Abstract: A long life catalyst is provided that is conveniently and inexpensively capable of being produced and that is highly active and has inhibited metal leakage. According to aspects of the present invention, a catalyst is provided that includes: a polymer including a plurality of first structural units and a plurality of second structural units; and metal acting as a catalytic center, wherein at least part of the metal is covered with the polymer, each of the plurality of first structural units has a first atom constituting a main chain of the polymer and a first substituent group bonded to the first atom, a second atom included in each of the plurality of second structural units is bonded to the first atom, and the second atom is different from the first atom, or at least one of all substituent groups on the second atom is different from the first substituent group.

Abstract: A suitable combination of a composition for formation of a resin mold with a pattern and a composition for formation of resin to which the pattern is transferred from the resin mold is found.

Abstract: A sulfonic acid derivative, wherein the sulfonic acid derivative is represented by the following general formula (1): R1COOCH2CH2CFHCF2SO3?M+??(1) where: R1 represents a monovalent organic group having carbon number of 1 to 200, having at least one hydroxyl group and optionally having a substituent other than the hydroxyl group; and M+ represents a counter cation.

Abstract: Compositions are for formation of etch-resistant resins. Such resins are useful for manufacturing components or devices.

Abstract: A curable resin composition comprising: a fluorinated urethane(meth)acrylate represented by formula (1), wherein, R1, R2, R3 and R4 each independently represents a hydrogen atom or a methyl group, x and y each independently represents 1 or 2, and n represents an integer within the range of 1 to 10; R3 and R4 each independently represents the hydrogen atom when x and y are both 1; R3 represents the hydrogen atom and R4 represents the methyl group when x is 1 and y is 2; R3 represents the methyl group and R4 represents the hydrogen atom when x is 2 and y is 1; and R3 and R4 each independently represents the methyl group when x and y are both 2.

Abstract: Synthesis of organic compounds that has chirality is an important technique in the fields of pharmaceuticals, agrichemicals, health foods and the like. However, raw materials of a catalyst used for the synthesis of such compounds are expensive, and the synthesis needs many steps, so that it is difficult to reduce the cost. Linking a catalyst center to a polymer chain or a resin through an organic group enables to use the catalyst repeatedly and produce a chiral compound at low cost.

Abstract: A liquid crystal display device includes a substrate; a liquid crystal layer containing a liquid crystal material; and a first layer formed on the substrate, the first layer being configured to control the alignment of liquid crystal molecules, the first layer being placed between the substrate and the liquid crystal layer, and being formed by polymerization of two or more kinds of radical polymerizable monomers in the liquid crystal layer.

Abstract: An object of the present invention is to provide a polymer used for a resist composition having high absorption efficiency for a particle beam or an electromagnetic wave, and excellence in sensitivity, resolution and pattern performance characteristics, and provide a resist composition containing the polymer and a method of manufacturing a device using thereof. The polymer comprises: a unit A; and a unit B, wherein the unit A has an onium salt structure and generates a first radical by irradiation with a particle beam or an electromagnetic wave, the unit B has a radical generating structure containing at least one multiple bond which is between a carbon atom and a carbon atom or between a carbon atom and a heteroatom, and generates a second radical by irradiation with a particle beam or an electromagnetic wave, and the multiple bond is not one contained in a benzenoid aromatic.

Abstract: An aspect of the present invention provides a monomer from which a polymer layer capable of keeping high display quality even in high temperature and high humidity environments can be formed. The monomer in an aspect of the present invention is a compound represented by P-Sp1-Z2-A1-(Z1-A2)n1-Z3-Sp2-P: in the formula, P denotes the same or different radical polymerizable group; and at least one of Z1, Z2, and Z3 denotes —NRCO— or —CONR— group.

Abstract: A method for manufacturing a device including a substrate and a second film disposed above the substrate includes: forming a first film above the substrate using a composition containing a polymerizable monomer and an oxidation inhibitor; and forming the second film by curing the first film in a state where at least one part of a mold having a convexo-concave pattern is in contact with the first film, or after at least one part of the mold is brought into contact with the first film. The oxidation inhibitor is at least one of a hindered amine compound and a hindered phenol compound having a molecular weight of 700 or more. The composition satisfies a relationship of (t0(T)-tx(T))/t0(T)×100?13.0. (t0(T) is a height of a convex part of cured film obtained by the specific method, and tx(T) is the corresponding height after heating at 260° C.

Abstract: A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed.

Abstract: A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed.

Abstract: A sulfonic acid derivative, wherein the sulfonic acid derivative is represented by the following general formula (1): R1COOCH2CH2CFHCF2SO3?M+??(1) where: R1 represents a monovalent organic group having carbon number of 1 to 200, having at least one hydroxyl group and optionally having a substituent other than the hydroxyl group; and M+ represents a counter cation.

Abstract: A method for manufacturing a polymer of which structure is exactly controlled is disclosed.

Abstract: Described is a resinous structure derived from fluorine-containing polymers useful as a mold having excellent dimensional stability.

Abstract: A long life catalyst is provided that is conveniently and inexpensively capable of being produced and that is highly active and has inhibited metal leakage. According to aspects of the present invention, a catalyst is provided that includes: a polymer including a plurality of first structural units and a plurality of second structural units; and metal acting as a catalytic center, wherein at least part of the metal is covered with the polymer, each of the plurality of first structural units has a first atom constituting a main chain of the polymer and a first substituent group bonded to the first atom, a second atom included in each of the plurality of second structural units is bonded to the first atom, and the second atom is different from the first atom, or at least one of all substituent groups on the second atom is different from the first substituent group.

Abstract: The present invention provides a liquid crystal composition for forming a polymer layer capable of keeping high voltage holding ratio. The liquid crystal composition in an aspect of the present invention contains a liquid crystal material and one or more kind monomers and, at least one of the monomers is a compound produced by further bonding a hydrocarbon group with 12 carbon atoms or more to a compound produced by bonding two polymerizable groups to a cyclic aliphatic compound or aromatic compound with 6 carbon atoms or more.

Abstract: Sulfonic acid derivatives of general formula RCOOCH2CH2CFHCF2SO3-M+ are provided, wherein R represents a substituted or unsubstituted C1-30 linear, branched, or cyclic hydrocarbon group, or a substituted or unsubstituted C6-30 aryl group, and M+ represents a counter cation. Photoacid generators and photoresists containing such sulfonic acid derivatives are also provided.

Abstract: A transverse field liquid crystal device that is capable of restraining an increase in a pretilt angle of a liquid crystal material due to formation of a polymer layer and a manufacturing method thereof are provided. According to embodiments of the present invention, a method of manufacturing a transverse field liquid crystal device includes: forming a liquid crystal composition layer above a substrate using a liquid crystal composition including a liquid crystal material and a radically polymerizable monomer; and forming a polymer layer by irradiating the liquid crystal composition layer with light and polymerizing the radically polymerizable monomer, wherein the radically polymerizable monomer includes a compound A represented by a chemical formula (1) and a compound B represented by a chemical formula (2).

Abstract: Acid generators and compositions are disclosed. Such acid generators and compositions are applicable to functional materials such as adhesives, sealant or antireflection coating (ARC).