Patents Assigned to Carl Zeiss SMT AG
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Patent number: 9933707Abstract: An optical apparatus includes an interchange mechanism and an optical assembly of an illumination system or a projection objective. At least one of the plurality of optical elements of the optical assembly is selected from among a plurality of ones selectable from the interchange mechanism which facilitates exchange of one for another in the beam path. To reduce transmission of vibration from the interchange mechanism to the optical assembly, the interchange mechanism is mounted on a structure which is substantially dynamically decoupled from the housing, and a selected selectable optical element is located at an operating position at which it is separate from the interchange mechanism.Type: GrantFiled: October 24, 2011Date of Patent: April 3, 2018Assignee: Carl Zeiss SMT AGInventors: Yim-Bun Patrick Kwan, Erik Loopstra
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Publication number: 20150015858Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: ApplicationFiled: October 1, 2014Publication date: January 15, 2015Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Christiaan Alexander HOOGENDAM, Erik Roelof LOOPSTRA, Bob STREEFKERK, Bernhard GELLRICH, Andreas WURMBRAND
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Patent number: 8861084Abstract: A polarization-modulating optical element consisting of an optically active crystal material has a thickness profile where the thickness, as measured in the direction of the optical axis, varies over the area of the optical element. The polarization-modulating optical element has the effect that the plane of oscillation of a first linearly polarized light ray and the plane of oscillation of a second line early polarized light ray are rotated, respectively, by a first angle of rotation and a second angle of rotation, with the first angle of rotation and the second angle of rotation being different from each other.Type: GrantFiled: August 28, 2008Date of Patent: October 14, 2014Assignee: Carl Zeiss SMT AGInventors: Damian Fiolka, Markus Deguenther
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Patent number: 8860922Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: GrantFiled: January 23, 2012Date of Patent: October 14, 2014Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernhard Gellrich, Andreas Wurmbrand
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Publication number: 20140293248Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: ApplicationFiled: April 24, 2014Publication date: October 2, 2014Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Adrianus Franciscus Petrus ENGELEN, Jozef Maria FINDERS, Paul GRÄUPNER, Johannes Catharinus Hubertus MULKENS, Jan Bernard Plechelmus VAN SCHOOT
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Patent number: 8810771Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: GrantFiled: December 12, 2011Date of Patent: August 19, 2014Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernhard Gellrich, Andreas Wurmbrand
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Patent number: 8711330Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: GrantFiled: May 6, 2011Date of Patent: April 29, 2014Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
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Patent number: 8570486Abstract: An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.Type: GrantFiled: April 13, 2012Date of Patent: October 29, 2013Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Johannes Catharinus Hubertus Mulkens, Johannes Jacobus Matheus Baselmans, Paul Graupner, Erik Roelof Loopstra, Bob Streefkerk
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Publication number: 20120194790Abstract: An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.Type: ApplicationFiled: April 13, 2012Publication date: August 2, 2012Applicants: CARL ZEISS SMT AG, ASML NETHERLANDS B.V.Inventors: Johannes Catharinus Hubertus Mulkens, Johannes Jacobus Matheus Baselmans, Paul Graupner, Erik Roelof Loopstra, Bob Streefkerk
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Publication number: 20120120377Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: ApplicationFiled: January 23, 2012Publication date: May 17, 2012Applicants: CARL ZEISS SMT AG, ASML NETHERLANDS B.V.Inventors: Christiaan Alexander HOOGENDAM, Erik Roelof Loopstra, Bob Streefkerk, Bernhard Gellrich, Andreas Wurmbrand
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Patent number: 8174674Abstract: An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.Type: GrantFiled: September 9, 2008Date of Patent: May 8, 2012Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Johannes Catharinus Hubertus Mulkens, Johannes Jacobus Matheus Baselmans, Paul Graupner, Erik Roelof Loopstra, Bob Streefkerk
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Publication number: 20120086926Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: ApplicationFiled: December 12, 2011Publication date: April 12, 2012Applicants: CARL ZEISS SMT AG, ASML NETHERLANDS B.V.Inventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernard Gellrich, Andreas Wurmbrand
