Search Patents
  • Publication number: 20020006877
    Abstract: Planarizing High Temperature Superconductor (HTS) surfaces, especially HTS thin film surfaces is crucial for HTS thin film device processing. Disclosed is a method of surface planarization for HTS film. The method includes first smoothing the HTS surface by Gas Cluster Ion Beam bombardment, followed by annealing in partial pressure of oxygen to regrow the damaged surface layer. A rough HTS surface can be planarized down to a smoothness with a standard deviation of one nanometer or better.
    Type: Application
    Filed: June 25, 2001
    Publication date: January 17, 2002
    Applicant: Epion Corporation
    Inventors: Wei-Kan Chu, Judy Z. Wu
  • Patent number: 6251835
    Abstract: Planarizing High Temperature Superconductor (HTS) surfaces, especially HTS thin film surfaces is crucial for HTS thin film device processing. Disclosed is a method of surface planarization for HTS film. The method includes first smoothing the HTS surface by Gas Cluster Ion Beam bombardment, followed by annealing in partial pressure of oxygen to regrow the damaged surface layer. A rough HTS surface can be planarized down to a smoothness with a standard deviation of one nanometer or better.
    Type: Grant
    Filed: May 6, 1998
    Date of Patent: June 26, 2001
    Assignee: Epion Corporation
    Inventors: Wei-Kan Chu, Judy Z. Wu