Abstract: A magnetron includes semi-circularly shaped electric field adjusting grooves provided on surfaces of outer ends of vanes brought into contact with an inner surface of a positive polar body to make distribution of an electric field uniform on the surfaces of the outer ends of the vanes. Accordingly, the electric field becomes uniform by the electric field adjusting grooves provided on the surfaces of the outer ends of the vanes, so that generation of undesirable harmonics is suppressed.
Type:
Grant
Filed:
December 22, 2003
Date of Patent:
November 14, 2006
Assignee:
Samsung Electronics Co., Ltd.
Inventors:
Jong-Chull Shon, Boris V. Rayskiy, Hyun-Jun Ha
Abstract: A magnetron includes a positive polar cylinder, a plurality of vanes, a filament, upper and lower shields, and upper and lower pole pieces. The vanes are disposed in the positive polar cylinder to constitute a positive polar section. The filament is disposed on an axis of the positive polar cylinder to define an activating space. The upper and lower shields cover a top and bottom of the filament, respectively. The upper and lower pole pieces are disposed to induce magnetic flux into the activating space. The upper shield preferably has a diameter ranging from 6.95 mm to 7.10 mm. Additionally, the lower shield preferably has a diameter ranging from 6.95 mm to 7.10 mm.
Type:
Application
Filed:
November 27, 2002
Publication date:
February 5, 2004
Applicant:
SAMSUNG ELECTRONICS CO., LTD.
Inventors:
Jong-Chull Shon, Boris V. Rayskiy, Chul Kim, Hyun-Jun Ha
Abstract: A magnetron includes a positive polar cylinder, a plurality of vanes, a filament, upper and lower shields, and upper and lower pole pieces. The vanes are disposed in the positive polar cylinder to constitute a positive polar section. The filament is disposed on an axis of the positive polar cylinder to define an activating space. The upper and lower shields cover a top and bottom of the filament, respectively. The upper and lower pole pieces are disposed to induce magnetic flux into the activating space. The upper shield preferably has a diameter ranging from 6.95 mm to 7.10 mm. Additionally, the lower shield preferably has a diameter ranging from 6.95 mm to 7.10 mm.
Type:
Grant
Filed:
November 27, 2002
Date of Patent:
March 15, 2005
Assignee:
Samsung Electronics Co., Ltd.
Inventors:
Jong-Chull Shon, Boris V. Rayskiy, Chul Kim, Hyun-Jun Ha