Search Patents
  • NANOIMPRINT LITHOGRAPHY METHOD FOR MAKING A PATTERNED MAGNETIC RECORDING DISK USING IMPRINT RESIST WITH ENLARGED FEATURE SIZE
    Publication number: 20120138567
    Abstract: A method for making a patterned-media magnetic recording disk using nanoimprint lithography (NIL) enlarges the size of the imprint resist features after the imprint resist has been patterned by NIL. The layer of imprint resist material is deposited on a disk blank, which may have the magnetic layer already deposited on it. The imprint resist layer is patterned by NIL, resulting in a plurality of spaced-apart resist pillars with sloped sidewalls from the top to the base. An overlayer of a material like a fluorocarbon polymer is deposited over the patterned resist layer, including over the sloped resist pillar sidewalls. This enlarges the lateral dimension of the resist pillars. The overlayer is then etched to leave the overlayer on the sloped resist pillar sidewalls while exposing the disk blank in the spaces between the resist pillars.
    Type: Application
    Filed: December 1, 2010
    Publication date: June 7, 2012
    Inventors: Toshiki Hirano, Dan Saylor Kercher, Jeffrey S. Lille, Kanaiyalal Chaturdas Patel
  • Drive-assisting system comprising at least a fluid engine
    Patent number: 4321855
    Abstract: The invention relates to a drive-assisting device comprising at least a fluid relief engine, a source of pressurized fluid, an engine supply pipe connecting the delivery connector of the fluid source to the inlet connector of the engine, and a calibrated discharge valve, shunt-connected to the supply pipe and provided with means for adjusting its calibration, the control of which is deliberate.
    Type: Grant
    Filed: January 23, 1980
    Date of Patent: March 30, 1982
    Assignee: Poclain Hydraulics
    Inventors: Serge B. Bacquie, Jean M. R. Rouillard
  • INORGANIC MATRIX NANOIMPRINT LITHOGRAPHS AND METHODS OF MAKING THEREOF
    Publication number: 20220019015
    Abstract: The disclosure provides high refractive index ceramic material nanoimprint lithography (NIL) gratings having a relatively lower amount of carbon compared to traditional NIL gratings, and methods of making and using thereof, and devices including such gratings. The ceramic material includes one or more of titanium oxide, zirconium oxide, hafnium oxide, tungsten oxide, zinc tellurium, gallium phosphide, or any combination or derivative thereof.
    Type: Application
    Filed: June 30, 2021
    Publication date: January 20, 2022
    Inventors: Giuseppe CALAFIORE, Tingling RAO, Ankit VORA, Peter TOPALIAN
  • Duplex Stainless Steel and Method of Manufacturing Duplex Stainless Steel
    Publication number: 20190292619
    Abstract: A duplex stainless steel with good low-temperature toughness is provided. The duplex stainless steel has a chemical composition of, in mass %; up to 0.03% C; 0.1 to 0.8% Si; up to 2.3% Mn; up to 0.040% P; up to 0.010% S; up to 0.040% sol. Al; 3 to 7% Ni; 20 to 28% Cr; 0.5 to 2.0% Mo; more than 2.0% and not more than 4.0% Cu; 0.02 to 0.5% Co; 0.1 to 0.35% N; up to 0.010% O; and other elements, the steel having a microstructure including an austenite phase and a ferrite phase, the ferrite phase having an area percentage of 30 to 60%, the steel satisfying the following Formula, (1); 0.70×NiL?NiH??(1), where NiH and NiL are obtained by using an electron-beam microanalyzer to measure Ni content and, in a distribution of Ni content, determining two maximum frequencies, and treating the one with a higher Ni content as NiH and treating the one with a lower Ni content as NiL.
    Type: Application
    Filed: May 24, 2017
    Publication date: September 26, 2019
    Inventors: Daisuke Motoya, Masayuki Sagara, Hidenori Shitamoto
  • NANOIMPRINT LITHOGRAPHY PROCESS AND PATTERNED SUBSTRATE OBTAINABLE THEREFROM
    Publication number: 20200218147
    Abstract: The present invention pertains to the field of nanoimprint lithography (NIL) processes and more specifically to a soft NIL process used for providing a sol-gel patterned layer on a substrate. Specifically, this process comprises a step of adjusting the solvent uptake of the sol-gel film to 10 to 50% vol., preferably between 15 and 40% vol., by varying the relative pressure of the solvent while a soft mould is applied onto the substrate coated with the sol-gel film.
