Abstract: A resilient element includes interconnected lower and upper parts. The lower part includes a planar bottom segment having front and rear ends, a first curved segment that curves upwardly and rearwardly from the front end of the planar bottom segment, and a second curved segment that curves upwardly and forwardly from the rear end of the planar bottom segment. The upper part includes a planar top portion having front and rear ends, a first curved portion that curves downwardly and rearwardly from the front end of the planar top portion, and a second curved portion that curves downwardly and forwardly from the rear end of the planar top portion. The first curved segment and the second curved portion have interconnected distal ends.

Abstract: The present invention relates generally to methods, apparatus and materials to reduce or minimize the heating of a substrate (and associated distortions of the photomask) caused by electron-beam energy deposited in the substrate during patterning. Heating of the substrate is exacerbated by radiative transfer of infrared energy from the substrate to other nearby components of the e-beam apparatus followed by reflection or re-radiation of a portion of the energy back to the substrate. The present invention provides useful materials and methods for reducing such reflection or re-radiation effects, leading to temperature stability of the substrate, reduced thermal distortion and the possibility of increased patterning accuracy.

Abstract: The present invention provides a technique for determining characteristics of substrates, such as the presence of contaminants, shape, as well as the spatial relationships between spaced-apart substrates. The spatial relationships include distance and angular orientation, between first and second spaced apart substrates. The technique includes forming a volume of fluid on the second substrate, with the volume of fluid having an area associated therewith. The volume of fluid is compressed between the first and second substrates to effectuate a change in properties of the area, defining changed properties. The changed properties are sensed, and the characteristics of the first and second substrates are determined as a function of the changed properties.

Abstract: Processes and associated devices for high precision positioning of a template an substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of maintaining a uniform gap between the template and substrate. The fine orientation stage includes a pair of flexure members having flexure joints for motion about a pivot point intersected by first and second orientation axes. Actuators lengthen or shorten to expand or contract the flexure members. Separation of the template is achieved using a peel-and-pull method that avoids destruction of imprinted features from the substrate.

Abstract: Processes and associated devices for high precision positioning of a template an substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of maintaining a uniform gap between the template and substrate. The fine orientation stage includes a pair of flexure members having flexure joints for motion about a pivot point intersected by first and second orientation axes. Actuators lengthen or shorten to expand or contract the flexure members. Separation of the template is achieved using a peel-and-pull method that avoids destruction of imprinted features from the substrate.

Abstract: An electrical connector includes first conductive terminals disposed on a bottom wall of a dielectric housing, each of which has a first contacting end portion opposite to a first coupling end portion that extends outwardly of one of a front open side and a rear side of the housing and projecting into a first card receiving space confined by the bottom wall, a partition wall and lower wall portions of opposite lateral walls of the housing, and second conductive terminals disposed on the partition wall, each of which has a second contacting end portion opposite to a second coupling end portion that extends outwardly of the rear side of the housing and projecting into a second card receiving space confined by the partition wall, upper wall portions of the lateral walls, and a cover plate mounted on the lateral walls and disposed above the partition wall.

Abstract: A filtering technique for free space communication that features an improved extinction ratio by providing a filter that employs a bulk holographic transform function and a polarizing film. In this manner, a greater number of channels of communication may be provided in a unit volume while preventing unwanted cross-talk between the communication channels. To that end, the system includes a source of energy to direct energy along a path, a detector disposed in the path, and a filter. The filter has a surface upon which a polarizing film is disposed and a holographic transform function recorded throughout a volume thereon.

Abstract: A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.

Abstract: Provided is a technique for generating patterns with a raster scanned beam in a photolithographic system that employs a multiple blank position flash cycle. In accordance with one embodiment of the present invention, a beam creates a shadow of a first aperture that impinges upon a region of a stop, referred to as a first blank position. The beam is deflected so that the shadow of the first aperture moves along a first direction to a flash position, in which a portion thereof superimposes a second aperture located in the stop. To complete the flash cycle, the beam is deflected so that shadow of the first aperture impinges upon a second region of the stop, referred to as second blank position. As a result, during the flash cycle, the beam is deflected in one direction to impinge upon two different blank positions.

