Patents Assigned to Tokyo Ohka Kogyo Co., Ltd.
  • Adhesive composition, adhesive film, and bonding method
    Patent number: 10793756
    Abstract: An adhesive composition contains (a) a resin consisting of (i) a block copolymer or (ii) 35% by weight or greater and less than 100% of the block copolymer and 65% by weight or less of a random copolymer, the block copolymer having a weight average molecular weight in a range of 50,000 to 150,000, wherein the block copolymer is a diblock copolymer, a triblock copolymer, or a combination thereof, and includes a styrene group, both terminals of a main chain of the triblock copolymer are styrene groups; (b) a solvent which includes a condensed polycyclic hydrocarbon, wherein an adhesive layer formed by using the adhesive composition has a Young's modulus of 0.1 GPa or greater at 23° C., a storage modulus (G?) of 1.5×105 Pa or less at 220° C., and a loss factor (tan ?) of 1.3 or less at 220° C.; and (c) a thermal polymerization inhibitor.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: October 6, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Koki Tamura, Hirofumi Imai, Toshiyuki Ogata, Atsushi Kubo, Takahiro Yoshioka
  • Resin composition, method for producing resin composition, film formation method, and cured product
    Patent number: 10767017
    Abstract: A resin composition including a silicon-containing resin component and a solvent, the silicon-containing resin component including at least one of (I) and (II) mentioned below, the solvent including at least one of a terpene compound having at least one of a hydroxy group and an acetoxy group, and a cyclic skeleton-containing acetate compound (excluding the terpene compound): (I) a polysilane-polysiloxane resin having a polysilane structure and a polysiloxane structure, and (II) a mixture of a resin having a polysilane structure and a resin having a polysiloxane structure.
    Type: Grant
    Filed: December 27, 2017
    Date of Patent: September 8, 2020
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kunihiro Noda, Hiroki Chisaka, Kazuya Someya, Dai Shiota
  • Porous separator for secondary batteries and secondary battery using same
    Patent number: 10763480
    Abstract: A porous separator for secondary batteries is formed of a porous film, and has a first layered region having an average pore diameter of 100 nm or more and 500 nm or less, and a second layered region having a larger average pore diameter than the first layered region. The first layered region is positioned in one outermost surface of the porous film. Both the first layered region and the second layered region may be positioned as outermost surfaces of the porous film.
    Type: Grant
    Filed: March 12, 2015
    Date of Patent: September 1, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Tsukasa Sugawara
  • Gas-permeable membrane
    Patent number: 10751672
    Abstract: The present invention provides a gas-permeable membrane comprising a partial structure represented by formula (I) or formula (II), (wherein R1 and R2 each independently represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyloxy group having 2 to 6 carbon atoms, an aryl group or an aryloxy group, M1, M2 and M3 each independently represents a metal atom, m1 represents an integer, n1, n2 and n3 each independently represents an integer of 1 to 3, * represents a bonding hand), a composition for forming the gas-permeable membrane and a production process of the gas-permeable membrane.
    Type: Grant
    Filed: July 11, 2017
    Date of Patent: August 25, 2020
    Assignees: NANOMEMBRANE TECHNOLOGIES, INC., TOKYO OHKA KOGYO CO., LTD.
    Inventors: Shigenori Fujikawa, Selyanchyn Roman, Takahiro Senzaki, Takuya Noguchi, Toshiyuki Ogata
  • Method of pattern formation and method of producing polysilane resin precursor
    Patent number: 10747113
    Abstract: A method of pattern formation. The method is capable of inhibiting a post-development residue from remaining on a support equipped with an electrode, and a method of producing a polysilane-polysiloxane resin precursor that is suitable for use in the method of pattern formation. The method of pattern formation includes forming a film of a silicon-containing composition on the support equipped with an electrode forming a film of a resin composition on the film of a silicon-containing composition, and forming the film of a resin composition into a pattern.
