Abstract: A method may include forming a dummy dielectric layer over a substrate, and forming a dummy gate over the dummy dielectric layer. The method may also include forming a first spacer adjacent the dummy gate, and removing the dummy gate to form a cavity, where the cavity is defined at least in part by the first spacer. The method may also include performing a plasma treatment on portions of the first spacer, where the plasma treatment causes a material composition of the portions of the first spacer to change from a first material composition to a second material composition. The method may also include etching the portions of the first spacer having the second material composition to remove the portions of the first spacer having the second material composition, and filling the cavity with conductive materials to form a gate structure.

Abstract: A semiconductor package includes a lower semiconductor die and an upper semiconductor die which are stacked with an offset in a first direction, wherein the lower semiconductor die includes a plurality of lower pads arranged in a second direction, which is perpendicular to the first direction, and wherein the upper semiconductor die includes a plurality of upper pads arranged in the second direction. The semiconductor package also includes bent wires electrically connecting the lower pads of the lower semiconductor die with the upper pads of the upper semiconductor die in the first direction. The semiconductor package further includes vertical wires such that a vertical wire is disposed on any one of the lower pad and the upper pad for each pair of pads electrically connected by a bent wire.

Abstract: The present application provides methods for manufacturing a vertical device. To begin with, a GaN-based semiconductor substrate is etched from a front surface to form a trench. Then, a P-type semiconductor layer and an N-type semiconductor layer are sequentially formed on a bottom wall and side walls of the trench and the front surface of the semiconductor substrate. The trench is partially filled with the P-type semiconductor layer. Thereafter, the N-type semiconductor layer and the P-type semiconductor layer are planarized, and the P-type semiconductor layer and the N-type semiconductor layer in the trench are retained. Next, a gate structure is formed at a gate area of the front surface of the semiconductor substrate, a source electrode is formed on two sides of the gate structure, and a drain electrode is formed on a rear surface of the semiconductor substrate respectively.

Abstract: A semiconductor package may include: a substrate; a first sub-semiconductor package disposed over the substrate, the first sub-semiconductor package including a first buffer chip and a first memory chip; and a second memory chip disposed over the first sub-semiconductor package, wherein the first buffer chip and the first memory chip are connected to each other using a first redistribution line, and wherein the first buffer chip and the second memory chip are connected to each other using a second bonding wire.

Abstract: A semiconductor device includes a substrate, an interconnect structure, and conductive vias. The substrate has a first side, a second side and a sidewall connecting the first side and the second side, wherein the sidewall includes a first planar sidewall of a first portion of the substrate, a second planar sidewall of a second portion of the substrate and a curved sidewall of a third portion of the substrate, where the first planar sidewall is connected to the second planar sidewall through the curved sidewall. The interconnect structure is located on the first side of the substrate, where a sidewall of the interconnect structure is offset from the second planar sidewall. The conductive vias are located on the interconnect structure, where the interconnect structure is located between the conductive vias and the substrate.

Abstract: A universal interposer for an integrated circuit (IC) device has a body having a first surface and a second surface opposite the first surface. A first region is formed on a first side of the body along a first edge. The first region has first slots, each having an identical first bond pad layout. A second region is formed on the first side along a second edge, opposite the first edge. The second region has second slots having an identical second bond pad layout. A third region having third slots is formed on the first side between the first and second regions, each slot having an identical third bond pad layout. A pad density of the third bond pad layout is greater than the first bond pad layout. One of the third slots is coupled to contact pads disposed in a region not directly below any of the second slots.

Abstract: A display substrate includes a first base and a plurality of pixel units arranged in rows and in columns. A pixel unit includes a first light-emitting device, a second light-emitting device and a third light-emitting device. A first effective light-emitting area where the first light-emitting device is located and a second effective light-emitting area where the second light-emitting device is located are arranged at intervals along a first direction, a third effective light-emitting area where the third light-emitting device is located is spaced apart from both the first effective light-emitting area and the second effective light-emitting area arranged along a second direction.

Abstract: An organic light-emitting diode (OLED) display substrate, a manufacturing method thereof and a display panel are provided. The OLED display substrate has pixel regions and includes a base substrate and a pixel defining layer disposed on the base substrate; in regions of the pixel defining layer corresponding to the pixel regions, accommodation parts penetrating the pixel defining layer are disposed, and the pixel defining layer is further provided with guide parts disposed corresponding to the accommodation parts, the guide parts are located on a periphery of the corresponding accommodation parts and formed by recessed areas which are formed on a side of the pixel defining layer away from the base substrate, the recessed areas do not penetrate the pixel defining layer, and an orthographic projection of the guide part on the base substrate is directly coupled to an orthographic projection of the corresponding accommodation part on the base substrate.

Abstract: A first wiring member bends at a first bent portion in the shape of the letter “L” in a side view and includes a first horizontal portion parallel to the principal surface of a semiconductor chip and a first vertical portion perpendicular to the first horizontal portion. A second wiring member bends at a second bent portion in a direction opposite to the first wiring member in the shape of the letter “L” in the side view and includes a second horizontal portion flush with the first horizontal portion and a second vertical portion a determined distance distant from the first vertical portion and parallel to the first vertical portion. A wiring holding portion fills a gap between the first and second vertical portions and a gap between the first and second bent portions. Therefore, stress applied to the vicinity of the first or second bent portion is relaxed.

