Abstract: CVD Alumina coating has been one of the most important materials for wear resistant application for many years. Recently, texture control in ?-Al2O3 has attracted increasing attention due to the possibility to further improve the anisotropic properties such as thermal conductivity and mechanical properties. The influence of process parameters on textures is complex. In the present application, the influence of nucleation surface condition and H2S on the texture in CVD ?-Al2O3 coatings has been investigated. It has been shown that without the addition of H2S, the crystal orientation in the Al2O3 coatings is primarily dominated by the nucleation surface condition, whereas the effect of reactant composition on texture is minimal. On the other hand, in the presence of H2S during growth, reactant composition also plays an important role in affecting the crystal orientation. This effect is likely due to the strong interaction between the Al2O3 surface and the H2S.

Abstract: A coated cutting tool, comprising: a substrate; and a coating layer formed on the substrate, wherein the coating layer includes a lower part layer and an upper part layer formed on the lower part layer, the lower part layer has an average thickness of 2.0 ?m or more and 15.0 ?m or less, and is formed of a Ti oxycarbonitride layer including a compound having a composition represented by formula (1) below: Ti(C1-x-yNxOy)??(1) (where, x denotes an atomic ratio of an N element based on a total of a C element, the N element, and an O element, y denotes an atomic ratio of the O element based on a total of the C element, the N element, and the O element, and 0.35?x?0.60 and 0.01?y?0.10 are satisfied), a FWHM of a rocking curve of a plane (4,2,2) of the lower part layer, which is obtained through X-ray diffraction, is 20° or less, the upper part layer is formed of an ?-aluminum oxide layer having an average thickness of 1.0 ?m or more and 15.

Abstract: An article includes a monolithic substrate and a coating on the monolithic substrate. The monolithic substrate is selected from graphite, silicon carbide, silicon carbide nitride, silicon nitride carbide, and silicon nitride. The coating has a free, exposed surface and includes a compound of aluminum (Al), boron (B) and nitrogen (N) in a continuous chemically bonded network having Al—N bonds and B—N bonds. The compound includes an atom of nitrogen covalently bonded to an atom of boron and an atom of aluminum, and the compound has a composition BxAl(1-x)N, where x is 0.001 to 0.999.

Abstract: The present disclosure relates to a coated substrate having a hard material coating, which comprises a hard carbon layer of the hydrogen-free amorphous carbon layer type, wherein the coating comprises a layer consisting of zirconium between the substrate and the hydrogen-free amorphous carbon layer; wherein between the layer consisting of zirconium and the hydrogen-free amorphous carbon layer, a layer consisting of Zr—Cx can be formed in which a zirconium monocarbide is formed; and the layer consisting of Zr—Cx and comprising zirconium monocarbide is applied directly to the adhesive layer consisting of zirconium.

Abstract: In one aspect, articles are described comprising wear resistant coatings employing one or more composite refractory layers. For example, a coated article described herein comprises a substrate and a coating deposited by CVD adhered to the substrate, the coating including a multiphase refractory layer comprising an alumina phase and a zirconia phase, wherein the zirconia phase has a texture coefficient for the (200) growth direction, TC(200), greater than 4.

Abstract: A method for producing a coating on a substrate, wherein the coating includes a PVD layer (A), deposited by cathodic arc evaporation, being a compound of the formula MexSiyAlzCaNbOc, wherein Me is one or more metals of groups 4, 5 and 6 in the IUPAC periodic table of elements. The PVD layer (A) is deposited by applying a pulsed bias voltage of from about ?40 to about ?450 V to the substrate and using a duty cycle of less than about 12% and a pulsed bias frequency of less than about 10 kHz. A coated cutting tool having a substrate and a coating is also disclosed, wherein the coating includes the PVD layer (A) with the compound of the formula MexSiyAlzCaNbOc. The PVD layer (A) is crystalline having a FWHM (Full Width at Half Maximum) value for the cubic (111) peak in X-ray diffraction of ?0.3 degrees (2theta).

Abstract: The invention relates to building products that contain graphene and/or graphene oxide in the bulk component thereof. The addition of graphene and/or graphene oxide improves the mechanical properties of said building products, particularly in terms of strength.

Abstract: A cutting tool in an embodiment includes a base member composed of cemented carbide and a coating layer located on a surface of the base member. The coating layer includes a first layer which is in contact with the base member and contains Ti(CxN1-x) (0?x?1). A KAM average value of WC particles in a region extending to a depth of 5 ?m from the surface of the base member is 1° or less, which is measured by electron backscatter diffraction (EBSD) method using a scanning electron microscope with an electron backscatter diffraction imaging system.

Abstract: A method for the pretreatment of a friction lining, in particular a dry clutch friction lining, comprising carbon compounds, includes modifying an effective surface of the friction lining by laser radiation in such a way that an oxidation layer containing carbon compounds is created. The pretreatment may be effected by means of laser radiation after hardening of the friction lining. The effective surface may be partially conditioned by means of laser radiation.

Abstract: A method of manufacturing a diamond substrate includes: forming an ion implantation layer at a side of a main surface of a diamond seed substrate by implanting ions into the main surface of the diamond seed substrate; producing a diamond structure by growing a diamond growth layer by a vapor phase synthesis method on the main surface of the diamond seed substrate, after implanting the ions; and performing heat treatment on the diamond structure. The performed heat treatment causes the diamond structure to be separated along the ion implantation layer into a first structure including the diamond seed substrate and failing to include the diamond growth layer, and a diamond substrate including the diamond growth layer. Thus, the method of manufacturing a diamond substrate is provided that enables a diamond substrate with a large area to be manufactured in a short time and at a low cost.

