Abstract: An electrophotographic imaging member includes a blocking layer formed from a maleic acid half ester copolymer which has free acid groups neutralized by an alkali metal. The imaging member may be provided with a conductive layer formed from a phenolic resin and dispersed carbon black particles in an amount which allows sufficient transparency for rear erasure.

Abstract: A photo curable diallyl phthalate resin composition characterized by containing 0.1 to 10 parts by weight of an agent for preventing back side undesirable curing and 20 to 100 parts by weight of a filler per 100 parts by weight of a diallyl phthalate prepolymer is particularly suitable for a partly additive process for forming a solder resist effective for preventing back side undesirable curing by ultraviolet light and having resistance to release of substances from the solder resist for deteriorating properties of plated copper film as well as for giving good mechanical properties.

Abstract: In a film forming method of an organic thin film for an optical information recording medium, the speed of forming the film can be increased and the quantity of the waste dust which is produced in the process of film forming can be decreased. Moreover, the ratio of the number of fluorine atoms to the number of the carbon atoms contained in the under layer is controlled to be less than 1.8, whereby the heat resistance of the under layer is improved and thermal deformation of an uneven pattern of the substrate can be prevented so that the endurance life of the optical information recording medium can be prolonged.

Abstract: An electrophotographic imaging member is disclosed which contains a substrate having an electrically conductive surface, a dried continuous adhesive layer comprising a semi-interpenetrating network derived from a coating mixture comprising a blend of a self-crosslinkable polyurethane and a non-self-crosslinkable polyurethane, a thin homogeneous charge generating layer, and a charge transport layer comprising a film forming polymer.

Abstract: The invention provides a photosensitive resin composition useful as a solder resist, etching resist or plating resist in the manufacture of printed circuit boards to exhibit excellent resistance against heat and chemicals and good adhesion to the substrate surface. The composition essentially comprises (a) a copolymeric resin of an .alpha.,.beta.-unsaturated dicarboxylic acid anhydride and an ethylenically unsaturated polymerizable compound, of which the acid anhydride units are partially esterified with an unsaturated alcohol and a saturated alcohol, and (b) a photopolymerization initiator. The composition may further comprise optional ingredients such as (c) a photopolymerizable monomeric compound, (d) an epoxy-based resin and (e) an aromatic diamine compound.

Abstract: An imaging process which comprises the genertion of an image in an electronic printing magnetic image character recognition apparatus; thereafter developing the image with an encapsulated toner composition comprised of a core with a fluorocarbon-incorporated polymer binder, magnetite, and optional color pigments and a polymeric shell.

Abstract: Compositions which include an acidified epoxy oligomer, a free radical photoinitiator and a monomer capable of being polymerized by the photoinitiator are used to form aqueous developable, photodefined coatings useful as permanent solder marks for printed circuits and permanent plating resists for additive printed wiring boards.The process for using the compositions include application as a fluid in solvents; drying; exposing to ultraviolet light; developing in an aqueous alkaline solution; and crosslinking the acidified, epoxy oligomers. The articles produced include printed wiring boards with the permanent, photoimaged resist composition thereon.

Abstract: Radiation-sensitive compositions which are especially useful in the production of negative-working lithographic printing plates comprise a photocrosslinkable polymer containing the photosensitive group ##STR1## as an integral part of the polymer backbone and, in an amount sufficient to improve the properties of the composition, both a polymer of vinyl pyrrolidone and an unsaturated polyester such as a polyester derived from fumaric acid and a 4,4'-isopropylidine-diphenol. The combination of a polymer of vinyl pyrrolidone and an unsaturated polyester improves the properties of the radiation-sensitive composition in regard to such factors as shelf life, image contrast, developability and ink receptivity and thereby provides a superior lithographic printing plate.

Abstract: The present invention is directed to a compound of the formula (I): ##STR1## where D+ is a cationic dye moiety; R.sup.1 is a branched chain alkyl group, and R.sup.2, R.sup.3 and R.sup.4 are independently selected from the group consisting of alkyl, aryl, aralkyl, alkaryl, alkenyl, alkynyl, alicyclic, heterocyclic, and allyl groups.

Abstract: The invention relates to a positive radiation-sensitive mixture containing a compound which forms an acid under the action of actinic radiation, an acid-cleavable compound, and a binder, wherein the acid-cleavable compound comprises a monomeric silylenol ether. The radiation-sensitive mixture described has a better shelf life than the prior art products and a high structural resolution.

