Patents Examined by Bernard E. Souw
  • Patent number: 9224576
    Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first re
    Type: Grant
    Filed: January 27, 2014
    Date of Patent: December 29, 2015
    Assignees: CARL ZEISS MICROSCOPY GMBH, APPLIED MATERIALS ISRAEL, LTD.
    Inventors: Rainer Knippelmeyer, Oliver Kienzle, Thomas Kemen, Heiko Mueller, Stephan Uhlemann, Maximilian Haider, Antonio Casares, Steven Rogers
  • Patent number: 9218941
    Abstract: An ion implantation system and method for implanting ions at varying energies across a workpiece is provided. The system comprises an ion source configured to ionize a dopant gas into a plurality of ions and to form an ion beam. A mass analyzer is positioned downstream of the ion source and configured to mass analyze the ion beam. A deceleration/acceleration stage is positioned downstream of the mass analyzer. An energy filter may form part of the deceleration/acceleration stage or may positioned downstream of the deceleration/acceleration stage. An end station is provided having a workpiece support associated therewith for positioning the workpiece before the ion beam is also provided. A scanning apparatus is configured to scan one or more of the ion beam and workpiece support with respect to one another. One or more power sources are operably coupled to one or more of the ion source, mass analyzer, deceleration/acceleration stage, and energy filter.
    Type: Grant
    Filed: December 29, 2014
    Date of Patent: December 22, 2015
    Assignee: Axcelis Technologies, Inc.
    Inventors: Causon Ko-Chuan Jen, Marvin Farley
  • Patent number: 9214323
    Abstract: A sample plate handling system for a time-of-flight mass spectrometer includes a sample plate for supporting samples for analysis. A first sample plate receiver is positioned in a first chamber. First and second sample plate receivers are positioned in a second chamber. A first gate valve isolates the first and second chambers when closed and allows transfer of sample plates between the first sample plate receiver in the first chamber and one of the first and second sample plate receivers in the second chamber when the first gate valve is open. A first linear extender pushes a sample plate from the first sample plate receiver in the first chamber to the first sample plate receiver positioned in the second chamber, and then retracts a second sample plate from the second sample plate receiver positioned in the second chamber and transports the second sample plate to the first sample plate receiver in the first chamber. A first sample plate receiver is positioned in a third chamber.
    Type: Grant
    Filed: September 2, 2014
    Date of Patent: December 15, 2015
    Assignee: Virgin Instruments Corporation
    Inventors: Marvin L. Vestal, Kevin Hayden
  • Patent number: 9208988
    Abstract: The present invention is a shielded anode having an anode with a surface facing an electron beam and a shield configured to encompass the anode surface. The shield has at least one aperture and an internal surface facing the anode surface. The shield internal surface and anode surface are separated by a gap in the range of 1 mm to 10 mm. The shield of the present invention is fabricated from a material, such as graphite, that is substantially transmissive to X-ray photons.
    Type: Grant
    Filed: November 11, 2012
    Date of Patent: December 8, 2015
    Assignee: Rapiscan Systems, Inc.
    Inventors: Edward James Morton, Russell David Luggar, Paul De Antonis
  • Patent number: 9205159
    Abstract: A multi-charging and sterilizing apparatus includes a case having a slot unit on one surface thereof; a plurality of slots defined in the slot unit such that a plurality of objects are inserted into and mounted in the plurality of slots; and ultraviolet sources disposed in the respective slots to irradiate ultraviolet on front surfaces and rear surfaces of the objects.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: December 8, 2015
    Assignee: SEOUL VIOSYS CO., LTD.
    Inventor: Jong-Rak Kim
  • Patent number: 9207221
    Abstract: Provided are methods for determining the amount of reverse T3 in a sample using mass spectrometry. The methods generally involve ionizing reverse T3 in a sample and detecting and quantifying the amount of the ion to determine the amount of reverse T3 in the sample.
    Type: Grant
    Filed: November 5, 2014
    Date of Patent: December 8, 2015
    Assignee: Quest Diagnostics Investments Incorporated
    Inventors: J. Fred Banks, Peter P. Chou, Noriya M. Matt
  • Patent number: 9196468
    Abstract: An electrospray ion source method and system is provided for detecting emitter failure comprising a liquid chromatography column suitable for chromatographic separation of a sample. The column can have an inlet for receiving the sample; and an outlet for ejecting the sample. A make-up flow channel is provided for introducing make-up flow of liquid to the sample post-column, wherein the make-up flow normalizes the spray current. An electrospray ionization source is provided having one or more electrospray ionization emitter nozzles for receiving the make-up flow containing sample. A power supply can provide a voltage to the one or more emitter nozzles, and a measurement device can measure and monitor the spray current.
    Type: Grant
    Filed: May 17, 2013
    Date of Patent: November 24, 2015
    Assignee: DH Technologies Development Pte. Ltd.
