Patents Assigned to Sumitomo Chemical Company, Limited
  • Publication number: 20240059839
    Abstract: A polyimide material includes a polyimide of Formula (I) wherein A1 and A2 for each occasion independently are selected from a group of tetravalent moieties and B for each occasion independently is selected from a group of divalent moieties, wherein x is an integer greater than 1. The polyimide material has desirable optical, structural, thermal, mechanical properties, or combination thereof.
    Type: Application
    Filed: December 6, 2021
    Publication date: February 22, 2024
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Kelby Hull, Arjan Zoombelt
  • Patent number: 11908688
    Abstract: A method for manufacturing a nitride semiconductor substrate, including: a step of preparing a base substrate; a step of forming a mask layer having a plurality of openings on the main surface of the base substrate; a first step of growing a first layer whose surface is composed only of inclined interfaces; and a second step of epitaxially growing a single crystal of a group III nitride semiconductor on the first layer, making the inclined interfaces disappear, and growing a second layer having a mirror surface, wherein in the first step, at least one valley and a plurality of tops are formed at an upper side of each of the plurality of openings of the mask layer by forming a plurality of concaves on a top surface of the single crystal and making the (0001) plane disappear.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: February 20, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Takehiro Yoshida
  • Patent number: 11905240
    Abstract: The present invention provides a compound that have excellent harmful arthropod controlling effects, the compounds being represented by formula (I) [wherein R1 represents a hydrogen atom etc., and R21, R22, R31 and R32 are identical to or different from each other and each represents a hydrogen atom etc., Q1, Q2, Q3, Q4 are identical to or different from each other and each represents CH etc.], as well as a composition comprising the same, and a method for controlling harmful arthropod comprising applying the same.
    Type: Grant
    Filed: March 27, 2019
    Date of Patent: February 20, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hajime Mizuno, Motohiro Nakajima, Kazuya Ujihara
  • Patent number: 11905271
    Abstract: Provided is a compound represented by formula M-30: or an N-oxide compound thereof, wherein the variable groups are as defined in the specification. Also provided is an arthropod pest control agent containing a compound represented by formula M-30 and an inert carrier. The compound represented by formula M-30 and arthropod pest control agent exhibit an excellent controlling effect against arthropod pests.
    Type: Grant
    Filed: April 1, 2021
    Date of Patent: February 20, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kohei Orimoto, Yoshihiko Nokura, Yuji Nakajima, Takamasa Tanabe, Takahiro Kimura
  • Patent number: 11910623
    Abstract: To reduce the dark current ratio. A photoelectric conversion element 10 including an anode 16, a cathode 12, an active layer 14 provided between the anode and the cathode, and at least one electron transportation layer 13 provided between the active layer and the cathode, in which the electron transportation layer contains an insulating material and a semiconductor material; a difference between a work function of the electron transportation layer and a work function of the cathode is 0.88 eV or more; the active layer contains a p-type semiconductor material and an n-type semiconductor material; and a work function of the electron transportation layer (Wf1) and an energy level of a lowest occupied molecular orbital of the n-type semiconductor material (LUMO) satisfy the following Formula (2): |LUMO|?Wf1?0.06 eV??(2).
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: February 20, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Giovanni Ferrara, Miki Nishi
  • Patent number: 11908902
    Abstract: Provided is a group III nitride laminate for improving device characteristics, including: an underlying substrate; a first layer that is formed on the underlying substrate and is made of aluminum nitride; and a second layer that is formed on the first layer and is made of gallium nitride, wherein the first layer has a thickness of more than 100 nm and 1 ?m or less, a full width at half maximum of (0002) diffraction determined through X-ray rocking curve analysis is 250 seconds or less, and a full width at half maximum of (10-12) diffraction determined through X-ray rocking curve analysis is 500 seconds or less.
    Type: Grant
    Filed: July 7, 2021
    Date of Patent: February 20, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hajime Fujikura, Taichiro Konno, Takeshi Kimura, Osamu Goto
  • Publication number: 20240051986
    Abstract: The present invention provides an efficient process for preparing a nucleic acid oligomer, specifically a method for deprotecting a protecting group of hydroxy group in the nucleic acid oligomer effectively. The present invention provides also a process for preparing a nucleic acid oligomer represented by formula (4) which comprises contacting a nucleic acid oligomer represented by formula (3) with a fluoride ion under an atmosphere of an inert gas or inert gases containing 15% or less of oxygen concentration (wherein each definition of the groups described in the formula (3) and the formula (4) are the same as those described in the Description).
