Abstract: A radiographic silver halide film comprises a cubic grain silver halide emulsion layer on one side of the support and a tabular grain silver halide emulsion layer on the other side. The cubic grain silver halide emulsion layer comprises a combination of first and second spectral sensitizing dyes that provides a combined maximum J-aggregate absorption on the cubic silver halide grains of from about 540 to about 560 nm. The first spectral sensitizing dye is an anionic benzimidazole-benzoxazole carbocyanine, the second spectral sensitizing dye is an anionic oxycarbocyanine. The cubic grain silver halide emulsion layer also includes a mixture of gelatin or a gelatin derivative and a second hydrophilic binder other than gelatin or a gelatin derivative at a weight ratio of first to second hydrophilic binder of from about 2:1 to about 5:1. The cubic silver halide grains comprise from about 1 to about 20 mol % chloride and from about 0.25 to about 1.

Abstract: A method for defining a full phase layout for defining a layer of material in an integrated circuit is described. The method can be used to define, arrange, and refine phase shifters to substantially define the layer using phase shifting. Through the process, computer readable definitions of an alternating aperture, dark field phase shift mask and of a complimentary mask are generated. Masks can be made from the definitions and then used to fabricate a layer of material in an integrated circuit. The separations between phase shifters, or cuts, are designed for easy mask manufacturability while also maximizing the amount of each feature defined by the phase shifting mask. Cost functions are used to describe the relative quality of phase assignments and to select higher quality phase assignments and reduce phase conflicts.

Abstract: A phase shift mask including a first phase shifter through which light passes by a first optical path length; a second phase shifter through which light passes by a second optical path length inverted in an optical phase from the first optical path length, the second phase shifter formed away from the first phase shifter by a predetermined distance; a light-blocking part formed around the first phase shifter and second phase shifter; and a correction pattern provided at a part of at least one of the first phase shifter and second phase shifter for correcting a distribution of light intensity between light passing through the first phase shifter and light passing through the second phase shifter, and method of exposure and method of producing a semiconductor device using the phase shift mask.

Abstract: A mask used for imaging nearly dense features in a substrate. Scatter dots are disposed on the mask in proximity to the nearly dense features, where the scatter dots adjust photon levels of the nearly dense features to a desired level. The adjustment is controlled by selective adjustment of a duty cycle and degree of stagger of the scatter dots. In this manner, the scatter dots adjust the optical properties of the nearly dense features to be very similar to the optical properties of dense features, which enables more accurate imaging of the nearly dense features on the substrate. However, because the scatter dots are discontinuous, they do not overcorrect in the same manner that a scatter bar formed at a minimum resolution might overcorrect. Further, there is a reduced likelihood that the scatter dots would actually print on the substrate.

Abstract: A silver halide color photosensitive material comprises at least one layer on a support. At least one of the layers contains a coupler represented by general formula (I): wherein X represents H or split-off group; R1 and R2 independently represents an electron withdrawing group whose Hammett ?p value is 0.20 or greater, provided that the sum of R1 and R2 ?p values is 0.65 or greater; R3 represents a group selected from alkyl, alkenyl, alkynyl, cycloalkyl, cycloalkenyl, aryl and heterocyclic, each of which may have a substituent; R4 represents H, or a group selected from alkyl, alkenyl, alkynyl, cycloalkyl, cycloalkenyl, aryl, acyl, alkoxycarbonyl, aryloxycarbonyl and carbamoyl, each of which may have a substituent, provided that R3 and R4 may be bonded to form a ring; R11, R12 and R13 independently represent an alkyl group having 1-30 carbon atoms; R represents a substituent; and n represents an integer of 0-3.

Abstract: Disclosed is a photographic element comprising a light sensitive silver halide emulsion layer and, having associated with that layer a 1H-pyrazolo[1,5-b]-1,2,4-triazole dye forming coupler having a fully substituted carbon atom at the 6-position, a chloro group at the 7-position, and, at the 2-position, a phenyl ring substituted in the meta position with a carbonamido substituent containing an ?-sulfone moiety. Photographic elements containing these couplers exhibit desirable bleach-fix and activity characteristics.

