Abstract: A structure includes a base; a first mask layer disposed on the base, where the first mask layer has a first channel exposing the base, the first channel comprises a first open end and a second open end, the second open end is close to a surface of the base, the first open end is away from the surface of the base, and an area of an orthographic projection of the first open end in a plane where the base is located is smaller than an area of an orthographic projection of the first channel in the plane; and a second mask layer disposed on the first mask layer, where the second mask layer has a second channel exposing the first mask layer, and the second channel is connected to the first channel.

Abstract: Disclosed is a semiconductor structure. The semiconductor structure includes a support structure, and a first dielectric layer and a growth substrate sequentially formed on the support structure, where a gravity center of the support structure and a gravity center of the growth substrate are disposed in a staggered manner, so that the direct contact between the growth substrate and the graphite disk can be avoided, a centrifugal force on the growth substrate exerted by the graphite disk to the support structure can be transferred, thereby further ensuring a quality of the growth substrate, and significantly reducing a probability of cracking to ensure a crystal quality of a subsequent epitaxial layer. The support structure is formed at the bottom of the growth substrate, so that a mechanical strength of the semiconductor structure can be effectively improved, a stability can be enhanced, and a deformation of the semiconductor structure can be suppressed.

Abstract: A light-emitting device and a method for manufacturing the same are provided. The method includes: providing an epitaxial base with a first concave portion, wherein an inner surface of the first concave portion is a curved surface; epitaxially growing a light-emitting structure layer on the epitaxial base, wherein the light-emitting structure layer comprises a first surface and a second surface opposite the first surface, and the second surface protrudes towards the first concave portion; forming a first reflector layer on the first surface; and removing the epitaxial base to form a second reflector layer covering the second surface. A curved resonant cavity can be formed by the method.

Abstract: Disclosed are a micro light-emitting diode chip, a manufacturing method therefor, and an electronic device. The micro light-emitting diode chip includes: a substrate; a plurality of light-emitting units, where a light-emitting unit is located on a side of the substrate, the light-emitting unit includes a first semiconductor layer, an active layer and a second semiconductor layer stacked in sequence, the first semiconductor layer is located on a side, away from the substrate, of the second semiconductor layer, and the light-emitting unit further includes a reflective sidewall, which constitutes a sidewall of the active layer, the second semiconductor layer and at least a part of the first semiconductor layer; and a blocking portion, where at least a part of the blocking portion is located between first semiconductor layers of two of the light-emitting units.

Abstract: Disclosed are a film bulk acoustic resonator and a manufacturing method therefor. The film bulk acoustic resonator includes: a substrate, a buffer layer, a first electrode layer, a piezoelectric layer, a second electrode layer stacked in sequence, and a cavity structure arranged between the substrate and the first electrode layer and at least partially located in the buffer layer, where the first electrode layer includes an N-type semiconductor. The N-type semiconductor has an integrated structure and may be used as an electrode, so that the cavity structure at least partially located in the buffer layer may be formed first, and then the N-type semiconductor is arranged on the cavity structure. Thus, there is no need to etch sacrificial materials to form the cavity structure, thereby reducing probability of device reliability deterioration due to etching sacrificial materials.

Abstract: A substrate structure, a method for manufacturing a substrate structure, a light-emitting device and a method for manufacturing a light-emitting device are provided. The substrate structure may include a base, a mask layer, and an epitaxial structure. The mask layer is provided on the base, where the mask layer is provided with an opening for exposing the base. The epitaxial structure is provided in the opening, where a material of the mask layer is different from a material of the epitaxial structure.

Abstract: A semiconductor structure includes: a stacked structure, including one stacked structure unit or a plurality of stacked structure units disposed along a horizontal direction, where each of the stacked structure units includes a plurality of stacked island structures separated from each other along the horizontal direction; and an N-type semiconductor layer, a light-emitting layer and a P-type semiconductor layer sequentially laminated on the stacked structure. In the present disclosure, by providing the stacked structure, the light-emitting efficiency of the semiconductor device can be improved.

