Patents Assigned to Rigaku Corporation
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Patent number: 11846594Abstract: It is enabled to surely attach a sample holder to a goniometer head with good reproducibility in a relatively easy manner, the sample holder holding a porous complex crystal where a single-crystal is soaked. There is provided a single-crystal X-ray structure analysis apparatus that performs a structure analysis of a material, the apparatus comprising a goniometer having a goniometer head 514 to which a sample holder 310 is attached, the sample holder holding a porous complex crystal where a sample is soaked; an X-ray irradiation section that irradiates the X-rays to the porous complex crystal whose position is adjusted with the goniometer head 514, wherein a positioning portion for positioning the sample holder 310 to be attached is formed on a surface of the goniometer head 514, the sample holder 310 being attached onto the surface.Type: GrantFiled: November 21, 2019Date of Patent: December 19, 2023Assignee: Rigaku CorporationInventor: Takashi Sato
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Patent number: 11841334Abstract: A quantitative phase analysis device includes: a unit for acquiring a powder diffraction pattern of the sample; a unit for acquiring information on a plurality of crystalline phases; a unit for acquiring a fitting function for each of the plurality of crystalline phases; a unit for executing whole-powder pattern fitting for the powder diffraction pattern by using the acquired fitting functions, to thereby acquire a fitting result; and a unit for calculating a weight ratio of the plurality of crystalline phases based on the fitting result. Each fitting function is selected from the group consisting of a first fitting function using an integrated intensity obtained by whole-powder pattern decomposition, a second fitting function using an integrated intensity obtained by observation or calculation, and a third fitting function using a profile intensity obtained by observation or calculation.Type: GrantFiled: February 10, 2020Date of Patent: December 12, 2023Assignee: RIGAKU CORPORATIONInventors: Hideo Toraya, Norihiro Muroyama
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Publication number: 20230393084Abstract: An exclusion module (21) is configured to calculate a coating amount of each component whose measurement element is not contained in the base layers, for each of corresponding measurement lines, on an assumption that that component solely makes up the thin film and to adopt a maximum coating amount as an initial value of the coating amount of that component; and to calculate a coating amount of each component whose measurement element is contained in the base layers, for each of corresponding measurement lines, on the basis of initial values of coating amounts of individual components whose measurement elements are not contained in the base layers, if calculation results for all the corresponding measurement lines give errors, to exclude that component from analysis targets as an unquantifiable component, and in other cases, to adopt a maximum coating amount as an initial value of the coating amount of that component.Type: ApplicationFiled: September 10, 2021Publication date: December 7, 2023Applicant: RIGAKU CORPORATIONInventors: Shinya HARA, Yasujiro YAMADA, Kenji KODAMA, Makoto DOI
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Patent number: 11832981Abstract: By regarding total precision of an X-ray intensity as counting precision due to statistical fluctuation and counting loss and by regarding the counting precision as a product of precision of an uncorrected intensity, which is an intensity before counting loss correction is performed, and a gradient of a corrected intensity with respect to the uncorrected intensity, a counting time calculation unit (13) included in an X-ray fluorescence spectrometer of the present invention calculates a counting time from specified total precision of the X-ray intensity, a given counting loss correction coefficient, and a given corrected intensity for each measurement line (5).Type: GrantFiled: May 26, 2023Date of Patent: December 5, 2023Assignee: Rigaku CorporationInventors: Yoshiyuki Kataoka, Yasuhiko Nagoshi, Eiichi Furusawa
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Patent number: 11835476Abstract: A single-crystal X-ray structure analysis apparatus capable of surely and easily performing operations of removing/attaching a sample soaked in a crystalline sponge from/to the apparatus, and a sample holder attaching device thereof, are provided. There are provided a sample holder attaching device comprising a sample holder attaching mechanism 600 that attaches the sample holder 250 to a goniometer 12 in the single-crystal X-ray structure analysis apparatus in a state where the sample holder 250 is removed from the applicator 300; wherein the sample holder 250 comprises a porous complex crystal capable of soaking the sample in a plurality of fine pores formed therein, and the porous complex crystal is fixed at a position of the sample holder 250 to which X-rays are irradiated from an X-ray irradiation section, in a state where the sample holder 250 is attached to the goniometer 12.Type: GrantFiled: November 21, 2019Date of Patent: December 5, 2023Assignee: Rigaku CorporationInventor: Takashi Sato