Abstract: This invention relates to semiconductor devices, microelectronic devices, microelectromechanical devices, microfluidic devices, photonic devices, and more particularly to a multi-tiered lithographic template, a method of forming the multi-tiered lithographic template and a method for forming devices with the multi-tiered lithographic template. The multi-tiered lithographic template (10/10?) is formed having a first relief structure and a second relief structure, thereby defining a multi-tiered relief image. The template is used in the fabrication of a semiconductor device (40) for affecting a pattern in device (40) by positioning the template in close proximity to semiconductor device (40) having a radiation sensitive material formed thereon and applying a pressure to cause the radiation sensitive material to flow into the multi-tiered relief image present on the template.

Abstract: A silver halide color photographic light-sensitive material with a magenta emulsion layer containing a pyrazolotriazole magenta dye-forming coupler and containing an emulsion whose silver chloride content is 98 mol % or more, with a light-insensitive hydrophilic colloidal layer containing a solid fine-particle dispersion of a dye. The magenta emulsion layer is a light-sensitive silver halide emulsion layer most apart from the light-insensitive hydrophilic colloidal layer among all the light-sensitive silver halide emulsion layers. A silver halide color photographic light-sensitive material for cinema, in which light-sensitive silver halide particles have a silver chloride content of 95 mol % or more, a total coated amount of silver is 1.7 g/m2 or less, a thickness of the film on the support on the side of layers containing the light-sensitive silver halide is 12.0 ?m or less, and the swelling rate to water is 200% or less.

Abstract: A mask for fabricating semiconductor components contains first transparent regions and second transparent regions. The second regions are laid out such that they do not act on the regions of the photoresist directly beneath them in the exposure of the photoresist through the mask. The transparent regions define a size and a shape of structures to be formed.

Abstract: The invention provides a silver halide emulsion, comprising: silver halide grains containing silver chloride as a primary component and further containing silver bromide; wherein, when an average value of a silver bromide content of the silver halide grains is represented by Y (mol %), a silver bromide content of at least 68% of the silver halide grains is from 0.82×Y (mol %) to 1.18×Y (mol %). Further, the invention provides a method of producing the silver halide emulsion, comprising the step of reacting at least a silver ion, a chlorine ion and a bromine ion; wherein a growth speed at a time of forming a silver bromine-containing phase in the reaction process is at least 60% of a critical growth speed.

Abstract: A method and apparatus for coupling a pellicle assembly to a photomask are disclosed. A pellicle assembly is mounted on a photomask by bringing an adhesive material formed on a surface of a frame associated with the pellicle assembly in contact with the photomask. The adhesive material is heated to cause the adhesive gasket to flow and comply with a flatness of the photomask.

Abstract: Photomask blanks are fabricated by forming half-tone film over quartz substrate and causing a half-tone phase shift film to contain impurity becoming a color center by implanting ion at a predetermined depth of the half-tone film by means of ion-implantation. Using the above photomask blanks, a desired pattern is formed within photosensitive resist by applying photosensitive resist over the half-tone film thereover, exposing the resist through use of a desired pattern, and then developing the resist. Through the above photosensitive resist as a mask, the half-tone film is etched to form a predetermined pattern within the half-tone film. The exposed photosensitive resist is removed to fabricate a photomask.

Abstract: The invention relates to a photographic element comprising at least one light-sensitive silver halide emulsion layer having associated therewith in the same dispersion a certain de-aggregating hydrogen bond donating and hydrogen bond accepting compound and at least one pyrazole fused ring derivative coupler. The combination provides improved colour reproduction.

Abstract: The invention is intended for commercializing a pattern transfer process using a graytone mask, wherein the mask has a graytone part constituted of a minute opaque pattern of a size smaller than a resolution limit of an aligner using a graytone mask. For example, a contour pattern 30 is formed in an area close to a graytone part 3 along a contour pattern of an opaque pattern 1 adjacent to the graytone part 3.

