Patents Assigned to Rigaku Corporation
  • Patent number: 11832981
    Abstract: By regarding total precision of an X-ray intensity as counting precision due to statistical fluctuation and counting loss and by regarding the counting precision as a product of precision of an uncorrected intensity, which is an intensity before counting loss correction is performed, and a gradient of a corrected intensity with respect to the uncorrected intensity, a counting time calculation unit (13) included in an X-ray fluorescence spectrometer of the present invention calculates a counting time from specified total precision of the X-ray intensity, a given counting loss correction coefficient, and a given corrected intensity for each measurement line (5).
    Type: Grant
    Filed: May 26, 2023
    Date of Patent: December 5, 2023
    Assignee: Rigaku Corporation
    Inventors: Yoshiyuki Kataoka, Yasuhiko Nagoshi, Eiichi Furusawa
  • Patent number: 11835476
    Abstract: A single-crystal X-ray structure analysis apparatus capable of surely and easily performing operations of removing/attaching a sample soaked in a crystalline sponge from/to the apparatus, and a sample holder attaching device thereof, are provided. There are provided a sample holder attaching device comprising a sample holder attaching mechanism 600 that attaches the sample holder 250 to a goniometer 12 in the single-crystal X-ray structure analysis apparatus in a state where the sample holder 250 is removed from the applicator 300; wherein the sample holder 250 comprises a porous complex crystal capable of soaking the sample in a plurality of fine pores formed therein, and the porous complex crystal is fixed at a position of the sample holder 250 to which X-rays are irradiated from an X-ray irradiation section, in a state where the sample holder 250 is attached to the goniometer 12.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: December 5, 2023
    Assignee: Rigaku Corporation
    Inventor: Takashi Sato
  • Publication number: 20230384248
    Abstract: A transmission type small-angle scattering device of the present invention includes a goniometer 10 including a rotation arm 11. The rotation arm 11 is freely turnable around a ?-axis extending in a horizontal direction from an origin with a vertical arrangement state of the rotation arm 11 being defined as the origin, and has a vertical arrangement structure in which an X-ray irradiation unit 20 is installed on a lower-side end portion of the rotation arm 11, and a two-dimensional X-ray detector 30 is installed on an upper-side end portion of the rotation arm 11 to form a vertical arrangement structure.
    Type: Application
    Filed: July 31, 2023
    Publication date: November 30, 2023
    Applicant: RIGAKU CORPORATION
    Inventors: Naoki Matsushima, Kiyoshi Ogata, Sei Yoshihara, Yoshiyasu Ito, Kazuhiko Omote, Hiroshi Motono, Shigematsu Asano, Katsutaka Horada, Sensui Yasuda
  • Publication number: 20230375485
    Abstract: A transmission type small-angle scattering device of the present invention includes a goniometer 10 including a rotation arm 11. The rotation arm 11 is freely turnable around a ?-axis extending in a horizontal direction from an origin with a vertical arrangement state of the rotation arm 11 being defined as the origin, and has a vertical arrangement structure in which an X-ray irradiation unit 20 is installed on a lower-side end portion of the rotation arm 11, and a two-dimensional X-ray detector 30 is installed on an upper-side end portion of the rotation arm 11 to form a vertical arrangement structure.
    Type: Application
    Filed: July 31, 2023
    Publication date: November 23, 2023
    Applicant: RIGAKU CORPORATION
    Inventors: Naoki Matsushima, Kiyoshi Ogata, Sei Yoshihara, Yoshiyasu Ito, Kazuhiko Omote, Hiroshi Motono, Shigematsu Asano, Katsutaka Horada, Sensui Yasuda
  • Patent number: 11821855
    Abstract: A sample holder capable of quickly and precisely performing single-crystal X-ray structure analysis by quickly and easily soaking a sample in a crystalline sponge, and also a sample holder unit and a soaking method therefor are provided. There are provided a sample holder used in a single-crystal X-ray structure analysis apparatus is provided, the sample holder comprising a base part attached to a goniometer in the single-crystal X-ray structure analysis apparatus; a sample holding part formed in the base part to hold the porous complex crystal capable of soaking the sample in a plurality of fine pores formed therein; and a sample introduction structure formed in the base part and introducing the sample to be soaked in the porous complex.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: November 21, 2023
    Assignee: Rigaku Corporation
    Inventor: Takashi Sato
  • Patent number: 11808721
    Abstract: Provided is an X-ray analysis apparatus including: a goniometer; a sample stage provided at a rotation center of the goniometer; an X-ray source configured to irradiate a sample with an X-ray, the sample being fixed on the sample stage; an X-ray detector configured to detect the X-ray diffracted by the sample; and an opening/closing mechanism configured to vary a width of a slit, which is formed between a pair of shielding members, by opening/closing the pair of shielding members, the opening/closing mechanism including an asymmetric control unit configured to control aperture widths of the pair of shielding members asymmetrically for one of the pair of shielding members on one side and another one of the pair of shielding members on another side depending on a rotation angle of the goniometer.