    Inventors: John L. Campbell, Thomas Covey, Yves LeBlanc, Bradley B. Schneider
  • Patent number: 9188554
    Abstract: Provided is a pattern inspection device for accurately simulating an electron beam image of a circuit pattern on a wafer from design data, and implementing high-precision defect detection based on the comparison between the simulated electron beam image and a real image. A pattern inspection device comprises: an image capturing unit for capturing an electron beam image of a pattern formed on a substrate; a simulated electron beam image generation unit for generating a simulated electron beam image using a parameter indicating the characteristics of the electron beam image on the basis of design data; and an inspection unit for comparing the electron beam image of the pattern, which is the image captured by the image capturing unit, and the simulated electron beam image generated by the simulated electron beam image generation unit, and inspecting the pattern on the substrate.
    Type: Grant
    Filed: May 22, 2013
    Date of Patent: November 17, 2015
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Chie Shishido, Shinya Murakami, Takashi Hiroi, Taku Ninomiya, Michio Nakano
  • Patent number: 9190254
    Abstract: In one aspect of the invention, an ion trap mass analyzer includes a variable- or multi-potential type ion guide (MPIG) assembly which has been pre-configured to produce a parabolic-type potential field. Each MPIG electrode has a resistive coating of designed characteristics. In one example the coating varies in thickness along the length of an underlying uniform substrate. The MPIG assembly can be a single MPIG electrode or an array of a plurality of MPIG electrodes. An array can facilitate delocalization for improved performance. This chemical modification of a uniform underlying substrate promotes cheaper and flexible instruments. The modified MPIG electrodes also allow miniaturization (e.g. micro and perhaps even nano-scale), which allows miniaturization of the instrument in which the single or plural modified MPIG electrode(s) are placed. This promotes portability and field use instead of limitation to laboratory settings.
    Type: Grant
    Filed: December 15, 2014
    Date of Patent: November 17, 2015
    Assignee: University of Northern Iowa Research Foundation
    Inventor: Curtiss Dwight Hanson
  • Patent number: 9190253
    Abstract: Certain embodiments described herein are directed to systems including a cell downstream of a mass analyzer. In some instances, the cell is configured as a reaction cell, a collision cell or a reaction/collision cell. The system can be used to suppress unwanted ions and/or remove interfering ions from a stream comprising a plurality of ions.
    Type: Grant
    Filed: November 3, 2014
    Date of Patent: November 17, 2015
    Assignee: PERKINELMER HEALTH SCIENCES, INC.
    Inventors: Hamid Badiei, Samad Bazargan
  • Patent number: 9184038
    Abstract: The invention generally relates to apparatuses for focusing ions at or above ambient pressure and methods of use thereof. In certain embodiments, the invention provides an apparatus for focusing ions that includes an electrode having a cavity, at least one inlet within the electrode configured to operatively couple with an ionization source, such that discharge generated by the ionization source is injected into the cavity of the electrode, and an outlet. The cavity in the electrode is shaped such that upon application of voltage to the electrode, ions within the cavity are focused and directed to the outlet, which is positioned such that a proximal end of the outlet receives the focused ions and a distal end of the outlet is open to ambient pressure.
    Type: Grant
    Filed: May 16, 2013
    Date of Patent: November 10, 2015
    Assignee: PURDUE RESEARCH FOUNDATION
    Inventors: Robert Graham Cooks, Zane Baird, Wen-Ping Peng
  • Patent number: 9177773
    Abstract: Disclosed herein are systems and methods that allow analysis of macromolecular structures using laserspray ionization at intermediate pressure or high vacuum using commercially available mass spectrometers with or without modification and with the application of heat. The systems and methods produce multiply-charged ions for improved analysis in mass spectrometry.
    Type: Grant
    Filed: September 4, 2014
    Date of Patent: November 3, 2015
    Assignee: Wayne State University
    Inventor: Sarah Trimpin
  • Patent number: 9177758
    Abstract: The present invention provides a dual-beam apparatus which employs the dark-field e-beam inspection method to inspect small particles on a surface of a sample such as wafer and mask with high throughput. The dual beam apparatus comprises two single-beam dark-field units placed in a same vacuum chamber and in two different orientations. The two single-beam dark-field units can perform the particle inspection separately or almost simultaneously by means of the alternately-scanning way. The invention also proposes a triple-beam apparatus for both inspecting and reviewing particles on a sample surface within the same vacuum chamber. The triple-beam apparatus comprises one foregoing dual-beam apparatus performing the particle inspection and one high-resolution SEM performing the particle review.
    Type: Grant
    Filed: December 9, 2014
    Date of Patent: November 3, 2015
    Assignee: HERMES MICROVISION INC.
