Search Patents
  • Patent number: 4927432
    Abstract: An improved polishing pad material is produced by modifying conventional poromeric materials in which a porous thermoplastic resin matrix, typically polyurethane, is reinforced with a fibrous network such as a felted mat of polyester fibers. The polishing material is modified by coalescing the resin among the fibers, preferably by heat treatment, to increase the porosity and hardness of the material as well increasing the surface activity of the resin. The polishing material may also incorporate polishing aids such as particulate abrasives and may also be used as a lapping or grinding material.
    Type: Grant
    Filed: March 25, 1986
    Date of Patent: May 22, 1990
    Assignee: Rodel, Inc.
    Inventors: William D. Budinger, Elmer W. Jensen
  • Patent number: 4728552
    Abstract: The present invention relates to a poromeric article of manufacture comprising a felt sheet of fibers impregnated with microporous elastomer having a work surface, side surfaces joining the work surface and a support surface joining the side surfaces, wherein a majority of the fibers are oriented primarily transverse to the work surface such that the majority of fiber ends adjacent to the work surface form an angle of between about 45.degree. and about 135.degree. with respect to the work surface, and preferably, wherein the fibers have a uni-directional orientation substantially perpendicular to the work surface. The present invention also includes a plurality of such articles bonded together and oriented such that the work surfaces of adjacent articles are substantially coplanar to form a laminated article of manufacture. Further, processes for making the basic and laminated articles are set forth as other aspects of the invention.
    Type: Grant
    Filed: July 6, 1984
    Date of Patent: March 1, 1988
    Assignee: Rodel, Inc.
    Inventor: Elmer W. Jensen, Jr.
  • Patent number: 5578362
    Abstract: The present invention relates to an article of manufacture or polishing pad for altering a surface of a workpiece, such as polishing or planarizing a semiconductor device. The article includes a polymeric matrix impregnated with a plurality of polymeric microelements, each polymeric microelement having a void space therein. The article has a work surface and a subsurface proximate to the work surface. When the article is in contact with a working environment, polymeric microelements at the work surface of the article are less rigid than polymeric elements embedded in the subsurface. As the work surface of the article is abraded during use, the work surface of the pad may be continuously regenerated. In alternative preferred embodiments, the work surface may further include a minitexture and/or a macrotexture. Preferably, the minitexture is formed by fractal patterning at least a portion of the work surface.
    Type: Grant
    Filed: July 12, 1994
    Date of Patent: November 26, 1996
    Assignee: Rodel, Inc.
    Inventors: Heinz F. Reinhardt, John V. H. Roberts, Harry G. McClain, William D. Budinger, Elmer W. Jensen