Abstract: A coated cutting tool, comprising: a substrate made of a cubic boron nitride-containing sintered body; and a coating layer formed on the substrate, wherein the cubic boron nitride-containing sintered body includes 65 volume % or more and 85 volume % or less of cubic boron nitride, and 15 volume % or more and 35 volume % or less of a binder phase; the cubic boron nitride is in a form of particles, the particles having an average particle size from 1.5 ?m or more to 4.0 ?m or less; the coating layer includes a lower layer, and an upper layer formed on the lower layer; the lower layer contains particles each having a composition represented by (Ti1-xAlx)N; the lower layer has an average thickness from 0.1 ?m or more to 1.0 ?m or less; the particles forming the lower layer have an average particle size from 0.01 ?m or more to 0.05 ?m or less; the upper layer contains particles each having a composition represented by (Ti1-yAly)(C1-zNz); and the upper layer has an average thickness from 1.0 ?m or more to 5.

Abstract: An optical component according to an embodiment of the present invention includes a translucent substrate, one or more intermediate layers stacked on at least one of an incident surface and an exit surface of the substrate, and a surface layer stacked on an outermost layer of the one or more intermediate layers, the surface layer containing diamond-like carbon as a main component. At least one intermediate layer among the one or more intermediate layers contains silicon as a main component, and the intermediate layer containing silicon as a main component has an oxygen content of 10 atomic % or less.

Abstract: In one aspect, coated cutting tools are described herein comprising a substrate and a coating comprising a refractory layer deposited by physical vapor deposition adhered to the substrate, the refractory layer comprising M1?xAlxN wherein x?0.68 and M is titanium, chromium or zirconium, the refractory layer including a cubic crystalline phase and having hardness of at least 25 GPa.

Abstract: A coated cutting tool comprising a substrate and a coating layer formed on the substrate, wherein: the coating layer has an alternating laminate structure of an alternating laminate of: a first composite nitride layer containing a compound having a composition represented by formula (1) below: (Al1-xCrx)N??(1) ?(wherein x denotes an atomic ratio of the Cr element based on a total of the Al element and the Cr element and satisfies 0.10?x?0.50); and a second composite nitride layer containing a compound having a composition represented by formula (2) below: (Ti1-ySiy)N??(2) ?(wherein y denotes an atomic ratio of the Si element based on a total of the Ti element and the Si element and satisfies 0.00<y<1.

Abstract: A coating for a diamond table of a cutting element is described. The coating is employed to fill a plurality of voids left by the manufacturing process that compromise the integrity of the cutting element and the associated downhole tooling. The coating may comprise diamond nanoparticles in a metal matrix and may be used with or without a binder layer applied directly to the diamond table, the coating may alternatively be a pure diamond film coating, and may be employed to fill voids left by the manufacturing process.

Abstract: A tool having a cutting edge that includes a sintered body containing cubic boron nitride. The sintered body integrally and inseparably includes an inner region and a binder phase enriched layer formed on at least part of a surface of the inner region. The inner region includes: 15-90 volume % of cubic boron nitride; and 10-85 volume % of a mixture of a binder phase and impurities. The binder phase enriched layer includes: 90-100 volume % of the binder phase and impurities mixture; and 0-10 volume % of cubic boron nitride; and the binder phase contains at least one kind selected from the group consisting of: at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Al, Co, Ni and Si; and a compound of the element and at least one element selected from the group consisting of C, N, O and B.

Abstract: The present disclosure relates to a coated substrate with a coating deposited on at least a part of the substrate surface, said coating comprising at least one metal boron carbide layer, characterized in that the metal boron carbide layer is a ternary compound exhibiting a polycrystalline structure formed of a single phase of hafnium, boron and carbon. Further a method for deposition of such a coating is provided.

Abstract: The present invention is directed to compositions for photolithographic masks comprising a substrate and a coating having at least one electrical conducting layer comprising a nitride, a boride or a carbide, and methods of making the same.

Abstract: A titanium aluminum nitride coating having a columnar crystal structure, which is formed on a substrate, comprises high-Al TiAlN having an fcc structure, which has a composition represented by (Tix1, Aly1)N, wherein x1 and y1 are numbers meeting x1=0.005-0.1, and y1=0.995-0.9 by atomic ratio, and network-like, high-Ti TiAlN having an fcc structure, which has a composition represented by (Tix2, Aly2)N, wherein x2 and y2 are numbers meeting x2=0.5-0.9, and y2=0.5-0.1 by atomic ratio; the high-Al TiAlN being surrounded by the network-like, high-Ti TiAlN.

Abstract: Disclosed herein is a transparent glass system that includes an optical grade silicon substrate, and a nanocrystalline diamond film on the silicon substrate, the diamond film deposited using a chemical vapor deposition system having a reactor in which methane, hydrogen and argon source gases are added. Further disclosed is a method of fabricating transparent glass that includes the steps of seeding an optical grade silicon substrate and forming a nanocrystalline diamond film on the silicon substrate using a chemical vapor deposition system having a reactor in which methane, hydrogen and argon source gases are added.