    Type: Grant
    Filed: December 27, 2017
    Date of Patent: August 18, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Dai Shiota, Hiroki Chisaka, Kunihiro Noda, Kazuya Someya
  • Energy-sensitive resin composition
    Patent number: 10696845
    Abstract: An energy-sensitive resin composition with which it is possible, even if the precursor polymer is heat-treated at low temperatures, to produce a film or molded article comprising an imide ring-containing polymer having excellent heat resistance, tensile elongation and chemical resistance with a low dielectric constant, or a film or molded article comprising an oxazole ring-containing polymer having excellent heat resistance, tensile elongation and chemical resistance. A method of manufacturing the film or molded article; a method of forming a pattern using the energy-sensitive resin composition; and a permanent film having excellent heat resistance, tensile elongation and chemical resistance.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: June 30, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Kunihiro Noda, Hiroki Chisaka, Dai Shiota
  • METHOD FOR PRODUCING POROUS FILM, METHOD FOR PRODUCING COMPOSITION FOR PRODUCING POROUS FILM, AND POROUS FILM
    Publication number: 20200199322
    Abstract: To provide a method for producing a porous film in which even when minute fine particles are used, fine particles can be satisfactorily dispersed, a method for producing a composition for producing a porous film, and a porous film that can be produced by the method for producing a porous film. When a porous film is formed using a varnish including at least one resin component selected from the group consisting of polyamide acid, polyimide, a polyamide-imide precursor, polyamide-imide and polyethersulfone, and fine particles, varnish is produced by dispersing the fine particles by using a pressure device that pressurizes slurry including the fine particles and a dispersing device provided with a flow path whose cross-sectional area is 1960 ?m2 or more and 785000 ?m2 or less, and allowing the slurry pressurized to 50 MPa or more to pass through the flow path.
    Type: Application
    Filed: December 23, 2019
    Publication date: June 25, 2020
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Tsukasa SUGAWARA
  • Silicon-containing resin composition
    Patent number: 10689514
    Abstract: A silicon-containing resin composition with which it is possible to form a silica-based coating film in which generation of cracks is minimized, a method for forming a silica-based coating film using the silicon-containing resin composition, and a crack-free silica-based coating film formed using the silicon-containing resin composition. The silicon-containing resin composition includes a silicon-containing resin and a solvent, in which one or more of siloxane resins and polysilanes is used as the silicon-containing resin, and the solvent contains a cycloalkyl acetate having a specific structure.
    Type: Grant
    Filed: July 8, 2016
    Date of Patent: June 23, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Hiroki Chisaka, Mayumi Kuroko, Kunihiro Noda, Dai Shiota
  • Brush composition, and method of producing structure containing phase-separated structure
    Patent number: 10676636
    Abstract: A method of producing a structure containing a phase-separated structure, the method including: applying a brush composition to a substrate to form a brush layer; forming a layer containing a block copolymer on the brush layer; and phase-separating the layer containing the block copolymer, the brush composition including a resin component (A), the resin component (A) containing a polymeric compound (A1) in which a first polymer block and a second polymer block are bonded to each other through a linking group containing a substrate adhering group.
    Type: Grant
    Filed: March 19, 2018
    Date of Patent: June 9, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Akiya Kawaue
  • Composition for nanoimprint, cured product, pattern forming method, and article having pattern
    Patent number: 10678129
    Abstract: A composition for nanoimprint including a cycloolefin-based copolymer; a polymerizable monomer; and a photoinitiator. The polymerizable monomer of the present invention may include a polyfunctional monomer, and the cycloolefin-based copolymer may include a constituent unit having a cyclic olefin and a constituent unit having an acyclic olefin.
    Type: Grant
    Filed: June 6, 2016
    Date of Patent: June 9, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Satoshi Shimatani
  • Deep ultraviolet LED and method for manufacturing the same
    Patent number: 10680134
    Abstract: Provided is a deep ultraviolet LED with a design wavelength ?, including a reflecting electrode layer, an ultra-thin metal layer, and a p-type contact layer that are arranged in this order from a side opposite to a substrate; and a hemispherical lens bonded to a rear surface of the substrate on a side of the p-type contact layer, the hemispherical lens being transparent to light with the wavelength ?. The refractive index of the hemispherical lens is greater than or equal to the average value of the refractive index of the substrate and the refractive index of air and is less than or equal to the refractive index of the substrate. The hemispherical lens has a radius that is greater than or equal to the radius of an inscribed circle of the substrate and is about equal to the radius of a circumscribed circle of the substrate.
