Patents Examined by Bruce Anderson
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Patent number: 6617600Abstract: A radiation shield device (100) and method, the apparatus comprising either an absorbing shield (130), a scattering shield (200) or an absorbing and scattering shield (300) arranged in a processing tool (50) that irradiates a workpiece (70) with high-irradiance radiation (80) from a light source (78). The processing tool has a tool portion (66) having an irradiance damage threshold (IDT). The radiation shield device is designed to intercept a portion of the high-irradiance radiation that would otherwise be incident the tool portion, and to ensure that radiation exiting the particular shield comprising the radiation shield device and incident the tool portion has an irradiance below the tool portion irradiance damage threshold. The method includes using the radiation shield device in processing a workpiece using a processing tool.Type: GrantFiled: February 16, 2000Date of Patent: September 9, 2003Assignee: Ultratech Stepper, Inc.Inventors: Andrew M. Hawryluk, Joe Gortych, Yu Chue Fong
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Patent number: 6614018Abstract: A process and apparatus for separating element isotopes in space by heating a stream of raw materials using concentrated sunlight and ionizing radiation, followed by electromagnetic separation, and collection of the desired isotopes in appropriate receptacles. The unique design of this invention allows flexibility of implementation, very high separation efficiency, and minimal waste. The intent of collecting a multiplicity of isotopes simultaneously is a key feature of this invention. The goal for this work is to greatly reduce the cost of producing purified finished materials in space. This capability makes economical the fabrication of complex and large structures for space-based industry and habitation. This invention builds upon the sciences of plasma physics, ion separation, and microgravity processing, and incorporates new concepts of the integral design and efficient process operation, taking advantage of the peculiar properties of a microgravity environment.Type: GrantFiled: September 1, 1999Date of Patent: September 2, 2003Inventor: Peter J. Schubert
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Patent number: 6614026Abstract: A column for directing a beam of charged particles with a finite energy spread onto a specimen surface under an oblique beam landing angle comprises: a particle source; an objective lens; a deflection unit for deflecting the beam of charged particles away from the optical axis such that the beam.of charged particles traverses the objective lens off-axis, thereby causing a chromatic aberration, a compensation unit adapted to disperse the beam of charged particles, thereby substantially compensating said chromatic aberration in the plane of the specimen surface, whereby the combined action of the objective lens and the deflection unit directs the beam of charged particles to hit the specimen surface under said large beam landing angle.Type: GrantFiled: April 15, 1999Date of Patent: September 2, 2003Assignee: Applied Materials, Inc.Inventor: Pavel Adamec
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Patent number: 6614024Abstract: A high data-rate infra-red wireless receiver of improved sensitivity utilizing concave reflectors to concentrate said radiation energy on an array of photo-diodes while significantly reducing radio frequency (RF) and visible light interference as well as temperature dependent variations of said photo-diode response.Type: GrantFiled: September 11, 2000Date of Patent: September 2, 2003Assignee: Free Systems Pte Ltd.Inventors: Chan Chee Oei, Siew Chee Kong
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Patent number: 6608304Abstract: A mass spectrometer (MS) which uses the Fourier transform ion cyclotron resonance (FTICR) technique to determine the mass of ions. The MS is prepared with a surface that guarantees that a particle striking the surface will have at least one contact with the cathode and will most likely be re-pumped before escaping into the vacuum chamber volume.Type: GrantFiled: October 2, 2000Date of Patent: August 19, 2003Assignee: Siemens Energy & AutomationInventors: Duane P. Littlejohn, Thomas Knudsen
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Patent number: 6608313Abstract: Methods and devices are disclosed for aligning a beam-propagation axis with the center of an aperture, especially an aperture configured to limit the aperture angle of the charged particle beam. In an exemplary method, an alignment-measurement aperture is provided at an imaging plane of a charged-particle-beam (CPB) optical system, and a beam detector is downstream of the alignment-measurement aperture. A scanning deflector is energized to cause the beam to be scanned in two dimensions, transverse to an optical axis, over the aperture. Meanwhile, the beam detector obtains an image of beam intensity in the two dimensions. In the image a maximum-intensity point is identified, corresponding to the propagation axis. Based on the two-dimensional image, the beam is deflected as required to align the propagation axis with the aperture center.Type: GrantFiled: January 19, 2001Date of Patent: August 19, 2003Assignee: Nikon CorporationInventor: Hiroyasu Simizu
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Patent number: 6608306Abstract: The invention provides a probe for use with a scanning tunneling microscope, a method of treating the probe, and a method of fabricating a nano-structure, which facilitates formation of a continuous nano-structure. The probe for the scanning tunneling microscope is formed of an Ag2S crystal having both ion conductivity and electron conductivity. Voltage and tunnel current are applied between the probe and a substrate in order to move movable Ag ions to thereby grow, on the tip end of the probe, a projection (mini chip) composed of Ag ions or Ag atoms. The polarity of the applied voltage is reversed after the growth of the projection in order to return the Ag ions or Ag atoms constituting the grown projection (mini chip) into the Ag2S crystal to thereby contract the projection. Thus, the probe can have a projection composed of Ag ions or Ag atoms and a regulated shape.Type: GrantFiled: January 8, 2001Date of Patent: August 19, 2003Assignees: Japan Science and Technology Corporation, RikenInventors: Masakazu Aono, Tomonobu Nakayama, Kazuya Terabe
