Search Patents
  • Spall propagation properties of case-hardened M50 and M50NiL bearings
    Publication number: 20040079448
    Abstract: A roller bearing that provides ball and roller bearing elements comprised of M50 steel and M50NiL steel having surface hardnesses above 60 HRC, and in the range of 65-72 HRC. The hardness in the surface region is achieved by nitriding the surface to achieve a high hardness and extended life. This improvement is brought about by controlling the microstructure of the alloy by minimizing the formation of retained austenite. The material is tempered as required. The surface is then nitrided, but the nitriding operation is carefully controlled to avoid the formation of intergranular nitrides. Because of the method used to prevent the formation of intergranular nitrides, some carbon may be present to prevent the surface of the steel from becoming depleted of carbon. The hardening element in this nitro-carburizing operation is nitrogen, which forms iron nitride as Fe3N or Fe4N intragranularly.
    Type: Application
    Filed: October 24, 2002
    Publication date: April 29, 2004
    Applicant: General Electric
    Inventors: Mark Alan Rhoads, Michael Gilbert Johnson, Jonothan Allen Scheetz
  • Double-acting valve system for underwater breathing or the like
    Patent number: 4711263
    Abstract: A valve for regulating the through-flow of a fluid from an inlet (10) to an outlet (11), especially for regulating a gas flow from a place (4) with a higher pressure than the ambient pressure, the valve (2) being arranged to be opened by an operating means (22) which is mechanically coupled to a means sensing the pressure at said place (4). The valve comprises a piston (7) which is slidable in a piston guide (8), a sealing seat (12) for the piston (7) being provided at the end of the piston guide (8) facing away from the place (4) with higher pressure. The other end (14) of the piston guide (8) is closed and together with an adjacent end face (15) of the piston (7) define a chamber (16).
    Type: Grant
    Filed: September 15, 1986
    Date of Patent: December 8, 1987
    Assignees: Nils T. Ottestad, Den Norske Stats Oljeselskap A.S.
    Inventor: Nils T. Ottestad
  • Spall propagation properties of case-hardened M50 and M50NiL bearings
    Patent number: 6966954
    Abstract: A roller bearing that provides ball and roller bearing elements comprised of M50 steel and M50NiL steel having surface hardnesses above 60 HRC, and in the range of 65-72 HRC. The hardness in the surface region is achieved by nitriding the surface to achieve a high hardness and extended life. This improvement is brought about by controlling the microstructure of the alloy by minimizing the formation of retained austenite. The material is tempered as required. The surface is then nitrided, but the nitriding operation is carefully controlled to avoid the formation of intergranular nitrides. Because of the method used to prevent the formation of intergranular nitrides, some carbon may be present to prevent the surface of the steel from becoming depleted of carbon. The hardening element in this nitro-carburizing operation is nitrogen, which forms iron nitride as Fe3N or Fe4N intragranularly.
    Type: Grant
    Filed: October 24, 2002
    Date of Patent: November 22, 2005
    Assignee: General Electric Comany
    Inventors: Mark Alan Rhoads, Michael Gilbert Johnson, Jonothan Allen Scheetz
  • Press roll with displaceable end walls to reduce press jacket wear
    Patent number: 5084137
    Abstract: In order to increase the life of a flexible jacket in a shoe type press roll having a flexible jacket (11), end wall displacing element (28) and jacket stretching element (27), the end wall displacing element (28) are designed to permit a setting of an arbitrary operating position for one roll end wall (18) between two end positions on one of the two stub shafts (13) of the roll, and the jacket stretching element (27) are designed to maintain the stretching force substantially constant, whereby the other roll end wall (22) will be self-positioning and will automatically follow each axial displacment of said one roll end wall (18).
    Type: Grant
    Filed: April 29, 1991
    Date of Patent: January 28, 1992
    Assignee: Valmet Paper Machinery, Inc.
