Abstract: An electron microscope is provided, which enables an observation with high resolution. The electron microscope is able to detect the deviation of an electron beam relative to the opening of a slit quantitatively, thereby shifting the electron beam accurately to the center of the opening of slit so as to execute energy selection. The electron microscope has an energy filter control unit for adjusting a relative position between an electron beam and a slit by shifting the position of electron beam based on a signal delivered by an energy filter electron beam detector. Also a method for controlling an energy filter is provided, which includes the steps of shifting the position of an electron beam, determining the position of electron beam and letting the electron beam pass through the center of an opening of the slit by controlling the position of slit or position of electron beam.

Abstract: An ion implanting apparatus of has a wafer cassette capable of loading a plurality of wafers, an implanting chamber including an implanting base, a cassette-transferring module for moving the wafer cassette, and a wafer-transferring module for moving the wafer from the wafer cassette to the implanting base. The wafer cassette has a plurality of irradiation trays for loading the wafer, while the implanting base has a guiding slot for guiding the irradiation tray. The cassette-transferring module includes a rack positioned on the wafer cassette, a gear for moving the wafer cassette by driving the rack through rotating, and a first stepping motor for driving the gear. The wafer-transferring module has a push plate for moving the irradiation tray from the wafer cassette to the implanting base, and a second stepping motor for driving the push plate.

Abstract: An electron beam exposure apparatus for exposing a wafer by an electron beam incorporates a circuit structure for conducting a scan test to self-diagnose the electrical connections. The electron beam exposure apparatus includes: an electron beam generating section for generating the electron beam; a plurality of deflectors for deflecting the corresponding electron beams; a deflection control section for outputting a deflection control signal for causing the deflector to deflect the electron beam; and a control signal storage section for storing a value of the deflection control signal output from the deflection control section. The control signal storage section connects the plurality of deflectors in series when conducting the scan test. The control signal storage section and the deflector may be monolithically integrated on a semiconductor substrate.

Abstract: First embodiment: an article is conveyed in a first direction at different speeds at different positions on the article in a second direction substantially perpendicular to the first direction. For example, when the article is conveyed in a rotary direction, the positions on the radially outer side of the article rotate at higher speeds than the positions at the radially inner side of the article. Radiant energy directed against the conveyed article is scanned on a cyclic basis in the second direction between the radially inner and outer sides of the article. During the scanning, the intensity of the radiant energy is varied at each position in the second direction to direct a constant intensity of radiant energy against the article at every position in the article. Second embodiment: the article scanning in the second direction is varied according to the article characteristics (e.g. thickness) in the second direction.

Abstract: A miniaturized terahertz radiation source based on the Smith-Purcell effect is provided, in which, from a focused electron source, a high-energy bundle of electrons is transmitted at a defined distance over a reflection diffraction grating composed of transversely disposed grating rods, so that, in response to oscillating image charges, electromagnetic waves of one wavelength are emitted, the wavelength being adjustable as a function of the periodicity of the lines and of the electron velocity. The elements of the radiation source, such as field emitter (1), electrostatic lens (4), beam deflector (5), grating (7) of metal, and a second anode (8), are integrated on a semiconductor chip using additive nanolithographic methods. The field electron source is constructed to project, as a wire, out of the surface, using additive nanolithography, and is made of readily conductive material having stabilizing series resistance.

Abstract: The invention solves the problem of artifact ghost peaks which can sometimes arise in mass spectrometers that employ a quadrupole rod set for both trapping and mass analyzing the trapped ions. The problem arises as a result of randomly distributed voltage gradients along the length of the rods. Three solutions are presented. The first approach involves improving the conduction characteristics of the rod sets. The second approach involves the application of at least one continuous axial DC field to the trapping quadrupole rod set in order to urge ions towards a pre-determined region of the trap, thereby avoiding voltage gradients. The third approach involves the application of one or more discrete axial fields to create one or more potential barriers along the axial dimension of the trap (in addition to the barriers used to initially trap the ions). These barriers prevent ions of differing voltage gradients from equilibrating with one another.

Abstract: A mass spectrometer is disclosed wherein ions having a particular desired charge state are selected by operating an ion mobility spectrometer in combination with a quadrupole mass filter. Precursor ions are fragmented or reacted to form product ions in a collision cell ion trap and sent back upstream to an upstream ion trap. The fragment or product ions are then passed through the ion mobility spectrometer wherein they become temporally separated according to their ion mobility. Fragment or product ions are then re-trapped in the collision cell ion trap before being released therefrom in packets. A pusher electrode of a time of flight mass analyzer is energized a predetermined period of time after a packet of ions is released from the collision cell ion trap. Accordingly, it is possible to select multiply charged precursor ions from a background of singly charged ions, fragment them, and mass analyze the fragment ions with a near 100% duty cycle across the whole mass range.

Abstract: An actuator has a pair of electromagnets and a curved magnetic member that is magnetically coupled to the electromagnets. The magnetic force acting on the curved magnetic member has less of a tendency to induce torque to the table than a straight magnetic member, because the geometry of the magnetic force between the curved magnetic member and electromagnets remain relatively unchanged over the permitted range of movement of the magnetic member.

Abstract: The ion activity-measuring device of the present invention is provided with a hydrophobic bridge of which portion contacting with a liquid reservoir is hydrophilic. The hydrophobic bridge is made of, for example, at least one selected from the group consisting of polyester, nylon, polypropylene, rayon and polyethylene, and is produced by treating a portion contacting with the liquid reservoir with a spreading accelerator. The spreading accelerator is at least one selected from the group consisting of a surfactant and a hydrophilic polymer. There is also provided a method for producing the above ion activity-measuring device, comprising embedding nonwoven fabric in the cover plate to bond the nonwoven fabric to the cover plate.