    Type: Application
    Filed: August 19, 2021
    Publication date: February 15, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takuya MIYAGAWA, Hideki OKUMURA
  • Publication number: 20240049711
    Abstract: A herbicidal composition including one or more uracil compounds selected from the group consisting of a compound of formula (I): a compound of formula (II): and a compound of formula (III): and one or more compounds selected from the group consisting of the herbicide compound group B and the safener group C, wherein the herbicide compound group B is the group consisting of the following B-1 to B-12: B-1, acetolactate synthase inhibitors; B-2, acetyl CoA carboxylase inhibitors; B-3, protoporphyrinogen IX oxidase inhibitors; B-4, 4-hydrophenylpyrubic acid dioxygenase inhibitors; B-5, phytoene desaturase inhibitors; B-6, photosystem II inhibitors; B-7, very-long-chain fatty acid synthesis inhibitors; B-8, microtubule formation inhibitors; B-9, auxin-type herbicides; B-10, enolpyruvylshikimate-3-phosphate synthase inhibitors; B-11, glutamine synthase inhibitors; and B-12, other herbicides; (including agriculturally acceptable salts or derivatives thereof).
    Type: Application
    Filed: December 21, 2021
    Publication date: February 15, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuki OKAJIMA, Mai TORIUMI, Yoshinao SADA
  • Publication number: 20240049752
    Abstract: The present disclosure provides a feed additive composition and a feed for livestock; a method of feeding livestock, a method of improving the weight gain of livestock, and a method of increasing the feed efficiency in livestock, comprising letting livestock take said feed; and a use of the feed for livestock for improving the weight gain of livestock, and a use of the feed for increasing the feed efficiency in livestock.
    Type: Application
    Filed: February 16, 2022
    Publication date: February 15, 2024
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Hiroshi Kojo, Tsuyoshi Tonoue, Kaori Ikari
  • Publication number: 20240049713
    Abstract: To provide a method for effectively controlling specific weeds having resistance to herbicides. Disclosed is a method for controlling PPO inhibitor-resistant weeds, which comprises a step of applying one or more uracil compounds selected from the group consisting of a compound represented by the following formula (I), a compound represented by the following formula (II) and a compound represented by the following formula (III).
    Type: Application
    Filed: December 21, 2021
    Publication date: February 15, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuki OKAJIMA, Mai TORIUMI, Yoshinao SADA
  • Patent number: 11896010
    Abstract: A compound having excellent weed control efficacy and high safety against useful plants is represented by formula (A):
    Type: Grant
    Filed: July 11, 2019
    Date of Patent: February 13, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Hajime Mizuno
  • Patent number: 11899363
    Abstract: A salt represented by formula (I), an acid generator and a resist composition: wherein R1, R2 and R3 each represent a hydroxy group, —O—R10, —O—CO—O—R10, —O-L1-CO—O—R10; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, etc.; L1 represents an alkanediyl group; R10 represents an acid-labile group; X1, X2 and X3 each represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0?m1+m7?5, 0?m2+m8?4, 0?m3+m9?4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, —CH2—, —O—, —S—, etc.; and AI? represents an organic anion.
    Type: Grant
    Filed: June 28, 2021
    Date of Patent: February 13, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Katsuhiro Komuro, Koji Ichikawa
  • Patent number: 11897976
    Abstract: A process or apparatus for producing polyethylene with improved film thinning and handleability involves polymerizing high-pressure ethylene using an autoclave-type reactor in the presence of a polymerization initiator. The reaction zone of the reactor has at least two different temperature sections; the polymerization initiator and the ethylene are supplied to the upstream temperature section in the reaction zone and the ethylene is polymerized to generate polyethylene; unreacted ethylene and the polyethylene generated at the upstream temperature section in the reactor flow into the downstream temperature section in communication with the upstream temperature section, so that additional polyethylene is generated at the downstream temperature section. A difference (?T [° C.]) between a temperature (T1 [° C.]) of the temperature section positioned upstream and a temperature (T2 [° C.