    Type: Grant
    Filed: September 2, 2016
    Date of Patent: June 9, 2020
    Assignees: Marubun Corporation, Toshiba Kikai Kabushiki Kaisha, RIKEN, ULVAC, INC., Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yukio Kashima, Eriko Matsuura, Mitsunori Kokubo, Takaharu Tashiro, Hideki Hirayama, Ryuichiro Kamimura, Yamato Osada, Toshiro Morita
  • Resist composition, method of forming resist pattern, compound, and acid generator
    Patent number: 10649330
    Abstract: A resist composition including a base component which exhibits changed solubility in a developing solution under action of acid, and a compound (B1) having an anion moiety and a cation moiety and being represented by general formula (b1) (wherein R01 to R014 each independently represents a hydrogen atom or a hydrocarbon group which may have a substituent, or two or more of R01 to R014 may be mutually bonded to form a ring structure, provided that at least two of R01 to R014 are mutually bonded to form a ring structure, and at least one of R01 to R014 has an anion group, and the anion moiety as a whole forms an anion having a valency of n; n represents an integer of 1 or more; represents an integer of 1 or more; and Mm+ represents an organic cation having a valency of m).
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: May 12, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Masatoshi Arai, Takaya Maehashi, Takuya Ikeda
  • Curable composition, cured film, display panel, and method for producing cured product
    Patent number: 10640607
    Abstract: A curable composition having satisfactory curability, capable of forming a cured product having satisfactory heat resistance and adhesion to a base material, a cured film made of a cured product of the curable composition, a display panel provided with the cured film, and a method for producing a cured product using the above-mentioned curable composition. The curable composition includes a curable compound and a thermal cationic polymerization initiator, the curable compound contains a cationic polymerizable compound containing, as a main skeleton, a fused ring in which three or more rings including an aromatic ring are fused, and the thermal cationic polymerization initiator contains a quaternary ammonium salt-type compound having a specific structure.
    Type: Grant
    Filed: May 8, 2018
    Date of Patent: May 5, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Kazuya Someya, Hiroki Chisaka, Naozumi Matsumoto, Koichi Misumi, Dai Shiota
  • Resist composition and method of forming resist pattern
    Patent number: 10627717
    Abstract: A resist composition which generates an acid when exposed and whose solubility in a developer is changed by an action of an acid, the resist composition including: a base material component (A) whose solubility in a developer is changed by an action of an acid, in which the base material component (A) comprises a polymer compound (A1) having a constitutional unit (a01) represented by Formula (a0-1) and a constitutional unit (a1) which comprises an acid-decomposable group whose polarity is increased due to an action of an acid, and the constitutional unit (a1) comprises a constitutional unit containing an acid-dissociable group represented by Formula (a1-r-1) and a constitutional unit containing an acid-dissociable group represented by Formula (a1-r-2).
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: April 21, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Junichi Tsuchiya, Masafumi Fujisaki, Kotaro Endo
  • Permanent adhesive composition for image sensors, and bonding method and laminate using same
    Patent number: 10611934
    Abstract: A permanent adhesive composition for image sensors which provides an adhesive layer having excellent heat resistance and thermal shock resistance, and a bonding method and laminate using the permanent adhesive composition. The permanent adhesive composition for image sensors contains a thermosetting or photocurable resin containing a specific bifunctional (meth)acrylic acid ester-derived structural unit, a polymerizable monomer, and an antioxidant, and used to bond together a substrate and a support for the substrate. The bonding method includes bonding together a substrate and a support for the substrate using the permanent adhesive composition. The laminate is provided with a substrate, a support for the substrate, and an adhesive layer for bonding the substrate and the support together, and the adhesive layer is formed of the permanent adhesive composition.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: April 7, 2020
    Assignees: TOKYO OHKA KOGYO CO., LTD., NIPPON STEEL CHEMICAL & MATERIAL CO., LTD.