    Type: Grant
    Filed: January 31, 2022
    Date of Patent: November 7, 2023
    Assignee: RIGAKU CORPORATION
    Inventor: Takeshi Osakabe
  • Patent number: 11802844
    Abstract: A single-crystal X-ray structure analysis apparatus capable of surely and easily performing a single-crystal X-ray structure analysis using a crystalline sponge, and an analysis method and a sample holder unit thereof are provided. There are provided a sample holder that holds a sample; a goniometer that rotationally moves, the sample holder 250 being attached to the goniometer; an X-ray irradiation section that irradiates the X-rays from the X-ray source to the sample held by the sample holder 250 attached to the goniometer, wherein the sample holder 250 comprises a porous complex crystal capable of soaking the sample in a plurality of fine pores formed therein, and the applicator comprises a space for soaking the sample in the porous complex crystal of the sample holder 250.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: October 31, 2023
    Assignee: Rigaku Corporation
    Inventor: Takashi Sato
  • Patent number: 11796495
    Abstract: Provided are a total reflection X-ray fluorescence spectrometer and an estimation method which are capable of easily and quickly estimating whether contamination exists on a substrate through use of a machine learning device. The total reflection X-ray fluorescence spectrometer includes: a spectrum acquisition unit configured to acquire a spectrum; and a learning unit which includes an estimation unit configured to generate estimation data on an element contained in contamination on a surface of a substrate in response to input of the spectrum, and for which learning by the estimation unit has been executed based on teacher data including the spectrum for learning and data on the element contained in the contamination on the surface of the substrate which has been used to acquire the spectrum for learning and the estimation data generated when the spectrum for learning is input to the estimation unit.
    Type: Grant
    Filed: June 9, 2021
    Date of Patent: October 24, 2023
    Assignee: RIGAKU CORPORATION
    Inventors: Shinya Kikuta, Makoto Doi
  • Patent number: 11788974
    Abstract: There is provided a control apparatus 40 that controls a tilt of a sample, the control apparatus comprising an input section 41 that receives an input of inclination information representing inclination of the sample with respect to a ? axis; an adjustment amount determination section 43 that determines adjustment amounts of a ? value and a ? value for correcting a deviation amount between a scattering vector and a normal line to a sample surface or a lattice plane with respect to a ? value that varies, using the inclination information; and a drive instruction section 47 that drives a goniometer according to ? axis rotation of the sample, based on the determined adjustment amounts of the ? value and the ? value, during an X-ray diffraction measurement.
    Type: Grant
    Filed: December 11, 2020
    Date of Patent: October 17, 2023
    Assignee: RIGAKU CORPORATION
    Inventors: Shintaro Kobayashi, Katsuhiko Inaba, Hisashi Konaka
  • Patent number: 11782000
    Abstract: Provided are a quantitative analysis method, a quantitative analysis program, and an X-ray fluorescence. The quantitative analysis method includes: a step of acquiring a representative composition set to represent contents of analysis components; a step of acquiring a plurality of comparative compositions, in each of which the content of one of the analysis components of the representative composition is changed by a predetermined content; a detection intensity calculation step of calculating a detection intensity indicating an intensity of fluorescent X-rays detected under the influence of the geometry effect through use of an FP method with respect to a virtual sample having a thickness set in advance and being indicated by each of the representative composition and the comparative compositions; and a step of calculating a matrix correction coefficient for each of the analysis components based on the detection intensity.
