Patents Assigned to Sumitomo Chemical Company, Limited
  • Compound, resin, resist composition and method for producing resist pattern
    Patent number: 11815813
    Abstract: Disclosed are a compound represented by formula (I), a resin and a resist composition: wherein R1 represents an alkyl group which may have a halogen atom, a hydrogen atom or a halogen atom; L1 represents a single bond or —CO—O*; R3 represents an alkyl group, and —CH2— included in the group may be replaced by —O— or —CO; R4 represents a fluorine atom, an alkyl fluoride group or an alkyl group, and —CH2— included in the alkyl fluoride group and the alkyl group may be replaced by —O— or —CO—; R5 represents a hydrogen atom, an alkylcarbonyl group or an acid-labile group; m2 and m3 represent an integer of 1 to 3, m4 represents an integer of 0 to 2, and m5 represents 1 or 2, in which 3?m2+m3+m4+m5?5.
    Type: Grant
    Filed: May 26, 2021
    Date of Patent: November 14, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tatsuro Masuyama, Takuya Nakagawa, Koji Ichikawa
  • RESIN COMPOSITION
    Publication number: 20230357538
    Abstract: An objective of the present invention is to provide a resin composition capable of improving at least either one of heat resistance and visible light transmission. A resin composition according to an aspect of the present invention contains a coloring agent and a resin, and the coloring agent contains a compound represented by a formula (I), a formula (II), a formula (III) or a formula (IV).
    Type: Application
    Filed: September 10, 2021
    Publication date: November 9, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tetsuo AKASAKA, Ayaka MATSUYAMA, Takuma AOKI, Yutaka KAWANISHI
  • PHOTOELECTRIC CONVERSION ELEMENT AND METHOD FOR MANUFACTURING SAME
    Publication number: 20230363184
    Abstract: Deterioration of an external quantum efficiency due to a heat treatment is suppressed. A photoelectric conversion element 10 includes an anode 12, a cathode 16, and an active layer 14 provided between the anode and the cathode, in which the active layer contains at least one p-type semiconductor material and at least two n-type semiconductor materials, the at least one p-type semiconductor material is a polymer compound having a structural unit represented by the following Formula (I): in Formula (I), Ar1, Ar2, and Z are as defined in the specification, and the at least two n-type semiconductor materials contain one or more non-fullerene compounds.
    Type: Application
    Filed: July 9, 2021
    Publication date: November 9, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Miki KATAKURA
  • METHOD FOR EVALUATING PLATE AND METHOD FOR EVALUATING TOXICITY OF TEST SUBSTANCE
    Publication number: 20230358743
    Abstract: A method for evaluating a plate including a plurality of wells, the method including: an injection step of injecting an evaluation sample including a cell and a test substance into the plurality of wells, the evaluation sample being adjusted in advance so that a foreign matter is generated as a result of cell death caused by the test substance; a counting step of counting the number of wells having the foreign matter among the plurality of wells at a first counting timing at which a first predetermined time has elapsed since the evaluation sample is injected into the plurality of wells; and a determination step of determining that the plate is appropriate when the number of wells having the foreign matter among the plurality of wells is one or more, and determining that the plate is inappropriate when the number of wells having the foreign matter is zero.
    Type: Application
    Filed: September 27, 2021
    Publication date: November 9, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Sachiko YAMADA, Hanaho KANO, Maya OZAKI
  • METHOD OF CONTROLLING SOYBEAN RUST FUNGUS RESISTANT TO QOI FUNGICIDE
    Publication number: 20230354808
    Abstract: The present invention provides a method for controlling soybean rust fungus having an amino acid replacement of F129L in mitochondrial cytochrome b protein. A compound represented by formula (I) [wherein: Q represents a group represented by Q1 etc. (wherein “•” represents a position bonding to benzene ring); E represents C1-C6 chain hydrocarbon group, etc.; R1 represents C1-C3 chain hydrocarbon group, etc.; n is 0, 1, 2 or 3; when n is 2 or 3, two or more of R2 may be identical to or different from each other; and R2 represents C1-C3 chain hydrocarbon group, etc.] can be used for controlling soybean rust fungus having an amino acid replacement of F129L in mitochondrial cytochrome b protein.