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Publication number: 20230384248Abstract: A transmission type small-angle scattering device of the present invention includes a goniometer 10 including a rotation arm 11. The rotation arm 11 is freely turnable around a ?-axis extending in a horizontal direction from an origin with a vertical arrangement state of the rotation arm 11 being defined as the origin, and has a vertical arrangement structure in which an X-ray irradiation unit 20 is installed on a lower-side end portion of the rotation arm 11, and a two-dimensional X-ray detector 30 is installed on an upper-side end portion of the rotation arm 11 to form a vertical arrangement structure.Type: ApplicationFiled: July 31, 2023Publication date: November 30, 2023Applicant: RIGAKU CORPORATIONInventors: Naoki Matsushima, Kiyoshi Ogata, Sei Yoshihara, Yoshiyasu Ito, Kazuhiko Omote, Hiroshi Motono, Shigematsu Asano, Katsutaka Horada, Sensui Yasuda
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Publication number: 20230375485Abstract: A transmission type small-angle scattering device of the present invention includes a goniometer 10 including a rotation arm 11. The rotation arm 11 is freely turnable around a ?-axis extending in a horizontal direction from an origin with a vertical arrangement state of the rotation arm 11 being defined as the origin, and has a vertical arrangement structure in which an X-ray irradiation unit 20 is installed on a lower-side end portion of the rotation arm 11, and a two-dimensional X-ray detector 30 is installed on an upper-side end portion of the rotation arm 11 to form a vertical arrangement structure.Type: ApplicationFiled: July 31, 2023Publication date: November 23, 2023Applicant: RIGAKU CORPORATIONInventors: Naoki Matsushima, Kiyoshi Ogata, Sei Yoshihara, Yoshiyasu Ito, Kazuhiko Omote, Hiroshi Motono, Shigematsu Asano, Katsutaka Horada, Sensui Yasuda
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Patent number: 11821855Abstract: A sample holder capable of quickly and precisely performing single-crystal X-ray structure analysis by quickly and easily soaking a sample in a crystalline sponge, and also a sample holder unit and a soaking method therefor are provided. There are provided a sample holder used in a single-crystal X-ray structure analysis apparatus is provided, the sample holder comprising a base part attached to a goniometer in the single-crystal X-ray structure analysis apparatus; a sample holding part formed in the base part to hold the porous complex crystal capable of soaking the sample in a plurality of fine pores formed therein; and a sample introduction structure formed in the base part and introducing the sample to be soaked in the porous complex.Type: GrantFiled: November 21, 2019Date of Patent: November 21, 2023Assignee: Rigaku CorporationInventor: Takashi Sato
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Patent number: 11808721Abstract: Provided is an X-ray analysis apparatus including: a goniometer; a sample stage provided at a rotation center of the goniometer; an X-ray source configured to irradiate a sample with an X-ray, the sample being fixed on the sample stage; an X-ray detector configured to detect the X-ray diffracted by the sample; and an opening/closing mechanism configured to vary a width of a slit, which is formed between a pair of shielding members, by opening/closing the pair of shielding members, the opening/closing mechanism including an asymmetric control unit configured to control aperture widths of the pair of shielding members asymmetrically for one of the pair of shielding members on one side and another one of the pair of shielding members on another side depending on a rotation angle of the goniometer.Type: GrantFiled: January 31, 2022Date of Patent: November 7, 2023Assignee: RIGAKU CORPORATIONInventor: Takeshi Osakabe
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Patent number: 11802844Abstract: A single-crystal X-ray structure analysis apparatus capable of surely and easily performing a single-crystal X-ray structure analysis using a crystalline sponge, and an analysis method and a sample holder unit thereof are provided. There are provided a sample holder that holds a sample; a goniometer that rotationally moves, the sample holder 250 being attached to the goniometer; an X-ray irradiation section that irradiates the X-rays from the X-ray source to the sample held by the sample holder 250 attached to the goniometer, wherein the sample holder 250 comprises a porous complex crystal capable of soaking the sample in a plurality of fine pores formed therein, and the applicator comprises a space for soaking the sample in the porous complex crystal of the sample holder 250.Type: GrantFiled: November 21, 2019Date of Patent: October 31, 2023Assignee: Rigaku CorporationInventor: Takashi Sato