    Type: Grant
    Filed: December 4, 2020
    Date of Patent: October 10, 2023
    Assignee: RIGAKU CORPORATION
    Inventors: Yoshiyuki Kataoka, Yasushi Kusakabe
  • Patent number: 11774379
    Abstract: It is made possible to surely supply a porous complex crystal in which a sample is soaked, into a single-crystal X-ray structure analysis apparatus. There is provided a soaking machine for soaking a sample, comprising a supply section that supplies the sample to the porous complex crystal held by a sample holder 310, a temperature control section that controls a temperature of the porous complex crystal, a drive section that drives the supply section, and a control section that controls the supply section, the temperature control section and the drive section. The supply section supplies the sample to the porous complex crystal held by the sample holder 310 inside the applicator 311; and the temperature control section controls the temperature of the porous complex crystal held by the sample holder 310, inside the applicator 311 into which the sample is supplied.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: October 3, 2023
    Assignee: Rigaku Corporation
    Inventor: Takashi Sato
  • Publication number: 20230304948
    Abstract: A damage measurement technique capable of measuring damage of a sample in a single crystal state, regardless of the surrounding condition, includes irradiating microbeam white X-rays to a sample in a single crystal state, diffraction of a spot generated by the irradiation is detected, a coefficient on variance of an intensity distribution in a specific direction in the detected diffraction spot is calculated, and a damaged state of the sample is specified based on the calculated coefficient.
    Type: Application
    Filed: March 22, 2023
    Publication date: September 28, 2023
    Applicants: Rigaku Corporation, Chubu Electric Power Company, Incorporated
    Inventors: Ryouichi YOKOYAMA, Kazuhiko OMOTE, Daisuke KOBAYASHI
  • Publication number: 20230296539
    Abstract: A correction apparatus for correcting a structure factor includes a structure factor acquisition section that acquires the structure factor; a PDF calculation section that calculates PDF from the acquired structure factor; a correction function preparation section that prepares a first correction function that is Fourier-transformed in a predetermined range, and a second correction function that is Fourier-transformed in the predetermined range, the first correction function comprising data of the PDF and a cut-off function for cutting off data on a long distance side of the PDF and the second correction function comprising the cut-off function; a correction amount calculation section that calculates a correction amount comprising the first correction function, the second correction function, and a scale factor; a structure factor correction section that corrects the structure factor; and an R-factor value calculation section that calculates an R-factor value indicating correction accuracy.
    Type: Application
    Filed: March 17, 2023
    Publication date: September 21, 2023
    Applicant: RIGAKU CORPORATION
    Inventor: Masatsugu YOSHIMOTO
  • Publication number: 20230293129
    Abstract: By regarding total precision of an X-ray intensity as counting precision due to statistical fluctuation and counting loss and by regarding the counting precision as a product of precision of an uncorrected intensity, which is an intensity before counting loss correction is performed, and a gradient of a corrected intensity with respect to the uncorrected intensity, a counting time calculation unit (13) included in an X-ray fluorescence spectrometer of the present invention calculates a counting time from specified total precision of the X-ray intensity, a given counting loss correction coefficient, and a given corrected intensity for each measurement line (5).
    Type: Application
    Filed: May 26, 2023
    Publication date: September 21, 2023
    Applicant: Rigaku Corporation
    Inventors: Yoshiyuki Kataoka, Yasuhiko Nagoshi, Eiichi Furusawa
  • Publication number: 20230288348
    Abstract: There is provided a technique capable of evaluating an anisotropy of an object with a large field of view, in a non-destructive manner and with high angular resolution. An object 1 is irradiated with X-rays from a radiation source 22 of a phase-contrast X-ray optical system 2. A change characteristic in X-ray scattering intensities for individual relative angles each formed between an incident angle of the X-rays and an anisotropic structure in the object 1 are then acquired. Evaluation data for evaluating a state of the anisotropic structure in the object 1 is then generated based on the change characteristic in the X-ray scattering intensities.