    Inventors: Antti I. Ilmarinen, Nils-Erik R. Karlsson, Nils-Erik Safman, Carl Zotterman
  • Modular packaging system
    Patent number: 5398159
    Abstract: In a modular packaging system for electrical equipment, two or more modules are arranged horizontally or vertically relative to one another. Each module includes electrical equipment, a cabinet in which the electrical equipment is disposed, and a fan assembly for forcing air through the cabinet to cool the electrical equipment. The cabinet includes an inner cabinet wall forming an air shaft, a vertical space extending between a top and a bottom opening in the cabinet, and a horizontal space extending between a left and a right opening in the cabinet. The cabinet is further formed with a first and a second opening. The second opening is formed in the inner cabinet wall. The fan assembly forces air through the first opening of the cabinet, past the electrical equipment, out the second opening of the cabinet, and into the air shaft.
    Type: Grant
    Filed: December 15, 1992
    Date of Patent: March 14, 1995
    Assignee: Telefonaktiebolaget LM Ericsson
    Inventors: Nils A. T. Andersson, Nils U. H. Fagerstedt, Bjorn G. Gudmundsson
  • Heat exchanger
    Patent number: 5964278
    Abstract: A heat exchanger has been developed with a helical insert (9) permanently mounted in a housing (2). Between the windings in the insert (9) there is formed a helical channel (20) for one heat exchange medium. The insert (9) is designed with a channel (10) for the second heat exchange medium. The heat exchanger is designed with a central tube (13) which is axially movable and rotatable. The central tube (13) is designed with scraper elements for removal of deposits in the channel (20). In one embodiment the scraper element is formed by a helical insert (15) of the same design as the insert (9). The insert (15) is designed with a channel (16) for the second heat exchange medium. In a further embodiment the central tube (13) is designed with one or more scraper arms (23) which may be liquid-cooled. Deposits are often formed on the heat transfer surfaces.
    Type: Grant
    Filed: February 4, 1997
    Date of Patent: October 12, 1999
    Assignee: Kvaerner Engineering a.s
    Inventors: Jostein Langoy, Nils Myklebust, Nils I. Viken, deceased, Steiner Lynum, Alfhild Irene Fagervik
  • Halo substituted aminotetralins
    Patent number: 5225596
    Abstract: This invention is therapeutically useful tetralins and pharmaceutically acceptable acid addition salts thereof of the formula ##STR1## wherein X.sub.1 is halogen, CF.sub.3, --OR.sub.3, or --SR.sub.4 ; wherein R.sub.3 is alkyl(C.sub.1 -C.sub.8); alkenyl(C.sub.1 -C.sub.8); --CH.sub.2 -cycloalkyl(C.sub.3 -C.sub.8) or benzyl; wherein R.sub.4 is alkyl(C.sub.1 -C.sub.3); wherein X.sub.2 is hydrogen, CF.sub.3 or halogen; wherein R.sub.7 is hydrogen or methyl; wherein R.sub.1 is hydrogen, alkyl(C.sub.1 -C.sub.3), or cyclopropylmethyl; wherein R.sub.2 is --CH.sub.2 -cycloalkyl(C.sub.3 -C.sub.8), alkyl(C.sub.1 -C.sub.8), --(CH.sub.2).sub.q --R.sub.5 or --CH.sub.2 CH.sub.2 --Z--(CH.sub.2).sub.r CH.sub.3 ; wherein R.sub.5 is phenyl, 2-thiophene or 3-thiophene; wherein Z is oxygen or sulfur; and wherein p is one or 2, q is 2 or 3, and r is zero to 3; with the provisos that (1) when X.sub.1 is --OR.sub.3, X.sub.2 is halogen or CF.sub.3 ; and (2) when X.sub.1 is halogen, X.sub.2 is hydrogen, and p is 2, X.sub.