    Type: Application
    Filed: January 29, 2021
    Publication date: November 9, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Yuichi MATSUZAKI, Takaaki NAKANO, Hidekatsu TOBITA, Keisuke ARAI, Nao MAEHATA
  • METHOD FOR EVALUATING EVALUATION TARGET
    Publication number: 20230358667
    Abstract: A method for evaluating an evaluation target includes: an irradiation step of irradiating an evaluation plate, in which an evaluation target is held in a plurality of wells provided in the evaluation plate, with illumination light from a light source; an imaging step of imaging the evaluation plate while the evaluation plate is irradiated with the illumination light; and an evaluation step of evaluating the evaluation target based on an image of the evaluation plate obtained in the imaging step, in the imaging step, imaging of the whole of the evaluation plate is ended in less than 120 seconds from start of irradiation of the evaluation plate with the illumination light in the irradiation step, and irradiation with the illumination light is ended after end of imaging of the whole of the evaluation plate in the imaging step.
    Type: Application
    Filed: September 27, 2021
    Publication date: November 9, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Maya OZAKI, Ryoko MATSUYAMA
  • LAYERED BODY AND DISPLAY DEVICE
    Publication number: 20230350108
    Abstract: There are provided a layered body and a display device including the same, the layered body including a substrate layer and a resin layer disposed on at least one surface of the substrate layer, in which the resin layer contains a light scattering agent (A), and, when the contact angle of the substrate layer with respect to diiodomethane is indicated by ?s (°) and the contact angle of the resin layer with respect to diiodomethane is indicated by ?r (°), the following formula: |?s - ?r| ? 21 is satisfied.
    Type: Application
    Filed: August 12, 2021
    Publication date: November 2, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masayoshi TOKUDA, Yoshihiro HARADA, Yoshifumi KOMATSU
  • COMPOUND
    Publication number: 20230348502
    Abstract: The present invention provides a novel compound represented by formula (I) or formula (II) capable of reducing the color difference before and after post-baking. [In the formula (I), Y1 and Z1 each independently represent an oxygen atom or a sulfur atom, and Z2 and Z3 each independently represent a single bond, an oxygen atom, or a sulfur atom, provided that at least one of Y1, Z1, Z2, and Z3 represents a sulfur atom, and in the formula (II), Y2 and Z4 each independently represent an oxygen atom or a sulfur atom, and Z5 represents a single bond, an oxygen atom, or a sulfur atom, provided that at least one of Y2, Z4, and Z5 represents a sulfur atom.
    Type: Application
    Filed: August 18, 2021
    Publication date: November 2, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takuma AOKI, Tomohiro NAKAYAMA, Tetsuo AKASAKA, Takahiro KUROGI
  • Laminated substrate having piezoelectric film, element having piezoelectric film and method for manufacturing this laminated substrate
    Patent number: 11805700
    Abstract: There is provided a laminated substrate having a piezoelectric film, including: a substrate; a first electrode film provided on the substrate; and a piezoelectric film provided on the first electrode film, wherein an oxide film containing an oxide represented by a composition formula of RuOx or IrOx, is provided on the piezoelectric film.
    Type: Grant
    Filed: April 19, 2018
    Date of Patent: October 31, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kenji Shibata, Kazutoshi Watanabe, Fumimasa Horikiri
  • RESIN PELLET AND METHOD OF PRODUCING RESIN PELLET
    Publication number: 20230339144
    Abstract: There are provided a resin pellet having high transportability in a solid state in a feeder and a method of producing the same. A resin pellet has a recess, and when a height of the resin pellet in a case in which the resin pellet is disposed on a horizontal plane in such a manner that the recess faces the horizontal plane is defined as T1, and a maximum diameter of the resin pellet as viewed from a direction perpendicular to the horizontal plane is defined as L, an aspect ratio defined by L/T1 is 1.2 to 1.8.
