Patents Assigned to ASML Netherlands B.V.
  • Patent number: 11972194
    Abstract: A method for determining a patterning device pattern. The method includes obtaining (i) an initial patterning device pattern having at least one feature, and (ii) a desired feature size of the at least one feature, obtaining, based on a patterning process model, the initial patterning device pattern and a target pattern for a substrate, a difference value between a predicted pattern of the substrate image by the initial patterning device and the target pattern for the substrate, determining a penalty value related the manufacturability of the at least one feature, wherein the penalty value varies as a function of the size of the at least one feature, and determining the patterning device pattern based on the initial patterning device pattern and the desired feature size such that a sum of the difference value and the penalty value is reduced.
    Type: Grant
    Filed: December 28, 2022
    Date of Patent: April 30, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Roshni Biswas, Rafael C. Howell, Cuiping Zhang, Ningning Jia, Jingjing Liu, Quan Zhang
  • Patent number: 11972922
    Abstract: A method for calibrating a scanning charged particle microscope, such as a scanning electron microscope (SEM), is provided. The method includes dividing a wafer into a plurality of regions; preparing, on each of the plurality of regions, a pattern including a first periodic structure interleaved with a second periodic structure, the first and second periodic structures having an induced offset; determining an actual pitch the first and second periodic structures and thereby determining actual induced offset on each of the plurality of regions; selecting a plurality of regions from among the plurality of regions; measuring, by the SEM, a pitch of first and second periodic structures on each of the plurality of regions; and performing linearity calibration on the SEM based on the determining and the measuring.
    Type: Grant
    Filed: March 24, 2023
    Date of Patent: April 30, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Hermanus Adrianus Dillen, Wim Tjibbo Tel, Willem Louis Van Mierlo
  • Patent number: 11971656
    Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack having a planar substrate and at least one membrane layer, wherein the planar substrate includes an inner region and a border region around the inner region; and selectively removing the inner region of the planar substrate. The membrane assembly includes: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate. The stack is provided with a mechanical protection material configured to mechanically protect the border region during the selectively removing the inner region of the planar substrate.
    Type: Grant
    Filed: March 13, 2023
    Date of Patent: April 30, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Hendrik Klootwijk, Wilhelmus Theodorus Anthonius Johannes Van Den Einden
  • Patent number: 11971654
    Abstract: A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.
    Type: Grant
    Filed: June 9, 2023
    Date of Patent: April 30, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pieter-Jan Van Zwol, Adrianus Johannes Maria Giesbers, Johan Hendrik Klootwijk, Evgenia Kurganova, Maxim Aleksandrovich Nasalevich, Arnoud Willem Notenboom, Mária Péter, Leonid Aizikovitsj Sjmaenok, Ties Wouter Van Der Woord, David Ferdinand Vles
  • Publication number: 20240134182
    Abstract: An optical filter apparatus including an optical divergence device, operable to receive optical pulses and spatially distribute the optical pulses over an optical plane in dependence with a pulse energy of each of the optical pulses; and a spatial filter, located at the optical plane, operable to apply spatial filtering to the optical pulses based on a location of each of the optical pulses at the optical plane resulting from the spatial distributing.
    Type: Application
    Filed: January 12, 2022
    Publication date: April 25, 2024
    Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Ali ALSAQQA, Patrick Sebastian UEBEL, Paulus Antonius Andreas TEUNISSEN
  • Publication number: 20240134208
    Abstract: Disclosed is a pupil shaping arrangement for obtaining a defined pupil intensity profile for a metrology illumination beam configured for use in a metrology application. The pupil shaping arrangement comprises an engineered diffuser (ED) having a defined far-field profile configured to impose said defined pupil intensity profile on said metrology illumination beam. The pupil shaping arrangement may further comprise a multimode fiber (MMF) and be configured to reduce spatial coherence of coherent radiation.
    Type: Application
    Filed: September 29, 2020
    Publication date: April 25, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Zili ZHOU, Janneke RAVENSBERGEN
  • Publication number: 20240136218
    Abstract: A substrate restraining system comprising: a substrate table and a plurality of circumferentially arranged restrainers each comprising a spring, wherein the spring has a proximal end and a distal end, wherein the distal end of the spring is radially displacable, and wherein a base of the proximal end of the spring is fixed to the substrate table at a fixing location.