    Type: Grant
    Filed: July 8, 1991
    Date of Patent: July 6, 1993
    Assignee: The Upjohn Company
    Inventors: Per A. E. Carlsson, Hakan V. Wikstrom, Kjell A. I. Svensson, Bengt R. Andersson, Barbro A. Ekman, Nils P. Stjernlof, Nils A. Svensson
  • NANOIMPRINT LITHOGRAPHY MATERIAL WITH SWITCHABLE MECHANICAL PROPERTIES
    Publication number: 20190346760
    Abstract: A method is described for utilizing NIL materials with switchable mechanical properties. The method comprises applying an imprint mask to a nano-imprint lithography (NIL) material layer. The NIL material layer is comprised of a NIL material with a modulus level below a flexibility threshold. The NIL material layer has an internal property, that when changed, causes a change in the modulus level of the NIL material. The method further comprises detaching the imprinted NIL material layer from the imprint mask, with the low modulus level of the NIL material causing a shape of the imprinted NIL material layer to remain unchanged after detachment. A modulus level of the NIL material is increased by changing an internal property of the NIL material, with the modulus level increased beyond a strength threshold to create a first imprint layer that has a structure that remains unaffected by a subsequent process.
    Type: Application
    Filed: January 18, 2019
    Publication date: November 14, 2019
    Inventors: Austin Lane, Matthew E. Colburn, Giuseppe Calafiore, Nihar Ranjan Mohanty
  • NANOIMPRINT LITHOGRAPHY PROCESSES FOR SWITCHING MECHANICAL PROPERTIES OF IMPRINT MATERIALS
    Publication number: 20190346759
    Abstract: A method is described for modifying the mechanical properties of NIL materials. The method includes applying an imprint mask to a nano-imprint lithography (NIL) material layer to create an imprinted NIL material layer, with the NIL material layer comprised of a NIL material. The method further includes detaching the imprinted NIL material layer from the imprint mask, with the modulus level of the NIL material below a flexibility threshold to cause a shape of the imprinted NIL material layer to remain unchanged after detachment. The modulus level of the NIL material of the imprinted NIL material layer is increased beyond a strength threshold to create a first imprint layer, with the imprint layer having a structure that remains unaffected by a subsequent process to form a second imprint layer matching a master mold pattern.
    Type: Application
    Filed: January 18, 2019
    Publication date: November 14, 2019
    Inventors: Austin Lane, Matthew E. Colburn, Giuseppe Calafiore, Nihar Ranjan Mohanty
  • NANOIMPRINT LITHOGRAPHY PROCESSES FOR SWITCHING MECHANICAL PROPERTIES OF IMPRINT MATERIALS
    Publication number: 20220128903
    Abstract: A method is described for modifying the mechanical properties of NIL materials. The method includes applying an imprint mask to a nano-imprint lithography (NIL) material layer to create an imprinted NIL material layer, with the NIL material layer comprised of a NIL material. The method further includes detaching the imprinted NIL material layer from the imprint mask, with the modulus level of the NIL material below a flexibility threshold to cause a shape of the imprinted NIL material layer to remain unchanged after detachment. The modulus level of the NIL material of the imprinted NIL material layer is increased beyond a strength threshold to create a first imprint layer, with the imprint layer having a structure that remains unaffected by a subsequent process to form a second imprint layer matching a master mold pattern.
    Type: Application
    Filed: January 4, 2022
    Publication date: April 28, 2022
    Inventors: Austin Lane, Matthew E. Colburn, Giuseppe Calafiore, Nihar Ranjan Mohanty
  • Nanoimprint lithography material with switchable mechanical properties
    Patent number: 11415880
    Abstract: A method is described for utilizing NIL materials with switchable mechanical properties. The method comprises applying an imprint mask to a nano-imprint lithography (NIL) material layer. The NIL material layer is comprised of a NIL material with a modulus level below a flexibility threshold. The NIL material layer has an internal property, that when changed, causes a change in the modulus level of the NIL material. The method further comprises detaching the imprinted NIL material layer from the imprint mask, with the low modulus level of the NIL material causing a shape of the imprinted NIL material layer to remain unchanged after detachment. A modulus level of the NIL material is increased by changing an internal property of the NIL material, with the modulus level increased beyond a strength threshold to create a first imprint layer that has a structure that remains unaffected by a subsequent process.