Abstract: A pair of eyeglasses includes a lens member formed with left and right retention holes respectively disposed adjacent to opposites sides thereof, and an arcuate groove that extends between the left and right retention holes, that is indented inwardly from a front face and that has two end portions. An elongated connecting member of a temple unit has two end segments extending respectively and rearwardly through the end portions of the groove, and an intermediate segment that is disposed within the groove and that interconnects the end segments. Temples are respectively pivoted to the end segments which are respectively formed with engaging tongues projecting frontwardly into and engaging the retention holes in the lens member.

Abstract: The present invention provides a device and method to facilitate use of a golf club, having a face, as a system to improve a user's performance in the game of golf. The device includes a body having first and second opposed surfaces; and a clamping mechanism connected to the body to securely affix the body to the golf club, with the second surface being coextensive with the first surface and having an arcuate shape with a constant radius of curvature.

Abstract: Disclosed are a method, system and holder for transferring templates during imprint lithography processes. To that end, a method for handling a template, having a patterned mold thereon, in an imprint lithography system having a motion stage with a chucking device coupled thereto, includes providing the template into a template transfer holder. The template transfer holder includes a side coupled to the motion stage and support members extending from the side. The template is disposed within the template transfer holder so as to have the patterned mold facing the side and spaced-apart therefrom. Relative movement is created between the motion stage and an imprint head to place the template transfer holder and the imprint head in superimposition. The template is removed from the template transfer holder, and the template is suspended above the wafer chuck by the imprint head. In another embodiment, a system and a template holder are described that facilitates the method.

Abstract: The present invention provides a low-k dielectric constant structure and method of forming the same on a substrate 10 that features having a dielectric layer 20 with differing regions of density 12 and 18. To that end, the method includes depositing, upon the substrate, a dielectric layer having first and second density regions. The density associated with the second density region being greater than the density associated with the first density region, and the first density region being disposed between the substrate and the second density region.

Abstract: A bicycle wheel rim includes an annular rim body having left and right annular tire retaining walls with inner edges connected to left and right edges of an annular spoke mounting wall. Each of a pair of annular corner reinforcing members is formed integrally with the rim body at a junction of a corresponding one of the left and right edges of the spoke mounting wall with the inner edge of a respective one of the tire retaining walls. Each of the corner reinforcing members extends laterally outward relative to the respective one of the tire retaining walls, and further extends radially inward relative to the spoke mounting wall.

Abstract: A thermally-shaped optical fiber and a method for forming the same so as to minimize the presence of optical artifacts in the optical fiber that contributes to insertion loss.

Abstract: A method and apparatus is disclosed to monitor and/or control the electrical states at a workpiece disposed in a plasma chamber that is in electrical communication with an RF signal source over a defined signal path. The method includes ascertaining an impedance of the signal path, sensing electrical characteristics of the RF power at the RF signal source and obtaining values of the electrical states at the workpiece. To provide a more accurate model of the electrical states at the workpiece, the modeling includes information concerning the impedance introduced by the signal path. This technique may be employed to provide feedback control of the RF generator, so that the electrical states may be dynamically adjusted be within predefined, or desired, parameters.

Abstract: The present invention provides a real-time luminescent piezoelectric detector capable of sensing the presence of biological and chemical agents. This detector includes a free-standing thin film that is driven by a frequency driver to produce light emitted from an edge of the thin film. A surface layer sensitive to the biological or chemical agent to be detected is disposed on the surface of the thin film. In the presence of the biological or chemical agent to be detected, the light emitted from the edge of the thin film structure is altered. A processor capable of determining the presence and/or concentration of the biological or chemical agent in question based on the altered emitted light receives an output representative of the emitted light and outputs the status of the presence and/or concentration of the biological or chemical agent in question.

Abstract: Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder.