Patents Assigned to Shin-Etsu Chemical Co., Ltd.
  • Patent number: 11901545
    Abstract: Methods for producing a negative electrode active material particle which includes a silicon compound particle containing a silicon compound that contains oxygen. The methods including preparing a silicon compound particle containing a silicon compound that contains oxygen; inserting Li into the silicon compound particle; and heating, while stirring, the Li-inserted silicon compound particle in a furnace to produce a negative electrode active material particle, wherein at least part of Si constituting the silicon compound particle is present in at least one state selected from oxide of Si2+ to Si3+ containing no Li, and compound containing Li and Si2+ to Si3+.
    Type: Grant
    Filed: February 2, 2022
    Date of Patent: February 13, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takakazu Hirose, Takumi Matsuno, Reiko Sakai, Kohta Takahashi, Hidekazu Awano
  • Patent number: 11897773
    Abstract: A carbide-coated carbon material including a base material containing carbon as a main component and chlorine, and a carbide layer containing a carbide as a main component and chlorine, the carbide layer being disposed on the base material. The base material has, near an interface between the base material and the carbide layer, a base material buffer region where a chlorine concentration continuously changes in a direction toward the carbide layer. The carbide layer has, near the interface between the base material and the carbide layer, a carbide layer buffer region where the chlorine concentration continuously changes in a direction toward the base material. The carbide-coated carbon material has sufficient adhesion strength in the interface between the carbide layer and the base material containing carbon as a main component.
    Type: Grant
    Filed: June 7, 2021
    Date of Patent: February 13, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Akihiro Hirate, Waichi Yamamura
  • Patent number: 11897989
    Abstract: A fluorine-containing curable composition which contains, as essential components, component (A) that is composed of a compound which is a linear polymer having a fluoropolyether in the main chain, while having a trifluoromethyl group at one end of the molecular chain and two or more (meth)acryl groups at the other end, component (B) that is composed of a compound which is a linear polymer having a fluoropolyether in the main chain, while having two or more (meth)acryl groups at each end of the molecular chain, and which has four to ten (meth)acryl groups in each molecule on average, and component (C) that is composed of a non-fluorinated acrylic compound which contains no fluoropolyether structure, while having two or more (meth)acryl groups in each molecule on average; the total blending amount of component (A) and component (B) relative to 100 parts by mass of component (C) is from 0.
    Type: Grant
    Filed: May 26, 2020
    Date of Patent: February 13, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Yasunori Sakano
  • Publication number: 20240047243
    Abstract: A microstructure-transfer stamp component including a substrate and a silicone-based rubber film formed on the substrate, wherein a surface of the silicone-based rubber film facing away from the substrate has one or more recesses each being closed except for a surface opening. This provides a microstructure-transfer stamp component that can optimize temporary adhesive strength of the surface of the silicone-based rubber film stamp in a short period of time.
    Type: Application
    Filed: November 16, 2021
    Publication date: February 8, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hideo NAKAGAWA, Yoshinori OGAWA, Toshiyuki OZAI
  • Publication number: 20240043983
    Abstract: An yttrium-base sprayed coating is obtained by thermally spraying yttrium oxide, yttrium fluoride or yttrium oxyfluoride onto a substrate to form a coating of 10-500 ?m thick, and chemically cleaning the coating with a cleaning liquid of organic acid, inorganic acid or a mixture thereof until the population of particles with a size of up to 300 nm becomes no more than 5 particles/mm2 of the coating surface. The yttrium-base sprayed coating exhibits high corrosion resistance even in a halogen gas plasma atmosphere and prevents yttrium-base particles from spalling off during etching treatment.
    Type: Application
    Filed: October 18, 2023
    Publication date: February 8, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yasushi Takai, Noriaki Hamaya
  • Patent number: 11892773
    Abstract: A photosensitive resin composition, a patterning process performed using the photosensitive resin composition, a cured film formed by curing the pattern, and an electronic component having the cured film. The photosensitive resin composition includes a resin, a photosensitizer, a surfactant containing a structural unit represented by formula (1), and a solvent, where Y1 and Y2 each independently represent a hydrogen atom, a methyl group, a phenyl group, or a group represented by formula (2), at least one of Y1 and Y2 is a group represented by formula (2), R1 to R6 are monovalent hydrocarbon groups that may be the same or different and optionally contain a heteroatom, having 1 to 20 carbon atoms, “1” and “n” are each independently integers of 1 to 100, and “m” is an integer of 0 to 100.
    Type: Grant
    Filed: September 8, 2021
    Date of Patent: February 6, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Hiroyuki Urano, Masashi Iio, Katsuya Takemura
  • Patent number: 11891701
    Abstract: A spraying material comprising a rare earth (R), aluminum and oxygen, the spraying material being a powder and comprising a crystalline phase of a rare earth (R) aluminum monoclinic (R4Al2O9) and a crystalline phase of a rare earth oxide (R2O3), with respect to diffraction peaks detected within a diffraction angle 2? range from 10° to 70° by a X-ray diffraction method using the characteristic X-ray of Cu-K?, the spraying material having diffraction peaks attributed to the rare earth oxide (R2O3) and diffraction peaks attributed to the rare earth (R) aluminum monoclinic (R4Al2O9), and an intensity ratio I(R)/I(RAL) of an integral intensity I(R) of the maximum diffraction peak attributed to the rare earth oxide (R2O3) to an integral intensity I(RAL) of the maximum diffraction peak attributed to the rare earth aluminum monoclinic (R4Al2O9) being at least 1.
    Type: Grant
    Filed: April 8, 2020
    Date of Patent: February 6, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Ryo Iwasaki, Noriaki Hamaya, Toshihiko Tsukatani, Yugo Taniguchi
  • Publication number: 20240036466
    Abstract: Provided is a novel onium salt used for a resist composition that has high sensitivity and excellent resolution, improved LWR and CDU, and that can inhibit collapse of a resist pattern for both of positive-type and negative-type resists in lithography: an onium salt represented by the following general formula (1), wherein RALU represents any one of a tertiary ether, tertiary carbonate, or acetal formed together with the adjacent oxygen atom and having a cyclic structure; RF represents any one of a fluorine atom, a fluorine-containing alkyl group having 1 to 6 carbon atoms, and a nitro group; Ra represents a hydrocarbyl group having 1 to 20 carbon atoms; n1 represents an integer of 0 or 1; n2 and n3 represent an integer of 1 or 2; one of RF and one of —O—RALU are bonded to carbon atoms adjacent to each other; n4 represents an integer of 0 to 3; and Z+ represents an onium cation.
    Type: Application
    Filed: July 10, 2023
    Publication date: February 1, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro FUKUSHIMA, Jun HATAKEYAMA, Tomomi WATANABE, Kazuhiro KATAYAMA
  • Publication number: 20240032838
    Abstract: The present invention is a bio-electrode composition containing an ionic polymer material as a component (A), where the component (A) includes a polymer having: a repeating unit-a having a structure selected from the group consisting of salts of ammonium, sodium, potassium, and silver formed with any of fluorosulfonic acid, fluorosulfonimide, and N-carbonyl-fluorosulfonamide; and a repeating unit-b having a nitro group. This provides: a bio-electrode composition capable of forming a living body contact layer for a bio-electrode that is excellent in electric conductivity and biocompatibility, is light-weight, can be manufactured at low cost, can control significant reduction in conductivity either when the bio-electrode is soaked in water or dried, and is soft and has excellent stretchability and adhesiveness; a bio-electrode including a living body contact layer formed of the bio-electrode composition; and a method for manufacturing the bio-electrode.
