Abstract: Enhanced Coulomb repulsion (electron) screening around light element nuclei is achieved by way of utilizing target structures (e.g., nanoparticles) that undergo plasmon oscillation when subjected to electromagnetic (EM) radiation, whereby transient high density electron clouds are produced in localized regions of the target structures during each plasmon oscillation cycle. Each target structure includes an integral body composed of an electrically conductive material that contains light element atoms (e.g., metal hydrides, metal deuterides or metal tritides). The integral body is also configured (i.e., shaped/sized) to undergo plasmon oscillations in response to the applied EM radiation such that the transient high density electron clouds are formed during each plasmon oscillation cycle, whereby brief but significantly elevated charge density variations are generated around light element (e.g.

Abstract: A light emitting device package including a package body including a first cavity and a second cavity, a pad disposed on a bottom surface of the first cavity, a light emitting device disposed on the second cavity electrically connected to the pad, a heat dissipation member inserted into the package body, the heat dissipation member including a body and expanded portions disposed at a partial edge region of the body and electrode patterns disposed at the package body, wherein the package body has an upper portion and a lower portion disposed under the upper portion, wherein the first cavity including side surfaces and a bottom surface, wherein the second cavity provided in the bottom surface of the first cavity.

Abstract: A method for generating electromagnetic radiation, including the steps of: providing a series of adjacent electrode pairs arranged on a common dielectric substrate, the electrodes of each electrode pair substantially aligned on opposite sides of the common dielectric substrate; energizing a first electrode pair in the series of electrode pairs at an energizing time to produce a volume polarization distribution pattern within the common dielectric substrate; energizing a next adjacent electrode pair in the series of adjacent electrode pairs at a next energizing time to produce a variation of the volume polarization distribution pattern within the common dielectric substrate, the center of the next adjacent electrode pair located a distance from the center of the previous adjacent electrode pair, wherein the next energizing time is a time interval after the previous energizing time, the time interval less than the time for light to travel the distance between the centers of the previous and the next adjacent el

Abstract: An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.

Abstract: A charged particle processing apparatus includes a vacuum chamber, an optics plate, charged particle optics mounted to the optics plate, and mounting members coupled between the optics plate and a chamber wall. The mounting members are configured for isolating the optics plate from deformation of the chamber wall, as may occur due to a pressure differential between the chamber interior and the environment outside the chamber. The isolation may prevent deformation from affecting the alignment and positioning of the charged particle optics. The charged particles may, for example, be ions or electrons. Thus, the apparatus may be utilized, for example, in analytical instruments such as for mass spectrometry, or inspection instruments such as for electron microscopy.

Abstract: In various embodiments of the invention, a cargo container can be monitored at appropriate time intervals to determine that no controlled substances have been shipped with the cargo in the container. The monitoring utilizes reactive species produced from an atmospheric analyzer to ionize analyte molecules present in the container which are then analyzed by an appropriate spectroscopy system. In an embodiment of the invention, a sorbent surface can be used to absorb, adsorb or condense analyte molecules within the container whereafter the sorbent surface can be interrogated with the reactive species to generate analyte species characteristic of the contents of the container.

Abstract: Quantitation of analytes, including but not limited to peptides, polypeptides, and proteins, in mass spectrometry using a labeled peptide coupled to a reporter, and a universal reporter.

Abstract: An ion optical element that may be used as an ion guide in a mass spectrometer, as a reflectron in a time-of-flight mass spectrometer, as an ion mobility drift tube in an ion mobility spectrometer, or as a collision cell or reaction cell in a mass spectrometer. The ion optical element has an inner tube made of a first ceramic material within an outer ceramic tube made of a second ceramic material. The electrical resistivity of the second ceramic material is two orders of magnitude or more higher than the electrical resistivity of the first ceramic material. In certain embodiments, the thermal conductivity of the second ceramic material is at least about an order of magnitude higher than the thermal conductivity of the first ceramic material.

Abstract: The present invention provides templating methods for replicating patterned metal films from a template substrate such as for use in plasmonic devices and metamaterials. Advantageously, the template substrate is reusable and can provide plural copies of the structure of the template substrate. Because high-quality substrates that are inherently smooth and flat are available, patterned metal films in accordance with the present invention can advantageously provide surfaces that replicate the surface characteristics of the template substrate both in the patterned regions and in the unpatterned regions.

Abstract: An object of the present invention is to provide a mass spectrometer and a mass separator whose design and performance are less restricted by problems arising from the principle of operation, and which have in principle no limitation on the mass-to-charge ratio range to be able to deal with and are each capable of repeatedly analyzing or extracting plural ionic species of different mass-to-charge ratios in a short time. A mass spectrometer (10) is configured from an ion source (1), an ion introduction unit (2), a mass analyzer (3), an ion detection unit (4), and the like. Crude ions are introduced into a separation space (5) at a predetermined acceleration voltage as a pulse synchronized with the phase of a one-dimensional high-frequency electric field. In the separation space (5), each ion travels in an incident direction by inertia, and besides they are displaced by force received from the one-dimensional high-frequency electric field which acts in the y-direction crossing the incident direction.

