Abstract: A memory includes an array of phase change memory cells and a first circuit. The first circuit is for refreshing only memory cells within the array of phase change memory cells that are programmed to non-crystalline states in response to a request for a refresh operation.

Abstract: An integrated circuit includes a contact and a first electrode coupled to the contact. The first electrode includes at least two electrode material layers. The at least two electrode material layers include different materials. The integrated circuit includes a second electrode and a resistivity changing material between the first electrode and the second electrode.

Abstract: The present invention in one embodiment provides a memory device including a first electrode; a second electrode; and a memory cell positioned between the first electrode and the second electrode, the memory cell including a core of a first phase change material and a cladding of a second phase change material, wherein the first phase change material has a lower crystallization temperature than the second phase change material. The present invention also provides methods of forming the above described memory device.

Abstract: An integrated circuit includes a bottom electrode, a top electrode, resistivity changing material between the bottom electrode and the top electrode, and a contact contacting the top electrode. The contact includes a bottom and sidewalls. The integrated circuit includes first material between the sidewalls of the contact.

Abstract: Methods and circuit arrangements are provided for improving equalization of sense nodes of a sense amplifier in a semiconductor memory device. When a memory array segment on a side a sense amplifier has a bitline leakage anomaly for which the sense amplifier is to be isolated when that memory is in an unselected state, isolation of the sense amplifier from the memory array segment is delayed when transitioning from a selected state of the memory array segment to an unselected state of the memory array segment. The duration of the delay is sufficient to allow time for equalization of the sense nodes of the sense amplifier before isolating the sense amplifier from the memory array segment.

Abstract: A memory cell includes a first electrode and an opposing second electrode, and a memory stack between the first and second electrodes. The memory stack includes a first layer of thermal isolation material contacting the first electrode, a second layer of thermal isolation material contacting the second electrode, and a phase change material between the first layer of thermal isolation material and the second layer of thermal isolation material. In this regard, the phase change material defines an active region width that is less than a width of either of the first layer of thermal isolation material and the second layer of thermal isolation material.

Abstract: An integrated circuit includes a memory array, first pads, and second pads. The integrated circuit is configured to operate in a first mode and in a second mode. The first mode includes receiving data signals on the first pads and address signals on the second pads to access the memory array. The second mode includes receiving multiplexed data signals and address signals on the first pads to access the memory array.

Abstract: Memory devices are described along with methods for manufacturing. A memory device as described herein includes a plurality of word lines extending in a first direction, and a plurality of bit lines overlying the plurality of word lines and extending in a second direction. A plurality of memory cells are at cross-point locations. Each memory cell comprises a diode having first and second sides aligned with sides of a corresponding word line. Each memory cell also includes a bottom electrode self-centered on the diode, the bottom electrode having a top surface with a surface area less than that of the top surface of the diode. Each of the memory cells includes a strip of memory material on the top surface of the bottom electrode, the strip of memory material underlying and in electrical communication with a corresponding bit line.

Abstract: A memory includes a bit line and a phase change element. A first side of the phase change element is coupled to the bit line. The memory includes a first access device coupled to a second side of the phase change element and a second access device coupled to the second side of the phase change element. The memory includes a circuit for precharging the bit line and one of selecting only the first access device to program the phase change element to a first state and selecting both the first access device and the second access device to program the phase change element to a second state.

Abstract: An electrical circuit comprising a first metal oxide silicon (MOS) n type field effect transistor (NFET) or p type field effect transistor (PFET) and a second MOS NFET or PFET of the same conductivity type as the first NFET or PFET, wherein the drain of the first NFET or PFET is directly connected to the source of the second NFET or PFET, and wherein the gate of the second NFET or PFET is at a voltage value which is equal to or lower than the drain voltage value of the second NFET or PFET in the case of an NFET and equal to or higher than the drain voltage value of the second NFET or PFET in the case of a PFET.

Abstract: In one embodiment, an electronic device comprises control circuitry. The control circuitry disables termination circuitry coupled to one or more input/output (I/O) signals of the electronic device during at least a portion of a relatively low frequency operation which causes insubstantial signal reflections at the I/O signals. The control circuitry re-enables the termination circuitry prior to the electronic device performing a relatively high frequency operation after completion of the low frequency operation, the high frequency operation causing substantial signal reflections at the I/O signals. The electronic device is a memory device in one embodiment. This way, the termination circuitry may be disabled during at least a portion of a refresh operation performed by the memory device and re-enabled prior to the memory device resuming normal operation (i.e., reads and writes) after completion of the refresh operation.

Abstract: A random access memory including a first amplifier, a second amplifier, a first data path, a second data path, and a first circuit. The first data path receives first data via first memory cells and the second data path receives second data via second memory cells. The first circuit is configured to receive the first data via the first data path and the second data via the second data path. The first circuit is configured to selectively provide the first data to the first amplifier and the second amplifier and the second data to the first amplifier and the second amplifier.

Abstract: A memory includes a phase change element having a first side and a second side and a first line coupled to the first side of the element. The memory includes an access device coupled to the second side of the element and a second line coupled to the access device for controlling the access device. The memory includes a circuit for precharging the first line to a first voltage and for applying a voltage pulse to the second line such that a current pulse is generated through the access device to the element to program the element to a selected one of more than two states. The voltage pulse has an amplitude based on the selected state.

Abstract: One embodiment provides a semiconductor device including a plurality of multi-bit memory cells, a first temperature budget sensor, and a circuit. Each of the plurality of multi-bit memory cells is programmable into each of more than two states. The circuit compares a first signal from the first temperature budget sensor to a first reference signal to obtain a first comparison result. The circuit refreshes the plurality of multi-bit memory cells based on the first comparison result.

Abstract: A memory device includes a plurality of word lines extending as rows and bit lines extending as columns. A memory cell is coupled between a word line and a bit line, wherein the memory cell includes a unipolar memory element selectively coupled to the bit line via a trigger element.

Abstract: One embodiment of the present invention provides a system including a tester and a back end manufacturing system. The tester tests a resistive memory and obtains configuration data for the resistive memory. The back end manufacturing system prevents temperatures in back end processing from reducing data retention time of the configuration data in the resistive memory.

Abstract: An integrated circuit having a nominal minimum burst length defined by a nominal data prefetch size transfers data by accepting an abbreviated burst data read request directed to a first bank, prefetching less than the nominal data prefetch size, and providing the data in an abbreviated burst data transfer less than the nominal minimum burst length.

Abstract: Semiconductor devices and methods of manufacture thereof are disclosed. A preferred embodiment comprises a method of forming an insulating material layer. The method includes forming a barrier layer and forming a rare earth element-containing material layer over the barrier layer.

Abstract: An integrated circuit includes a resistance changing memory element and a circuit. The circuit is configured to program the memory element by iteratively applying a variable program pulse to the memory element until a resistance of the memory element crosses a first reference resistance. The variable program pulse is adjusted for each iteration such that the resistance of the memory element approaches the first reference resistance.

Abstract: A semiconductor manufacture and testing device is provided, comprising: a process device configured to perform a semiconductor processing operation on a semiconductor wafer; a testing device configured to perform a testing operation on the semiconductor wafer and generate real-time testing metrics relating to the testing operation; a data storage element configured to store the real-time testing metrics as stored testing metrics; a control and dispatch element configured to receive the stored testing metrics and generate dispatch control signals based on the stored testing metrics and a set of evaluation rules; and a test routing element located between the process element and the testing element, and configured to route the semiconductor wafer either from the process element to the testing element or from the process element around the testing element, based the dispatch control signals.