Patents Assigned to PLATECH CO., LTD.
  • Patent number: 9150977
    Abstract: The present invention relates to a copper plating solution for relieving the deposit stress of an electroplated copper film. In the copper electroplating solution of the present invention, glycerin propoxylate ethoxylate is used as a carrier for relieving the deposit stress, and phenylurea is added as a deposit stress relieving additive. The copper electroplating solution of the present invention includes the phenylurea by from about 0.02 to about 0.08 g/l.
    Type: Grant
    Filed: February 6, 2014
    Date of Patent: October 6, 2015
    Assignee: HOJIN PLATECH CO., LTD.
    Inventors: Pan Soo Kim, Duk Haeng Lee, Woon Suk Jung
  • Publication number: 20150176148
    Abstract: Provided is a substrate carrier device for electroplating of a solar cell which simultaneously plates both surfaces of a wafer.
    Type: Application
    Filed: April 5, 2013
    Publication date: June 25, 2015
    Applicant: HOJIN PLATECH CO., LTD.
    Inventors: Pan Soo Kim, Duk Haeng Lee, Woon Suk Jung
  • Patent number: 8967428
    Abstract: The present invention relates to a gum dispenser for automatically dispensing gum by the vertical lifting of a gum case. Particularly, the present invention provides a container that has a self-sealing means, accurately dispenses a piece of gum one by one, prevents the generation of container defects, and provides ease of operation and molding. Currently, in the above operation structure, an inner case receiving gum therein is fitted in a lifting shaft of an outer case to be lifted or lowered so that a piece of gum is pushed up to an upper end of the lifting shaft, and then the gum is exposed to a dispensing hole perforated in a lid, which is coupled with the inner case, one by one for a user to enjoy.
    Type: Grant
    Filed: January 20, 2010
    Date of Patent: March 3, 2015
    Assignee: ID Platech Co., Ltd
    Inventor: Kang Cheal Kim
  • Publication number: 20140309474
    Abstract: A melting furnace includes a waste inlet formed on a first side wall of the plasma melting furnace to feed waste therein, an exhaust gas outlet formed on a second side wall facing the first side wall and located diagonally to a direction orthogonal to the first side wall having the waste inlet to discharge the exhaust gas generated in the plasma melting furnace, and a plasma torch mounted on a third side wall for heating inside of the plasma melting furnace at a position nearer to the second side wall than the first side wall so as to inject a plasma into the exhaust gas.
    Type: Application
    Filed: April 7, 2014
    Publication date: October 16, 2014
    Applicant: GS Platech Co., Ltd.
    Inventors: Soon-Mo HWANG, Young-Suk KIM, Cheul Jin DO, Jin Ho LEE, Byung-Ju YOO
  • Publication number: 20140246410
    Abstract: A non-transferred and hollow type plasma torch includes a rear torch unit, and a front torch unit. The rear torch unit includes a rear electrode housing whose both sides are opened, a hollow rear electrode body that is fixed inside the rear electrode housing, a magnetic coil that is wound around the rear electrode housing corresponding to the rear electrode body, and a rear electrode cover that is inserted into the opened side of the rear electrode housing and detachably formed on an end of the rear electrode body.
    Type: Application
    Filed: March 3, 2014
    Publication date: September 4, 2014
    Applicant: GS Platech Co., Ltd.
    Inventors: Soon-Mo HWANG, Young-Suk KIM, Byung-Ju YOO, Myung-Gyu KIM, Chul Jin DO
  • Publication number: 20140151238
    Abstract: The present invention relates to a copper plating solution for relieving the deposit stress of an electroplated copper film. In the copper electroplating solution of the present invention, glycerin propoxylate ethoxylate is used as a carrier for relieving the deposit stress, and phenylurea is added as a deposit stress relieving additive. The copper electroplating solution of the present invention includes the phenylurea by from about 0.02 to about 0.08 g/l.
    Type: Application
    Filed: February 6, 2014
    Publication date: June 5, 2014
    Applicant: HOJIN PLATECH CO.,LTD.
