or an .alpha.-tocopheryl radical; and R.sub.2 is a hydrogen atom, an alkyl radical having from 1 to 4 carbon atoms, such as a methyl or ethyl radical in particular, or an oxyethylene chain of the formula ##STR2## in which R.sub.3 and R.sub.4 independently are a hydrogen atom or a methyl radical and n is an integer greater than or equal to 1, or a salt thereof, for preparing a pharmaceutical, dermatological or cosmetic composition for the prevention or treatment of allergic manifestations such as skin allergy or bronchial asthma, or inflammatory manifestations, or for the prevention or treatment of the harmful effects of free radicals.
    Type: Grant
    Filed: July 31, 1992
    Date of Patent: February 7, 1995
    Assignee: Lvmh Recherche
    Inventors: Alain Meybeck, Frederic Bonte, Christian Marechal
  • Patent number: 5603949
    Abstract: Use of a tocopherol phosphate, other than alpha-tocopherol phosphate, especially in its dl or d form, or one of its esters having general formula (I) in which: R' is hydrogen atom, an alkyl radical having from 1 to 4 carbon atoms, such as the methyl or ethyl radical in particular, R'O is a tocopheryl radical; R" is a hydrogen atom, an alkyl radical having from 1 to 4 carbon atoms, such as the methyl or ethyl radical in particular, or R"O is an oxyethylene chain, of formula (a) in which R.sub.4 and R.sub.5 are independently a hydrogen atom or a methyl radical, and n is an integer of 1 or over; R.sub.1, R.sub.2 and R.sub.3 are independently a hydrogen atom or a methyl radical, it being understood that R.sub.1, R.sub.2 and R.sub.3 cannot simultaneously be a methyl radical. A represents the groups (b), or (c).
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: February 18, 1997
    Assignee: LVMH Recherche
    Inventors: Alain Meybeck, Marc Dumas, Frederic Bonte, Christian Marechal
  • Patent number: 5643597
    Abstract: Use of a tocopherol phosphate, other than alpha-tocopherol phosphate, especially in its dl or d form, or one of its esters having general formula (I) in which: R' is hydrogen atom, an alkyl radical having from 1 to 4 carbon atoms, such as the methyl or ethyl radical in particular, R'O is a tocopheryl radical; R" is a hydrogen atom, an alkyl radical having from 1 to 4 carbon atoms, such as the methyl or ethyl radical in particular, or R"O is an oxyethylene chain, of formula (a) in which R.sub.4 and R.sub.5 are independently a hydrogen atom or a methyl radical, and n is an integer of 1 or over; R.sub.1, R.sub.2 and R.sub.3 are independently a hydrogen atom or a methyl radical, it being understood that R.sub.1, R.sub.2 and R.sub.3 cannot simultaneously be a methyl radical. A represents the groups (b), or (c).
    Type: Grant
    Filed: June 5, 1995
    Date of Patent: July 1, 1997
    Assignee: LVMH Recherche
    Inventors: Alain Meybeck, Marc Dumas, Frederic Bonte, Christian Marechal