Patents Assigned to NanoGram Corporation
  • Patent number: 9475695
    Abstract: Silicon based nanoparticle inks are formulated with viscous polycyclic alcohols to control the rheology of the inks. The inks can be formulated into pastes with non-Newtonian rheology and good screen printing properties. The inks can have low metal contamination such that they are suitable for forming semiconductor structures. The silicon based nanoparticles can be elemental silicon particles with or without dopant.
    Type: Grant
    Filed: May 20, 2014
    Date of Patent: October 25, 2016
    Assignee: NanoGram Corporation
    Inventors: Weidong Li, Masaya Soeda, Gina Elizabeth Pengra-Leung, Shivkumar Chiruvolu
  • Patent number: 9448331
    Abstract: Polymer-inorganic particle blends are incorporated into structures generally involving interfaces with additional materials that can be used advantageously for forming desirable devices. In some embodiments, the structures are optical structures, and the interfaces are optical interfaces. The different materials at the interface can have differences in index-of-refraction to yield desired optical properties at the interface. In some embodiments, structures are formed with periodic variations in index-of-refraction. In particular, photonic crystals can be formed. Suitable methods can be used to form the desired structures.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: September 20, 2016
    Assignee: NanoGram Corporation
    Inventors: Nobuyuki Kambe, Shivkumar Chiruvolu
  • Patent number: 9378957
    Abstract: The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells.
    Type: Grant
    Filed: February 14, 2014
    Date of Patent: June 28, 2016
    Assignee: NanoGram Corporation
    Inventors: Guojun Liu, Uma Srinivasan, Shivkumar Chiruvolu
  • Patent number: 9343606
    Abstract: Photovoltaic modules comprise solar cells having doped domains of opposite polarities along the rear side of the cells. The doped domains can be located within openings through a dielectric passivation layer. In some embodiments, the solar cells are formed from thin silicon foils. Doped domains can be formed by printing inks along the rear surface of the semiconducting sheets. The dopant inks can comprise nanoparticles having the desired dopant.
    Type: Grant
    Filed: October 31, 2012
    Date of Patent: May 17, 2016
    Assignee: NanoGram Corporation
    Inventor: Henry Hieslmair
  • Patent number: 9199435
    Abstract: Inorganic particle/polymer composites are described that involve chemical bonding between the elements of the composite. In some embodiments, the composite composition includes a polymer having side groups chemically bonded to inorganic particles. Furthermore, the composite composition can include chemically bonded inorganic particles and ordered copolymers. Various electrical, optical and electro-optical devices can be formed from the composites.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: December 1, 2015
    Assignee: NanoGram Corporation
    Inventors: Nobuyuki Kambe, Shivkumar Chiruvol
  • Patent number: 9175174
    Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.
    Type: Grant
    Filed: October 28, 2013
    Date of Patent: November 3, 2015
    Assignee: NanoGram Corporation
    Inventor: Nobuyuki Kambe
  • Patent number: 9163308
    Abstract: Light reactive deposition uses an intense light beam to form particles that are directly coated onto a substrate surface. In some embodiments, a coating apparatus comprising a noncircular reactant inlet, optical elements forming a light path, a first substrate, and a motor connected to the apparatus. The reactant inlet defines a reactant stream path. The light path intersects the reactant stream path at a reaction zone with a product stream path continuing from the reaction zone. The substrate intersects the product stream path. Also, operation of the motor moves the first substrate relative to the product stream. Various broad methods are described for using light driven chemical reactions to produce efficiently highly uniform coatings.
    Type: Grant
    Filed: July 30, 2009
    Date of Patent: October 20, 2015
    Assignee: NanoGram Corporation
    Inventors: Xiangxin Bi, Ronald J. Mosso, Shivkumar Chiruvolu, Sujeet Kumar, James T. Gardner, Seung M. Lim, William E. McGovern
  • Patent number: 9006720
    Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.
    Type: Grant
    Filed: April 8, 2013
    Date of Patent: April 14, 2015
    Assignee: NanoGram Corporation
    Inventors: Shivkumar Chiruvolu, Igor Altman, Bernard M. Frey, Weidong Li, Guojun Liu, Robert B. Lynch, Gina Elizabeth Pengra-Leung, Uma Srinivasan
  • Patent number: 9000083
    Abstract: Polymer-inorganic particle blends are incorporated into structures generally involving interfaces with additional materials that can be used advantageously for forming desirable devices. In some embodiments, the structures are optical structures, and the interfaces are optical interfaces. The different materials at the interface can have differences in index-of-refraction to yield desired optical properties at the interface. In some embodiments, structures are formed with periodic variations in index-of-refraction. In particular, photonic crystals can be formed. Suitable methods can be used to form the desired structures.
    Type: Grant
    Filed: December 2, 2013
    Date of Patent: April 7, 2015
    Assignee: NanoGram Corporation
    Inventor: Nobuyuki Kambe
  • Patent number: 8912083
    Abstract: The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells.
    Type: Grant
    Filed: May 23, 2011
    Date of Patent: December 16, 2014
    Assignee: NanoGram Corporation
    Inventors: Guojun Liu, Uma Srinivasan, Shivkumar Chiruvolu
  • Publication number: 20140346436
    Abstract: Silicon based nanoparticle inks are formulated with viscous polycyclic alcohols to control the rheology of the inks. The inks can be formulated into pastes with non-Newtonian rheology and good screen printing properties. The inks can have low metal contamination such that they are suitable for forming semiconductor structures. The silicon based nanoparticles can be elemental silicon particles with or without dopant.