    Type: Application
    Filed: March 8, 2018
    Publication date: July 9, 2020
    Inventors: David GROSSO, Marco FAUSTINI, Olivier DALSTEIN, Andréa CATTONI, Thomas BOTTEIN
  • Inorganic matrix nanoimprint lithographs and methods of making thereof with reduced carbon
    Patent number: 11543584
    Abstract: The disclosure provides high refractive index ceramic material nanoimprint lithography (NIL) gratings having a relatively lower amount of carbon compared to traditional NIL gratings, and methods of making and using thereof, and devices including such gratings. The ceramic material includes one or more of titanium oxide, zirconium oxide, hafnium oxide, tungsten oxide, zinc tellurium, gallium phosphide, or any combination or derivative thereof.
    Type: Grant
    Filed: June 30, 2021
    Date of Patent: January 3, 2023
    Assignee: META PLATFORMS TECHNOLOGIES, LLC
    Inventors: Giuseppe Calafiore, Tingling Rao, Ankit Vora, Peter Topalian
  • Duplex stainless steel and method of manufacturing duplex stainless steel
    Patent number: 11066719
    Abstract: A duplex stainless steel with good low-temperature toughness is provided. The duplex stainless steel has a chemical composition of, in mass %: up to 0.03% C; 0.1 to 0.8% Si; up to 2.3% Mn; up to 0.040% P; up to 0.010% S; up to 0.040% sol. Al; 3 to 7% Ni; 20 to 28% Cr; 0.5 to 2.0% Mo; more than 2.0% and not more than 4.0% Cu; 0.02 to 0.5% Co; 0.1 to 0.35% N; up to 0.010% O; and other elements, the steel having a microstructure including an austenite phase and a ferrite phase, the ferrite phase having an area percentage of 30 to 60%, the steel satisfying the following Formula, (1); 0.70×NiL?NiH??(1), where NiH and NiL are obtained by using an electron-beam microanalyzer to measure Ni content and, in a distribution of Ni content, determining two maximum frequencies, and treating the one with a higher Ni content as NiH and treating the one with a lower Ni content as NiL.
    Type: Grant
    Filed: May 24, 2017
    Date of Patent: July 20, 2021
    Assignee: Nippon Steel Corporation
    Inventors: Daisuke Motoya, Masayuki Sagara, Hidenori Shitamoto
  • Process for the Preparation of 4,7-Dimethoxy-5-Methyl-1,3-Benzodioxole and Derivatives Thereof
    Publication number: 20110137050
    Abstract: Disclosed herein is a novel process for the preparation of a compound of formula (I), In which a compound of formula (II) is reacted with a Lewis acid to produce a compound of formula (III); and the compound of formula (III) is subsequently reacted with dihalomethane to give the desired compound of formula (I); wherein R is nil or C1-6 alkyl, and X is nil, a nitro group, an amino group or a halogen selected from the group consisting of F, Cl, Br and I.
    Type: Application
    Filed: December 4, 2009
    Publication date: June 9, 2011
    Applicant: YONG CHUN PROSPEROUS BIOTECH CO.
    Inventors: Kai-Yih Tarng, Jenn-Tsang Hwang
  • Method of fabricating nanoimprint mold
    Publication number: 20070128549
    Abstract: Provided is a method of fabricating a nanoimprint mold which can form sub-100 nm fine pattern structures. The method includes forming patterns on a first substrate using an E-beam lithography (EBL) process, and transferring the patterns formed on the first substrate to a second substrate using a nanoimprint lithography (NIL) process to complete an NIL mold. Accordingly, the method can easily fabricate the nanoimprint mold at low costs on a quartz or glass substrate, which is not suitable for an EBL process to produce sub-100 nm patterns, by utilizing the advantages of the EBL process with a resolution of tens of nanometers.
    Type: Application
    Filed: August 17, 2006
    Publication date: June 7, 2007
    Inventors: Jong Park, Hyo Lee, Nak Choi, Jung Lee, Gyeong Bang
  • ROLL-TO-ROLL NANOIMPRINT LITHOGRAPHY TOOLS AND PROCESSES
    Publication number: 20220229361
    Abstract: A method and system for configuring ultraviolet (UV)-based nanoimprint lithography (NIL) for roll-to-roll (R2R) processing, which combines the benefits of inexpensive R2R processing with the precise nanoscale patterning afforded by NIL. Furthermore, an R2R fabrication process is used to create nanoscale copper (Cu) metal mesh electrodes on flexible polycarbonate substrates and rigid quartz substrates employing jet-and-flash nanoimprint lithography (J-FIL), linear ion source etching (LIS) and selective electroless Cu metallization (ECu) using a palladium (Pd) seed layer.