    Type: Application
    Filed: February 3, 2022
    Publication date: April 25, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Marinus Augustinus Christiaan VERSCHUREN, Thomas POIESZ
  • Publication number: 20240136147
    Abstract: A method for projecting a charged particle multi-beam toward a sample comprises manipulating respective sub-beams of a charged particle multi-beam using a control lens array comprising a plurality of control lenses for the respective sub-beams; controlling the control lens array to manipulate the sub-beams such that the sub-beams are shaped by respective apertures of a beam shaping aperture array such that less than a threshold current of charged particles of each sub-beam passes through the respective apertures of the beam shaping aperture array, down-beam of the control lens array, comprising a plurality of apertures for the respective sub-beams; and controlling the control lens array to manipulate the sub-beams such that at least the threshold current of at least a proportion of the sub-beams passes through the respective apertures of the beam shaping aperture array.
    Type: Application
    Filed: January 2, 2024
    Publication date: April 25, 2024
    Applicant: ASML Netherlands B.V.
    Inventor: Erwin SLOT
  • Publication number: 20240134289
    Abstract: A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.
    Type: Application
    Filed: February 3, 2022
    Publication date: April 25, 2024
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Bram Paul Theodoor VAN GOCH, Johan KUNNEN, Sae Na NA
  • Publication number: 20240134283
    Abstract: Methods and apparatus for characterizing a semiconductor manufacturing process performed on a substrate. First data is obtained associated with fingerprint data of the substrate measured after a first processing step. Second data is obtained associated with fingerprint data of the substrate measured after a second processing step. A statistical model is used to decompose the first and second data into a first class of fingerprint components mutually correlating between the first and second data and a second class of fingerprint components not mutually correlating between the first and second data. At least one of the first class fingerprint of components and the second class of fingerprint components are used to characterize the semiconductor manufacturing process.
    Type: Application
    Filed: February 7, 2022
    Publication date: April 25, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Niek Willem KLEIN KOERKAMP, Marc HAUPTMANN, Aliasghar KEYVANI JANBAHAN, Jingchao WANG
  • Patent number: 11966166
    Abstract: A measurement apparatus and method for determining a substrate grid describing a deformation of a substrate prior to exposure of the substrate in a lithographic apparatus configured to fabricate one or more features on the substrate. Position data for a plurality of first features and/or a plurality of second features on the substrate is obtained. Asymmetry data for at least a feature of the plurality of first features and/or the plurality of second features is obtained. The substrate grid based on the position data and the asymmetry data is determined. The substrate grid and asymmetry data are passed to the lithographic apparatus for controlling at least part of an exposure process to fabricate one or more features on the substrate.
    Type: Grant
    Filed: July 16, 2021
    Date of Patent: April 23, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Franciscus Godefridus Casper Bijnen, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Robert John Socha, Youping Zhang
  • Patent number: 11966168
    Abstract: Methods of measuring variation across multiple instances of a pattern on a substrate or substrates after a step in a device manufacturing process are disclosed. In one arrangement, data representing a set of images is received. Each image represents a different instance of the pattern. The set of images are registered relative to each other to superimpose the instances of the pattern. Variation in the pattern is measured using the registered set of images. The pattern comprises a plurality of pattern elements and the registration comprises applying different weightings to two or more of the plurality of pattern elements. The weightings control the extent to which each pattern element contributes to the registration of the set of images. Each weighting is based on an expected variation of the pattern element to which the weighting is applied.
    Type: Grant
    Filed: September 24, 2021
    Date of Patent: April 23, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Antoine Gaston Marie Kiers, Scott Anderson Middlebrooks, Jan-Willem Gemmink
  • Patent number: 11966167
    Abstract: A method for calibrating a resist model. The method includes: generating a modeled resist contour of a resist structure based on a simulated aerial image of the resist structure and parameters of the resist model, and predicting a metrology contour of the resist structure from the modeled resist contour based on information of an actual resist structure obtained by a metrology device. The method includes adjusting one or more of the parameters of the resist model based on a comparison of the predicted metrology contour and an actual metrology contour of the actual resist structure obtained by the metrology device.
    Type: Grant
    Filed: December 20, 2018
    Date of Patent: April 23, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Marleen Kooiman, David Marie Rio, Sander Frederik Wuister
  • Publication number: 20240126183
    Abstract: A method for generating a retargeted pattern for a target pattern to be printed on a substrate. The method includes obtaining (i) the target pattern comprising at least one feature, the at least one feature having geometry including a first dimension and a second dimension, and (ii) a plurality of biasing rules defined as a function of the first dimension, the second dimension, and a property associated with features of the target pattern within a measurement region; determining values of the property at a plurality of locations on the at least one feature of the target pattern, each location surrounded by the measurement region; selecting, from the plurality of biasing rules based on the values of the property, a sub-set of biases; and generating the retargeted pattern by applying the selected sub-set of biases to the at least one feature of the target pattern.
