Patents Assigned to Archimedes Technology Group, Inc.
  • Patent number: 6203669
    Abstract: A method and system for separating radioactive waste containing volatiles, into light ions and heavy ions, includes a loader/transporter for transferring the waste into a high vacuum environment in the chamber of a plasma processor. During this transfer, gases of the volatiles are released from the waste, collected in a holding tank, and subsequently ionized in the chamber. As the volatiles are ionized, the ions are directed by a magnetic field into contact with the waste to vaporize the waste. The waste vapors are then ionized in the plasma processor chamber to create a multi-species plasma which includes electrons, light ions and heavy ions. Within the chamber, the density of the multi-species plasma is established to be above its collision density in order to establish a substantially uniform velocity for all ions in the plasma. A nozzle accelerates the multi-species plasma to generate a fluid stream which is directed from the chamber toward an inertial separator.
    Type: Grant
    Filed: March 24, 1999
    Date of Patent: March 20, 2001
    Assignee: Archimedes Technology Group, Inc.
    Inventor: Tihiro Ohkawa
  • Patent number: 6204510
    Abstract: An apparatus for altering the surface of a substrate includes a housing that is formed with an enclosed chamber having a first end and a second end. The chamber defines a longitudinal axis extending between the ends, and the substrate is positioned near the second end. A set of conductors are mounted in the chamber parallel to the longitudinal axis, and each conductor carries a current to establish a magnetic field (B) in said chamber. A first casing and a second casing surround each conductor with time alternating voltages being applied on the set of first casings to generate a plasma. The second casings are electrically insulated from a respective first casing so that a dc voltage can be applied to the second casings in a manner which ensures the potential of the resultant electric field (E) in the chamber is proportional to the magnetic flux.
    Type: Grant
    Filed: December 18, 1998
    Date of Patent: March 20, 2001
    Assignee: Archimedes Technology Group, Inc.
    Inventor: Tihiro Ohkawa
  • Patent number: 6139681
    Abstract: A system and method for removing plasma contaminants from a vacuum vessel requires circulating a fluid through the vacuum vessel and thereby exposing the fluid to the contaminants. When the contaminants contact the fluid, they are trapped and become suspended in the fluid. The contaminants are then removed from the vacuum vessel along with the fluid. Subsequently, the contaminants can be removed from the fluid, and the fluid reintroduced into the vessel for the subsequent removal of additional contaminants. For one embodiment, a cleaning plasma is generated in the vacuum chamber which interacts with the contaminants to create neutrals. The fluid is then circulated through channels that are formed into a tray which is inserted into the bottom of the chamber. The neutrals then fall into the fluid on the tray, while magnetic shields prevent the cleaning plasma itself from doing so. In another embodiment, the vacuum vessel is an open-ended, hollow, cylindrical centrifuge which is tilted from the vertical.
    Type: Grant
    Filed: March 9, 1999
    Date of Patent: October 31, 2000
    Assignee: Archimedes Technology Group, Inc.
    Inventor: Tihiro Ohkawa
  • Patent number: 6096220
    Abstract: A plasma mass filter for separating low-mass particles from high-mass particles in a multi-species plasma includes a cylindrical shaped wall which surrounds a hollow chamber. A magnet is mounted on the wall to generate a magnetic field that is aligned substantially parallel to the longitudinal axis of the chamber. Also, an electric field is generated which is substantially perpendicular to the magnetic field and which, together with the magnetic field, creates crossed magnetic and electric fields in the chamber. Importantly, the electric field has a positive potential on the axis relative to the wall which is usually zero potential. When a multi-species plasma is injected into the chamber, the plasma interacts with the crossed magnetic and electric fields to eject high-mass particles into the wall surrounding the chamber. On the other hand, low-mass particles are confined in the chamber during their transit therethrough to separate the low-mass particles from the high-mass particles.
    Type: Grant
    Filed: November 16, 1998
    Date of Patent: August 1, 2000
    Assignee: Archimedes Technology Group, Inc.
    Inventor: Tihiro Ohkawa
  • Patent number: 5939029
    Abstract: A method and system for separating radioactive waste containing volatiles, into light ions and heavy ions, includes a loader/transporter for transferring the waste into a high vacuum environment in the chamber of a plasma processor. During this transfer, gases of the volatiles are released from the waste, collected in a holding tank, and subsequently ionized in the chamber. As the volatiles are ionized, the ions are directed by a magnetic field into contact with the waste to vaporize the waste. The waste vapors are then ionized in the plasma processor chamber to create a multi-species plasma which includes electrons, light ions and heavy ions. Within the chamber, the density of the multi-species plasma is established to be above its collision density in order to establish a substantially uniform velocity for all ions in the plasma. A nozzle accelerates the multi-species plasma to generate a fluid stream which is directed from the chamber toward an inertial separator.
    Type: Grant
    Filed: November 14, 1997
    Date of Patent: August 17, 1999
    Assignee: Archimedes Technology Group, Inc.
    Inventor: Tihiro Ohkawa