Search Patents
  • Model-based retargeting of layout patterns for sub-wavelength photolithography
    Patent number: 8321818
    Abstract: Mechanism are provided for model-based retargeting of photolithographic layouts. An optical proximity correction is performed on a set of target patterns for a predetermined number of iterations until a counter value exceeds a maximum predetermined number of iterations in order to produce a set of optical proximity correction mask shapes. A set of lithographic contours is generated for each of the set of optical proximity correction mask shapes in response to the counter value exceeding the maximum predetermined number of iterations. A normalized image log slope (NILS) extraction is performed on the set of target shapes and use the set of lithographic contours to produce NILS values. The set of target patterns is modified based on the NILS values in response to the NILS values failing to be within a predetermined limit. The steps are repeated until the NILS values are within the predetermined limit.
    Type: Grant
    Filed: June 26, 2009
    Date of Patent: November 27, 2012
    Assignee: International Business Machines Corporation
    Inventors: Kanak B. Agarwal, Shayak Banerjee, Sani R. Nassif
  • HELIUM PLASMA NUTATIONAL INFRASONIC LIPOSCULPTURE SYSTEM AND METHOD
    Publication number: 20240099757
    Abstract: A minimally invasive body sculpting system and method is provided using a numbing component, a helium plasma component, and an NIL component. An NIL cannula of the NIL component is insertable into the body to remove the fat cell via nutational movement thereof and suction there through. Skin tightening is achieved through the subcutaneous exposure of the skin to helium plasma.
    Type: Application
    Filed: September 28, 2022
    Publication date: March 28, 2024
    Inventor: Aaron J. ROLLINS
  • Rapid Onset and Short Term Modafinil Compositions and Methods of Use Thereof
    Publication number: 20090123545
    Abstract: Compositions are described that comprise a modafÊnil component that is a combination of the d- and l-enantiomers of modafinil and wherein the modafÊnil component is greater than 50% by weight d-modafÊnil for use in promoting or enhancing the state of wakefulness, alertness, and/or central nervous system stimulation in an individual.
    Type: Application
    Filed: July 21, 2006
    Publication date: May 14, 2009
    Inventors: Eyal S. Ron, Neal M. Farber, Daniel E. Katzman, Elkan R. Gamzu
  • RAPID ONSET AND SHORT TERM MODAFINIL COMPOSITIONS AND METHODS OF USE THEREOF
    Publication number: 20110306669
    Abstract: Compositions are described that comprise a modafÊnil component that is a combination of the d- and l-enantiomers of modafinil and wherein the modafÊnil component is greater than 50% by weight d-modafÊnil for use in promoting or enhancing the state of wakefulness, alertness, and/or central nervous system stimulation in an individual.
    Type: Application
    Filed: August 22, 2011
    Publication date: December 15, 2011
    Inventors: Eyal S. Ron, Neal M. Farber, Daniel E. Katzman, Elkan R. Gamzu
  • Treatment of psychic disorders and inflammation with fused isoquinolines
    Patent number: 4232017
    Abstract: New tricyclic ortho-fused heterocyclic compounds of formula ##STR1## wherein A is the group ##STR2## or the group ##STR3## in which R represents hydrogen, (C.sub.1-4)alkyl, phenyl or tolyl and R.sub.1 and may be (C.sub.1-4)alkyl, phenyl or tolyl, R.sub.2 is selected from (C.sub.1-4)alkyl, (C.sub.2-4)alkanoylmethyl, carbo(C.sub.1-3)alkoxymethyl, hydroxy(C.sub.2-4)alkyl, halo(C.sub.2-4)alkyl and a group ##STR4## wherein R.sub.3 is an alkylene group from 2 to 4 carbon atoms and R.sub.4 and R.sub.5 independently represent hydrogen or (C.sub.1-4)alkyl or, taken together with the nitrogen atom, a fully hydrogenated 5 or 6 membered heterocyclic radical which may contain a further heteroatom selected from O, N and S and be optionally substituted by a (C.sub.1-4)alkyl or phenyl group, or R.sub.2 may represent, nil the dotted lines x and y may represent nil or additional bonds; with the proviso that, when the symbol R.sub.
    Type: Grant
    Filed: May 22, 1979
    Date of Patent: November 4, 1980
    Assignee: Gruppo Lepetit S.p.A.
