Patents Represented by Attorney Philip A. Dalton
  • Patent number: 5200855
    Abstract: High purity (95-99.5 percent) red, orange and yellow filters are disclosed which comprise a periodic stack of relatively low index of refraction dielectric material (L) such as SiO.sub.2 or MgF.sub.2 and absorbing relatively high index material such as silicon or Fe.sub.2 O.sub.3. Together, the low and high index materials provide a high index ratio (typically 1.7 to 2.5). The filters are fabricated according to designs such as (H/2 L H/2).sup.n, typically using only 5 to 7 layers. Despite the very small layer count, these filters provide overall optical performance which is at least the equivalent of all-dielectric filters of 30 or more layers, with color purity that is unachievable by all-dielectric filters and simple low cost design. In addition, our filters have inherently low stress levels and absorb and reflect unwanted light such as blue light.
    Type: Grant
    Filed: July 12, 1991
    Date of Patent: April 6, 1993
    Assignee: Optical Coating Laboratory, Inc.
    Inventors: William A. Meredith, Jr., Paul M. LeFebvre
  • Patent number: 5186718
    Abstract: A processing system for workpieces such as semiconductor wafers is disclosed which incorporates multiple, isolated vacuum stages between the cassette load lock station and the main vacuum processing chambers. A vacuum gradient is applied between the cassette load lock and the main processing chambers to facilitate the use of a very high degree of vacuum in the processing chambers without lengthy pump down times. Separate robot chambers are associated with the vacuum processing chambers and the load lock(s). In addition, separate transport paths are provided between the two robot chambers to facilitate loading and unloading of workpieces. Pre-treatment and post-treatment chambers may be incorporated in the two transport paths.
    Type: Grant
    Filed: April 15, 1991
    Date of Patent: February 16, 1993
    Assignee: Applied Materials, Inc.
    Inventors: Avi Tepman, Howard Grunes, Sasson Somekh, Dan Maydan
  • Patent number: 5167453
    Abstract: A recorder is disclosed for producing a continuous data record and comprises a case, a strip chart which is wound from a chart storage compartment onto a spring-driven take-up spool, and a speed-reducing governor comprising a gear train which is operatively connected to a hub and spoke assembly immersed in small spheres or balls, preferably of environmentally impervious material such as glass. The sphere-immersed paddle wheel approximates the drag of viscous fluid systems, with advantages which include independence of drag characteristics from temperature variation, simplicity, and easy speed adjustment, that is, the size of the spheres can be used to change the speed of the recorder.
    Type: Grant
    Filed: October 22, 1991
    Date of Patent: December 1, 1992
    Inventors: George Nakagawa, Robert M. Nakagawa
  • Patent number: 5158644
    Abstract: A reactor chamber self-cleaning process is disclosed which uses a fluorocarbon-containing gas and, preferably, C.sub.2 F.sub.6 in combination with oxygen. The two-step process involves, first, a chamber-wide etch at relatively low pressure and with relatively large separation between the gas inlet manifold and the wafer supports which are the RF electrodes and, second, a local etch step which uses a relatively high chamber pressure and smaller electrode spacing, to complete the cleaning of the RF electrodes.
    Type: Grant
    Filed: October 10, 1991
    Date of Patent: October 27, 1992
    Assignee: Applied Materials, Inc.
    Inventors: David Cheung, Peter Keswick, Jerry Wong
  • Patent number: 5155627
    Abstract: An optical screen or cover for computer monitors and other video displays comprises a frame to which is mounted an optical plate such as an anti-glare screen, and a concave, U-shaped lip which is mounted to the rear of the frame along three sides of the frame. The lip slides onto and off the monitor for mounting and removing the cover. Also, the lip adapts to monitors of different sizes and provides a snug, custom-appearing fit.
    Type: Grant
    Filed: October 4, 1991
    Date of Patent: October 13, 1992
    Assignee: Optical Coating Laboratory, Inc.
    Inventors: Donald L. Keehn, David L. Soberanis, Russell E. Barbaria
  • Patent number: 5154810
    Abstract: A system and process for forming optical quality, protective, relatively thick, thin film coatings on workpieces such as detectors or solar cells. The apparatus includes a rotary cylindrical sputtering system which incorporates separate deposition devices and at least one chemical reaction device for simultaneously (1) depositing materials which form tensile and compressive oxides and (2) oxidizing the deposited materials. The system also includes a stressometer system, preferably a cantilevered beam stressometer system which monitors the stress of the depositing film in-situ. The monitored stress levels are used to control the relative amounts of compressive and tensile materials which are deposited and, thus, control stress in the thin film coatings. In a preferred embodiment for forming protective covers on solar cells, the deposition devices are linear magnetron sputter cathode devices having silicon and aluminum targets, and the reaction device is a linear magnetron ion source oxidizer device.
    Type: Grant
    Filed: January 29, 1991
    Date of Patent: October 13, 1992
    Assignee: Optical Coating Laboratory, Inc.