    Type: Application
    Filed: June 15, 2023
    Publication date: October 26, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Toshihiko MANAMI, Shohei UENO
  • PHOTOSENSITIVE COMPOSITION
    Publication number: 20230340289
    Abstract: The photosensitive composition according to the present invention is a photosensitive composition including a semiconductor particle (A), a photopolymerizable compound (C) and a photopolymerization initiator (D), in which the photosensitive composition satisfies any one or more of the following (a) to (c): (a) the photosensitive composition further includes a stabilizer (E), and a content of the stabilizer (E) is 8% by mass or more based on the total amount of the photosensitive composition; (b) the photopolymerizable compound (C) includes a (meth)acrylate compound (C1) having a molecular weight of 180 or less; and (c) the photopolymerizable compound (C) includes a compound (C2) having a vinyl ether group and a (meth)acryloyl group in the same molecule.
    Type: Application
    Filed: June 27, 2023
    Publication date: October 26, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tomohiro FUKUURA, Yoshihiro HARADA, Yoshifumi KOMATSU, Masayoshi TOKUDA
  • METHOD FOR EDITING TARGET DNA, METHOD FOR PRODUCING CELL IN WHICH TARGET DNA IS EDITED, AND DNA EDITING SYSTEM FOR USE IN THESE
    Publication number: 20230340455
    Abstract: A method for editing a target DNA comprising: a step of bringing (1) a fusion protein containing a TALE and a nucleic acid base converting enzyme and (2) a CRISPR-Cas9 system containing a Cas9 protein which has lost part or all of a nuclease activity and a guide RNA thereof into contact with a target DNA to edit a base in a target site of the target DNA by using a nucleic acid base converting enzyme activity of the fusion protein, wherein a TALE recognition sequence recognized by the TALE in the fusion protein or a complementary sequence thereof is present on a 5? side of the target site via a spacer 1 having a chain length of 7 to 31 bp, and a guide RNA-target sequence recognized by the guide RNA in the CRISPR-Cas9 system is present to contain a complementary base of the target site.
    Type: Application
    Filed: September 3, 2021
    Publication date: October 26, 2023
    Applicants: Hiroshima University, SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Tetsushi SAKUMA, Takashi YAMAMOTO, Nahoko NISHIBORI, Tadahiko YOSHIMA, Kazuhiko HORIGOME
  • POLYPROPYLENE-BASED RESIN COMPOSITION
    Publication number: 20230340244
    Abstract: Provided is a polypropylene-based resin composition capable of improving the moist-heat resistance of a molded product. The polypropylene-based resin composition includes: component (A) of a polypropylene-based polymer that is contained in an amount of 40-90 mass%; component (B) of an acid-modified polypropylene that is contained in an amount of 0.1-10 mass%; and component (C) of a glass fiber which has a water-soluble base component amount of at most 0.1 mmol/g, and a water-soluble weak acid salt content of at most 0.1 mmol/g and which is contained in an amount of 10-60 mass%.
    Type: Application
    Filed: October 12, 2021
    Publication date: October 26, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Kenta ISHIZUKA
  • STRUCTURE MANUFACTURING METHOD AND STRUCTURE MANUFACTURING APPARATUS
    Publication number: 20230343597
    Abstract: There is provided a structure manufacturing method, including: preparing an etching target at least whose top surface comprises group III nitride crystal, and an alkaline or acidic etching liquid containing peroxodisulfate ion as an oxidizing agent that receives electrons; irradiating the top surface of the etching target with light while rotating the etching target, with the top surface of the etching target immersed in the etching liquid heated to generate sulfate ion radicals.
    Type: Application
    Filed: February 12, 2021
    Publication date: October 26, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Fumimasa HORIKIRI, Noboru FUKUHARA
  • METHOD OF CONTROLLING SOYBEAN RUST FUNGUS HAVING RESISTANCE TO QoI FUNGICIDE
    Publication number: 20230337672
    Abstract: A method for controlling a soybean rust fungus having an amino acid substitution of F129L in a mitochondrial cytochrome b protein. A compound of formula (I) can be used for controlling a soybean rust fungus having an amino acid substitution of F129L in a mitochondrial cytochrome b protein, wherein: R1 represents a C1-C4 alkyl group or the like; n represents 0, 1, or 2; Q represents the group of Q1 or the like; represents the binding site to the rest of molecule; X1 represents —C(H)? or the like; X2 represents -C(O)OCH3 or the like; J represents the group represented by J1 or the like; # represents the binding position to E; Y1 represents an oxygen atom or the like; Y2 represents ?C(R6)— or the like; R6 represents a C1-C4 alkyl group or the like; and E represents a C1-C6 chain hydrocarbon group or the like.
