Abstract: A wet processing apparatus and method that takes advantage of a fluid meniscus to process at least a portion of a surface of an object. After one surface of the object has been processed another side or surface of the object can be similarly processed. This processing can be coating, etching, plating, to name a few. An application of the apparatus and method is in the semiconductor processing industry, especially, the processing of wafers and substrates. The method and apparatus also allows the processing of multiple surfaces of an electronic component.
Abstract: An apparatus for viewing and inspecting the surface area of an object, including a probe having a viewing window defining a field of view, and an image-forming lens within the probe. The probe also includes an image detector on an opposite side of the image-forming lens relative to the viewing window for receiving a viewed image of the surface area through the lens, and transmitting electrical signals indicative thereof. At least one of a focal length of the lens, a primary object distance between the lens and a primary target plane wherein image resolution is optimal, and a primary image distance between the lens and the detector, is selected to: (i) form the primary target plane at approximately the viewing window of the probe; (ii) focus approximately the entire field of view onto the image detector; and (iii) define a depth of the field of view at least approximately equal to a height of the field of view.
Abstract: An apparatus (10) and method is provided for generating a 360.degree. view of a surface area of a three-dimensional object, such as a wire or cable, and for inspecting the surface area for flaws or imperfections. A receiving lens (12) defines an optical axis (14) extending through the object, and an origin (0) located on the optical axis within the object and spaced a predetermined distance (S) from the receiving lens (12), for generating a direct image of a front surface section of the object. A first mirror (16) is spaced a first predetermined distance (L1) from the origin (0) on another side of the object relative to the receiving lens (12) for generating a first mirror image of a first rear surface section of the object.
Type:
Grant
Filed:
June 7, 1999
Date of Patent:
September 19, 2000
Assignee:
Materials Technologies Corporation
Inventors:
John Nazarian Pike, Yogesh Mehrotra, Herbert Kaplan
Abstract: An apparatus and method measures the roughness or some other surface dimension by transmitting a beam of light through a grating member at an angle of incidence relative to the grating member. The grating member has a plurality of parallel opaque bars and adjacent transparent bars. The beam of light forms a multiple line shadow pattern on the surface below the grating member formed by the shadows of the opaque bars of the grating member. A camera records the multiple line shadow pattern, and the recorded pattern is superimposed on a plurality of parallel, equally spaced scan lines oriented perpendicular to the shadow lines. The distances between the points at which adjacent shadow lines cross each respective scan line are measured to determine the roughness or some other surface dimension.
Abstract: A semiconductor wafer holding and support fixture having a low effective thermal mass comprises a planar surface having a recess for a wafer and consisting essentially of chemical vapor deposited silicon carbide. The wafer holder is specifically designed to isolate the wafer from regions of significant thermal mass of the holder. The wafer holder is particularly adapted for accomplishing chemical reactions in rapid thermal processing equipment in the fabrication of electronic integrated circuits. The method for making such an article comprises shaping a substrate, e.g. graphite, to provide a planar surface having a recess installing means for masking any regions of the substrate where silicon carbide is not desired, chemically vapor depositing a conformal outer coating of silicon carbide onto the substrate, removing the means for masking and removing the graphite by machining, drilling, grit-blasting, dissolving and/or burning.
Type:
Grant
Filed:
March 31, 1988
Date of Patent:
December 18, 1990
Assignee:
Materials Technology Corporation, subsidiary of the Carbon/Graphite Group, Inc.
Abstract: Fiber reinforced hollow microspheres made from dispersed particle film forming compositions including fibers, dispersed particles, a binder, a film stabilizing agent, a dispersing agent and a continuous liquid phase. Porous and non-porous fiber reinforced hollow microspheres can be made. The fiber reinforced hollow microspheres have walls with voids which are interconnected to each other and to the inner and outer wall surfaces, and the fiber reinforced hollow microspheres can be used as membrane substrates in selective separation processes and in biotech processes. The fiber reinforced hollow microspheres can be used as supports for catalysts and as enclosures for catalysts, adsorbents and absorbents. The fiber reinforced hollow microspheres can also be used as filler materials and as proppants for increasing gas recovery from gas wells.
Abstract: Fiber reinforced hollow film forming material microspheres 17 made from a fiber and film forming material composition are described. The fiber reinforced hollow microspheres 17 are used to make shaped and molded articles and to make insulation materials. The fibers can be made from ceramic materials, glass, metal, metal glass and plastic. The reinforcing fibers can be one-half to five microns in diameter and five to one hundred microns in length.
Abstract: A method providing for the non-wetting of predetermined portions of articles exposed to molten filler metals during soldering or brazing operations wherein predetermined areas of said elements are provided with a layer of chemical vapor deposited titanium carbide with an overlayer of titanium nitride or with a layer of titanium diboride to resist wetting of the coated areas by the filler metals. Articles coated by the non-wetting titanium compounds include circuit board support brackets and other elements used in immersion soldering machines, and heating elements for soldering operations such as soldering tips for various types of heated soldering tools and the like.
Type:
Grant
Filed:
October 5, 1981
Date of Patent:
December 13, 1983
Assignee:
Materials Technology Corporation
Inventors:
Allan W. McCullough, Richard A. Springer
Abstract: Disclosed is a method of forming dense protective coatings of co-deposited aluminum oxide and titanium oxide on wear surfaces. The coating is formed by simultaneously reacting an aluminum halide gas and a titanium halide gas with water vapor on a surface maintained at a temperature of about 900.degree. to about 1250.degree. C. Reaction conditions are maintained to assure mixing of the titanium halide gas with the other reactants only in the reaction zone and compositions of the reactant gases are limited to produce a coating comprising alpha alumina (Al.sub.2 O.sub.3) with about 2% to about 10% hexagonal alpha titanium oxide (Ti.sub.2 O.sub.3) dispersed in the alumina matrix.
Abstract: Disclosed is a method of forming dense protective coatings of co-deposited aluminum oxide and titanium oxide on wear surfaces. The coating is formed by simultaneously reacting an aluminum halide gas and a titanium halide gas with water vapor on a surface maintained at a temperature of about 900.degree. C to about 1250.degree. C. Reaction conditions are maintained to assure mixing of the titanium halide gas with the other reactants only in the reaction zone and compositions of the reactant gases are limited to produce a coating comprising alpha alumina (Al.sub.2 O.sub.3) with about 2% to about 10% hexagonal alpha titanium oxide (Ti.sub.2 O.sub.3) dispersed in the alumina matrix.
Abstract: Disclosed is a composite coating for wear surfaces comprising a layer of vapor deposited titanium nitride overlying a layer of titanium carbide. The composite coating is formed by successive chemical vapor depositions of titanium carbide and titanium nitride on a heated substrate.
Type:
Grant
Filed:
December 20, 1974
Date of Patent:
June 22, 1976
Assignee:
Materials Technology Corporation
Inventors:
Robert C. Post, Allen W. McCullough, James H. McClure