Abstract: Apparatus for measuring angular changes in the direction of travel of a light beam comprising at least one beam shearing assembly for separating, preferably orthogonally polarized, components of the light beam and introducing a lateral shear between them. An analyzer operates on the components to provide them with a common polarization state. A lens focuses the commonly polarized components of the light beam to a spot in a detector plane, and a detector operates to generate an electrical signal having a phase that varies in accordance with the angular change of the light beam in at least one plane. Electronic means receive the electrical signal, determines the phase therefrom, and converts the phase to the angular change in the direction of travel of the light beam.

Abstract: A system and method for measuring optical characteristics of an optical device under test (DUT) is provided. The system includes a light source for generating an optical signal applied to the optical DUT. A reference interferometer and a test interferometer are optically coupled to the light source. A computing unit is coupled to the interferometers, and utilizes amplitude and phase computing components, such as orthogonal filters, in determining optical characteristics of the optical DUT.

Abstract: A wavemeter (30) comprises a first wavelength determination unit (40) having a substantially periodic wavelength dependency and being adapted for providing a reference wavelength dependency (100) over a reference wavelength range. A second wavelength determination unit (50) has a substantially periodic wavelength dependency and is adapted for providing a second wavelength dependency (140) over a second wavelength range (120). An evaluation unit (60) compares the second wavelength dependency (140) with the reference wavelength dependency (100) for adjusting (160) the second wavelength dependency (140) in wavelength.

Abstract: An interferometric surface profiler implements a lenslet array to accommodate a large field of view (FOV) without a corresponding loss in light efficiency. Using the lenslet array, the optical surface profiler multiplexes the measurement of an interference phase over multiple spots on a measurement surface, with each spot corresponding to an element of the lenslet array. The FOV of the profiler corresponds to the area of the measurement surface spanned by the spots, and each lenslet element provides a large numerical aperture for each spot, thereby improving light efficiency. The large FOV and increased light efficiency are useful in scanning white light interferometry, as well as other types of interferometric analysis of surface form and roughness such as phase shifting interferometry.

Abstract: A Mach-Zehnder interferometer having two optical couplers interconnected by two optical fibers at least one of which is temperature insensitive. In use, temperature induced changes in the geometrical length and refractive index of the temperature insensitive fibers offset each other so that the optical path length of the fiber is unaffected by the temperature change. Where two temperature insensitive fibers are included these may be of the same or of different lengths. The interferometer may be used in a Dense Wavelength Division Multiplex system.

Abstract: The invention proposes a novel technique for implementing high performance atomic lithography, and in particular high resolution lithography. The technique makes use of Stern-Gerlach type atomic interferometry enabling disturbances to be implemented in the atomic phase of the beam. Such interaction then directly modulates the intensity of the associated wave in the plane extending transversely to the beam of atoms, and does so in controllable manner. The installation of the invention for nanolithography by atomic interferometry comprises a Stern-Gerlach type interferometer comprising, as its phase object, four-pole magnetic induction having a transverse gradient created by four parallel bars carrying alternating direct currents, bracketed between two separator plates, preceded and followed respectively by a spin polarizer and by an analyzer operating by laser pumping.

Abstract: The invention features a system and method for reducing the contribution of cyclic errors to an interferometric position measurement of a movable stage. An initial interferometric position measurement of the stage is averaged with at least one additional measurement corresponding to a displacement(s) of the stage from its initial position. The displacements are selected to reduce the overall cyclic error contribution to an average position measurement. As a result, the average position of the stage can be measured more accurately than any of its individual positions. The average position can be used to more accurately determine the average position of an alignment mark on a wafer carried by the stage. Furthermore, the averaging described above can be applied to additional interferometric measurement axes.

Abstract: A method and device for measuring the current in a conductor are presented. They utilize the Faraday effect on counter-propagating circularly polarized beams of light in a fiber optic coil. The light beams are transformed to and from circular polarization by a polarization transformer comprised of a birefringent fiber with a twist through an appropriate angle at an appropriate distance from one end.

Abstract: A system and method are provided for obtaining mapping profiles of transparent objects having a plurality of reflective surfaces. The object, the surfaces of which are to be mapped, is placed in an unequal path interferometer including a reference surface located a predetermined distance from the object. Coherent light is supplied in the interferometer from a tunable source; and multiple optical interferograms for each of the plurality of reflective surfaces are simultaneously recorded. These interferograms are simultaneously extracted through the use of a dynamically generated weighted least-square fitting technique; which separates interferograms from a set of superimposed interferograms to obtain a given interferogram for any one of the surfaces, free from errors resulting from the existence of the other interferograms.