    Inventors: Marc A. Kamerling, William T. Beauchamp, Robert E. Klinger, John P. Lehan
  • Patent number: 5124013
    Abstract: A high ratio planetary drive system, a vacuum processing chamber system incorporating the planetary drive system, and a method of operating the system are disclosed. The planetary drive system provides relatively slow planetary workpiece rotation for effecting processing (deposition and reaction) of thin films, in particular, optical thin films, with complete film oxidation, controlled film uniformity, reduced bearing wear and reduced heat dissipation.
    Type: Grant
    Filed: January 10, 1991
    Date of Patent: June 23, 1992
    Assignee: Optical Coating Laboratory, Inc.
    Inventors: Richard I. Seddon, John D. Sonderman
  • Patent number: 5112644
    Abstract: A simple, double rotary workpiece or cage holder is disclosed for coating articles such as tubes or article-holders. The articles or article holders are supported in oversized support holes or on undersized pegs so that rotation of the cage about a horizontal axis causes gravity-induced precession of the tubes. The center of gravity of the article holders may be displaced so that the article holders are maintained at an acute angle relative to the cage axis, to facilitate coating difficult shapes such as lenses.
    Type: Grant
    Filed: March 8, 1990
    Date of Patent: May 12, 1992
    Assignee: Optical Coating Laboratory, Inc.
    Inventors: Richard I. Seddon, Michael D. Temple
  • Patent number: 5099531
    Abstract: The present invention attaches a row of fasteners such as buttons along the foot of a mattress. Holes are also provided in associated sheets, blankets, comforters and other covers. Preferably, the fasteners are mounted on fairly long, flexible shanks so that they can pass through the holes in the layers of covers to secure and automatically align the covers relative to the mattress and to one another. The covers may be fastened to one another at the top edges thereof using fasteners such as button tracks. The foot and edge fasteners facilitate making and remaking the bed covers. Also, the fasteners and holes may be formed in a standardized configuration and spacing to provide upward and downward compatibility among different mattress sizes.
    Type: Grant
    Filed: April 5, 1990
    Date of Patent: March 31, 1992
    Inventor: Kenneth J. Schmier
  • Patent number: 5097985
    Abstract: A soft-throw machine is disclosed that dispenses softballs or baseballs or other articles one at a time (or alternatively, a selected plurality or multiplicity at a time) from a reservoir onto a chute for delivery to a hitting area where a person may strike the ball. In addition to its automatic dispensing, soft-throwing capability, the machine is specially designed for quiet operation to decrease the possibility that the striker or batter can anticipate delivery of the ball.
    Type: Grant
    Filed: May 31, 1990
    Date of Patent: March 24, 1992
    Inventor: Kenneth E. Jones
  • Patent number: 5098198
    Abstract: The temperature of a semiconductor wafer during annealing of metallization is accurately and indirectly monitored by supporting the wafer on a thin susceptor of constant emissivity and monitoring the temperature of the susceptor. The system has the added advantage of providing efficient, controlled heating of the wafer by radiant heating of the backside of the susceptor.
    Type: Grant
    Filed: September 3, 1991
    Date of Patent: March 24, 1992
    Assignee: Applied Materials, Inc.
    Inventors: Jaim Nulman, Dan Maydan
  • Patent number: 5088535
    Abstract: An improved bicycle tire tread comprising selected combinations of tread block and trough dimensions and concave, convex and beveled tread surface configurations, is disclosed.
    Type: Grant
    Filed: May 25, 1990
    Date of Patent: February 18, 1992
    Assignee: Specialized Bicycle Components, Inc.
    Inventors: Stephen M. Potts, Mark J. Slate, Charles B. Cunningham, James H. Merz
  • Patent number: 5083865
    Abstract: A particle monitor for a processing chamber exhaust line is disclosed which incorporates exhaust line heating, purge gas flow over surfaces such as optical windows in the exhaust gas line, and a thermally and electrically insulating particle monitor mounting arrangement. The features collectively protect the particle monitor from electrical disturbance and from the heated inlet and maintain the optical surfaces clean and free of depositions from the exhaust gas flow for an extended period. The arrangement also suppresses etching of the optical surfaces.
    Type: Grant
    Filed: May 11, 1990
    Date of Patent: January 28, 1992
    Assignee: Applied Materials, Inc.
    Inventors: Patrick Kinney, Boris Fishkin, Jun Zhao, Anand Gupta, Robert Bendler
  • Patent number: 5057024
    Abstract: A computer controlled illuminated globe almanac is disclosed for rotating the globe to a selected viewing position and illuminating selected points, lines and areas on the globe. The system also displays and/or prints associated almanac-type data such as, for example, city or country name and population, river name an length, etc.