    Inventors: Giorgio Winters, Nunzio Di Mola
  • NANOIMPRINT LITHOGRAPHY RESIN COMPOSITION
    Publication number: 20240018381
    Abstract: An example nanoimprint lithography (NIL) resin composition includes a total of three monomers, wherein two of the three monomers are selected from the group consisting of two different epoxy substituted silsesquioxane monomers; two different epoxy substituted cyclosiloxane monomers; and two different non-organosilicon epoxy monomers. A third of the three monomers is a fluorinated monomer that is present in an amount ranging from about from 0.5 mass % to about 4 mass %, based on a total solids content of the NIL resin composition. The NIL resin also includes a photoinitiator and a solvent.
    Type: Application
    Filed: June 28, 2023
    Publication date: January 18, 2024
    Inventors: Alexandra Szemjonov, Alexandre Richez
  • Imidazo-rifamycin derivatives with antibacterial utility
    Patent number: 4341785
    Abstract: New rifamicyn derivatives of the following general formula ##STR1## wherein: A may be the structure ##STR2## --x-- is a chemical bond or nil; R is hydrogen or acetylR.sub.1 and R.sub.2 independently represent hydrogen, (C.sub.1-4) alkyl, benzyloxy, mono- and di-(C.sub.1-3)alkylamino- (C.sub.1-4)alkyl, (C.sub.1-3)alkoxy- (C.sub.1-4)alkyl, hydroxymethyl, hydroxy-(C.sub.2-4)-alkyl, nitro or R.sub.1 and R.sub.2 taken together with two consecutive carbon atoms of the pyridine nucleus form a benzene ring optionally substituted by one or two methyl or ethyl groups; R.sub.3 is a hydrogen atom or nil;with the proviso that, when A is A.sub.1, --x-- is nil and R.sub.3 is a hydrogen atom; with the further proviso that, when A is A.sub.2, --x-- is a chemical bond and R.sub.3 is nil.The compounds possess antibacterial utility.
    Type: Grant
    Filed: May 11, 1981
    Date of Patent: July 27, 1982
    Assignee: Alfa Farmaceutici S.p.A.
    Inventors: Egidio Marchi, Lauretta Montecchi
  • Method and device for controlling a matrix screen displaying gray levels using time modulation
    Patent number: 5075683
    Abstract: A process and device for controlling a matrix screen displaying gray levels, wherein during the line time T activation signals are delivered to the columns of the screen for a time depending on the gray level i of the image point in question and equal to (T/N).Nil, where O.ltoreq.i.ltoreq.m.ltoreq.N, the Nils forming a strictly increasing sequence of i of first term zero and of last term lower than or equal to N, the Nils being so selected as to obtain a predetermined distribution for the light intensities of the different gray levels.Application to the control of microdot or liquid crystal matrix screens.
    Type: Grant
    Filed: June 14, 1989
    Date of Patent: December 24, 1991
    Assignee: Commissariat a l'Energie Atomique
    Inventor: Anne Ghis
  • CURABLE FORMULATION WITH HIGH REFRACTIVE INDEX AND ITS APPLICATION IN SURFACE RELIEF GRATING USING NANOIMPRINTING LITHOGRAPHY
    Publication number: 20200247073
    Abstract: Disclosed herein are materials for nanoimprinting lithography (NIL) and devices molded from the materials using NIL processes. According to certain aspects, an NIL material includes a mixture including a light-sensitive base resin and nanoparticles. The light-sensitive base resin is characterized by a first refractive index ranging from 1.58 to 1.77. The nanoparticles are characterized by a second refractive index greater than the first refractive index of the light-sensitive base resin. The mixture is curable to form a cured material characterized by a third refractive index greater than 1.78. The nanoparticles include from 45 wt. % to 90 wt. % of the cured material.
    Type: Application
    Filed: January 31, 2020
    Publication date: August 6, 2020
    Inventors: Tingling RAO, Ankit VORA, Austin LANE, Giuseppe CALAFIORE, Matthew E. COLBURN
  • LAMINATE, METHOD FOR PRODUCING LAMINATE, AND PERSONAL AUTHENTICATION MEDIUM
    Publication number: 20180326710
    Abstract: A transparent reflection layer is a visible light refractive index of greater than or equal to 2.0. In a plan view of a plane, the transparent reflection layer is located in a part of the transfer layer. At least a part of the transparent reflection layer is located inside an outline of the transfer layer. A portion of the transfer layer that is nil of the transparent reflection layer is a visible light refractive index of between 1.4 and 1.8 inclusive. The polycarbonate layer encloses the transfer layer. A cross section in a thickness direction of the laminate includes a first cross section that is nil of the transfer layer, a second cross section including the portion of the transfer layer that is nil of the transparent reflection layer, and a third cross section including a portion of the transfer layer that includes the transparent reflection layer.