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Patent number: 6605814Abstract: A resist curing device including a workpiece stage with a plate adapted to support a silicon wafer laid thereupon, a workpiece retention device that vacuum adsorbs the silicon wafer laid upon the plate, a light source unit that provides ultraviolet irradiation to cure resist applied to the silicon wafer, and a workpiece temperature control device that heats and/or cools the silicon wafer supported on the plate, where the plate has an expansion coefficient substantially similar to that of the silicon wafer.Type: GrantFiled: January 22, 2001Date of Patent: August 12, 2003Assignee: Ushiodenki Kabushiki KaishaInventors: Nozomu Tadika, Satoru Kuramochi, Yoshiki Mimura
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Patent number: 6593568Abstract: An Atmospheric Pressure Ion (API) source is configured for Electrospray (ES) and Atmospheric Pressure Chemical Ionization (APCI) operating modes. The API source includes a multipurpose heater assembly mounted in the API source chamber. The multipurpose heater supplies heat to the API chamber endplate, bath gas and entrance end of the capillary orifice into vacuum as well as supplying electrical connections to the API source elements. An additional heater is configured at the exit end of the capillary orifice into vacuum. With this configuration, the bath gas, endplate and capillary entrance temperature can be set independent of gas flow rate. The capillary exit and entrance temperatures can be set independently as well. The multipurpose endplate heater combined with the capillary exit heater allows the optimization of API source performance over a wide range of operating conditions and analytical applications.Type: GrantFiled: June 2, 1999Date of Patent: July 15, 2003Inventors: Craig M. Whitehouse, Bruce A. Andrien, Jr., Michael A. Sansone, Clement Catalano
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Patent number: 6590203Abstract: The present invention relates to analysis of organic compounds using an ion trap mass spectrometer. Substantially, the method of the present invention comprises steps of isolating ions of a wide mass range including isotope peaks, performing CID (Collision Induced Dissociation) on a plurality of ions simultaneously to produce daughter ions, obtaining the mass spectrum of the daughter ions, accumulating ionic currents of isotope peaks of the obtained daughter ions, comparing the result by the isotope pattern of the daughter ions, and evaluating the result of analysis.Type: GrantFiled: November 29, 2000Date of Patent: July 8, 2003Assignee: Hitachi, Ltd.Inventor: Yoshiaki Kato
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Patent number: 6590220Abstract: A light source for examining sites in heating, ventilating, and air conditioning systems for leaks using a fluorescent dye is described. The light source can include a low voltage lamp or a low heat generating lamp.Type: GrantFiled: November 3, 2000Date of Patent: July 8, 2003Assignee: Bright Solutions, Inc.Inventors: Terrence D. Kalley, John R. Burke, David Gentit
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Patent number: 6590208Abstract: A balanced momentum probe holder in an apparatus for characterizing a sample surface has first and second members each having extensible and retractable distal ends. The distal ends extend or retract substantially simultaneously in response to a signal from a detector thus balancing the momentums of the first and second members and reducing the net momentum of the probe holder to essentially zero. Balancing the momentum of the probe holder reduces parasitic oscillations in the apparatus thus enhancing performance.Type: GrantFiled: January 19, 2001Date of Patent: July 8, 2003Assignee: Veeco Instruments Inc.Inventor: James R. Massie
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Patent number: 6586734Abstract: A hyperbaric hydrothermal atomic force microscope (AFM) is provided to image solid surfaces in fluids, either liquid or gas, at pressures greater than normal atmospheric pressure. The sample can be heated and its surface imaged in aqueous solution at temperatures greater than 100° C. with less than 1 nm vertical resolution. A gas pressurized microscope base chamber houses the stepper motor and piezoelectric scanner. A chemically inert, flexible membrane separates this base chamber from the sample cell environment and constrains a high temperature, pressurized liquid or gas in the sample cell while allowing movement of the scanner. The sample cell is designed for continuous flow of liquid or gas through the sample environment.Type: GrantFiled: June 28, 2002Date of Patent: July 1, 2003Assignee: The Regents of the University of CaliforniaInventors: Kevin G. Knauss, Carl O. Boro, Steven R. Higgins, Carrick M. Eggleston
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Patent number: 6586736Abstract: A method and apparatus for generating an image of a sample with a electron beam apparatus is disclosed. The image is generated from a portion of the sample with a measurement device having a source unit for directing an electron beam substantially towards the sample. The measurement device also has a detector for detecting particles that are emitted from the sample, an electrode proximal to the sample having a hole through which the electron beam and a portion of the emitted particles may pass, and an image generator for generating the image of the sample from the detected particles. A first voltage is applied to the electrode when the electron beam is substantially in a center of the hole. The first voltage is selected to control positive charge build up on the sample. A second voltage is applied to the electrode when the electron beam is deflected a predetermined distance from the center of the hole.Type: GrantFiled: September 10, 1999Date of Patent: July 1, 2003Assignee: KLA-Tencor, CorporationInventor: Mark A. McCord