    Type: Application
    Filed: May 20, 2014
    Publication date: November 27, 2014
    Applicant: NanoGram Corporation
    Inventors: Weidong Li, Masaya Soeda, Gina Elizabeth Pengra-Leung, Shivkumar Chiruvolu
  • Patent number: 8895962
    Abstract: Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.
    Type: Grant
    Filed: March 23, 2011
    Date of Patent: November 25, 2014
    Assignee: NanoGram Corporation
    Inventors: Shivkumar Chiruvolu, Igor Altman, Bernard M. Frey, Weidong Li, Guojun Liu, Robert B. Lynch, Gina Elizabeth Pengra-Leung, Uma Srinivasan
  • Patent number: 8853527
    Abstract: Photovoltaic modules comprise solar cells having doped domains of opposite polarities along the rear side of the cells. The doped domains can be located within openings through a dielectric passivation layer. In some embodiments, the solar cells are formed from thin silicon foils. Doped domains can be formed by printing inks along the rear surface of the semiconducting sheets. The dopant inks can comprise nanoparticles having the desired dopant.
    Type: Grant
    Filed: February 15, 2008
    Date of Patent: October 7, 2014
    Assignee: NanoGram Corporation
    Inventor: Henry Hieslmair
  • Publication number: 20140162445
    Abstract: The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells.
    Type: Application
    Filed: February 14, 2014
    Publication date: June 12, 2014
    Applicant: NanoGram Corporation
    Inventors: Guojun Liu, Uma Srinivasan, Shivkumar Chiruvolu
  • Publication number: 20140151706
    Abstract: Silicon nanoparticle inks provide a basis for the formation of desirable materials. Specifically, composites have been formed in thin layers comprising silicon nanoparticles embedded in an amorphous silicon matrix, which can be formed at relatively low temperatures. The composite material can be heated to form a nanocrystalline material having crystals that are non-rod shaped. The nanocrystalline material can have desirable electrical conductive properties, and the materials can be formed with a high dopant level. Also, nanocrystalline silicon pellets can be formed from silicon nanoparticles deposited form an ink in which the pellets can be relatively dense although less dense than bulk silicon. The pellets can be formed from the application of pressure and heat to a silicon nanoparticle layer.
    Type: Application
    Filed: February 7, 2014
    Publication date: June 5, 2014
    Applicant: NanoGram Corporation
    Inventors: Guojun Liu, Shivkumar Chiruvolu, Weidong Li, Uma Srinivasan
  • Publication number: 20140138135
    Abstract: Highly uniform silicon/germanium nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silicon/germanium particles can be surface modified to form the dispersions. The silicon/germanium nanoparticles can be doped to change the particle properties. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to form selectively doped deposits of semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.
    Type: Application
    Filed: December 31, 2013
    Publication date: May 22, 2014
    Applicant: NanoGram Corporation
    Inventors: Henry Hieslmair, Vladimir K. Dioumaev, Shivkumar Chiruvolu, Hui Du
  • Publication number: 20140106551
    Abstract: Laser based processes are used alone or in combination to effectively process doped domains for semiconductors and/or current harvesting structures. For example, dopants can be driven into a silicon/germanium semiconductor layer from a bare silicon/germanium surface using a laser beam. Deep contacts have been found to be effective for producing efficient solar cells. Dielectric layers can be effectively patterned to provide for selected contact between the current collectors and the doped domains along the semiconductor surface. Rapid processing approaches are suitable for efficient production processes.
    Type: Application
    Filed: December 16, 2013
    Publication date: April 17, 2014
    Applicant: NanoGram Corporation
    Inventors: Uma Srinivasan, Xin Zhou, Henry Hieslmair, Neeraj Pakala
  • Publication number: 20140084222
    Abstract: Polymer-inorganic particle blends are incorporated into structures generally involving interfaces with additional materials that can be used advantageously for forming desirable devices. In some embodiments, the structures are optical structures, and the interfaces are optical interfaces. The different materials at the interface can have differences in index-of-refraction to yield desired optical properties at the interface. In some embodiments, structures are formed with periodic variations in index-of-refraction. In particular, photonic crystals can be formed. Suitable methods can be used to form the desired structures.
    Type: Application
    Filed: December 2, 2013
    Publication date: March 27, 2014
    Applicant: NanoGram Corporation
    Inventor: Nobuyuki Kambe
  • Patent number: 8658726
    Abstract: Desirable composites of polysiloxane polymers and inorganic nanoparticles can be formed based on the appropriate selection of the surface properties of the particles and the chemical properties of the polymer. High loadings of particles can be achieved with good dispersion through the polymer. The composites can have good optical properties. In some embodiments, the inorganic particles are substantially free of surface modification.
    Type: Grant
    Filed: March 18, 2013
    Date of Patent: February 25, 2014
    Assignee: NanoGram Corporation
    Inventors: Hui Du, Shivkumar Chiruvolu, Ang-Ling Chu
  • Publication number: 20140047996
    Abstract: Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.
    Type: Application
    Filed: October 28, 2013
    Publication date: February 20, 2014
    Applicant: NanoGram Corporation
    Inventor: Nobuyuki Kambe