    Type: Application
    Filed: July 1, 2023
    Publication date: February 1, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Osamu WATANABE, Joe IKEDA
  • Publication number: 20240034859
    Abstract: [Problems] A composition capable of forming a film having both good solubility and good strength, and the film are provided. [Solution] The composition includes first hydroxypropyl methyl cellulose (HPMC) polymer having a viscosity of 2.5-4.5 mPa·s, second HPMC polymer having 6.0-50.0 mPa·s, third HPMC polymer having 4.5-15.0 mPa·s, a gelling agent, and a solvent, each viscosity determined at 20° C. in a 2 mass % aqueous solution, wherein the first HPMC polymer is selected from three members: HPMC-IA in Group I and HPMC-IIA and HPMC-IIB in Group II, the second HPMC polymer is the same member as that of the first HPMC polymer, provided that DS (MS) of the second HPMC polymer may be the same as or different from the DS (MS) of the first HPMC polymer, and the third HPMC polymer is selected from a member or members in a Group different from the Group of the first HPMC polymer.
    Type: Application
    Filed: September 3, 2020
    Publication date: February 1, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Shintaro MATSUSUE
  • Publication number: 20240035140
    Abstract: Provided is a rare earth oxide thermal spraying material which has a granular form having a volume-based average particle diameter D50 of 10 ?m to 18 ?m inclusive as measured by a laser diffraction scattering method, a compression degree of 13 or less and a BET specific surface area of 0.1 m2/g to 2 m2/g inclusive. The rare earth oxide thermal spraying material according to the present invention can form a dense thermally sprayed film having a small porosity even by atmospheric plasma spraying in which a thermal spraying material is supplied in a solid (particle) form. When a thermally sprayed film is formed by atmospheric plasma spraying using the rare earth oxide thermal spraying material according to the present invention, it becomes possible to form the thermally sprayed film in a curved shape easily and to form the thermally sprayed film in a large thickness.
    Type: Application
    Filed: December 16, 2021
    Publication date: February 1, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ryusei Nishimura, Yasushi Takai, Hajime Nakano, Kouhei Miyamoto
  • Patent number: 11886118
    Abstract: A material for forming an organic film, including: a compound for forming an organic film shown by the following general formula (1A); and an organic solvent, where W1 represents a tetravalent organic group, n1 an integer of 0 or 1, n2 an integer of 1 to 3, and R1 an alkynyl group having 2 to 10 carbon atoms. A compound for forming an organic film is cured not only under air, but also under film formation conditions of inert gas, and forms an organic film having not only excellent heat resistance and properties of filling and planarizing a pattern formed on a substrate, but also favorable adhesion to a substrate, and a material for forming an organic film containing the compound, and a substrate for manufacturing a semiconductor device using the material, a method for forming an organic film using the material, and a patterning process using the material.
    Type: Grant
    Filed: February 22, 2021
    Date of Patent: January 30, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke Kori, Takashi Sawamura, Keisuke Niida, Seiichiro Tachibana
  • Patent number: 11884778
    Abstract: The object of the present invention is to provide a silicone composition which provides a release coating having excellent adhesion to a substrate, in particular a plastic film substrate, such as a polyester film. Further, an object of the present invention is to provide a release sheet having a cured coating of the silicon composition. It is also an object of the present invention to provide a silicone composition which has improved storage stability and does not cause separation of the functional compound during long-term storage or transportation. The present invention provides a silicone composition comprising the following components (A) to (C): (A) an organopolysiloxane having at least two alkenyl groups each bonded to a silicon atom in a molecule, having a viscosity at 25 degrees C.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: January 30, 2024
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ataru Kobayashi, Ken Nakayama, Toshiaki Ihara
  • Patent number: 11884848
    Abstract: A glassy adhesive including a composition containing at least: a polysilazane compound having structures represented by the following formulae (A-1) and (A-2) and not containing a hydrosilyl group; and a curing catalyst, where a mole ratio of the component (A-1) to the component (A-2), which is (A-1):(A-2), is within a range of 3:7 to 7:3, the composition has a non-volatile content of 50 mass % or more, when the composition being heated at 105° C. for 3 hours, and the curing catalyst is at least one selected from the group consisting of an organic acid, a simple substance of a d block element belonging to the fourth period of the periodic table, a platinum group element, and an amphoteric element, and a compound containing the element. This provides an adhesive that is low-cost, has high UV resistance, and in which cracks and so forth do not occur even after a reflow process.