    Inventors: Tokunori Yamadaya, Hiroaki Takeuchi, Masatoshi Maeda, Kentaro Hayashi, Masayoshi Isozaki
  • Method for processing mold material and method for manufacturing structural body
    Patent number: 10607876
    Abstract: A method for processing a mold material which includes a heating step of heating a mold material layer formed of the mold material to discharge gas from the mold material constituting the mold material layer.
    Type: Grant
    Filed: May 5, 2014
    Date of Patent: March 31, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yasushi Fujii, Akihiko Nakamura, Yasumasa Iwata, Shingo Ishida
  • Resist composition and method of forming resist pattern
    Patent number: 10606174
    Abstract: A resist composition including a polymeric compound having a structural unit derived from a compound represented by general formula (a0-1), an onium salt having an anion moiety with a specific structure, and a photodecomposable base which is decomposed upon exposure and then loses the ability of controlling of acid diffusion. In formula (a0-1), Rax0 represents a polymerizable group-containing group; Wax0 represents an aromatic hydrocarbon group having a valency of (nax0+1), provided that Rax0 and Wax0 may together form a condensed ring structure; nax0 represents an integer of 1 to 3; Yax01 represents a carbonyl group or a single bond; Rax01 represents a hydrogen atom or a hydrocarbon group which may have a substituent.
    Type: Grant
    Filed: January 23, 2018
    Date of Patent: March 31, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Masahito Yahagi, Hiroto Yamazaki, Kenta Suzuki
  • Chemically amplified positive-type photosensitive resin composition
    Patent number: 10599036
    Abstract: A chemically amplified positive-type photosensitive resin composition that can be well developed with an aqueous basic solution having low pH, a substrate with a photosensitive film formed from the composition, and a method for patterned resist film formation using the composition. The composition includes an acid generator that produces an acid upon irradiation with an active ray or radiation; a resin whose solubility in alkali increases under the action of acid; and an organic solvent, in which a predetermined amount of an alkali-soluble resin soluble in an aqueous basic solution having a pH of 12 and containing alkali-soluble groups with hydrogen atoms in at least a part thereof is substituted with an acid-dissociative dissolution-controlling group contained in the resin.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: March 24, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yasushi Kuroiwa, Yasuo Masuda
  • Cleaning liquid, anticorrosion agent, and method for manufacturing the same
    Patent number: 10597609
    Abstract: A cleaning liquid and an anticorrosion agent having an excellent corrosion inhibition function, and a method for manufacturing the same. The cleaning liquid contains alkanol hydroxyamine represented by general formula (1), alkanolamine represented by general formula (2), a solvent, and a basic compound other than the alkanol hydroxyamine and the alkanolamine or an acidic compound. In the general formula (1), Ra1 and Ra2 each independently represents a C1-C10 alkyl group having one to three hydroxy groups, or a hydrogen atom, Ra1 and Ra2 are not simultaneously a hydrogen atom, and Rb1 and Rb2 are not simultaneously a hydrogen atom.
    Type: Grant
    Filed: December 27, 2017
    Date of Patent: March 24, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takumi Namiki, Takayuki Haraguchi, Yu-Geng Wu
  • HYDROGEN DETECTION ELEMENT, METHOD FOR MANUFACTURING HYDROGEN DETECTION ELEMENT, AND HYDROGEN DETECTION DEVICE
    Publication number: 20200088634
    Abstract: A hydrogen storage metal is disposed on a base material in a predetermined shape and a predetermined size such that hydrogen is detected based on surface plasmon resonance induced by incident light. The hydrogen storage metal is formed of a film body containing palladium and a noble metal. A spectrum of the light having passed through the hydrogen storage metal in which hydrogen is stored has a peak in a wavelength band separated from an absorption spectrum C1 of carbon dioxide with respect to the light and an absorption spectra H1 to H3 of water with respect to the light.
    Type: Application
    Filed: March 28, 2018
    Publication date: March 19, 2020
    Applicants: National University Corporation YOKOHAMA National University, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshiaki NISHIJIMA, Takeshi IWAI, Isao HIRANO