Abstract: A process for producing a spectrally sensitized silver halide photographic emulsion having high sensitivity. A process for producing a silver halide photographic emulsion comprising as a sensitizing dye at least one connection dye having two or more chromophores connected through a covalent bond, the process comprising adding said connection dye to a silver halide photographic emulsion and allowing at least one chromophore out of a plurality of chromophores in the molecule of the connection dye to change in the adsorption strength to a silver halide grain; and a process for producing a silver halide photographic emulsion comprising a silver halide grain having adsorbed on the surface thereof a sensitizing dye in multiple layers, the process comprising adding one or a plural of sensitizing dye(s) to said silver halide emulsion and allowing at least one sensitizing dye out of added sensitizing dyes to change in the adsorption strength to a silver halide grain.

Abstract: At least one of a nucleus forming process, a nucleus growing process, a chemical sensitizing process, and a spectral sensitizing process for producing a silver halide photographic emulsion is performed by using a microreactor. A minute region of the microreactor is used to precisely perform a reaction of nucleus formation. A condition under which host grains are allowed to react with newly supplied silver halide nuclei is made uniform to cause uniform crystal growth. A predetermined quantity of molecules for chemical sensitization is doped in a crystal lattice of a nucleus of silver halide to effect a sensitizing process. Alternatively, a spectral sensitizing process in which a single molecular layer of a spectral sensitizer is uniformly adsorbed on a silver halide nucleus grain surface is securely carried out.

Abstract: In order to increase the rigidity of a membrane mask that can be used for ion projection lithography, a second wafer made of the material of the membrane layer is provided in addition to a first wafer. The second wafer is patterned in the same way as the first wafer to form a second carrying ring and is fitted on the membrane layer in a mirror-inverted manner with respect to the first wafer so that the membrane area is arranged between the first and second carrying rings in a centered manner in the direction perpendicular to the membrane plane.

Abstract: Disclosed is a silver halide photographic light-sensitive material comprising at least one silver halide emulsion layer on a support, wherein 40 mol % or more of silver halide contained in the silver halide emulsion layer is silver bromide and the silver halide contains 1×10−6 mole or more per mole of silver of a metal complex containing one or more cyanide ligands, and the silver halide photographic light-sensitive material has a characteristic curve drawn in orthogonal coordinates of logarithm of light exposure (x-axis) and optical density (y-axis) using equal unit lengths for the both axes, on which gamma is 4.0 or more for the optical density range of 0.1-1.5. There is provided a silver halide photographic light-sensitive material showing high contrast and high sensitivity.

Abstract: A silver halide photographic material comprising at least one methine dye of formula (I) and at least one coupler of formula (X): wherein X1 and X2 each represents O, S, Se, Te, N or C; Y1 represents a furan, pyrrole or thiophene ring which may be condensed and substituted with the specific ring; Y2 represents an atomic group necessary for forming a benzene ring or a 5- or 6-membered unsaturated heterocycle; R1 and R2 each represents a substituted or unsubstituted alkyl, aryl or heterocyclic group; L1, L2 and L3 each represents a methine group; n1 represents 0 or 1; M1 represents a counter ion; and m1 represents a number of 0 or more necessary for neutralizing a charge in a molecule; wherein Z1 and Z2 each represents —C(Q3)═ or —N═; Q1 and Q3 each represents a hydrogen atom or a monovalent substituent group; Q2 represents a hydrogen atom or a coupling release group.

Abstract: An ablatable, direct write imaging medium includes a polymeric matrix having a carbon pigment and an ultraviolet absorbing dye therein. The carbon pigment functions to absorb relatively long wavelengths of light to cause ablation of the medium. The ultraviolet absorbing dye gives the ablation-imaged medium high optical density in ultraviolet portions of the spectrum.