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: August 16, 2022
    Assignee: Facebook Technologies, LLC
    Inventors: Austin Lane, Matthew E. Colburn, Giuseppe Calafiore, Nihar Ranjan Mohanty
  • Nanoimprint lithography processes for switching mechanical properties of imprint materials
    Patent number: 11249393
    Abstract: A method is described for modifying the mechanical properties of NIL materials. The method includes applying an imprint mask to a nano-imprint lithography (NIL) material layer to create an imprinted NIL material layer, with the NIL material layer comprised of a NIL material. The method further includes detaching the imprinted NIL material layer from the imprint mask, with the modulus level of the NIL material below a flexibility threshold to cause a shape of the imprinted NIL material layer to remain unchanged after detachment. The modulus level of the NIL material of the imprinted NIL material layer is increased beyond a strength threshold to create a first imprint layer, with the imprint layer having a structure that remains unaffected by a subsequent process to form a second imprint layer matching a master mold pattern.
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: February 15, 2022
    Assignee: Facebook Technologies, LLC
    Inventors: Austin Lane, Matthew E. Colburn, Giuseppe Calafiore, Nihar Ranjan Mohanty
  • CURABLE FORMULATION WITH HIGH REFRACTIVE INDEX AND ITS APPLICATION IN SURFACE RELIEF GRATING USING NANOIMPRINTING LITHOGRAPHY
    Publication number: 20200249568
    Abstract: Disclosed herein is a nanoimprint lithography (ML) precursor material comprising a base resin component having a first refractive index ranging from 1.45 to 1.80, and a nanoparticles component having a second refractive index greater than the first refractive index of the base resin component. According to certain embodiments, further disclosed herein are a cured NIL material made by curing the NIL precursor material, a NIL grating comprising the cured NIL material, an optical component comprising the NIL grating, and methods for forming the NIL grating and the optical component using a NIL process.
    Type: Application
    Filed: January 31, 2020
    Publication date: August 6, 2020
    Inventors: Tingling RAO, Zachary PERLMUTTER, Ankit VORA, Austin LANE, Giuseppe CALAFIORE, Matthew E. COLBURN
  • Soft mold formulations for surface relief grating fabrication with imprinting lithography
    Patent number: 11879024
    Abstract: Disclosed herein is a nanoimprint lithography (NIL) soft mold precursor material comprising a curable fluorinated base resin component, one or more additives, one or more crosslinkers, and one or more of a photo radical generator, a photo acid generator, or both. According to certain embodiments, further disclosed herein are a polymeric material comprising a partially or totally polymerized or crosslinked NIL precursor material, a NIL soft mold comprising the polymeric material, a process for making the NIL soft mold, and a method of using the NIL soft mold to form a NIL grating.
    Type: Grant
    Filed: July 14, 2021
    Date of Patent: January 23, 2024
    Assignee: META PLATFORMS TECHNOLOGIES, LLC
    Inventors: Zachary Perlmutter, Tingling Rao, Giuseppe Calafiore, Emily Anne Makoutz
  • High Refractive Index Nano-Imprint Lithography Resin
    Publication number: 20230236499
    Abstract: A photo nanoimprint lithography (P-NIL) resin is disclosed. The P-NIL resin comprises: a cross-linkable organic binder; solvent based inorganic nanoparticles dispersed in the P-NIL resin; and a solvent configured to be evaporated; the P-NIL resin having a viscosity in the range of 4,000 to 6,000 centipoise at 25° C. after the solvent is evaporated prior to curing the P-NIL resin; and the P-NIL resin having a refractive index of greater than 1.6 at 589 nm and glass transition temperature of greater than 50° C.
    Type: Application
    Filed: January 24, 2023
    Publication date: July 27, 2023
    Applicant: Addison Clear Wave Coatings, Inc.
    Inventors: Chau Ha, Martin Newcomb
  • ATHLETE NAME, IMAGE, AND LIKENESS MARKETING AND DIRECT PAYMENT SYSTEM
    Publication number: 20230289771
    Abstract: An athlete name, image, and likeness (NIL) marketing and direct payment system is disclosed. The athlete NIL marketing and direct payment system supports a marketplace which enables people to send money to athletes for their name, image, likeness (NIL). The athlete NIL marketing and direct payment system supports ownership NFT tokens for the athlete's NIL on the blockchain as well as a sales and marketing platform that allows for direct payment from people to the athletes.
