Abstract: At the time of real-time measurement, when a measurement position is specified by a marker, a marker level acquiring section acquires a waveform level from waveform data stored in a waveform memory. A level comparing section determines whether the waveform level acquired by the marker level acquiring section falls within an effective measurement level range preset correspondingly with attenuator (ATT) values. When the level comparing section determines that the waveform level does not fall within the effective measurement level range, an ATT value change section changes the ATT values into new ATT values at which a waveform level falls within the corresponding effective measurement level range. A control section allows a measured optical fiber to be measured based on the new ATT value, so as to enable waveform measurement with a good S/N ratio of not less than a predetermined value based on a measurement waveform displayed on a screen of a display section.

Abstract: A method and system for evaluating an object that has a repetitive pattern. Illumination optics of an optical unit are adapted to scan a spot of radiation over a repetitive pattern that includes multiple regularly repeating structural elements that are optically distinguishable from their background, generating a diffraction pattern that includes multiple diffraction lobes. Collection optics are adapted to focus radiation from the repetitive pattern onto a detector. The focused radiation includes a single diffraction lobe while not including other diffraction lobes. A grey field detector generates detection signals, responsive to the focused collected radiation.

Abstract: A system and method for improving data provided by ellipsometer, polarimeter and the like systems involving diminishing the effects of undesirable noise in the intensity of a beam of electromagnetic radiation caused by, for instance, random variations in intensity of a source provided beam of electromagnetic radiation and/or periodic or non-periodic variations in beam intensity resulting from wobble/wander of a moving sample, during investigation of the sample by the beam of electromagnetic radiation.

Abstract: A system for alignment measurement for a rolling embossed double-sided optical film, the system comprising: a first roller with a first brightness enhancement film pattern and a first alignment pattern thereon, a second roller with a second brightness enhancement film pattern and a second alignment pattern thereon; a measuring unit for measuring diffraction patterns in the first alignment region and the second alignment region, respectively; and a control unit electrically connected to the first roller, the second roller and the measuring unit to adjust the relative position between the first roller and the second roller according to the diffraction patterns measured by the measuring unit.

Abstract: A method for measuring visual appearance of birefringent fibers is disclosed. The method involves emitting light, creating N polarization states of the emitted light, wherein the polarized emitted light illuminates the birefringent fibers, thereby generating internal reflection components, external reflection components, and diffusion components of the light, observing the light from the illuminated birefringent fibers, creating N polarization states of the observed light, forming N images of the observed polarized light, each image comprising a plurality of pixels, measuring the intensity in each pixel of the N images, and for each pixel, separating the internal reflection component, the external reflection component, and the diffusion component from the i-th image for the N images, wherein i=1, 2, . . . N and N?4.

Abstract: In laser welding, the welding area is depicted coaxially in relation to the laser beam (3) through the laser optics (4), wherein not only a triangulation line and a grey or color image of the solidified weld is recorded but also the process radiation of the welding process. From these three image elements, an optimum quality assessment of the welding process and of the weld can be made.

Abstract: An exhaust gas analyzer capable of real-time analysis of the concentration, temperature, and the like of an exhaust gas component in a cross-section of an exhaust path in a spot-wise manner reduces analysis cost. An exhaust gas analyzer (10) comprises sensor units (11) to (14) disposed along the exhaust path, which comprises an exhaust manifold (3) for the engine (2) discharging exhaust gas, an exhaust tube (4), a first catalyst device (5), a second catalyst device (6), a muffler (7), and an exhaust pipe (8). Each sensor unit includes an optical fiber (25) for irradiating the exhaust gas with laser light, and a detector (26) for receiving the laser light emitted by the optical fiber that has been transmitted through the exhaust gas. Based on the laser light received by the detector, the condition of an exhaust gas component, such as its concentration, temperature, and the like, is measured for the analysis of the exhaust gas.

Abstract: A system includes a microprocessor, storage device, test instrument, switching system, main switching system with subsidiary, switching systems and the sensors. The program that is executed by the microprocessor accesses the database stored on the storage device. The microprocessor accesses information in the database and directs the switching system to select the appropriate sensor. Once the switching system has selected the appropriate sensor, the microprocessor then tells the test instrument to send a signal to the sensor. The test instrument sends the signal and collects the measured data. The measured data is then sent to the microprocessor, where the measured data is analyzed and compared with the baseline data. The comparison between the measured data and the baseline data reveals any anomalies that are occurring over the length of the sensor. The microprocessor displays the anomalies and keys an alarm when the anomalies are detected.

Abstract: A method of measuring a property of a substrate includes generating a patterned mask configured to cause a radiation beam passing through the mask to acquire the pattern, simulating radiating the substrate with a patterned radiation beam that has been patterned using the mask to obtain a simulated pattern, determining at least one location of the simulated pattern that is prone to patterning errors, and irradiating the substrate with the patterned radiation beam using a lithographic process. The method also includes measuring an accuracy of at least one property of the at least one location of the pattern on the substrate that has been determined as being prone to patterning errors, and adjusting the lithographic process according to the measuring.

Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including: but not limited to, critical dimension and overlay misregistration; defects and thin film characteristics; critical dimension and defects; critical dimension and thin film characteristics; critical dimension, thin film characteristics and defects; macro defects and micro defects; flatness, thin film characteristics and defects; overlay misregistration and flatness; an implant characteristic and defects; and adhesion and thickness.

Abstract: A focal position determining method determines a focal position of an objective lens focused on an observed target region in a specimen. The focal position determining method includes measuring any one of the focal position of the objective lens at a near point and the focal position of the objective lens at a far point or both so as to determine the focal position of the objective lens focused on the observed target region based on the measured focal position.

Abstract: A fragmented lens system for creating an invisible light pattern useful to computer vision systems is disclosed. Random or semi-random dot patterns generated by the present system allow a computer to uniquely identify each patch of a pattern projected by a corresponding illuminator or light source. The computer may determine the position and distance of an object by identifying the illumination pattern on the object.

Abstract: Laser light is confined in a hollow waveguide between two highly reflective mirrors. This waveguide cavity is used to conduct Cavity Ringdown Absorption Spectroscopy of loss mechanisms in the cavity including absorption or scattering by gases, liquid, solids, and/or optical elements.

Abstract: A method for measuring and monitoring the state of polarization (SOP) of a polarization maintaining (PM) fiber using a narrowband fiber Bragg grating (FBG) written on the same is provided. The PM fiber comprises a first narrowband reference FBG which is used as a reference to measure and monitor the SOP of the PM fiber. Due to the birefringence properties of the PM fiber, the reference FBG typically reflects two narrowband spectra, each having a central wavelength; one in the slow axis and one in the fast axis. By measuring the intensity of the reflected spectra in each axis and by tuning the fiber with a polarization controller, it is possible to adjust the fiber to a predetermined SOP. Accurate measures of optical properties (e.g. reflectivity) of optical devices (e.g. a FBG grating), according to the predetermined SOP, are possible.

Abstract: There is provided an on-line detection system and method for a weld of a steel strip, which can emit a laser beam onto the surface of a steel strip moving at a high speed and measure the reflectivity of the laser beam reflecting from the same, thereby detecting the weld of the steel strip easily on-line. In the on-line detection system, reflectivity measuring means emits a laser beam onto a moving steel strip and continuously measuring the reflectivity of the laser beam returning from the surface of the steel strip, and signal processing means detects a weld of the steel strip based on change in the reflectivity measured on the weld.

Abstract: The present invention relates to a spectral measurement apparatus and measurement method utilizing Brillouin scattering, which judge the state of the temperature or strain of an optical fiber more quickly. The spectral measurement apparatus comprises a light source, an analysis section, and an anomaly judgment section. The light source outputs pumping light and probe light. The pumping light and probe light thus output are caused to enter in opposite directions to the sensing fiber. The analysis section analyzes the gain received by the probe light as a result of the Brillouin scattering. The anomaly judgment section judges the state relating to the temperature or strain of the sensing fiber on the basis of the analysis result of the analysis section. The frequency difference ? between the pumping light and probe light is set within a predetermined frequency difference setting range.

Abstract: There is described a method for positioning an object on an optical sensor system for acquiring a surface thereof, the sensor system having a set of motors for rotating the object around a motor axis perpendicular to an optical axis of the sensor system and for translating the object in X, Y and Z directions, the method comprising: (a) acquiring a relief map of an area in a field of view of the sensor system; (b) computing a normal representative of a topography of the relief map of the area; (c) determining an angle difference between the normal and the optical axis of the sensor system; (d) comparing the angle difference to a threshold angle to determine if the surface of the area is perpendicular to the sensor axis; (e) if the angle difference is greater than a threshold angle, rotating the object to obtain a new difference angle less than the threshold angle; and (f) translating the object to reposition the area in the field of view after the rotating has displaced the area.

Abstract: A system for measuring a laser-induced damage threshold in an optical fiber may include a lens to direct a first laser beam through a core of the optical fiber. The system may also include an optical arrangement to direct a second laser beam through an exterior surface of the optical fiber and into the core of the optical fiber at a preselected location of the optical fiber to provide a predetermined power density at the preselected location, wherein the optical arrangement causes the second laser beam to be directed into the optical fiber substantially completely around a perimeter of the optical fiber to provide the predetermined power density.

Abstract: An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.

Abstract: A defect inspecting apparatus of the invention solves a problem that in a defect inspecting apparatus, because of improving detection sensitivity of a microscopic defect by reducing a detection pixel size, a focal depth becomes shallow, a height of imaging is varied due to environmental change and the detection sensitivity of a defect becomes unstable. This apparatus comprises an XY stage, which carries a substrate to be inspected and scans in a predetermined direction, and a mechanism having a system of irradiating a defect on the inspected substrate at a slant and detecting the defect by a detection optical system disposed on the upper side, which corrects a height of imaging in real time for change in temperature and barometric pressure in order to keep the imaging in a best condition.