    Type: Application
    Filed: May 13, 2020
    Publication date: July 21, 2022
    Inventors: Sidlgata V. Sreenivasan, Parth Pandya, Shrawan Singhal, Paras Ajay, Ziam Ghaznavi, Ovadia Abed, Michael Watts
  • Level-shifter circuit and memory device comprising said circuit
    Publication number: 20080285359
    Abstract: A level-shifter circuit is adapted for shift an input voltage into an output voltage that is variable between a negative voltage value up to a preset positive voltage level. The shifter circuit includes a first circuit adapted to shift the input voltage into the preset positive voltage level, a second circuit adapted to transfer the preset voltage level to a third circuit connected to a preset negative voltage value. The third circuit is connected to a further voltage at a positive or nil level and is adapted to supply an output voltage to the preset negative level or to the positive or nil level.
    Type: Application
    Filed: May 14, 2008
    Publication date: November 20, 2008
    Applicant: STMicroelectronics S.r.l.
    Inventors: Guido De Sandre, Andrea Ambrosino, Marco Pasotti
  • Level-shifter circuit and memory device comprising said circuit
    Patent number: 7835201
    Abstract: A level-shifter circuit is adapted for shift an input voltage into an output voltage that is variable between a negative voltage value up to a preset positive voltage level. The shifter circuit includes a first circuit adapted to shift the input voltage into the preset positive voltage level, a second circuit adapted to transfer the preset voltage level to a third circuit connected to a preset negative voltage value. The third circuit is connected to a further voltage at a positive or nil level and is adapted to supply an output voltage to the preset negative level or to the positive or nil level.
    Type: Grant
    Filed: May 14, 2008
    Date of Patent: November 16, 2010
    Assignee: STMicroelectronics S.r.l.
    Inventors: Guido De Sandre, Andrea Ambrosino, Marco Pasotti
  • NANOIMPRINTED ELECTRODES FOR FUEL CELLS
    Publication number: 20090075142
    Abstract: Nanoimprint lithography (NIL) method to fabricate electrodes with high specific Pt surface areas that can be used in fuel cell devices. The Pt catalyst structures were found to have electrochemical active surface areas (EAS) ranging from 0.8 to 1.5 m2g?1 Pt. These NIL catalyst structures include fuel cell membrane electrode assemblies (MEA) that are prepared by directly embossing a Nafion membrane. The features of the mold were transferred to the Nafion® and a thin film of Pt was deposited at a wide angle to form the anode catalyst layer. The resulting MEA yielded a Pt utilization of 15,375 mW mg?1 Pt compared to conventionally prepared MEAs (820 mW mg?1 Pt).
    Type: Application
    Filed: September 15, 2008
    Publication date: March 19, 2009
    Applicant: THE REGENTS OF UNIVERSITY OF MICHIGAN
    Inventors: Andre D. Taylor, Brandon D. Lucas
  • LIGHT EMITTING TOUCHPAD DEVICE
    Publication number: 20200301523
    Abstract: The present disclosure discloses a light emitting touch pad device including a circuit board, a plurality of sensing elements, a light guiding plate, a light emitting component, and a plurality of first spacing blocks. The sensing elements are disposed on the circuit board, and a distance between geometric centers of two adjacent sensing elements is a first length. The light guiding plate is disposed above the circuit board, and includes at least one light spot area and at least one nil-light spot area. The light emitting component emits light toward the light guiding plate. The first spacing blocks are disposed on the light guiding plate, and are located in the nil-light spot area. A distance between geometric centers of two adjacent first spacing blocks is a second length, and a spacing distance between two adjacent first spacing blocks is a third length.
    Type: Application
    Filed: March 5, 2020
    Publication date: September 24, 2020
    Inventors: HSUAN-WEI HO, YUEH-HENG LEE
  • Bunk bed/sofa
    Patent number: D642396
    Type: Grant
    Filed: July 15, 2009
    Date of Patent: August 2, 2011
    Inventor: Nils Dencker
  • Electric grill
    Patent number: D830760
    Type: Grant
    Filed: September 18, 2017
    Date of Patent: October 16, 2018
    Assignee: TEFAL
    Inventor: Nils Wessels
  • Smartglasses
    Patent number: D888819
    Type: Grant
    Filed: December 28, 2018
    Date of Patent: June 30, 2020
    Inventor: Nils Berger
  • Electric grill
    Patent number: D920730
    Type: Grant
    Filed: July 26, 2019
    Date of Patent: June 1, 2021
    Assignee: TEFAL
    Inventor: Nils Wessels
  • Lamp
    Patent number: D922647
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: June 15, 2021
    Inventor: Nils De Laeter
  • Electric meat grill
    Patent number: D1006524
    Type: Grant
    Filed: September 27, 2022
    Date of Patent: December 5, 2023
    Inventor: Nils Wessels
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