Patents Assigned to National University Corporation Tohoku University
  • Patent number: 11684693
    Abstract: A cell or tissue embedding device having an aqueous gel serving as an immunoisolation layer, the aqueous gel containing, as components thereof, a denatured polyvinyl alcohol resin having an activated carbonyl group and a crosslinking agent is highly capable of supplying a physiologically active substance.
    Type: Grant
    Filed: February 23, 2018
    Date of Patent: June 27, 2023
    Assignees: Japan Vam & Poval Co., Ltd., National University Corporation Tohoku University
    Inventors: Akinobu Oharuda, Yoshihiro Kimura, Masafumi Goto
  • Patent number: 10227687
    Abstract: A hard lubrication film, with which a surface of a base material is coated, has two or more alternately laminated layers that are one or more A-layers made of (CraMobWcVdBe)1?x?yCxNy and one or more B-layers made of (CraMobWcVdBe)1?x?y?zCxNyOz. Atom ratios a, b, c, d, e=1?a?b?c?d, x+y, and y related to A-layers satisfy 0.2?a?0.7, 0.05?b?0.6, 0?c?0.3, 0?d?0.05, 0?e?0.05, 0.3?x+y?0.6, and 0?y?0.6, respectively. Atom ratios a, b, c, d, e=1?a?b?c?d, x, y, z, and x+y+z related to B-layers satisfy 0.2?a?0.7, 0.05?b?0.6, 0?c?0.3, 0?d?0.05, 0?e?0.05, 0?x?0.6, 0?y?0.6, 0<z?0.6, and 0.3?x+y+z?0.6, respectively. Each A-layer has a film thickness within a range of 2 nm or more to 1000 nm or less, each B-layer has a film thickness within a range of 2 nm or more to 500 nm or less, and wherein the hard lubrication film has a total film thickness within a range of 0.1 ?m or more to 10.0 ?m or less.
    Type: Grant
    Filed: November 26, 2013
    Date of Patent: March 12, 2019
    Assignees: OSG CORPORATION, NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
    Inventors: Mei Wang, Masatoshi Sakurai, Yuji Sutou, Junichi Koike
  • Patent number: 10008961
    Abstract: A power generating device is disclosed that includes a power generating unit, an inductor, a switch connected to the inductor in series, and a control circuit. The power generating unit includes a piezoelectric element, and upper and lower electrodes disposed on surfaces of the piezoelectric element. The inductor is electrically connected to the electrodes in parallel, with the inductor and a capacitance component constituting a resonance circuit. The control circuit has a driving mode in which it controls the switch to an ON state in synchronism with the voltage generated in the piezoelectric element becoming a peak value. Further, in a rest mode, the control circuit controls the switch to be in an OFF state when the voltage generated in the piezoelectric element has the peak value.
    Type: Grant
    Filed: February 2, 2016
    Date of Patent: June 26, 2018
    Assignees: NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY, MURATA MANUFACTURING CO., LTD.
    Inventors: Kanjuro Makihara, Hitoshi Sakaguchi, Chikahiro Horiguchi
  • Publication number: 20170351805
    Abstract: It is an invention aimed at providing methods for optimizing read information mapped to the particular gene loci such as MHC loci under a framework of probabilistic statistical processing. In the present invention, a step in which for all reads, calculation of the expected number of mappings to alleles of the particular gene loci is performed for read information in which mapping of reads to alleles of the particular gene loci is identified, a step in which the total number of expected mappings for each allele is calculated, and a step in which the fraction of reads allocated to each allele is calculated, are repeatedly executed, in which the optimization of read information is performed in a computer, and based on the optimized information, a method of easily and accurately estimating the genotypes of the particular gene loci, a computer system, and a computer program capable of easily and accurately estimating the genotype of the particular gene loci, are provided.