    Type: Application
    Filed: July 25, 2018
    Publication date: November 15, 2018
    Inventor: Naoki MINAMIKAWA
  • Synthetic immunogen useful for generating long lasting immunity and protection against pathogens
    Patent number: 9340622
    Abstract: The present invention relates to a synthetic immunogen represented by the general formula 1, useful for generating long lasting protective immunity against various intracellular pathogens which are the causative agents of tuberculosis, leishmaniasis, AIDS, trypanosomiasis, malaria and also allergy, cancer and a process for the preparation thereof. The developed immunogen is able to circumvent HLA restriction in humans and livestock. The invention further relates to a vaccine comprising the said immunogen for generating enduring protective immunity against various diseases. The said vaccine is targeted against intracellular pathogens, more particularly the pathogen M. tuberculosis in this case. In the present invention, promiscuous peptides of M. tuberculosis are conjugated to TLR ligands especially; Pam2Cys to target them mainly to dendritic cells and therefore elicit long-lasting protective immunity. wherein, X1=a promiscuous CD4 T helper epitope selected from SEQ ID No.
    Type: Grant
    Filed: September 14, 2011
    Date of Patent: May 17, 2016
    Assignees: Council of Scientific & Industrial Research, University of Melbourne
    Inventors: Javed N. Agrewala, Uthaman Gowthaman, David Jackson, Weiguang Zeng
  • Control system for communication between units
    Patent number: 5077554
    Abstract: In control system for communication between units, each unit stores an adjacent-unit identifying number fixedly corresponding to each unit adjacent to one of the units, and forms a relative address, the relative address of the originating unit being "nil" and the relative address of the destination unit being expressed by a set of adjacent-unit identifying numbers of all units provided on the communication path between the originating unit and the destination unit, excluding the originating unit and including the destination unit, the signal message routing being executed in such a way that, when the received destination address is "nil", the unit receiving the message is determined to be the destination unit, and when the received destination address is not "nil", the unit receiving the message transfers the message to the next-stage unit, whereby a simple addressing process is realized.
    Type: Grant
    Filed: January 12, 1988
    Date of Patent: December 31, 1991
    Assignee: Fujitsu Limited
    Inventors: Akira Orita, Akinori Kamijo, Kohei Ueki, Takashi Hatano
  • Laminate, method for producing laminate, and personal authentication medium
    Patent number: 10471694
    Abstract: A transparent reflection layer is a visible light refractive index of greater than or equal to 2.0. In a plan view of a plane, the transparent reflection layer is located in a part of the transfer layer. At least a part of the transparent reflection layer is located inside an outline of the transfer layer. A portion of the transfer layer that is nil of the transparent reflection layer is a visible light refractive index of between 1.4 and 1.8 inclusive. The polycarbonate layer encloses the transfer layer. A cross section in a thickness direction of the laminate includes a first cross section that is nil of the transfer layer, a second cross section including the portion of the transfer layer that is nil of the transparent reflection layer, and a third cross section including a portion of the transfer layer that includes the transparent reflection layer.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: November 12, 2019
    Assignee: TOPPAN PRINTING CO., LTD.
    Inventor: Naoki Minamikawa
  • SYNTHETIC IMMUNOGEN USEFUL FOR GENERATING LONG LASTING IMMUNITY AND PROTECTION AGAINST PATHOGENS
    Publication number: 20130183377
    Abstract: The present invention relates to a synthetic immunogen represented by the general formula 1, useful for generating long lasting protective immunity against various intracellular pathogens which are the causative agents of tuberculosis, leishmaniasis, AIDS, trypanosomiasis, malaria and also allergy, cancer and a process for the preparation thereof. The developed immunogen is able to circumvent HLA restriction in humans and livestock. The invention further relates to a vaccine comprising the said immunogen for generating enduring protective immunity against various diseases. The said vaccine is targeted against intracellular pathogens, more particularly the pathogen M. tuberculosis in this case. In the present invention, promiscuous peptides of M. tuberculosis are conjugated to TLR ligands especially; Pam2Cys to target them mainly to dendritic cells and therefore elicit long-lasting protective immunity.