Abstract: A semiconductor structure and a manufacturing method therefor are provided by embodiments of the present application. A buffer layer is disposed on a substrate layer, and the buffer layer includes a first buffer layer and a second buffer layer. By doping a transition metal in the first buffer layer, a deep level trap may be formed to capture background electrons, and diffusion of free electrons toward the substrate may also be avoided. In the second buffer layer, by decreasing a doping concentration of the transition metal or not doping intentionally the transition metal, a tailing effect is avoided and current collapse is prevented. By doping periodically C in the buffer layer, C may be as an acceptor impurity to compensate the background electrons, and then a concentration of the background electrons is reduced.

Abstract: The present application provides a substrate and a manufacturing method therefor. The substrate includes a silicon substrate and a protective layer, the silicon substrate includes a middle part and an edge part, and a thickness of the middle part is greater than a thickness of the edge part. The middle part has a to-be-grown surface, and a crystal orientation of the to-be-grown surface is different from a crystal orientation of surface of the edge part. The protective layer covers the edge part and is configured to prevent defects in the edge part from extending to the middle part during high-temperature processing.

Abstract: A manufacturing method of a vertical cavity surface emitting laser is provided. The vertical cavity surface emitting laser includes a first reflector, a first semiconductor layer, an active layer, a second semiconductor layer, an oxide layer, and a second reflector sequentially stacked. The conductivity type of the first semiconductor layer is opposite to that of the second semiconductor layer. The oxide layer includes a light transmitting region and a light shielding region, and the light shielding region surrounds the light transmitting region. The manufacturing method includes planarizing a first contact surface of the first semiconductor layer and the first reflector, and/or a second contact surface of the second semiconductor layer and the second reflector.

Abstract: The present application provides a semiconductor structure and a manufacturing method therefor, and a light-emitting device and a manufacturing method therefor. The semiconductor structure includes a substrate, a first semiconductor layer, an isolation layer, an active layer, a second semiconductor layer, a first electrode and a second electrode. The second semiconductor layer is a conductive DBR structure. The first semiconductor layer includes a flat portion, a first protrusion and a second protrusion stacked sequentially in a vertical direction, the second protrusions correspond one-to-one to the first through-holes, and the second protrusions are arranged at intervals, and the side surface of the second protrusions are beveled. The active layer, the second semiconductor layer, and the first electrode are provided on the second protrusions of the first semiconductor layer stacked in sequence.

Abstract: Disclosed are an enhancement-mode switching device and a preparation method therefor. The enhancement-mode switching device includes: a substrate; a channel structure; an n-type semiconductor layer covering a bottom wall of the trench; a p-type semiconductor layer arranged in a gate region; a gate electrode arranged on a side, away from the substrate, of the p-type semiconductor layer; a source electrode arranged in a source region; a drain electrode arranged in a drain region. In the gate region, the p-type semiconductor layer and n-type semiconductor layer are in contact with each other to form a space depletion region in the gate region, and the electronic channel between the source electrode and the drain electrode of the switching device is interrupted, so that the switching device may be effectively turned off under a gate bias voltage of zero, improving control capability of the gate electrode and reliability of the device.

Abstract: The present disclosure provides enhancement mode switching devices and manufacturing methods thereof. The enhancement mode switching device includes a substrate; a channel structure including a channel layer and a barrier layer. The channel layer is provided on the substrate, and the barrier layer is provided on a side of the channel layer far away from the substrate. A side of the channel structure far away from the substrate is provided with a trench in a gate region, and the trench penetrates through the barrier layer and a part of the channel layer. The enhancement mode switching device includes a p-type semiconductor layer in the gate region, a gate electrode on a side of the p-type semiconductor layer far away from the substrate, a source electrode in the source region, and a drain electrode in the drain region. At least part of the p-type semiconductor layer is in the trench.