Abstract: Described herein are integrated circuit (IC) structures, devices, and methods associated with device layer interconnects. For example, an IC die may include a device layer including a transistor array along a semiconductor fin, and a device layer interconnect in the transistor array, wherein the device layer interconnect is in electrical contact with multiple different source/drain regions of the transistor array.

Abstract: A semiconductor package includes a package substrate that includes an interior laminate layer, a first metallization layer disposed below the interior laminate layer, and a second metallization layer disposed above the interior laminate layer, a first semiconductor die that includes a first load terminal disposed on a first surface of the first semiconductor die and a second load terminal disposed on a second surface of the first semiconductor die that is opposite from the first surface of the first semiconductor die, and a liner of dielectric material on the first semiconductor die, wherein the first semiconductor die is embedded within the interior laminate layer such that the first surface of the first semiconductor die faces the second metallization layer, and wherein the liner of dielectric material is disposed on a corner of the first semiconductor die that is between the first and second load terminals of the first semiconductor die.

Abstract: A display apparatus including a circuit board, at least one LED stack configured to emit light, electrode pads disposed on the at least one LED stack and electrically connected to the at least one LED stack, and electrodes disposed on the electrode pads and electrically connected to the electrode pads, respectively, in which each of the electrodes has a fixed portion that is fixed to one of the electrode pads and an extending portion that is spaced apart from the one of the electrode pads, and the electrodes include at least two metal layers having different thermal expansion coefficients from each other.

Abstract: A semiconductor device having a radiating element and a directing structure is provided. The semiconductor device includes a device package. A semiconductor die is coupled to the radiating element integrated in the device package. The directing structure is affixed to the device package by way of an adhesive. The directing structure is located over the radiating element and configured for propagation of radio frequency (RF) signals.

Abstract: A method of manufacturing a semiconductor device is provided. The method includes attaching a first end of a first bond wire to a first conductive lead and a second end of the first bond wire to a first bond pad of a first semiconductor die. A conductive lead extender is affixed to the first conductive lead by way of a conductive adhesive, the lead extender overlapping the first end of the first bond wire. A first end of a second bond wire is attached to the lead extender, the first end of the second bond wire conductively connected to the first end of the first bond wire.

Abstract: A semiconductor package comprising a first semiconductor chip and a second semiconductor chip disposed on the first semiconductor chip, wherein the first semiconductor chip includes a first semiconductor body, an upper pad structure, and a first through-electrode penetrating the first semiconductor body and electrically connected to the upper pad structure, and the second semiconductor chip includes a second semiconductor body, a lower bonding pad, and an internal circuit structure including a circuit element, internal circuit wirings, and a connection pad pattern disposed on the same level as the lower bonding pad, the upper pad structure includes upper bonding pads and connection wirings, the upper bonding pads are disposed at positions corresponding to the lower bonding pad and the connection pad pattern, and the internal circuit structure is electrically connected to the first through-electrode through at least one of the upper bonding pads and the connection wirings.

Abstract: An object is to provide a semiconductor device capable of reducing inductance between a high potential terminal and a low potential terminal while achieving downsizing of the semiconductor device. A semiconductor device includes: the insulating substrate; the circuit pattern including a low potential circuit pattern and a high potential circuit pattern provided on a region adjacent to the low potential circuit pattern; a plurality of semiconductor chips mounted on the circuit pattern; a low potential terminal having one end portion connected to the low potential circuit pattern; and a high potential terminal having one end portion connected to the high potential circuit pattern, wherein the high potential terminal and the low potential terminal include electrode parts and constituting parallel flat plates vertically disposed in parallel to each other and extending on a side of the low potential circuit pattern and electrode parts and protruding from the insulating substrate.

Abstract: A semiconductor device package includes a supporting element, a transparent plate disposed on the supporting element, a semiconductor device disposed under the transparent plate, and a lid surrounding the transparent plate. The supporting element and the transparent plate define a channel.

Abstract: A package structure includes a circuit substrate, a semiconductor package, a lid structure and a plurality of first spacer structures. The semiconductor package is disposed on and electrically connected to the circuit substrate. The lid structure is disposed on the circuit substrate covering the semiconductor package, wherein the lid structure is attached to the circuit substrate through an adhesive material. The plurality of first spacer structures is surrounding the semiconductor package, wherein the first spacer structures are sandwiched between the lid structure and the circuit substrate, and includes a top portion in contact with the lid structure and a bottom portion in contact with the circuit substrate.

Abstract: A package structure and method of manufacturing is provided, whereby heat dissipating features are provided for heat dissipation. Heat dissipating features include conductive vias formed in a die stack, thermal chips, and thermal metal bulk, which can be bonded to a wafer level device. Hybrid bonding including chip to chip, chip to wafer, and wafer to wafer provides thermal conductivity without having to traverse a bonding material, such as a eutectic material. Plasma dicing the package structure can provide a smooth sidewall profile for interfacing with a thermal interface material.

Abstract: The method for manufacturing an electronic device includes at least: a step of preparing a structure provided with an adhesive film provided with a base material layer, an adhesive resin layer (A) provided on a first surface side of the base material layer and for temporarily fixing an electronic component, and an adhesive resin layer (B) provided on a second surface side of the base material layer and in which an adhesive force is decreased by an external stimulus, an electronic component attached to the adhesive resin layer (A) of the adhesive film, and a support substrate attached to the adhesive resin layer (B) of the adhesive film; at least one step selected from a step of decreasing water content in the adhesive film and a step of decreasing water content in the structure; and a step of sealing the electronic component with a sealing material.