    Type: Application
    Filed: March 10, 2023
    Publication date: September 14, 2023
    Inventor: Brent Russell Chapman
  • NANOIMPRINT LITHOGRAPHY PROCESS USING LOW SURFACE ENERGY MASK
    Publication number: 20190346761
    Abstract: A method is described for creating a modified mask with low surface energies for a nano-imprint lithography (NIL) imprinting process. The method includes applying a master mold to an imprint mask material to create an imprint mask. The method further includes modifying the imprint mask by applying a treatment to the imprint mask to cause a surface energy level of the imprint mask to fall below a sticking threshold. The modified imprint mask is applied to a nano-imprint lithography (NIL) material to create an imprinted NIL material layer. The surface energy level of the imprint mask causes a shape of the imprinted NIL material layer to be remain unchanged when the imprinted NIL material layer is detached from the modified imprint mask.
    Type: Application
    Filed: January 18, 2019
    Publication date: November 14, 2019
    Inventors: Austin Lane, Matthew E. Colburn, Giuseppe Calafiore, Nihar Ranjan Mohanty
  • NANOIMPRINT LITHOGRAPHY PROCESS USING LOW SURFACE ENERGY MASK
    Publication number: 20220026799
    Abstract: A method is described for creating a modified mask with low surface energies for a nano-imprint lithography (NIL) imprinting process. The method includes applying a master mold to an imprint mask material to create an imprint mask. The method further includes modifying the imprint mask by applying a treatment to the imprint mask to cause a surface energy level of the imprint mask to fall below a sticking threshold. The modified imprint mask is applied to a nano-imprint lithography (NIL) material to create an imprinted NIL material layer. The surface energy level of the imprint mask causes a shape of the imprinted NIL material layer to be remain unchanged when the imprinted NIL material layer is detached from the modified imprint mask.
    Type: Application
    Filed: August 20, 2021
    Publication date: January 27, 2022
    Inventors: Austin Lane, Matthew E. Colburn, Giuseppe Calafiore, Nihar Ranjan Mohanty
  • Model-Based Retargeting of Layout Patterns for Sub-Wavelength Photolithography
    Publication number: 20100333049
    Abstract: Mechanism are provided for model-based retargeting of photolithographic layouts. An optical proximity correction is performed on a set of target patterns for a predetermined number of iterations until a counter value exceeds a maximum predetermined number of iterations in order to produce a set of optical proximity correction mask shapes. A set of lithographic contours is generated for each of the set of optical proximity correction mask shapes in response to the counter value exceeding the maximum predetermined number of iterations. A normalized image log slope (NILS) extraction is performed on the set of target shapes and use the set of lithographic contours to produce NILS values. The set of target patterns is modified based on the NILS values in response to the NILS values failing to be within a predetermined limit. The steps are repeated until the NILS values are within the predetermined limit.
    Type: Application
    Filed: June 26, 2009
    Publication date: December 30, 2010
    Applicant: International Business Machines Corporation
    Inventors: Kanak B. Agarwal, Shayak Banerjee, Sani R. Nassif
  • Nanoimprint lithography process using low surface energy mask
    Patent number: 11156913
    Abstract: A method is described for creating a modified mask with low surface energies for a nano-imprint lithography (NIL) imprinting process. The method includes applying a master mold to an imprint mask material to create an imprint mask. The method further includes modifying the imprint mask by applying a treatment to the imprint mask to cause a surface energy level of the imprint mask to fall below a sticking threshold. The modified imprint mask is applied to a nano-imprint lithography (NIL) material to create an imprinted NIL material layer. The surface energy level of the imprint mask causes a shape of the imprinted NIL material layer to be remain unchanged when the imprinted NIL material layer is detached from the modified imprint mask.
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: October 26, 2021
    Assignee: Facebook Technologies, LLC
    Inventors: Austin Lane, Matthew E. Colburn, Giuseppe Calafiore, Nihar Ranjan Mohanty
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