    Type: Application
    Filed: September 24, 2020
    Publication date: April 18, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Ayman HAMOUDA
  • Publication number: 20240128044
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
    Type: Application
    Filed: December 21, 2023
    Publication date: April 18, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Weiming REN, Xuedong LIU, Xuerang HU, Zhongwei CHEN
  • Publication number: 20240128045
    Abstract: Disclosed herein is a method of aligning a sample in a charged particle assessment system. The system comprises a support for supporting a sample, and is configured to project charged particles in a multi-beam towards a sample along a multi-beam path, the multi-beam comprising an arrangement of beamlets, and to detect signal particles emitted from the sample in response to a corresponding beamlet of the multi-beam. The method comprises: directing the multi-beam of charged particles along the multi-beam path towards an alignment feature of the sample, such that the field of view of the multi-beam of charged particles encompasses the alignment feature; detecting the signal particles emitted from the sample; generating a dataset representative of the alignment feature based on the detecting of the signal particles; and determining a global alignment of the sample with respect to the multi-beam path, using the dataset.
    Type: Application
    Filed: December 27, 2023
    Publication date: April 18, 2024
    Applicant: ASML Netherlands B.V.
    Inventor: Erwin SLOT
  • Publication number: 20240126181
    Abstract: A method including obtaining (i) measurements of a parameter of the feature, (ii) data related to a process variable of a patterning process, (iii) a functional behavior of the parameter defined as a function of the process variable based on the measurements of the parameter and the data related to the process variable, (iv) measurements of a failure rate of the feature, and (v) a probability density function of the process variable for a setting of the process variable, converting the probability density function of the process variable to a probability density function of the parameter based on a conversion function, where the conversion function is determined based on the function of the process variable, and determining a parameter limit of the parameter based on the probability density function of the parameter and the measurements of the failure rate.
    Type: Application
    Filed: November 16, 2023
    Publication date: April 18, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Abraham SLACHTER, Stefan HUNSCHE, Wim Tjibbo TEL, Anton Bernhard VAN OOSTEN, Koenraad VAN INGEN SCHENAU, Gijsbert RISPENS, Brennan PETERSON
  • Publication number: 20240128043
    Abstract: The disclosure relates to a charged particle beam apparatus configured to project charged particle beams towards a sample. The charged particle beam apparatus comprises: a plurality of charged particle-optical columns configured to project respective charged particle beams towards the sample, wherein each charged particle-optical column comprises: a charged particle source configured to emit the charged particle beam towards the sample, the charged particle sources being comprised in a source array; an objective lens comprising an electrostatic electrode configured to direct the charged particle beam towards the sample; and a detector associated with the objective lens array, configured to detect signal charged particles emitted from the sample. The objective lens is the most down-beam element of the charged particle-optical column configured to affect the charged particle beam directed towards the sample.
    Type: Application
    Filed: December 5, 2023
    Publication date: April 18, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Jurgen VAN SOEST, Roy Ramon VEENSTRA, Erwin Paul SMAKMAN, Tom VAN ZUTPHEN, Albertus Victor Gerardus MANGNUS
  • Patent number: 11960215
    Abstract: A radiation filter for reducing transmission of an unwanted wavelength of radiation. The radiation filter includes zirconium and SiN3. The radiation filter may form part of a radiation sensor including a passivation layer arranged to receive radiation transmitted by the radiation filter, a photodiode arranged to receive radiation transmitted by the passivation layer, and circuit elements connected to the photodiode. The radiation sensor may perform optical measurements as part of an extreme ultraviolet lithographic apparatus or a lithographic tool.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: April 16, 2024
    Assignee: ASML NETHERLANDS B. V.
    Inventors: Vahid Mohammadi, Yassin Chowdhury, Pieter Cristiaan De Groot, Wouter Joep Engelen, Marcel Johannes Petrus Theodorus Van Der Hoorn
  • Patent number: 11960213
    Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.
    Type: Grant
    Filed: April 12, 2023
    Date of Patent: April 16, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade, Elisabeth Corinne Rodenburg