    Type: Application
    Filed: December 25, 2015
    Publication date: December 7, 2017
    Applicant: NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
    Inventors: Masao NAGASAKI, Naoki NARIAI, Kaname KOJIMA
  • Patent number: 9812302
    Abstract: In a magnetron sputtering apparatus configured such that a magnetic field pattern on a target surface moves with time by means of a rotary magnet group, it is to solve a problem that the failure rate of substrates to be processed becomes high upon plasma ignition or extinction, thereby providing a magnetron sputtering apparatus in which the failure rate of the substrates is smaller than conventional. In a magnetron sputtering apparatus, a plasma shielding member having a slit is disposed on an opposite side of a target with respect to a rotary magnet group. The distance between the plasma shielding member and the substrate is set shorter than the electron mean free path or the sheath width. Further, the width and the length of the slit are controlled to prevent impingement of plasma on the processing substrate. This makes it possible to reduce the failure rate of the substrates.
    Type: Grant
    Filed: March 14, 2008
    Date of Patent: November 7, 2017
    Assignees: NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY, TOKYO ELECTRON LIMITED
    Inventors: Tadahiro Ohmi, Tetsuya Goto, Takaaki Matsuoka
  • Patent number: 9767994
    Abstract: A shower plate is disposed in a processing chamber in a plasma processing apparatus, and plasma excitation gas is released into the processing chamber so as to generate plasma. A ceramic member having a plurality of gas release holes having a diameter of 20 ?m to 70 ?m, and/or a porous gas-communicating body having pores having a maximum diameter of not more than 75 ?m communicating in the gas-communicating direction are sintered and bonded integrally with the inside of each of a plurality of vertical holes which act as release paths for the plasma excitation gas.
    Type: Grant
    Filed: November 17, 2014
    Date of Patent: September 19, 2017
    Assignees: TOKYO ELECTRON LIMITED, NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
    Inventors: Masahiro Okesaku, Tadahiro Ohmi, Tetsuya Goto, Takaaki Matsuoka, Toshihisa Nozawa, Atsutoshi Inokuchi, Kiyotaka Ishibashi
  • Patent number: 9693750
    Abstract: An evaluation aid is used as a phantom (imitation lesion) when a digital X-ray dynamic image thereof is taken and evaluated for image qualities for X-ray absorption parts having different X-ray absorption ratios. The evaluation aid contains a fixed plate (plate-like body) including a plurality of regions having different X-ray absorption ratios; a rotating disk (movable body) having a plurality of wires (wire rods), the rotating disk capable of rotating (moving) with respect to the fixed plate so that the plurality of wires traverse X-ray with which the fixed plate is irradiated; and a driving motor (driving portion) which rotates (moves) the rotating disk with respect to the fixed plate. It is preferred that thicknesses and/or constituent materials of the plurality of regions of the fixed plate are different from each other, so that these regions have the different X-ray absorption ratios.
    Type: Grant
    Filed: November 9, 2016
    Date of Patent: July 4, 2017
    Assignees: NATIONAL UNIVERSITY CORPORATION, TOHOKU UNIVERSITY, MITAYA MANFACTUING CO., LTD.
    Inventors: Koichi Chida, Yuji Kaga, Goro Yokouchi
  • Patent number: 9662087
    Abstract: An evaluation aid serves as a phantom (imitation lesion) when a digital X-ray image is taken, and evaluation is then carried out through the digital X-ray image. The evaluation aid can simplify evaluating image qualities of a digital X-ray image for X-ray absorption parts having different X-ray absorption ratios all at once. The evaluation aid contains a substrate (plate-like body) including a plurality of regions having different X-ray absorption ratios for taking a digital X-ray image to carry out evaluation. Step members are provided on the plate-like body so as to correspond to the plurality of regions, respectively, where each step member includes a plurality of subregions having different X-ray absorption ratios. Preferably the thicknesses and/or constituent materials of the plurality of regions of the substrate are different from each other in order to have different X-ray absorption ratios in these regions.
    Type: Grant
    Filed: April 6, 2016
    Date of Patent: May 30, 2017
    Assignees: National University Corporation, Tohoku University, Mitaya Manufacturing Co., Ltd.
    Inventors: Koichi Chida, Yuji Kaga, Goro Yokouchi
  • Publication number: 20170147745
    Abstract: The present invention provides a selection method of tag SNPs, for constituting a group of nucleic acid probes corresponding to the tag SNPs, the tag SNPs being used for performing imputation of information on SNPs of human genome by using human genome information, the human genome information including information on a group of SNPs, the genotypes of the SNPs being identified in multiple individuals, in which method a sum of mutual informations between tag SNP candidates and target SNPs is used as an index for selecting the tag SNPs, and a computer system based on the principle, a computer program, and a DNA microarray on which nucleic probes corresponding to the tag SNPs selected by the means, and a production method thereof.