Abstract: A method of producing a polydiacetylene thin film comprises spreading on a water surface a diacetylene compound having one or more conjugated diacetylene groups, subjecting the diacetylene compound to incomplete polymerization by irradiation with ultraviolet rays to an extent incapable of causing complete polymerization, transferring the spread film to a substrate to form a monolayer or built-up film thereon, and irradiating the transferred film with ultraviolet rays or an electron beam to complete the polymerization thereof.

Abstract: This invention relates to positive working photopolymerizable sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to accurately predict the image quality from a lithographic printing process.

Abstract: This invention relates to a process for making a printing relief from a flexographic photosensitive element comprising:(a) imagewise exposing to actinic radiation a layer of a photosensitive composition, said photosensitive composition comprising a binder having thermoplastic and elastomeric domains, a first addition polymerizable, ethylenically unsaturated monomer having some compatibility with both domains of the binder, and an addition polymerization initiator or initiating system;(b) removing the unexposed portions; and(c) applying post development treatment; wherein the improvement comprises increasing the flexibility of the flexographic printing relief by adding at least one additional ethylenically unsaturated monomer so that the ratio of first monomer to the additional monomer is in the range 1:4 to 4:1 based on total weight of monomer, said additional monomer is added to the photosensitive composition prior to imagewise exposing the layer provided that said additional monomer is substantially incompa

Abstract: Abstract of the disclosure: Novel photopolymerizable recording materials suitable in particular for producing photoresist layers and lithographic printing plates are composed of one or more photopolymerizable, olefinically unsaturated organic compounds, a photopolymerization initiator, a color-forming system composed of a color former and a photooxidant, novel 4-quinazolone compounds as sensitizers of the formula (I) ##STR1##

Abstract: An insoluble electron beam positive polyimide having the formula ##STR1## can be exposed by an electron beam to render the exposed areas soluble. The exposed areas can then be dissolved using a solvent to leave the pattern which can be used directly as an insulator layer in a semiconductor device.

Abstract: An insoluble photosensitive polyimide having the formula ##STR1## can be exposed by a pattern of light to render the exposed areas soluble. The exposed areas can then be dissolved using a solvent to leave the pattern which can be used directly as an insulator layer in a semiconductor device. A process for preparing the photosensitive soluble polyimide utilizes maleic anhydride which is irradiated by ultraviolet light to form a cyclobutane unit which is reacted with oxydianiline to form polymic acid. The polymic acid is cured using heat into the photosensitive soluble polyimide.

Abstract: Disclosed are a polysilane containing a unit represented by the following formulas I, II, or III, and a photosensitive composition consisting of the polysilane.

Abstract: A copolymer of ethylene and an ethylenically .alpha.,.beta.-unsaturated acid halogenated phenyl ester represented by the formula (1): ##STR1## (wherein R is hydrogen or a methyl group, X is a halogen atom, Y is an alkyl group having 4 to 18 carbon atoms, n is 0 or 1, m is an integer of 1 to 5, and l is 0 or an integer of 1 to 4), wherein the halogenated phenyl ester group unit content is about 0.005 to about 10 mol %. This copolymer is excellent in dielectric breakdown characteristics and flexibility, and its excellent performance can be maintained over a long period of time. Thus, it is useful as a superhigh voltage electric wire cable insulative material.

Abstract: An improved process for preparing negative images from a photohardenable tonable element, wherein the unexposed photohardenable tonable element is tacky in a preselected temperature range, T.sub.1 -T.sub.2, in which temperature range the exposed photosensitive tonable element is nontacky but wherein the exposed element is retackifiable at elevated temperatures above T.sub.2. After imagewise exposure the unexposed areas have a colorless toning material applied to them at a temperature within the range T.sub.1 -T.sub.2 to make them nontacky at temperatures of at least up to T.sub.3, which is greater than T.sub.2. After heating to an elevated temperature above T.sub.2 but less than T.sub.3 the exposed areas have a contrasting toning material applied to them to give a negative or reverse image.

Abstract: A pattern forming method in which a water-soluble organic film absorbing secondary electrons or soft X-rays is formed on a resist layer and thereafter, pattern exposure, development are carried out. The water-soluble organic film containing halogen, sulfur, metal atom, etc. absorbs secondary electrons or soft X-rays which are generated from a mask in X-rays exposure so that only X-rays passed through openings of the mask are applied to a resist layer and a super fine pattern of high aspect ratio can be obtained.