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Patent number: 8102502Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.Type: GrantFiled: April 10, 2009Date of Patent: January 24, 2012Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernhard Gellrich, Andreas Wurmbrand
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Patent number: 8094287Abstract: A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.Type: GrantFiled: September 25, 2008Date of Patent: January 10, 2012Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Tjarko Adriaan Rudolf Van Empel, Erik Roelof Loopstra, Antonius Johannes Van Der Net, Yuri Johannes Gabriel Van De Vijver, Bernhard Gellrich, Bauke Jansen, Rens Sanderse
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Publication number: 20110228246Abstract: Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.Type: ApplicationFiled: May 25, 2011Publication date: September 22, 2011Applicant: CARL ZEISS SMT AGInventors: Bernhard Kneer, Norbert Wabra, Toralf Gruner, Alexander Epple, Susanne Beder, Wolfgang Singer
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Publication number: 20110211181Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.Type: ApplicationFiled: May 6, 2011Publication date: September 1, 2011Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AGInventors: Bob STREEFKERK, Johannes Jacobus Matheus Baselmans, Adrianus Fransiscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
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Publication number: 20110188019Abstract: The invention relates to a projection system, comprising a radiation source, an illumination system operable to illuminate a structured mask, and a projection objective for projecting an image of the mask structure onto a light-sensitive substrate, wherein said projection system comprises an optical system comprising an optical axis or a preferred direction given by the direction of a light beam propagating through the optical system; the optical system comprising a temperature compensated polarization-modulating optical element described by coordinates of a coordinate system, wherein one preferred coordinate of the coordinate system is parallel to the optical axis or parallel to said preferred direction; said temperature compensated polarization-modulating optical element comprising a first and a second polarization-modulating optical element, the first and/or the second polarization-modulating optical element comprising solid and/or liquid optically active material and a profile of effective optical thickneType: ApplicationFiled: June 11, 2010Publication date: August 4, 2011Applicant: Carl Zeiss SMT AGInventors: Damian Fiolka, Markus Deguenther
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Publication number: 20110181857Abstract: An optical assembly supported in an arrangement, especially in an objective or in an illuminating or exposure system, in the interior of a housing comprising at least one optical element, especially a lens, a mirror, or an aperture, wherein the at least one element is influenceable by at least one manipulator is characterized in that the at least one manipulator is arranged either outside of the housing or in a holding means that is separated entirely or to a large extent by the help of a decoupling means, and that there is provided an effective coupling between the manipulator and the element to be influenced by the manipulator in the interior of the arrangement.Type: ApplicationFiled: March 11, 2011Publication date: July 28, 2011Applicant: CARL ZEISS SMT AGInventors: Hermann Bieg, Karl-Eugen Aubele, Yim-Bun Patrick Kwan, Stefan Xalter, Martin Schmidt, Saverio Sanvido, Uy-Liem Nguyen
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Patent number: 7986472Abstract: There is provided an optical element module comprising a first optical element and an optical element holder. The first optical element has a first coefficient of thermal expansion. The optical element holder holds the first optical element and has a second coefficient of thermal expansion, the second coefficient of thermal expansion being adapted to the first coefficient of thermal expansion. The optical element is directly contacting the optical element holder in a wide contact area. The contact area is defined by a first contact surface of the first optical element and a second contact surface of the optical element holder, wherein the second contact surface matches the first contact surface. Thus, favorable rigidity and deformation behavior is provided.Type: GrantFiled: May 31, 2006Date of Patent: July 26, 2011Assignee: Carl Zeiss SMT, AG.Inventors: Jens Kugler, Ulrich Weber, Bernhard Gellrich, Yim-Bun Patrick Kwan, Peter Deufel
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Publication number: 20110157572Abstract: A projection optics for microlithography, which images an object field in an object plane into an image field in an image plane, where the projection optics include at least one curved mirror and including at least one refractive subunit, as well as related systems, components, methods and products prepared by such methods, are disclosed.Type: ApplicationFiled: March 11, 2011Publication date: June 30, 2011Applicant: CARL ZEISS SMT AGInventor: Hans-Juergen Mann