    Type: Application
    Filed: February 27, 2023
    Publication date: September 14, 2023
    Applicants: RIGAKU CORPORATION, TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Masashi KAGEYAMA, Kenichi OKAJIMA, Masaru KURIBAYASHI, Yuichi NAGAMATSU, Yuzo MIURA
  • Patent number: 11754515
    Abstract: A transmission type small-angle scattering device of the present invention includes a goniometer 10 including a rotation arm 11. The rotation arm 11 is freely turnable around a ?-axis extending in a horizontal direction from an origin with a vertical arrangement state of the rotation arm being defined as the origin, and has a vertical arrangement structure in which an X-ray irradiation unit 20 is installed on a lower-side end portion of the rotation arm 11, and a two-dimensional X-ray detector 30 is installed on an upper-side end portion of the rotation arm 11 to form a vertical arrangement structure.
    Type: Grant
    Filed: January 8, 2020
    Date of Patent: September 12, 2023
    Assignee: RIGAKU CORPORATION
    Inventors: Naoki Matsushima, Kiyoshi Ogata, Sei Yoshihara, Yoshiyasu Ito, Kazuhiko Omote, Hiroshi Motono, Shigematsu Asano, Katsutaka Horada, Sensui Yasuda
  • Publication number: 20230280290
    Abstract: A device for analyzing a diffraction pattern of a mixture uses a fitting pattern including a term related to a known target pattern, which indicates a target component and which is changeable in shape with use of a shape parameter, and a term related to an unknown pattern, which indicates a residual group. The fitting pattern is fitted to an observed pattern with a given value assigned to the shape parameter and with the unknown pattern set to an initial pattern. The unknown pattern is then changed, to thereby fit the fitting pattern to the observed pattern. The fitting described above is executed with use of a plurality of shape parameters each of which is the shape parameter, and a calculation result related to one of the plurality of shape parameters is selected.
    Type: Application
    Filed: February 27, 2023
    Publication date: September 7, 2023
    Applicant: Rigaku Corporation
    Inventor: Hideo TORAYA
  • Patent number: 11733185
    Abstract: This fluorescent X-ray analysis apparatus is provided with an X-ray irradiation unit 20 for irradiating a sample S with: X-rays, having an energy that exceeds the energy absorption edge value of Ag which is selected as a measurement target element, and that is no greater than the energy absorption edge value of Sn which is an adjacent element having a higher energy absorption edge value than Ag; and X-rays having an energy exceeding the energy absorption edge value of Sn which is selected as a measurement target element.
    Type: Grant
    Filed: December 29, 2020
    Date of Patent: August 22, 2023
    Assignee: RIGAKU CORPORATION
    Inventors: Kiyoshi Ogata, Sei Yoshihara, Shuichi Kato, Kazuhiko Omote, Hiroshi Motono, Naoki Matsushima
  • Publication number: 20230258586
    Abstract: According to an aspect of the present invention, an X-ray diffraction apparatus is provided. The X-ray diffraction apparatus comprises: an X-ray source configured to irradiate a sample with an X-ray; a sample stage configured to allow the sample to be disposed in such a manner that the X-ray is diffracted; a detector configured to detect a diffracted X-ray, which is the X-ray that has been diffracted, in one dimension at a detection strip; a slit member provided between the sample stage and the detector, comprising a slit through which the diffracted X-ray can pass; wherein an axis in a longitudinal direction of the slit is parallel to an axis in a longitudinal direction of the detection strip.
    Type: Application
    Filed: February 8, 2023
    Publication date: August 17, 2023
    Applicant: RIGAKU CORPORATION
    Inventor: Hisashi KONAKA
  • Patent number: 11698353
    Abstract: Provided are a quantitative analysis method, a quantitative analysis program, and an X-ray fluorescence. The quantitative analysis method includes: a step of acquiring a representative composition set to represent contents of analysis components; a step of acquiring a plurality of comparative compositions, in each of which the content of one of the analysis components of the representative composition is changed by a predetermined content; a detection intensity calculation step of calculating a detection intensity indicating an intensity of fluorescent X-rays detected under the influence of the geometry effect through use of an FP method with respect to a virtual sample having a thickness set in advance and being indicated by each of the representative composition and the comparative compositions; and a step of calculating a matrix correction coefficient for each of the analysis components based on the detection intensity.
    Type: Grant
    Filed: December 4, 2020
    Date of Patent: July 11, 2023
    Assignee: RIGAKU CORPORATION
    Inventors: Yoshiyuki Kataoka, Yasushi Kusakabe