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Patent number: 11796495Abstract: Provided are a total reflection X-ray fluorescence spectrometer and an estimation method which are capable of easily and quickly estimating whether contamination exists on a substrate through use of a machine learning device. The total reflection X-ray fluorescence spectrometer includes: a spectrum acquisition unit configured to acquire a spectrum; and a learning unit which includes an estimation unit configured to generate estimation data on an element contained in contamination on a surface of a substrate in response to input of the spectrum, and for which learning by the estimation unit has been executed based on teacher data including the spectrum for learning and data on the element contained in the contamination on the surface of the substrate which has been used to acquire the spectrum for learning and the estimation data generated when the spectrum for learning is input to the estimation unit.Type: GrantFiled: June 9, 2021Date of Patent: October 24, 2023Assignee: RIGAKU CORPORATIONInventors: Shinya Kikuta, Makoto Doi
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Patent number: 11788974Abstract: There is provided a control apparatus 40 that controls a tilt of a sample, the control apparatus comprising an input section 41 that receives an input of inclination information representing inclination of the sample with respect to a ? axis; an adjustment amount determination section 43 that determines adjustment amounts of a ? value and a ? value for correcting a deviation amount between a scattering vector and a normal line to a sample surface or a lattice plane with respect to a ? value that varies, using the inclination information; and a drive instruction section 47 that drives a goniometer according to ? axis rotation of the sample, based on the determined adjustment amounts of the ? value and the ? value, during an X-ray diffraction measurement.Type: GrantFiled: December 11, 2020Date of Patent: October 17, 2023Assignee: RIGAKU CORPORATIONInventors: Shintaro Kobayashi, Katsuhiko Inaba, Hisashi Konaka
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Patent number: 11782000Abstract: Provided are a quantitative analysis method, a quantitative analysis program, and an X-ray fluorescence. The quantitative analysis method includes: a step of acquiring a representative composition set to represent contents of analysis components; a step of acquiring a plurality of comparative compositions, in each of which the content of one of the analysis components of the representative composition is changed by a predetermined content; a detection intensity calculation step of calculating a detection intensity indicating an intensity of fluorescent X-rays detected under the influence of the geometry effect through use of an FP method with respect to a virtual sample having a thickness set in advance and being indicated by each of the representative composition and the comparative compositions; and a step of calculating a matrix correction coefficient for each of the analysis components based on the detection intensity.Type: GrantFiled: December 4, 2020Date of Patent: October 10, 2023Assignee: RIGAKU CORPORATIONInventors: Yoshiyuki Kataoka, Yasushi Kusakabe
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Patent number: 11774379Abstract: It is made possible to surely supply a porous complex crystal in which a sample is soaked, into a single-crystal X-ray structure analysis apparatus. There is provided a soaking machine for soaking a sample, comprising a supply section that supplies the sample to the porous complex crystal held by a sample holder 310, a temperature control section that controls a temperature of the porous complex crystal, a drive section that drives the supply section, and a control section that controls the supply section, the temperature control section and the drive section. The supply section supplies the sample to the porous complex crystal held by the sample holder 310 inside the applicator 311; and the temperature control section controls the temperature of the porous complex crystal held by the sample holder 310, inside the applicator 311 into which the sample is supplied.Type: GrantFiled: November 21, 2019Date of Patent: October 3, 2023Assignee: Rigaku CorporationInventor: Takashi Sato
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Publication number: 20230304948Abstract: A damage measurement technique capable of measuring damage of a sample in a single crystal state, regardless of the surrounding condition, includes irradiating microbeam white X-rays to a sample in a single crystal state, diffraction of a spot generated by the irradiation is detected, a coefficient on variance of an intensity distribution in a specific direction in the detected diffraction spot is calculated, and a damaged state of the sample is specified based on the calculated coefficient.Type: ApplicationFiled: March 22, 2023Publication date: September 28, 2023Applicants: Rigaku Corporation, Chubu Electric Power Company, IncorporatedInventors: Ryouichi YOKOYAMA, Kazuhiko OMOTE, Daisuke KOBAYASHI