    Type: Grant
    Filed: March 24, 2022
    Date of Patent: February 13, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kensuke Naraki, Toshihiko Manami
  • Publication number: 20240049596
    Abstract: The present disclosure provides a light emitting device having an anode and a cathode, and a first layer and a second layer disposed between the anode and the cathode.
    Type: Application
    Filed: September 13, 2021
    Publication date: February 8, 2024
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Toshiaki Sasada, Atsushi Asano
  • Publication number: 20240049491
    Abstract: The present disclosure provides a light emitting device having an anode and a cathode, and a first layer and a second layer disposed between the anode and the cathode.
    Type: Application
    Filed: September 13, 2021
    Publication date: February 8, 2024
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Toshiaki Sasada, Atsushi Asano
  • Publication number: 20240043639
    Abstract: The present invention provides a cured film of a mixed composition of an organosilicon compound (A) including a fluoropolyether structure and an organosilicon compound (C) having an amino group or an amine skeleton, in which, when the elements constituting one side surface (W) of the cured film and amounts thereof are measured by X-ray photoelectron spectroscopy (XPS), the cured film has an F content of 60 atom % or more and an O content of 17 atom % or more.
    Type: Application
    Filed: January 21, 2022
    Publication date: February 8, 2024
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Michiru DAIMON, Sayaka SAKURAI, Tomohiro ITO
  • Patent number: 11892423
    Abstract: A sensor including a detection film formed from a resin composition, a first electrode provided on a first surface of the detection film, and a second electrode provided on a second surface of the detection film, wherein the first surface of the detection film includes a rough surface having fine irregularities with a root mean square roughness (Rq) of 0.3 ?m to 3.0 ?m in a portion that is in contact with the first electrode.
    Type: Grant
    Filed: March 25, 2019
    Date of Patent: February 6, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Megumi Hayasaka, Yoshifumi Komatsu, Yoshihiro Harada
  • Patent number: 11891478
    Abstract: A liquid crystal polyester fiber includes a liquid crystal polyester having a tensile strength is 25 cN/dtex to 30 cN/dtex, and an orientation degree of the fiber is 94% to less than 100%. The liquid crystal polyester has repeating units of Formula (1), Formula (2), and Formula (3). At least one repeating unit of Formula (1), Formula (2), and Formula (3) contains 2,6-naphthylene. A content of the repeating unit containing the 2,6-naphthylene is 68 to 80 mol % with respect to a total content of all the repeating units. The liquid crystal polyester fiber has a fiber diameter of 5 to 100 ?m; (1) —O—Ar1—CO—, (2) —CO—Ar2—CO—, and (3) —X—Ar3—Y—, wherein Ar1 represents phenylene, naphthylene, or biphenylylene, Ar2 and Ar3 each independently represent phenylene, naphthylene, or biphenylylene, Ar1, Ar2, or Ar3 contains 2,6-naphthylene, X and Y independently represent oxygen or —NH—, and Ar1, Ar2, or Ar3 may be substituted.
    Type: Grant
    Filed: August 30, 2021
    Date of Patent: February 6, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Yusaku Kohinata
  • Patent number: 11890841
    Abstract: Provided are an acrylic resin layer laminate having excellent impact resistance and a manufacturing method of the same. The laminate includes a first acrylic resin layer, a thermoplastic resin layer, and a second acrylic resin layer in this order, in which the thermoplastic resin layer contains 71% or more of a component having a spin-spin relaxation time T2H in pulse NMR measurement of 0.03 ms or longer. The manufacturing method of the laminate includes: discharging, from a die, a molten resin laminate containing at least a melt of a resin composition (1) containing a (meth)acrylic resin, a melt of a resin composition containing a thermoplastic resin, and a melt of a resin composition (2) containing a (meth)acrylic resin; and cooling the discharged molten resin laminate to obtain a laminate.
    Type: Grant
    Filed: March 13, 2020
    Date of Patent: February 6, 2024
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masakazu Sumida, Shota Konishi, Kensuke Maekawa, Noboru Kondo
  • Publication number: 20240040927
    Abstract: The present disclosure provides a light emitting device having an anode and a cathode, and a first layer and a second layer disposed between the anode and the cathode.
    Type: Application
    Filed: September 13, 2021
    Publication date: February 1, 2024
    Applicant: Sumitomo Chemical Company, Limited
    Inventors: Toshiaki Sasada, Atsushi Asano