    Type: Application
    Filed: June 29, 2021
    Publication date: October 26, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hidekatsu TOBITA, Takaaki NAKANO, Yoshihiko NOKURA
  • Antifouling oligomerization catalyst systems
    Patent number: 11794176
    Abstract: A catalyst system that may reduce polymeric fouling may include at least one titanate compound, at least one aluminum compound, and an antifouling agent. The antifouling agent may be chosen from one or more of a phosphonium or phosphonium salt; a sulfonate or a sulfonate salt; a sulfonium or sulfonium salt; an ester including a cyclic moiety; an anhydride; a polyether; and a long-chained amine-capped compound. The catalyst system may further include a non-polymeric ether compound.
    Type: Grant
    Filed: May 27, 2022
    Date of Patent: October 24, 2023
    Assignees: Saudi Arabian Oil Company, Sumitomo Chemical Company, Limited
    Inventors: Sohel Shaikh, Motaz Khawaji, Hussain Al Yami, Wei Xu
  • Piezoelectric stack, piezoelectric element, and method of manufacturing piezoelectric stack
    Patent number: 11800808
    Abstract: There is provided a piezoelectric stack, including: a substrate; an electrode film; and a piezoelectric film which is comprised of alkali niobium oxide of a perovskite structure represented by a composition formula of (K1-xNax)NbO3 (0<x<1), wherein the piezoelectric film comprises crystals having a grain size with a standard deviation of 0.42 ?m or less.
    Type: Grant
    Filed: July 30, 2020
    Date of Patent: October 24, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kenji Shibata, Kazutoshi Watanabe, Toshiaki Kuroda
  • MUTANT INSECT OLFACTORY RECEPTOR PROTEIN
    Publication number: 20230331793
    Abstract: An object is to provide a technique of increasing the response activity of an olfactory receptor to a chemical substance, and the object is achieved by introducing a mutation into a specific site in an insect olfactory receptor protein so as to satisfy a specific condition.
    Type: Application
    Filed: July 21, 2021
    Publication date: October 19, 2023
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Atsufumi OZOE, Yasuhiko TAKAHASHI
  • Structure production wet etch method and structure production apparatus
    Patent number: 11791151
    Abstract: A process of preparing a wafer having a diameter of two inches or more, at least a surface of the wafer being formed from a group III nitride crystal, including preparing an alkaline or acidic etching liquid containing a peroxodisulfate ion as an oxidizing agent that accepts an electron, accommodating the wafer such that the surface of the wafer is immersed in the etching liquid such that the surface of the wafer is parallel with a surface of the etching liquid; and radiating light from the surface side of the etching liquid onto the surface of the wafer without agitating the etching liquid. First and second etching areas disposed at an interval from each other are defined on the surface of the wafer. In the process of radiating the light onto the surface of the wafer, the light is radiated perpendicularly onto surfaces of the first and second etching areas.
    Type: Grant
    Filed: February 9, 2022
    Date of Patent: October 17, 2023
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Fumimasa Hirikiri
  • Antifouling oligomerization catalyst systems
    Patent number: 11786889
    Abstract: A catalyst system that may reduce polymeric fouling may include at least one titanate compound, at least one aluminum compound, and an antifouling agent. The antifouling agent may be chosen from one or more of a phosphonium or phosphonium salt; a sulfonate or a sulfonate salt; a sulfonium or sulfonium salt; an ester including a cyclic moiety; an anhydride; a polyether; and a long-chained amine-capped compound. The catalyst system may further include a non-polymeric ether compound.
    Type: Grant
    Filed: June 14, 2016
    Date of Patent: October 17, 2023
    Assignees: Saudi Arabian Oil Company, Sumitomo Chemical Company, Limited
    Inventors: Sohel Shaikh, Motaz Khawaji, Hussain Al Yami, Wei Xu