Patents Assigned to Mitsui Mining & Smelting Co., Ltd.
  • Patent number: 10727493
    Abstract: In order to provide a novel oriented apatite-type oxide ion conductor which can achieve an increase in area through suppression of crack generation and preferably can be manufactured more inexpensively by an uncomplicated process, an oriented apatite-type oxide ion conductor composed of a composite oxide represented by A9.33+x[T6?yMy]O26.00+z A in the formula is one kind or two or more kinds of elements selected from the group consisting of La, Ce, Pr, Nd, Sm, Eu, Gd, Tb, Dy, Be, Mg, Ca, Sr, and Ba. T in the formula is an element including Si, Ge, or both of them. M in the formula is one kind or two or more kinds of elements selected from the group consisting of B, Ge, Zn, Sn, W, and Mo.
    Type: Grant
    Filed: December 9, 2015
    Date of Patent: July 28, 2020
    Assignee: Mitsui Mining & Smelting Co., Ltd.
    Inventors: Shingo Ide, Yuichi Anno, Yasuhisa Izutsu, Jun Omura, Rintaro Ishii, Minoru Kahata
  • Patent number: 10710888
    Abstract: The purpose of the present invention is to provide a beta zeolite which includes zinc and has a small particle size. This beta zeolite includes a silicon oxide and a zinc oxide, and has an average particle size of 50 to 100 nm at a cumulative frequency of 50% in a particle size distribution measured by scanning electron microscope observation.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: July 14, 2020
    Assignees: MITSUI MINING & SMELTING CO., LTD., THE UNIVERSITY OF TOKYO
    Inventors: Kenta Iyoki, Keiji Itabashi, Tatsuya Okubo
  • Patent number: 10688480
    Abstract: An exhaust gas purifying composition of the present invention contains zeolite that is BEA zeolite having an SiO2/Al2O3 molar ratio of greater than 25 and 600 or less and containing phosphorus. Furthermore, the exhaust gas purifying composition preferably contains zirconium in addition to phosphorus. Furthermore, the zeolite has an SiO2/Al2O3 molar ratio of from 30 to 150. The present invention provides an exhaust gas purifying composition having excellent HC adsorbability for exhaust gas purification in internal combustion engines such as gasoline engines.
    Type: Grant
    Filed: July 26, 2017
    Date of Patent: June 23, 2020
    Assignee: Mitsui Mining & Smelting Co., Ltd.
    Inventors: Jo Nishikawa, Satoshi Watanabe, Michitaka Yamaguchi
  • Patent number: 10669157
    Abstract: Disclosed is a method for readily and inexpensively producing zeolite without using an organic structure-directing agent (organic SDA). Specifically disclosed is a method whereby a gel containing a silica source, an alumina source, an alkaline source and water is reacted with zeolite seed crystals, to produce a zeolite with the same kind of skeletal structure as the zeolite. The gel used is a gel of a composition whereby, when a zeolite is synthesized from this gel only, the synthesized zeolite comprises at least one of the kinds of composite building units of the target zeolite.
    Type: Grant
    Filed: April 20, 2017
    Date of Patent: June 2, 2020
    Assignee: Mitsui Mining & Smelting Co., Ltd.
    Inventors: Keiji Itabashi, Tatsuya Okubo, Yoshihiro Kamimura, Shanmugam Palani Elangovan
  • Patent number: 10645809
    Abstract: There is provided a surface-treated copper foil including a surface coating layer provided on at least one surface of a copper foil, the surface coating layer being mainly composed of silicon with a hydrogen content of 1 to 35 atomic % and/or a carbon content of 1 to 15 atomic %. This foil can be manufactured by forming a surface coating layer composed mainly of silicon with the above hydrogen and carbon contents on at least one surface of the copper foil by PVD or CVD. The present invention can provide a copper foil with a surface coating layer that can achieve a high bonding strength to a resin layer even if the copper foil has an extremely smooth surface such as one formed by vapor deposition, for example, sputtering and also has a desirable insulation resistance suitable for achieving a fine pitch in a printed wiring board.
    Type: Grant
    Filed: September 3, 2015
    Date of Patent: May 5, 2020
    Assignee: Mitsui Mining & Smelting Co., Ltd.
    Inventors: Yoshinori Matsuura, Joe Nishikawa, Hiroaki Kurihara
  • Patent number: 10644348
    Abstract: Provided is a novel crystalline solid electrolyte which can be used as a dispersion medium when slurrying polar solvents such as NMP, acetone, and DMF, and for which a decrease in conductivity when the crystalline solid electrolyte is immersed in said solvents can be suppressed. Proposed is a crystalline solid electrolyte represented by Compositional Formula: LixSiyPzSaHaw (here, Ha includes one or two or more of Br, Cl, I, and F, and 2.4<(x?y)/(y+z)<3.3), in which the content of S is 55 to 73% by mass, the content of Si is 2 to 11% by mass, and the content of a Ha element is 0.02% by mass or more.