Abstract: A semiconductor structure and a manufacturing method thereof are provided in the present application provides. The semiconductor structure includes a substrate and a heterojunction structure located on the substrate. The heterojunction structure includes a channel layer and a barrier layer located on the channel layer. The channel layer includes at least one n-type doped layer. The manufacturing method of the semiconductor structure includes: providing a substrate; forming a heterojunction structure on the substrate, where forming the heterojunction structure includes: forming a channel layer on the substrate, doping the channel layer to form an n-type doped layer; forming a barrier layer on the channel layer; forming a gate electrode, a source electrode and a drain electrode, the gate electrode is located on the heterojunction structure, and the source electrode and the drain electrode are located on two sides of the grid electrode, separately.

Abstract: The present disclosure provides a full-color LED structure, a full-color LED structure unit, and a method for manufacturing the same. Different wavelengths of light emitted from the first sub-region, the second sub-region and the third sub-region of the light-emitting layer are achieved by controlling different surface dimensions of the bottom wall and the side wall of the first trench or the top wall of the first semiconductor layer. The above process is simple and can form full-color LED structure units during a single epitaxial growth process of the light-emitting layer, such that the size of the full-color LED is reduced, the cost is reduced, the service life is extended, and the reliability is improved.

Abstract: The present disclosure provides a method for manufacturing a semiconductor structure, the mothed including: providing a substrate, a heterojunction structure, and a P-type semiconductor layer, which are distributed from bottom to top; forming a patterned mask layer on the P-type semiconductor layer, the patterned mask layer covering at least a portion of the P-type semiconductor layer in a gate region; removing an exposed portion of the P-type semiconductor layer by in-situ etching with a corrosive gas, by using the patterned mask layer as a mask; and then activating the P-type dopant ions in the P-type semiconductor layer.

Abstract: The present disclosure provides a resonant tunneling diode including: a first barrier layer; a second barrier layer; a potential well layer between the first barrier layer and the second barrier layer, materials of the first barrier layer, the second barrier layer, and the potential well layer including a group III nitride, a material of the potential well layer including a gallium element; a first barrier layer between the first barrier layer and the potential well layer; and/or a second barrier layer between the second barrier layer and the potential well layer.

Abstract: The disclosure provides a semiconductor structure and a manufacturing method thereof. The semiconductor structure includes: a first group III nitride epitaxial layer disposed on a support substrate, a silicon substrate, a bonding layer and a second group III nitride epitaxial layer; wherein the first group III nitride epitaxial layer is bonded to the silicon substrate by the bonding layer; through-silicon-vias are formed in the silicon substrate, and first through-holes are formed in the bonding layer, wherein the through-silicon-vias communicate with the first through-holes; and the second group III nitride epitaxial layer is disposed within the first through-holes and the through-silicon-vias and on the silicon substrate, wherein the second group III nitride epitaxial layer is coupled to the first group III nitride epitaxial layer.

Abstract: Disclosed are a light emitting device and a method for manufacturing a light emitting device. The light emitting device according to the present application may be formed by an epitaxial growth process. In addition, the light emitting device according to the present application includes a first semiconductor layer, a light emitting layer and a second semiconductor layer. Light emitting wavelengths of the first region, the second region and the third region are different by setting composition of the light emitting layer of the top walls of the plurality of protrusions, the side walls of the plurality of protrusions and the recessed region between the plurality of protrusions to be different, therefore, the light-emitting device may emit light of different wavelengths without using phosphors or quantum dots for wavelength conversion, thereby prolonging the lifespan of the light-emitting device and improving the reliability of the light-emitting device.

Abstract: A multi-wavelength LED structure (1, 2, 3, 4, 5, 6, 7, 8) and a manufacturing method therefor. The multi-wavelength LED structure (1, 2, 3, 4, 5, 6, 7, 8) comprises: a first semiconductor layer (11), a stress release layer (12) having a V-shaped pit (12a), a first quantum well layer (131) and a second quantum well layer (132), which are stacked, from bottom to top, on a side wall of the V-shaped pit (12a) and a top wall of the stress release layer (12), and a second semiconductor layer (14) that is located on the second quantum well layer (132), wherein the conduction type of the second semiconductor layer (14) is the opposite of that of the first semiconductor layer (11).