    Inventors: Zhongwei Chen, Jack Jau, Weiming Ren, Chiyan Kuan, Yixiang Wang, Xiaoli Guo, Feng Cao
  • Patent number: 9171694
    Abstract: An electron beam device for inspecting a target substrate or specimen thereon includes a beam separator with an asymmetric quadrupole electrostatic deflector for improving field uniformity for a single direction of deflection. The asymmetric quadrupole electrostatic deflector includes two orthogonal electrode plates spanning roughly 60 degrees and two electrode plates spanning roughly 120 degrees, the two latter plates defining a unidirectional deflection field. The device generates a primary electron beam and focuses the primary electron beam along an optical axis into the target substrate. Secondary electrons detected at the target substrate are focused into a secondary electron beam. The beam separator with asymmetric quadrupole electrostatic deflector deflects the secondary electron beam away from the axis of the primary electron beam in the direction of deflection and into a detector array.
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: October 27, 2015
    Assignee: KLA-Tencor Corporation
    Inventor: Christopher Sears
  • Patent number: 9168391
    Abstract: One embodiment of the present disclosure is directed to a mobile X-ray unit. The mobile X-ray unit may include a base having a control unit and a power supply. The mobile X-ray unit may further include an articulated arm associated with the base. The articulated arm may be coupled to an X-ray applicator having an X-ray tube. The X-ray tube may include a target for generating an X-ray beam, a collimator for shaping the X-ray beam, and an exit surface through which the X-ray beam is configured to exit the X-ray tube. The mobile X-ray unit may have at least one light source configured to illuminate at least a portion of the X-ray beam emitted from the exit surface.
    Type: Grant
    Filed: December 22, 2011
    Date of Patent: October 27, 2015
    Assignee: NUCLETRON B.V.
    Inventors: Johan Henning, Bas Woudstra
  • Patent number: 9171697
    Abstract: The present invention provides apparatus for an imaging system comprising a multitude of imaging elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system are discussed.
    Type: Grant
    Filed: January 12, 2015
    Date of Patent: October 27, 2015
    Assignee: Futrfab, Inc
    Inventor: Frederick A. Flitsch
  • Patent number: 9170232
    Abstract: A system and methodology for the detection of threat substances is described. The detector system consists of a method to evaporate the sample into a primary separator and thermal release of trapped target materials into a secondary separator like conventional GC. The GC column is thermally ramped to elute all substances and the end of the column terminates into an atmospheric pressure chemical ionization source of an axial ion mobility spectrometer (AIMS). Both polarity ions are pulsed into a single construction separator tube at different timing. Their arrival time is detected on a collector plate, which allows registering their ion mobility spectra of both polarities for a single GC peak.
    Type: Grant
    Filed: April 26, 2013
    Date of Patent: October 27, 2015
    Assignee: Teknoscan Systems Inc.
    Inventors: Sabatino Nacson, Aleksandar Crnatovic, George Wiseman
  • Patent number: 9162082
    Abstract: One embodiment of a particle circular accelerator 1 includes: a beam deflector for beam injections, bending electromagnets that causes the beam injected from the beam deflector for beam injections to circulate so as to form a circulation orbit, orbit adjusting electromagnets for injected beams that shift the position of each injected beam relative to the center of the circulation orbit of the beam, quadrupole electromagnets and sextupole electromagnets that adjust their respective quantities of magnetic excitation at the time of a beam extraction so as to extract a beam in a resonant region off a stable reason of beams and a beam deflector for beam extractions that takes out the beam extracted from the resonant region to the outside. The circular accelerator 1 injects beams from the inner side thereof and emits beams to the outer side thereof.
    Type: Grant
    Filed: December 3, 2014
    Date of Patent: October 20, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Akihiro Osanai
  • Patent number: 9159537
    Abstract: Described herein is a method and system for on-line coupling of capillary isoelectric focusing (cIEF) to high-resolution mass spectrometry in which a sheath flow buffer comprising polar organic solvent and organic acid is used as both an immobilization solution for (cIEF) and an ionization solution for electrospray ionization (ESI).
    Type: Grant
    Filed: May 2, 2013
    Date of Patent: October 13, 2015
    Assignees: University of Notre Dame du Lac, Medimmune, LLC
    Inventors: James McGivney, Guijie Zhu, Norman Dovichi
  • Patent number: 9153406
    Abstract: An ion generator includes: an arc chamber; a repeller that includes a repeller plate provided within the arc chamber and a repeller extension portion inserted through a through hole communicating the inside and the outside of the arc chamber; and a supporting structure that is provided outside the arc chamber and that supports the repeller so that a gap is ensured between the repeller extension portion and an inner wall of the through hole. The supporting structure includes a cover member that forms, outside the arc chamber, a small chamber communicating with the gap, and an insulation member that electrically insulates the arc chamber and the repeller from each other.
    Type: Grant
    Filed: December 24, 2014
    Date of Patent: October 6, 2015
    Assignee: SEN CORPORATION
    Inventor: Masateru Sato