    Type: Grant
    Filed: April 8, 2022
    Date of Patent: January 30, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Tatsuro Kaneko
  • Patent number: 11885022
    Abstract: A film may be formed on a surface of a substrate by chemical vapor deposition in a reaction container provided with at least a first holding member that is capable of holding the substrate and a second holding member that is capable of holding the substrate independently from the first holding member, by: (a) forming a film on the surface of the substrate by chemical vapor deposition while holding the substrate by the first holding member; (b) moving at least one holding member among the first holding member and the second holding member in at least one direction of the upward direction and the downward direction to hold the substrate by the second holding member instead of the first holding member; and (c) forming a film on the surface of the substrate held by the second holding member by chemical vapor deposition.
    Type: Grant
    Filed: February 14, 2022
    Date of Patent: January 30, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Chikara Mori, Waichi Yamamura
  • Patent number: 11884820
    Abstract: This silicone gel composition contains (A) an organopolysiloxane having one or more silicon atom-bonded alkenyl groups per molecule, (B) an organohydrogen polysiloxane having two or more silicon atom-bonded hydrogen atoms per molecule, (C) a platinum group metal-based curing catalyst, (D) an isocyanuric acid derivative having two trialkoxysilyl groups and one crosslinkable vinyl group and/or an isocyanuric acid derivative having three trialkoxysilyl groups, and (E) a ketenesilylacetal-type compound, and provides a cured product having a specific penetration.
    Type: Grant
    Filed: July 12, 2019
    Date of Patent: January 30, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Tsuyoshi Matsuda
  • Publication number: 20240025754
    Abstract: A polysilicon rod wherein in an area whose distance from a center of a cross section of the polysilicon rod is within ? of a radius and that excludes a seed core, average grain boundary characteristics have following features: a coincidence grain boundary ratio exceeds 20%, a grain boundary length exceeds 550 mm/mm2, and a random grain boundary length does not exceed 800 mm/mm2.
    Type: Application
    Filed: October 2, 2023
    Publication date: January 25, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Atsushi YOSHIDA, Naruhiro HOSHINO, Masahiko ISHIDA, Takeshi AOYAMA
  • Publication number: 20240027903
    Abstract: Provided are: a resist material having high sensitivity and improved LWR (line width roughness) and CDU (critical dimension uniformity) for both of positive-type and negative-type resists; and a patterning process using this resist material: a resist material, including, as a quencher: a sulfonium salt of a substituted or unsubstituted hydroxy(trifluoromethoxy)benzoic acid; and/or a sulfonium salt of a substituted or unsubstituted hydroxy(trifluoromethylthio)benzoic acid.
    Type: Application
    Filed: July 10, 2023
    Publication date: January 25, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun HATAKEYAMA, Masahiro FUKUSHIMA
  • Publication number: 20240027909
    Abstract: A positive resist composition comprising a compound having a nitrobenzyl ester group bonded to an iodized aromatic ring exhibits a higher sensitivity and resolution than the prior art and forms a pattern of good profile with low edge roughness or improved CDU after exposure and development.
    Type: Application
    Filed: June 28, 2023
    Publication date: January 25, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Publication number: 20240027902
    Abstract: A chemically amplified resist composition comprising a quencher and an acid generator is provided. The quencher is a salt compound consisting of a nitrogen-containing cation having a carboxy group whose hydrogen is substituted by a tertiary hydrocarbyl group having an androstane structure and a non-nucleophilic counter anion of weak acid. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: June 22, 2023
    Publication date: January 25, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masahiro Fukushima