    Type: Application
    Filed: June 19, 2015
    Publication date: May 25, 2017
    Applicant: National University Corporation Tohoku University
    Inventors: Masao NAGASAKI, Kaname KOJIMA, Naoki NARIAI, Takahiro MIMORI, Yosuke KAWAI
  • Publication number: 20170037502
    Abstract: Provided are: a hard lubricating coating film which is hard and has wear resistance; and a hard lubricating coating film-covered tool. A hard coating film (10), which is hard and has wear resistance, and an end mill (12) can be obtained by alternately forming two or more (CraMobWcVdBe)1-x-yCxNy layers A (22) and two or more (CraMobWcVdBe)1-x-y-zCxNyOz layers B (24) by controlling the composition ratios of Cr, Mo, W, V and B and various reaction gases during the film formation, or alternatively by controlling only the various reaction gases during the film formation.
    Type: Application
    Filed: November 26, 2013
    Publication date: February 9, 2017
    Applicants: OSG CORPORATION, NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
    Inventors: Mei WANG, Masatoshi SAKURAI, Yuji SUTOU, Junichi KOIKE
  • Patent number: 9551062
    Abstract: A tool hard film that is to be disposed as coating on a surface of a tool, the tool hard film being a TiCrMoWV oxycarbide, oxynitride, or oxycarbonitride having a phase with a NaCl-type crystal structure as a main phase, the oxycarbide, oxynitride, or oxycarbonitride having fine crystals due to introduction of oxygen.
    Type: Grant
    Filed: March 28, 2013
    Date of Patent: January 24, 2017
    Assignees: OSG CORPORATION, NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
    Inventors: Masatoshi Sakurai, Mei Wang, Toshihiro Ohchi, Yuji Sutou, Junichi Koike, Shoko Komiyama
  • Patent number: 9521989
    Abstract: An evaluation aid is used as a phantom (imitation lesion) when a digital X-ray dynamic image thereof is taken and evaluated for image qualities for X-ray absorption parts having different X-ray absorption ratios. The evaluation aid contains a fixed plate (plate-like body) including a plurality of regions having different X-ray absorption ratios; a rotating disk (movable body) having a plurality of wires (wire rods), the rotating disk capable of rotating (moving) with respect to the fixed plate so that the plurality of wires traverse X-ray with which the fixed plate is irradiated; and a driving motor (driving portion) which rotates (moves) the rotating disk with respect to the fixed plate. It is preferred that thicknesses and/or constituent materials of the plurality of regions of the fixed plate are different from each other, so that these regions have the different X-ray absorption ratios.
    Type: Grant
    Filed: June 13, 2016
    Date of Patent: December 20, 2016
    Assignees: National University Corporation, Tohoku University, Mitaya Manufacturing Co., Ltd.
    Inventors: Koichi Chida, Yuji Kaga, Goro Yokouchi
  • Publication number: 20160276171
    Abstract: In a silicon wafer which has a surface with a plurality of terraces formed stepwise by single-atomic-layer steps, respectively, no slip line is formed.
    Type: Application
    Filed: September 17, 2015
    Publication date: September 22, 2016
    Applicant: NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
    Inventors: Tadahiro OHMI, Akinobu TERAMOTO, Tomoyuki SUWA
  • Patent number: 9392991
    Abstract: The present invention provides an evaluation aid which can be used as a phantom (imitation lesion) when a digital X-ray dynamic image thereof is taken and then evaluation is carried out through the digital X-ray dynamic image, and especially an evaluation aid which can be used for evaluating image qualities of a digital X-ray dynamic image for X-ray absorption parts having different X-ray absorption ratios, and an evaluation device provided with such an evaluation aid.
    Type: Grant
    Filed: July 2, 2012
    Date of Patent: July 19, 2016
    Assignees: NATIONAL UNIVERSITY CORPORATION, TOHOKU UNIVERSITY, MITAYA MANUFACTURING CO., LTD.