    Type: Grant
    Filed: February 28, 2014
    Date of Patent: May 5, 2020
    Assignee: Mitsui Mining & Smelting Co., Ltd.
    Inventors: Tsutomu Higuchi, Norihiko Miyashita, Kenji Matsuzaki, Takahiro Ito, Kenji Tomonari
  • Patent number: 10629935
    Abstract: In this fuel cell electrode catalyst layer, a catalyst is supported on a carrier comprising inorganic oxide particles. The fuel cell electrode catalyst layer is provided with a porous structure. When a mercury penetration method is used to measure the pore size distribution of the porous structure, a peak is observed in the range spanning from 0.005 ?m to 0.1 ?m inclusive, and a peak is also observed in the range spanning from over 0.1 ?m to not more than 1 ?m. When P1 represents the peak intensity in the range spanning from 0.005 ?m to 0.1 ?m inclusive, and P2 represents the peak intensity in the range spanning from over 0.1 ?m to not more than 1 ?m, the value of P2/P1 is 0.2-10 inclusive. It is preferable that the inorganic oxide be tin oxide.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: April 21, 2020
    Assignee: MITSUI MINING & SMELTING CO., LTD.
    Inventors: Ryoma Tsukuda, Naohiko Abe, Hiromu Watanabe, Susumu Takahashi, Kenichi Amitani, Akiko Sugimoto
  • Publication number: 20200113066
    Abstract: Provided is a method of manufacturing a circuit board involves: preparing a composite laminate including a support, a release layer, and a multilayered circuit board; disposing the composite laminate on a stage such that one face of the composite laminate is put into tight contact with the stage; and releasing the support or the multilayered circuit board from the release layer such that the support or the multilayered circuit board forms a convex face with a curvature radius of 200 to 5000 mm while the face of the composite laminate is kept in tight contact with the stage. The method according to the present invention can prevent the occurrences of defects, for example, breaking in the support and cracking and wire disconnections in the multilayered circuit board in manufacturing of circuit boards, such as coreless circuit boards, and ensure stable release of the support or the multilayered circuit board.
    Type: Application
    Filed: March 9, 2018
    Publication date: April 9, 2020
    Applicant: MITSUI MINING & SMELTING CO., LTD.
    Inventors: Toshimi NAKAMURA, Yoshinori MATSUURA
  • Patent number: 10615425
    Abstract: Disclosed is a tin oxide containing antimony and at least one element A selected from the group consisting of tantalum, tungsten, niobium, and bismuth. The antimony and the at least one element A selected from the group consisting of tantalum, tungsten, niobium, and bismuth are preferably dissolved in a solid state in tin oxide. The ratio of the number of moles of the element A to the number of moles of antimony, i.e., [(the number of moles of the element A/the number of moles of antimony)], is preferably 0.1 to 10.
    Type: Grant
    Filed: July 21, 2016
    Date of Patent: April 7, 2020
    Assignee: MITSUI MINING & SMELTING CO., LTD.
    Inventors: Koichi Miyake, Susumu Takahashi, Hiromu Watanbe, Naohiko Abe, Ryoma Tsukuda, Kenichi Amitani, Koji Taniguchi, Hiroki Takahashi, Yoshihiro Yoneda, Kazuhiko Kato
  • Patent number: 10612127
    Abstract: Provided is a sputtering target having extremely low occurrence of arcing or nodules, and a method for manufacturing such a sputtering target. A flat plate-shaped or cylindrical target material (3, 13) is obtained by processing a material composed of an oxide sintered body. In doing so, a grindstone having a specified grade is used to perform rough grinding of a surface of the material that will become a sputtering surface (5, 15) one or more times in accordance to the grade of the grindstone, after which zero grinding is performed one or more times so that the surface roughness of the sputtering surface (5, 15) has an arithmetic mean roughness Ra of 0.9 ?m or more, a maximum height Rz of 10.0 ?m or less, and RzJIS roughness of 7.0 ?m or less. A sputtering target (1, 11) is obtained by bonding the obtained target material (3, 13) to a backing body (2, 12) by way of a bonding layer (4, 14).
    Type: Grant
    Filed: June 25, 2015
    Date of Patent: April 7, 2020
    Assignee: MITSUI MINING & SMELTING CO., LTD.