Abstract: An apparatus and a method are provided which allow two opposite plane surfaces of a body to be interferometrically measured simultaneously using light from a single light source. From a parallel light beam (P) produced by a light source (1) partial light beams (A, B) having positive and negative diffraction angles are produced using a beam splitter (8) in the form of a diffraction grating. The partial light beams strike the respective surfaces (90, 91) of the body (9) to be measured and are reflected thereat. The reflected partial light beams (A, B) are interfered with the throughgoing partial light beam (P) having an order of diffraction of zero and the thus produced interference patterns are digitized and subtracted from each other, whereby the parallelism of both surfaces (90, 91) of the body can be determined.

Abstract: There are disclosed a wavelength monitoring device of tunable laser sources and a method thereof. A Fabry-Perot etalon is provided to detect the wavelength drift, and furthermore, a Fabry-Perot laser diode or a light emitting diode is provided to recognize the channel of the wavelength. The wavelength drift is used to determine the junction voltage of each corresponding channel in advance. Then, the actually detected junction voltage of the diode is used to determine the channel of the wavelength, thereby accurately detecting the actual channel wavelength.

Abstract: A scanning spot microscope for performing a Fourier spectral analysis has means for performing a repeatable scanning operation which includes scanning an incident light spot to successive locations of a specimen. An interferometer is placed across an optical light path of the microscope, the interferometer including a birefringent device between polarizing devices in the path and introducing a given path difference. Means are provided for receiving and recording an optical signal due to the incident light spot from each successive specimen location. In use the given path difference is maintained during each scanning operation but is varied between scanning operations so that the optical signals relating to these specimen locations and the values of the given path difference can be recorded.

Abstract: The present invention relates to an apparatus and a method for optical coherence reflectometry, in particular for optical coherence tomography. The invention particularly relates to the route of the light field in the sample arm. The reflected light field in the sample arm is amplified before being received by a combining means, said combining means being capable of receiving the reflected light field from the sample arm as well as the second reflected light field from the reference arm. Thereby, it is possible to direct substantially all light energy in the sample arm to the combining means, and to obtain fully the utilisation of the amplification of the reflected light field since preferably only the reflected light field is amplified by the optical amplifier. This leads to an improved signal-to-noise ratio (SNR) whereby an increase of the maximal penetration depth is obtained.

Abstract: The invention relates to polymeric/semiconductor thin film strain gauges comprising visible light from spectrometer (10) which is directed onto a thin film passive sensor (12) having a transparent glass substrate (14) and a laminated construction in succession from the substrate (14), of a polyimide layer(18a) a polysiloxane layer (16a) filled with alumina particles, a polyimide layer (18b) and a polysiloxane layer (16b) filled with alumina particles.

Abstract: The present invention consists of a technique and device for measuring the thickness variation and shape of wafers or other polished opaque plates. A combination of two improved phase-shifting Fizeau interferometers is used to simultaneously measure the single-sided distance maps between each side of the wafer and the corresponding reference flat, with the thickness variation and shape being calculated from these data. Provisions are made to determine and eliminate the shape and tilt of the reference surfaces, and also to facilitate the correct overlay of the two single-sided measurements for the calculation of thickness variation and shape.

Abstract: Beam shear can be reduced in an interferometric system by conditioning an input beam prior to directing the input beam to an interferometer. Accordingly, apparatus and methods for conditioning an interferometer input beam are disclosed.

Abstract: The present invention relates to systems and methods of field-based light scattering spectroscopy. These systems and methods provide for the diagnosis of tissue by measuring the size and distribution of cellular characteristics. Field based measurements provide phase information resulting from the interaction of scatterers within the material and the incident wavefront. These measurements can be used to provide three dimensional images of tissue.

Abstract: There is provided an interferometer for measuring a surface shape of an optical element using interference, including a reference wave-front deformation system for deforming a wave front of reference light.

Abstract: The glucose concentration in the bloodstream is directly correlated to the concentration of glucose in the aqueous humor. Furthermore, variation in the glucose concentration in the aqueous humor will cause like variations in its index of refraction. Thus, by measuring the refractive index of the aqueous humor, the glucose concentration in the blood can be determined. The refractive index of the aqueous humor can be measured by interferometry. In various embodiments of the invention that employ interferometry, two beams may be directed onto the eye and caused to interfere, thereby producing a fringe pattern. The fringe pattern may be analyzed to determine the index of refraction of the aqueous humor in the eye and the glucose concentration therein. The glucose level in the blood can be ascertained from this information.

Abstract: An inspection system calibration method includes producing two sideband signals of a first wavefront; interfering the two sideband signals in a photorefractive material, producing an output signal therefrom having a frequency and a magnitude; and producing a phase modulated operational signal having a frequency different from the output signal frequency, a magnitude, and a phase modulation amplitude. The method includes determining a ratio of the operational signal magnitude to the output signal magnitude, determining a ratio of a 1st order Bessel function of the operational signal phase modulation amplitude to a 0th order Bessel function of the operational signal phase modulation amplitude, and comparing the magnitude ratio to the Bessel function ratio.