    Inventors: Pan Soo Kim, Duk Haeng Lee, Woon Suk Jung
  • Publication number: 20140154836
    Abstract: The present invention relates to plating equipment and method for a solar cell wafer using electroplating and light-induced plating jointly. The plating equipment includes a jig allowing a wafer (1), that is a body to be plated, to be vertically immersed into a plating solution at a center of a plating bath (209), a first plating unit (200) comprising a plurality of anode members (210) symmetrically disposed on both sides of the plating bath (209) facing the wafer (1), the first plating unit performing electroplating; and a second plating unit (300) disposed in a light source receiving unit (320) physically blocked from the first plating unit (200), the second plating unit (300) being disposed at a rear side of the anode members (210) to perform light-induced plating by using an light emitting diode (LED) lamp (301) irradiating light onto the wafer (1).
    Type: Application
    Filed: February 6, 2014
    Publication date: June 5, 2014
    Applicant: HOJIN PLATECH CO., LTD.
    Inventors: Pan Soo Kim, Duk Haeng Lee, Woon Suk Jung
  • Publication number: 20130294474
    Abstract: A gasification melting furnace includes a gasification part into which the combustible material inputs, a sedimentary part communicating with a lower part of the gasification part, and a melting part communicating with a lateral face of the sedimentary part and having a heater, wherein the sedimentary part is filled with the combustible material and a gas generated in the melting part passes through the combustible material and inputs into the gasification part, thereby stably and rapidly treating the combustible material, reducing energy consumption of the heater, and providing a synthetic gas containing decreased hazardous substances.
    Type: Application
    Filed: May 6, 2013
    Publication date: November 7, 2013
    Applicant: GS PLATECH CO., LTD.
    Inventors: Young-Suk KIM, Soon-Mo HWANG, Chul-Jin DO, Jin-Ho LEE
  • Publication number: 20130292363
    Abstract: A plasma torch includes a rear torch unit and a front torch unit which are connected through an insulating body. The insulating body is made of an insulator, is injected with gas required to generate plasma, and includes an inflow chamber that may move the injected gas. The rear torch unit coupled with a rear side of the insulation body communicates with the inflow chamber and has a magnetic coil generating a magnetic field within a cavity of the rear electrode wound around an outer circumferential surface thereof. The front torch unit disposed at a front side of the insulating body so as to face the rear torch unit communicates with the inflow chamber of the insulating body and has the front electrode disposed therein. The front torch unit does not include a magnetic coil winding the front electrode, and thus may be easily detached from the insulating body.
    Type: Application
    Filed: May 6, 2013
    Publication date: November 7, 2013
    Applicant: GS PLATECH CO., LTD.
    Inventors: Soon-Mo HWANG, Young-Suk KIM, Byung-Ju YOO, Myung-Gyu KIM
  • Publication number: 20120111883
    Abstract: The present invention relates to a gum dispenser for automatically dispensing gum by the vertical lifting of a gum case. Particularly, the present invention provides a container that has a self-sealing means, accurately dispenses a piece of gum one by one, prevents the generation of container defects, and provides ease of operation and molding. Currently, in the above operation structure, an inner case receiving gum therein is fitted in a lifting shaft of an outer case to be lifted or lowered so that a piece of gum is pushed up to an upper end of the lifting shaft, and then the gum is exposed to a dispensing hole perforated in a lid, which is coupled with the inner case, one by one for a user to enjoy.
    Type: Application
    Filed: January 20, 2010
    Publication date: May 10, 2012
    Applicant: ID PLATECH CO., LTD.
    Inventor: Kang Cheal Kim
  • Patent number: 6353067
    Abstract: The polyolefin stretch film comprises a film produced from a resin composition principally composed of a polyolefin resin consisting either entirely of ethylene (meth)acrylic acid copolymer or ethylene (meth)acrylic acid (meth)acrylic ester terpolymer, or a mixed resin of both, and being, insofar as necessary, compounded with an anti-fogging agent and a tackifier, such film having a stress at 100% elongation in the longitudinal direction of 12-30 MPa and a stress at 100% elongation in the transverse direction of 5-11 MPa. This film is suitably used as a stretch wrap film material for packaging food and various items, inasmuch as it is free of pollution and sanitary/health hazard problems, and imparts a large elongation, excellent cut property of traverse direction, adherence/conformance property (cling property), elastic recovery after distention by fingertips, etc.
    Type: Grant
    Filed: May 23, 2000
    Date of Patent: March 5, 2002
    Assignees: Mitsui Chemicals, Inc., Mitsui Kagaku Platech Co., Ltd.
    Inventors: Masao Kameyama, Toshiyuki Ishii, Toshiki Itoh