    Inventors: Makoto Ozawa, Isao Ando
  • Patent number: 10576458
    Abstract: Provided is a new catalyst structure for exhaust gas treatment including an upper catalyst layer and a lower catalyst layer, in which the catalyst structure can sufficiently exhibit functions as a three way catalyst while maintaining gas diffusibility. Proposed is a catalyst structure including a substrate, an upper catalyst layer, and a lower catalyst layer, the catalyst structure having a first peak or a second peak at a pore volume diameter of 10 nm to 50 nm and a pore volume diameter of 50 nm to 100 nm, respectively, in the logarithmic differential pore volume distribution analyzed by a mercury intrusion porosimeter.
    Type: Grant
    Filed: March 13, 2014
    Date of Patent: March 3, 2020
    Assignee: Mitsui Mining & Smelting Co., Ltd.
    Inventors: Yasunori Imada, Yunosuke Nakahara
  • Publication number: 20200053885
    Abstract: There is provided a copper foil provided with a carrier exhibiting a high peeling resistance against the developer in the photoresist developing process and achieving high stability of mechanical peel strength of the carrier. The copper foil provided with a carrier comprises a carrier; an interlayer disposed on the carrier, the interlayer having a first surface adjacent to the carrier and containing 1.0 atom % or more of at least one metal selected from the group consisting of Ti, Cr, Mo, Mn, W and Ni and a second surface remote from the carrier and containing 30 atom % or more of Cu; a release layer disposed on the interlayer; and an extremely-thin copper layer disposed on the release layer.
    Type: Application
    Filed: October 18, 2019
    Publication date: February 13, 2020
    Applicant: MITSUI MINING & SMELTING CO., LTD.
    Inventor: Yoshinori MATSUURA
  • Publication number: 20200045830
    Abstract: A method of manufacturing a multilayer wiring board is disclosed, the method being capable of separating a substrate without large local warpage of the multilayer wiring layer and thereby improving the reliability of connection in the multilayer wiring layer. This method includes providing a laminated sheet having, in sequence, a substrate, a first release layer and a metal layer; forming a first wiring layer on the metal layer; alternately stacking insulating layers and wiring layers on the laminated sheet on which the first wiring layer is formed to give a laminate provided with a multilayer wiring layer; stacking a reinforcing sheet on the laminate provided with the multilayer wiring layer while interposing a second release layer; separating the substrate from the metal layer; and separating the reinforcing sheet from the laminate provided with the multilayer wiring layer to give the multilayer wiring board.
    Type: Application
    Filed: October 6, 2016
    Publication date: February 6, 2020
    Applicant: MITSUI MINING & SMELTING CO., LTD.
    Inventors: Yoshinori MATSUURA, Takenori YANAI, Toshimi NAKAMURA
  • Publication number: 20200045829
    Abstract: A method of manufacturing a multilayer wiring board is disclosed, the method being capable of reinforcing the multilayer wiring layer and thereby improving the reliability of connection and the flatness on the surface of the multilayer wiring layer. The method includes providing a laminated sheet having a substrate, a first release layer and a metal layer; forming a first wiring layer on the metal layer; alternately stacking insulating layers and wiring layers on the laminated sheet on which the first wiring layer is formed to give a laminate provided with a multilayer wiring layer; stacking a reinforcing sheet on the laminate provided with the multilayer wiring layer at the side opposite to the laminate sheet, while interposing the second release layer; separating the substrate from the metal layer; and separating the reinforcing sheet from the laminate provided with the multilayer wiring layer to give the multilayer wiring board.
    Type: Application
    Filed: October 6, 2016
    Publication date: February 6, 2020
    Applicant: MITSUI MINING & SMELTING CO., LTD.
    Inventors: Yoshinori MATSUURA, Takenori YANAI, Toshimi NAKAMURA
  • Patent number: 10550321
    Abstract: Proposed is a phosphor capable of effectively inhibiting the occurrence of adverse influence of a sulfur-based gas while improving water resistance of the phosphor and effectively inhibiting the corrosion of a metallic member. A phosphor is proposed, which includes particles or a layer provided on the surface of a sulfur-containing phosphor, which contains sulfur in a host material, and containing a crystalline metal borate containing an IIA-Group element, boron, and oxygen.
    Type: Grant
    Filed: January 15, 2015
    Date of Patent: February 4, 2020
    Assignee: Mitsui Mining & Smelting Co., Ltd.