    Type: Grant
    Filed: August 22, 1988
    Date of Patent: October 15, 1991
    Inventors: Glenn C. Sprott, Ruth J. Sprott, Kevin C. Malone
  • Patent number: 5007196
    Abstract: A non-toxic, non-chemical device and system for repelling crawling insects from a structure such as a building and training the insects to go elsewhere includes closely-spaced elongated conductors mounted on an insulating base and having a potential difference applied thereto for providing a insect-stunning short-circuit current of about fifteen microamps. When insects bridge the conductors, they receive a current as a function of their internal resistance. The conductors are mounted via the base along the foundation and about posts and other structures which connect into the building. Preferably, the conductors are also slippery and reflective to assist in repelling and training the insects without bridging the conductors.
    Type: Grant
    Filed: February 8, 1990
    Date of Patent: April 16, 1991
    Inventors: Anne L. Saunders, John G. Fields
  • Patent number: 5000113
    Abstract: A high pressure, high throughput, single wafer, semiconductor processing reactor is disclosed which is capable of thermal CVD, plasma-enhanced CVD, plasma-assisted etchback, plasma self-cleaning, and deposition topography modification by sputtering, either separately or as part of in-situ multiple step processing. The reactor includes cooperating arrays of interdigitated susceptor and wafer support fingers which collectively remove the wafer from a robot transfer blade and position the wafer with variable, controlled, close parallel spacing between the wafer and the chamber gas inlet manifold, then return the wafer to the blade. A combined RF/gas feed-through device protects against process gas leaks and applies RF energy to the gas inlet manifold without internal breakdown or deposition of the gas. The gas inlet manifold is adapted for providing uniform gas flow over the wafer.
    Type: Grant
    Filed: December 19, 1986
    Date of Patent: March 19, 1991
    Assignee: Applied Materials, Inc.
    Inventors: David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy, Kenneth S. Collins, John A. Adamik, Ilya Perlov, Dan Maydan
  • Patent number: 4969716
    Abstract: The fabrication and structure of a hermetically sealed, environmentally-sensitive, thin film coating between two planar transmitting substrates is disclosed. The edges of the substrates are metallized to allow solder to wet and form a vapor barrier. Two such substrates are assembled with an O-ring spacer or an epoxy/glue spacer and the assembly is then soldered to a protective ring using a benign low temperature indium based solder. Fluxes from the soldering step are separated from the coating by the O-ring spacer, which also acts as an aperture stop.
    Type: Grant
    Filed: April 3, 1989
    Date of Patent: November 13, 1990
    Assignee: Optical Coating Laboratory, Inc.
    Inventors: Michael A. Scobey, Robert S. Lipsky
  • Patent number: 4960488
    Abstract: A process for cleaning a reactor chamber both locally adjacent the RF electrodes and also throughout the chamber and the exhaust system to the including components such as the throttle valve. Preferably, a two-step continuous etch sequence is used in which the first step uses relatively high pressure, close electrode spacing and fluorocarbon gas chemistry for etching the electodes locally and the second step uses relatively lower pressure, farther electrode spacing and fluorinated gas chemistry for etching throughout the chamber and exhaust system. The local and extended etch steps may be used separately as well as together.
    Type: Grant
    Filed: December 19, 1989
    Date of Patent: October 2, 1990
    Assignee: Applied Materials, Inc.
    Inventors: Kam S. Law, Cissy Leung, Ching C. Tang, Kenneth S. Collins, Mei Chang, Jerry Y. K. Wong, David Nin-Kou Wang
  • Patent number: 4951604
    Abstract: A vacuum evaporation plasma plating system is disclosed in which the plasma and the crucible containing the evaporant material are part of an electrical circuit which effects vacuum evaporation operation. The crucible includes a constant anode cap which is heated by the plasma and thus maintains a low resistance circuit path to the crucible and also provides a uniform source of evaporant.
    Type: Grant
    Filed: February 17, 1989
    Date of Patent: August 28, 1990
    Assignee: Optical Coating Laboratory, Inc.
    Inventors: Michael D. Temple, Richard I. Seddon
  • Patent number: 4951601
    Abstract: An integrated modular multiple chamber vacuum processing system is disclosed. The system includes a load lock, may include an external cassette elevator, and an internal load lock wafer elevator, and also includes stations about the periphery of the load lock for connecting one, two or several vacuum process chambers to the load lock chamber. A robot is mounted within the load lock and utilizes a concentric shaft drive system connected to an end effector via a dual four-bar link mechanism for imparting selected R-.theta. movement to the blade to load and unload wafers at the external elevator, internal elevator and individual process chambers. The system is uniquely adapted for enabling various types of IC processing including etch, deposition, sputtering and rapid thermal annealing chambers, thereby providing the opportunity for multiple step, sequential processing using different processes.
    Type: Grant
    Filed: June 23, 1989
    Date of Patent: August 28, 1990
    Assignee: Applied Materials, Inc.
    Inventors: Dan Maydan, Sasson Somekh, David N. Wang, David Cheng, Masato Toshima, Isaac Harari, Peter D. Hoppe