Abstract: According to an embodiment, a method of operating a charged particle beam device is provided. The charged particle beam device includes a beam separation unit, a first optical component distanced from the beam separation unit and a second optical component distanced from the beam separation unit and distanced from the first optical component. The method includes generating a primary charged particle beam. The method further includes generating a first electric field and a first magnetic field in the beam separation unit. The method further includes guiding the primary charged particle beam through the beam separation unit in which the first electric field and the first magnetic field are generated, wherein a travel direction of the primary charged particle beam leaving the beam separation unit is aligned with a first target axis under the influence of the first electric field and the first magnetic field.

Abstract: A method for certifying an inspection system using a calibrated surface, comprising: acquiring a calibrated list from said calibrated surface, with said calibrated list comprising information about features located on said calibrated surface; inspecting said calibrated surface with said inspection system to generate an estimated list, with said estimated list comprising information about features located on said calibrated surface; generating a matched list by searching for the presence of one or more calibrated features in said estimated list, wherein said calibrated features are listed in said calibrated list; computing an estimated characteristic parameter from said matched list, wherein said estimated characteristic parameter quantifies features in said matched list having a unifying characteristic; and comparing said estimated characteristic parameter with a calibrated characteristic parameter, wherein said calibrated characteristic parameter quantifies features in said calibrated list having said unifyi

Abstract: The present invention relates to an X-ray imaging apparatus, comprising: an X-ray imager including an X-ray beam generator for emitting an X-ray beam, an X-ray beam detector for detecting the X-ray beam to obtain an X-ray image of an object, and a main body unit in which the X-ray beam generator and the X-ray beam detector are installed; and a three-dimensional scanner arranged in the X-ray imager in order to obtain an image of the outer appearance of the object. According to the present invention, an X-ray image and an image of the outer appearance of an object, for example, an image of the skull and an image of the face, can be obtained at the same time, thereby minimizing image correction procedures for matching two images.

Abstract: The invention provides a trapping ion mobility analyzer and methods for operating the ion mobility analyzer. The trapping ion mobility analyzer comprises an RF field for radially confining ions along an axis, a region with an axial electric DC field and a gas flow along the axis counteracting the electric DC field in the region, wherein the region either comprises a rising edge with an increasing axial electric DC field or a falling edge with a decreasing axial electric DC field and wherein the slope of the electric field strength along the axis is not constant at a substantial portion of the edge.

Abstract: In accordance with an embodiment, a marking apparatus includes a charged particle beam device and a marking unit. The charged particle beam device generates a charged particle beam, irradiates a sample including a laminated body with the charged particle beam, detects secondary charged particles generated from the sample, and acquires a sample image. The marking unit bores a hole reaching at least a second layer from a surface layer in the laminated body in a viewing field of the charged particle beam device.

Abstract: Apparatus for electron beam treatment of three-dimensional parts that includes cavities in a shielded rotating drum that preferably includes additional rotation mechanism for rotating parts within cavities in said drum. Radiation associated with the electron beam emitter is substantially shielded by the combination of the drum and the additional radiation shielding. The rotating drum is preferably made of at least four sections axially stacked, and its shielding properties are enhanced by including lead filled holes drilled in the sections.

Abstract: An example particle accelerator includes a coil to provide a magnetic field to a cavity; a particle source to provide a plasma column to the cavity; a voltage source to provide a radio frequency (RF) voltage to the cavity to accelerate particles from the plasma column, where the magnetic field causes particles accelerated from the plasma column to move orbitally within the cavity; an enclosure containing an extraction channel to receive the particles accelerated from the plasma column and to output the received particles from the cavity; and a structure arranged proximate to the extraction channel to change an energy level of the received particles.

Abstract: An ion spectrometer is provided, comprising: an ion source, arranged to generate ions continuously with a first range of mass to charge ratios; and an ion trap, arranged to receive ions from the ion source along an axis, and to eject ions with a second range of mass to charge ratios orthogonally to that axis, the second range of mass to charge ratios being narrower than the first range of mass to charge ratios. In some embodiments, ions generated by the ion source continuously flow into the ion trap. Additionally or alternatively, ion optics receive ions ejected from the ion trap and cool the ions without substantial fragmentation. An ion analyzer receives ions ejected from the ion trap or ion optics and separates the ions in accordance with at least one characteristic of the ions.

Abstract: Embodiments of methods/apparatus can transition a DR detector imaging array to low power photosensor mode where a first voltage is applied across the photosensors. Embodiments of methods/apparatus can provide an area radiographic imaging array including a plurality of pixels arranged in a matrix at the imaging array where each pixel can include at least one electrically chargeable photosensor and at least one transistor, row address circuits, signal sensing circuits, and photosensor power control circuitry to maintain a first voltage across photosensors of the portion of the imaging array when the detector is between imaging operations. In one embodiment, photosensor power control circuitry can maintain the first voltage across the photosensors when a power consumption of the signal sensing circuits is less than 1% of the power consumption of the signal sensing circuits during readout of a signal from the portion of the imaging array.

Abstract: Various embodiments for classifying defects detected on a wafer are provided. One method includes acquiring an electron beam image generated by a defect review tool for a location of a defect detected on a wafer by a wafer inspection tool. The method also includes determining a classification of the defect based on at least the electron beam image and without input from a user. The method may also include feeding back the classification results to the wafer inspection tool and optimizing the parameters of the tool to maximize sensitivity to the defects of interest.