    Inventors: Koichi Chida, Yuji Kaga, Goro Yokouchi
  • Patent number: 9383758
    Abstract: A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m(P1?P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
    Type: Grant
    Filed: December 21, 2015
    Date of Patent: July 5, 2016
    Assignees: Fujikin Incorporated, National University Corporation Tohoku University, Tokyo Electron Ltd.
    Inventors: Tadahiro Ohmi, Masahito Saito, Shoichi Hino, Tsuyoshi Shimazu, Kazuyuki Miura, Kouji Nishino, Masaaki Nagase, Katsuyuki Sugita, Kaoru Hirata, Ryousuke Dohi, Takashi Hirose, Tsutomu Shinohara, Nobukazu Ikeda, Tomokazu Imai, Toshihide Yoshida, Hisashi Tanaka
  • Patent number: 9385042
    Abstract: This invention provides a technique advantageous to improve the operating speed of an integrated circuit. In a semiconductor device in which an n-type transistor and a p-type transistor are formed on the (551) plane of silicon, the thickness of a silicide layer which is in contact with a diffusion region of the n-type transistor is smaller than that of a silicide layer which is in contact with a diffusion region of the p-type transistor.
    Type: Grant
    Filed: April 4, 2011
    Date of Patent: July 5, 2016
    Assignee: NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY
    Inventors: Tadahiro Ohmi, Hiroaki Tanaka
  • Publication number: 20160148975
    Abstract: A magnetoresistive element according to an embodiment includes: a first magnetic layer; a second magnetic layer; a first nonmagnetic layer disposed between the first magnetic layer and the second magnetic layer; and a third magnetic layer disposed between the first magnetic layer and the first nonmagnetic layer, the first magnetic layer including (MnxGay)100-zCoz (45 atm %?x?75 atm %, 25 atm %?y?55 atm %, x+y=100 atm %, 0 atm %<z?10 atm %).
    Type: Application
    Filed: January 29, 2016
    Publication date: May 26, 2016
    Applicants: Kabushiki Kaisha Toshiba, National University Corporation Tohoku University
    Inventors: Yushi KATO, Tadaomi DAIBOU, Eiji KITAGAWA, Takao OCHIAI, Junichi ITO, Takahide KUBOTA, Shigemi MIZUKAMI, Terunobu MIYAZAKI
  • Patent number: 9332957
    Abstract: An evaluation aid which can be used as a phantom (imitation lesion) when a digital X-ray image is taken and then evaluation is carried out through the digital X-ray image. The evaluation aid can be used to easily evaluate image qualities of a digital X-ray image for object parts having different X-ray absorption ratios at once. The evaluation aid is adapted to be used for taking a digital X-ray image thereof through which evaluation is carried out, and contains a substrate (plate-like body) including a plurality of regions having different X-ray absorption ratios; and step members provided on the plate-like body so as to correspond to the plurality of regions, respectively. Each step member includes a plurality of subregions having different X-ray absorption ratios. Thicknesses and/or constituent materials of the plurality of regions of the substrate may be different from each other to establish regions having different X-ray absorption ratios.
    Type: Grant
    Filed: January 30, 2015
    Date of Patent: May 10, 2016
    Assignee: National University Corporation, Tohoku University
    Inventors: Koichi Chida, Yuji Kaga, Goro Yokouchi
  • Patent number: 9296613
    Abstract: The invention is directed to a carbon material dispersion, including: a fluorinated carbon material having a fluorinated surface formed by bringing a treatment gas with a fluorine concentration of 0.01 to 100 vol % into contact with a carbon material under conditions at 150 to 600° C.; and a dispersion medium in which the fluorinated carbon material is dispersed.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: March 29, 2016
    Assignees: NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY, STELLA CHEMIFA CORPORATION
    Inventors: Kazuyuki Tohji, Yoshinori Sato, Shinji Hashiguchi, Kazutaka Hirano
  • Publication number: 20160076939
    Abstract: Provided is a photodiode having a high-concentration layer on its surface, in which the high-concentration layer is formed so that the thickness of a non-depleted region is larger than the roughness of an interface between silicon and an insulation film layer, and is smaller than a penetration depth of ultraviolet light.
    Type: Application
    Filed: November 10, 2015
    Publication date: March 17, 2016
    Applicant: National University Corporation Tohoku University
    Inventors: Shigetoshi SUGAWA, Rihito KURODA