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Patent number: 6583430Abstract: Some of a plurality of alignment marks formed in advance on a substrate are selected, and the positions of the selected alignment marks are detected in turn. The layout regularity of a plurality of patterns on the substrate is determined on the basis of the design coordinate values and actually measured values of the alignment marks. A pattern is written on the patterns by moving a stage relative to the electron beam on the basis of the layout regularity of the plurality of patterns. During writing, one of the selected alignment marks is irradiated with an electron beam, and electrons reflected by the alignment mark are detected, thereby detecting the mark position. Any difference between this actually measured value and the previous actually measured value is calculated, and the relative position between the electron beam and stage is corrected based on this difference.Type: GrantFiled: July 23, 1999Date of Patent: June 24, 2003Assignee: Canon Kabushiki KaishaInventor: Masato Muraki
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Patent number: 6583410Abstract: A polarimeter for analysing the electron-spin polarisations of an electron beam, the polarimeter comprising first target means comprising a layer of material for scattering a beam of electrons in directions dependent upon the transverse spin-orientation of the incident electrons, and first detector means for detecting the scattered electrons. The polarimeter also having second target means comprising a layer of ferromagnetic material, magnetising means for magnetising the ferromagnetic layer such that the second target means will transmit a beam of electrons at a rate dependent upon the longitudinal spin-orientation of the electrons, and second detector means for detecting the transmitted electrons.Type: GrantFiled: January 8, 2001Date of Patent: June 24, 2003Inventor: Elaine Ann Seddon
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Patent number: 6583414Abstract: There are provided an inline inspection system and inspection method for inspecting the substrate surface on which semiconductors and circuit patterns are formed by radiating thereto white beam, laser beam or electron beam, and reviewing, inspecting and discriminating the detected roughness and figure defect, particle and moreover electrical defect on the surface with higher accuracy within a short period of time with the same instrument. Thereby, automatic movement to the position to be reviewed, acquisition of image and classification can be realized. On the occasion of identifying the position to be reviewed on a sample and forming an image through irradiation of electron beam on the basis of the positional information of defect detected with the other inspection instrument, an electrical defect can be reviewed with the voltage contrast mode by designating the electron beam irradiation condition, detectors and detecting condition depending on a kind of defect to be reviewed.Type: GrantFiled: November 30, 2000Date of Patent: June 24, 2003Assignees: Hitachi, Ltd., Hitachi Tokyo Electronics Co., Ltd.Inventors: Mari Nozoe, Hidetoshi Nishiyama, Shigeaki Hijikata, Kenji Watanabe, Koji Abe
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Patent number: 6580085Abstract: A transport container for nuclear fuel assemblies, of right prismatic shape, which has an external envelope and an internal structure defining at least one housing for receiving and holding a fuel assembly.Type: GrantFiled: September 25, 2000Date of Patent: June 17, 2003Assignee: FramatomeInventor: Bernard Gaucherand
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Patent number: 6576897Abstract: An ion collision cell for use in a mass spectrometer uses pre-collision and post-collision evacuation regions with a sealed collision region therebetween without the need for lens to separate the regions. A continuous rod design reduces mechanical cost and simplifies the electronic design. A longer collision cell allows lower pressure operation, and a curved configuration permits the exit of neutral particles. A square quadrapole cross-section allows a field free region in the center of the cell and minimizes ion node effects. In one embodiment, the ion collision cell includes first and second pole segments mounted on a first support plate with the pole segments having pole surfaces arranged at approximately 90° with respect to each other, and third and fourth pole segments mounted on a second support plate, the pole segments having pole surfaces arranged at approximately 90° with respect to each other.Type: GrantFiled: September 13, 2000Date of Patent: June 10, 2003Assignee: Varian, Inc.Inventors: Urs Steiner, Hansjorg J. Cueni
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Patent number: 6576895Abstract: The present invention relates generally to time-of-flight mass spectrometers and discloses an improved method and apparatus for analyzing ions using a time-of-flight mass spectrometer. More specifically, the present invention comprises two or more electrostatic reflectors positioned coaxially with respect to one another such that ions generated by an ion source can be reflected back and forth between them. The first reflecting device is an ion accelerator which functions as both an accelerating device to provide the initial acceleration to the ions, and a reflecting device to reflect the ions in the subsequent mass analysis. The second reflecting device is a reflectron which functions only to reflect the ions in the mass analysis. During the mass analysis, the ions are reflected back and forth between the accelerator and reflectron multiple times.Type: GrantFiled: July 12, 2000Date of Patent: June 10, 2003Assignee: Bruker Daltonics Inc.Inventor: Melvin Park