    Inventors: Masaaki Inamura, Haruka Shimizu, Takayoshi Mori, Masanori Sato, Jun-ichi Itoh
  • Patent number: 10538679
    Abstract: Provided is a phosphor, which is excited by a wide band of visible light, capable of emitting near-infrared light of high intensity. The phosphor comprises a crystal phase represented by a formula (1): MCuSi2O6 (where M comprises one or more of Ba, Sr and Ca), and a crystal phase represented by a formula (2): MCuSi4O10 (where M comprises one or more of Ba, Sr and Ca), wherein a ratio ? of a diffraction peak intensity of MCuSi4O10 with respect to a diffraction peak intensity of MCuSi2O6 in an X-ray diffraction (XRD) pattern obtained by powder XRD measurement using CuK? rays is 0<??0.50.
    Type: Grant
    Filed: February 10, 2016
    Date of Patent: January 21, 2020
    Assignee: Mitsui Mining & Smelting Co., Ltd.
    Inventors: Jun-ichi Itoh, Ikuhiro Ozawa, Takayoshi Mori
  • Patent number: 10526209
    Abstract: The objective of the invention is to provide an MSE-type zeolite production method such that an MSE-type zeolite can be produced in a comparatively short heating time by using inexpensive tetraethylammonium ion. The production method of the present invention comprises steps of: (1) mixing a silica source, an alumina source, an alkali source, tetraethylammonium ion, and water in such a manner as to yield a reaction mixture of the composition represented by the molar ratios indicated below: SiO2/Al2O3=between 10 and 100 inclusive (Na2O+K2O)/SiO2=between 0.15 and 0.50 inclusive K2O/(Na2O+K2O)=between 0.05 and 0.7 inclusive TEA2O/SiO2=between 0.08 and 0.20 inclusive H2O/SiO2=between 5 and 50 inclusive; (2) using the MSE-type zeolite as a seed crystal, and adding this seed crystal to the mixture at a proportion of 5 to 30% by mass with respect to the silica component in the reaction mixture; and (3) heating, under hermetic seal at a temperature of 100 to 200° C.
    Type: Grant
    Filed: April 26, 2017
    Date of Patent: January 7, 2020
    Assignees: MITSUI MINING & SMELTING CO., LTD., The University of Tokyo
    Inventors: Keiji Itabashi, Shanmugam Palani Elangovan, Sibel Sogukkanli, Tatsuya Okubo
  • Publication number: 20200008298
    Abstract: A resin composition for use in a dielectric layer of a capacitor device or a capacitor-embedded printed circuit board is provided in which the resin composition can improve stability in capacitance and insulation properties of the capacitor device under high temperature and high humidity and ensures high adhesion of the dielectric layer to the device. The resin composition comprises a resin component and a dielectric filler. The resin component comprises an epoxy resin, an active ester resin, and an aromatic polyamide resin.
    Type: Application
    Filed: March 9, 2018
    Publication date: January 2, 2020
    Applicant: MITSUI MINING & SMELTING CO., LTD.
    Inventors: Yoshihiro YONEDA, Toshifumi MATSUSHIMA, Toshihiro HOSOI, Kenshiro FUKUDA
  • Patent number: 10518323
    Abstract: Disclosed is copper powder having an average primary particle size D of 0.15 to 0.6 ?m, having a ratio of D to DBET, D/DBET, of 0.8 to 4.0 wherein DBET is a sphere-equivalent average particle diameter calculated from a BET specific surface area, and having no layer for preventing agglomeration on the surface thereof. The copper powder is suitably produced by a method which includes a step of mixing (1) hydrazine and (2) a reactant mixture including a monovalent or divalent copper source and a liquid medium which includes water and an organic solvent having water miscibility and capable of reducing the surface tension of water, to reduce the copper source to form copper particles.
    Type: Grant
    Filed: June 20, 2013
    Date of Patent: December 31, 2019
    Assignee: MITSUI MINING & SMELTING CO., LTD.
    Inventors: Yoichi Kamikoriyama, Shigeki Nakayama
  • Patent number: 10524360
    Abstract: A material for forming of the capacitor layer which generates no crack in drilling on the dielectric layer of the capacitor in manufacturing of a highly multilayered printed wiring board embedded a capacitor circuit. Copper clad laminate for forming of an embedded capacitor layer of a multilayered printed wiring board including an embedded capacitor circuit having a layer structure of copper layer/dielectric layer of the capacitor/copper layer in an inner layer characterized in that the composite elastic modulus Er of the resin film constituting the dielectric layer of the capacitor along the thickness direction is less than 6.1 GPa is employed.
    Type: Grant
    Filed: February 8, 2018
    Date of Patent: December 31, 2019
    Assignee: MITSUI MINING & SMELTING CO., LTD.
    Inventors: Fujio Kuwako, Toshifumi Matsushima, Toshihiro Hosoi