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Publication number: 20230296539Abstract: A correction apparatus for correcting a structure factor includes a structure factor acquisition section that acquires the structure factor; a PDF calculation section that calculates PDF from the acquired structure factor; a correction function preparation section that prepares a first correction function that is Fourier-transformed in a predetermined range, and a second correction function that is Fourier-transformed in the predetermined range, the first correction function comprising data of the PDF and a cut-off function for cutting off data on a long distance side of the PDF and the second correction function comprising the cut-off function; a correction amount calculation section that calculates a correction amount comprising the first correction function, the second correction function, and a scale factor; a structure factor correction section that corrects the structure factor; and an R-factor value calculation section that calculates an R-factor value indicating correction accuracy.Type: ApplicationFiled: March 17, 2023Publication date: September 21, 2023Applicant: RIGAKU CORPORATIONInventor: Masatsugu YOSHIMOTO
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Publication number: 20230293129Abstract: By regarding total precision of an X-ray intensity as counting precision due to statistical fluctuation and counting loss and by regarding the counting precision as a product of precision of an uncorrected intensity, which is an intensity before counting loss correction is performed, and a gradient of a corrected intensity with respect to the uncorrected intensity, a counting time calculation unit (13) included in an X-ray fluorescence spectrometer of the present invention calculates a counting time from specified total precision of the X-ray intensity, a given counting loss correction coefficient, and a given corrected intensity for each measurement line (5).Type: ApplicationFiled: May 26, 2023Publication date: September 21, 2023Applicant: Rigaku CorporationInventors: Yoshiyuki Kataoka, Yasuhiko Nagoshi, Eiichi Furusawa
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Publication number: 20230288348Abstract: There is provided a technique capable of evaluating an anisotropy of an object with a large field of view, in a non-destructive manner and with high angular resolution. An object 1 is irradiated with X-rays from a radiation source 22 of a phase-contrast X-ray optical system 2. A change characteristic in X-ray scattering intensities for individual relative angles each formed between an incident angle of the X-rays and an anisotropic structure in the object 1 are then acquired. Evaluation data for evaluating a state of the anisotropic structure in the object 1 is then generated based on the change characteristic in the X-ray scattering intensities.Type: ApplicationFiled: February 27, 2023Publication date: September 14, 2023Applicants: RIGAKU CORPORATION, TOYOTA JIDOSHA KABUSHIKI KAISHAInventors: Masashi KAGEYAMA, Kenichi OKAJIMA, Masaru KURIBAYASHI, Yuichi NAGAMATSU, Yuzo MIURA
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Patent number: 11754515Abstract: A transmission type small-angle scattering device of the present invention includes a goniometer 10 including a rotation arm 11. The rotation arm 11 is freely turnable around a ?-axis extending in a horizontal direction from an origin with a vertical arrangement state of the rotation arm being defined as the origin, and has a vertical arrangement structure in which an X-ray irradiation unit 20 is installed on a lower-side end portion of the rotation arm 11, and a two-dimensional X-ray detector 30 is installed on an upper-side end portion of the rotation arm 11 to form a vertical arrangement structure.Type: GrantFiled: January 8, 2020Date of Patent: September 12, 2023Assignee: RIGAKU CORPORATIONInventors: Naoki Matsushima, Kiyoshi Ogata, Sei Yoshihara, Yoshiyasu Ito, Kazuhiko Omote, Hiroshi Motono, Shigematsu Asano, Katsutaka Horada, Sensui Yasuda
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Publication number: 20230280290Abstract: A device for analyzing a diffraction pattern of a mixture uses a fitting pattern including a term related to a known target pattern, which indicates a target component and which is changeable in shape with use of a shape parameter, and a term related to an unknown pattern, which indicates a residual group. The fitting pattern is fitted to an observed pattern with a given value assigned to the shape parameter and with the unknown pattern set to an initial pattern. The unknown pattern is then changed, to thereby fit the fitting pattern to the observed pattern. The fitting described above is executed with use of a plurality of shape parameters each of which is the shape parameter, and a calculation result related to one of the plurality of shape parameters is selected.Type: ApplicationFiled: February 27, 2023Publication date: September 7, 2023Applicant: Rigaku CorporationInventor: Hideo TORAYA