    Type: Application
    Filed: September 14, 2011
    Publication date: July 18, 2013
    Applicants: UNIVERSITY OF MELBOURNE, COUNCIL OF SCIENTIFIC & INDUSTRIAL RESEARCH
    Inventors: Javed Naim Agrewala, Uthaman Gowthaman, David Jackson, Weiguang Zeng
  • CLEANING COMPOSITIONS
    Publication number: 20090209447
    Abstract: The present application relates to nil phosphate and nil borate cleaning compositions comprising a protease cleaning system and a wetting agent, and processes for making and using such compositions. Such compositions offer improved enzyme stability in product and a consumer desirable cleaning profile.
    Type: Application
    Filed: February 9, 2009
    Publication date: August 20, 2009
    Inventors: Michelle Meek, Philip Frank Souter, Garry Steven Garrett, Charles Winston Saunders, Nancy L. Reeder, Brian Xiaoqing Song, Brian Lee Keith
  • CLEANING COMPOSITIONS
    Publication number: 20160122691
    Abstract: The present application relates to nil phosphate and nil borate cleaning compositions comprising a protease cleaning system and a wetting agent, and processes for making and using such compositions. Such compositions offer improved enzyme stability in product and a consumer desirable cleaning profile.
    Type: Application
    Filed: January 6, 2016
    Publication date: May 5, 2016
    Inventors: Michelle MEEK, Philip Frank SOUTER, Garry Steven GARRETT, Charles Winston SAUNDERS, Nancy L. REEDER, Brian Xiaoqing SONG, Brian Lee KEITH
  • MODIFICATION OF NANOIMPRINT LITHOGRAPHY TEMPLATES BY ATOMIC LAYER DEPOSITION
    Publication number: 20110146568
    Abstract: Methods of forming thin films on nanopatterning templates, such as nanoimprint lithography (NIL) templates are provided. In some embodiments, an atomic layer deposition (ALD) type process for modifying the surface of a NIL template comprises alternately and sequentially contacting a substrate in a reaction space with vapor phase pulses of two or more reactants.
    Type: Application
    Filed: December 21, 2007
    Publication date: June 23, 2011
    Applicant: ASM International N.V.
    Inventors: Suvi P. Haukka, Kai-Erik Elers
  • CLEANING COMPOSITIONS
    Publication number: 20140274862
    Abstract: The present application relates to nil phosphate and nil borate cleaning compositions comprising a protease cleaning system and a wetting agent, and processes for making and using such compositions. Such compositions offer improved enzyme stability in product and a consumer desirable cleaning profile.
    Type: Application
    Filed: May 29, 2014
    Publication date: September 18, 2014
    Applicant: The Procter & Gamble Company
    Inventors: Michelle MEEK, Philip Frank SOUTER, Garry Steven GARRETT, Charles Winston SAUNDERS, Nancy L. REEDER, Brian Xiaoqing SONG, Brian Lee KEITH
  • Modification of nanoimprint lithography templates by atomic layer deposition
    Patent number: 9217200
    Abstract: Methods of forming thin films on nanopatterning templates, such as nanoimprint lithography (NIL) templates are provided. In some embodiments, an atomic layer deposition (ALD) type process for modifying the surface of a NIL template comprises alternately and sequentially contacting a substrate in a reaction space with vapor phase pulses of two or more reactants.
    Type: Grant
    Filed: December 21, 2007
    Date of Patent: December 22, 2015
    Assignee: ASM INTERNATIONAL N.V.
    Inventors: Suvi P. Haukka, Kai-Erik Elers
  • NANOIMPRINT LITHOGRAPHY METHOD FOR MAKING A PATTERNED MAGNETIC RECORDING DISK USING IMPRINT RESIST WITH ENLARGED FEATURE SIZE
    Publication number: 20120138567
    Abstract: A method for making a patterned-media magnetic recording disk using nanoimprint lithography (NIL) enlarges the size of the imprint resist features after the imprint resist has been patterned by NIL. The layer of imprint resist material is deposited on a disk blank, which may have the magnetic layer already deposited on it. The imprint resist layer is patterned by NIL, resulting in a plurality of spaced-apart resist pillars with sloped sidewalls from the top to the base. An overlayer of a material like a fluorocarbon polymer is deposited over the patterned resist layer, including over the sloped resist pillar sidewalls. This enlarges the lateral dimension of the resist pillars. The overlayer is then etched to leave the overlayer on the sloped resist pillar sidewalls while exposing the disk blank in the spaces between the resist pillars.
    Type: Application
    Filed: December 1, 2010
    Publication date: June 7, 2012
    Inventors: Toshiki Hirano, Dan Saylor Kercher, Jeffrey S. Lille, Kanaiyalal Chaturdas Patel
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