Abstract: Polymeric article irradiation apparatus comprising a radiation source and a carousel, the carousel including drive means and a plurality of carriers for polymeric articles, each carrier being mounted on the carousel and adapted to rotate about a respective axis, wherein the drive means is adapted to cause the carousel to rotate about a central axis in use and further adapted to cause each carrier to rotate about said respective axis during rotation of the carousel about said central axis.

Abstract: A standard test device used for testing a hole of a semiconductor device includes a dummy film on a base surface, and an insulating layer which has an opening penetrating through the insulating layer, so that a part of a top surface of the dummy film is shown through the opening, wherein the dummy film has a predetermined constant thickness around the opening. The standard test device makes it easily possible to measure a thickness of a residual film on the bottom or the contact hole.

Abstract: An infrared light unit for a motor vehicle includes a light source, a reflector having two focal regions and a lens. The light source is in one of the focal regions and produces a pool of reflected light in the other focal region, and the lens converts this pool of light into a beam projected on the road. The light unit includes, between the reflector and the lens, a filter which is opaque to visible light and transparent to infrared light, and which is movable between a position out of the path of light going from the reflector to the lens, and an active position in which all or most of the light going from the reflector to the lens passes through the filter.

Abstract: A dielectric film is provided which includes a base layer and a capping layer, preferably silicon oxynitride, wherein the film is an effective moisture and ion barrier when disposed between a conductive substrate and a liquid having an electrical potential different than the electrical potential of the substrate.

Abstract: An apparatus configured to control a magnetic field strength of a magnetic lens is provided. The apparatus may include a magnetic sensor configured to generate an output signal responsive to a first magnetic field strength of the magnetic lens. The apparatus may also include a control circuit coupled to the magnetic sensor and the magnetic sensor. The control circuit may be configured to receive the output signal from the magnetic lens and to receive an input signal responsive to a predetermined magnetic field strength. The control circuit may be further configured to generate a control signal responsive to the output signal and the input signal. Additionally, the control circuit may be configured to apply a current to the magnetic lens such that a second magnetic field strength may be generated within the magnetic lens closer to the predetermined magnetic field strength than the first magnetic strength.

Abstract: Ion implantation systems and beam containment apparatus therefor are provided in which a photoelectron source and a photon source are provided along a beam path. The photon source, such as a UV lamp, provides photons to a photoemissive material of the photoelectron source to generate photoelectrons for enhanced beam containment in the ion implantation system.

Abstract: In relatively thick samples for electron microscopy imaging, details of interest are often located in the bulk of the sample, so that they cannot be directly imaged in the form of a SEM image. According to the invention, so as to expose the cross-section containing the details of interest, the frozen sample is subjected to ion milling, in such a manner that the desired cross-section is exposed. Thereafter, the exposed cross-section is further eroded in a controlled manner via sublimation, whereby the detail of interest is approached in a very accurate manner, and its fine details become visible. Hereafter, the finally desired SEM image can be made. By repetition of this process, a large number of successive cross-sections can be imaged, so that a spatial representation of the sample is obtained.

Abstract: A method for correcting drifts in beam irradiation position in a focused ion beam apparatus is disclosed. A linear line pattern is formed on a sample by linearly irradiating a focused ion beam at a location removed from a processing region where a cross section is to be formed in the sample. The linear line pattern extends in a direction in parallel with a surface of the cross section to be formed. By referring to the linear line pattern while a specified section of the sample is processed, the beam irradiation position of the focused ion beam with respect to the linear line pattern is measured in a direction perpendicular to the linear line pattern to detect a drift in the beam irradiation position of the focused ion beam in the direction perpendicular to the linear line pattern. The beam irradiation position of the focused ion beam is corrected based on the drift detected with respect to the processing region.

Abstract: One embodiment disclosed relates to an apparatus for inspecting a substrate. The apparatus includes at least an illumination system, a stage, a multiple-pixel detector, an imaging system, a deflector, and a deflector controller. The illumination system is configured to expose at least a portion of the substrate to an incident beam which causes said portion to emit radiation. The stage holds the substrate and moves the substrate relative to the beam during said exposure of the substrate. The imaging system images the emitted radiation onto the multi-pixel detector, which includes an array of detector elements configured to detect the emitted radiation. The deflector is configured to deflect the emitted radiation under control of the deflector controller. The deflection is controlled so as to compensate for the motion of the substrate relative to the beam.

Abstract: A method produces a three-dimensional macro-molecular structure on a substrate in a vacuum. In this method, a solution of a solvent and a macro-molecular species is provided. The solution is ionized to provide ionized molecules of the solvent and molecules of the macro-molecular species. The ionized molecules of the solvent have a first electrical charge and the molecules of the macro-molecular species have a second electrical charge equivalent to the first electrical charge. As such, the ionized molecules of the solvent and the molecules of the macro-molecular species naturally repel each other. The molecules of the macro-molecular species are deposited on the substrate in the vacuum to produce the three-dimensional macro-molecular structure.

Abstract: An indirectly heated button cathode for use in the ion source of an ion implanter has a button member formed of a slug piece mounted in a collar piece. The slug piece is thermally insulated from the collar piece to enable it to operate at a higher temperature so that electron emission is enhanced and concentrated over the surface of the slug piece. The slug piece and collar piece can be both of tungsten. Instead the slug piece may be of tantalum to provide a lower thermionic work function. The resultant concentrated plasma in the ion source is effective to enhance the production of higher charge state ions, particularly P+++ for subsequent acceleration for high energy implantation.