Patents Examined by Gregory Webb
  • Liquid mixture to clean dielectric barrier discharge surfaces
    Patent number: 9428718
    Abstract: Disclosed is a liquid cleaning mixture used to remove DMSO and other solvents and compounds that may build up on the surface of dielectric barrier material in a plasma cleaning device, where the DMSO, solvent and compounds have become contaminants.
    Type: Grant
    Filed: June 29, 2010
    Date of Patent: August 30, 2016
    Assignee: IONFIELD HOLDINGS, LLC
    Inventor: Paul F. Hensley
  • Cleaning liquid for semiconductor elements and cleaning method using same
    Patent number: 9422512
    Abstract: By cleaning with use of a cleaning liquid that contains 10-30% by mass of hydrogen peroxide, 0.005-10% by mass of a quaternary ammonium hydroxide, 0.005-5% by mass of potassium hydroxide, 0.000005-0.005% by mass of an amino polymethylene phosphonic acid and water, a hard mask, an organosiloxane-based thin film, dry etching residue and a photoresist can be removed without corroding a low-dielectric-constant interlayer dielectric film, a wiring material such as copper or an copper alloy, a barrier metal and a barrier dielectric film. According to preferred embodiments of the present invention, damage to copper wiring lines is suppressed even in cases where an acid is added into the cleaning liquid and significant decomposition of hydrogen peroxide is not caused even in cases where titanium is added into the cleaning liquid.
    Type: Grant
    Filed: November 29, 2013
    Date of Patent: August 23, 2016
    Assignee: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kenji Shimada, Toshiyuki Oie, Ryota Nakayama, Masaru Ohto
  • Optical reflective film and optical reflector using the same
    Patent number: 9417365
    Abstract: Provided are an optical reflective film which is a system that permits the employment of a water-based coating method in view of environmental conservation and which, even in a case where the optical reflective film is produced by simultaneous multilayer coating with high production efficiency, exhibits excellent light reflecting properties at a desired wavelength and a low haze due to the suppression of an interlaminar mixing level and interfacial disorder; and an optical reflector using the same.
    Type: Grant
    Filed: October 30, 2012
    Date of Patent: August 16, 2016
    Assignee: KONICA MINOLTA, INC.
    Inventor: Akihito Hisamitsu
  • Systems and methods for cooling tower fill cleaning with a chemical gel
    Patent number: 9404069
    Abstract: Systems and methods for formulating and utilizing chemical gel formulations, particularly with respect to cooling tower fill cleaning operations.
    Type: Grant
    Filed: September 30, 2015
    Date of Patent: August 2, 2016
    Assignee: Crossford International, LLC
    Inventors: Timothy J. Kane, Joseph J. Franzino, Pete Gentile, Mark Rothenhausen, Ray Field
  • Use of R-1233 in liquid chillers
    Patent number: 9404678
    Abstract: This invention relates to the use of chloro-trifluoropropenes as refrigerants in negative-pressure liquid chillers and methods of replacing an existing refrigerant in a chiller with chloro-trifluoropropenes. The chloro-trifluoropropenes, particularly 1-chloro-3,3,3-trifluoropropene, have high efficiency and unexpectedly high capacity in liquid chiller applications and are useful as more environmentally sustainable refrigerants for such applications, including the replacement of R-123 and R-11.
    Type: Grant
    Filed: February 25, 2014
    Date of Patent: August 2, 2016
    Assignee: Arkema Inc.
    Inventors: Brett L. Van Horn, Philippe Bonnet, Laurent Abbas
  • Cleaning composition, cleaning process, and process for producing semiconductor device
    Patent number: 9396926
    Abstract: A cleaning method is provided that includes a step of preparing a cleaning composition containing 57 to 95 wt % of (component a) water, 1 to 40 wt % of (component b) a secondary hydroxy group- and/or tertiary hydroxy group-containing hydroxy compound, (component c) an organic acid, and (component d) a quaternary ammonium compound, the composition having a pH of 5 to 10, and a step of removing plasma etching residue formed above a semiconductor substrate by means of the cleaning composition.
    Type: Grant
    Filed: January 17, 2014
    Date of Patent: July 19, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Atsushi Mizutani, Hideo Fushimi, Tomonori Takahashi, Kazutaka Takahashi
  • Phosphorus free low temperature ware wash detergent for reducing scale build-up
    Patent number: 9394508
    Abstract: Phosphorus-free detergent compositions are provided. Detergent compositions including an aminocarboxylate, water conditioning agent, source of alkalinity and water beneficially do not require the use of additional surfactants and/or polymers to provide suitable detergency and prevent scale build-up on treated surfaces. The detergent compositions are used with a sanitizer to employ the phosphorus-free detergent compositions for use as low temperature ware wash detergents that beneficially reduce scale build-up. Methods of employing the phosphorus-free detergent compositions are also provided.
    Type: Grant
    Filed: October 26, 2012
    Date of Patent: July 19, 2016
    Assignee: Ecolab USA Inc.
    Inventors: Erin Jane Dahlquist, Carter Martin Silvernail, Steven E. Lentsch, Terrence P. Everson
  • Stearyl and lauryl dimoniumhydroxy alkyl polyglucosides for enhanced food soil removal
    Patent number: 9382505
    Abstract: A cleaning composition including a primarily C12 quaternary functionalized alkyl polyglucoside selected from the group consisting of stearyldimoniumhydroxypropyl laurylglucosides chloride and lauryldimoniumhydroxypropyl cocoglucosides chloride, a water conditioning agent, an acid source, a solvent, and water. In one embodiment, the cleaning composition is substantially free of alkyl phenol ethoxylates. The cleaning composition is capable of removing soils including up to 20% proteins. The cleaning compositions include a biorenewable, environmentally friendly alternative to nonyl phenol ethoxylates and exhibit superior cleaning of food soils.
    Type: Grant
    Filed: September 30, 2014
    Date of Patent: July 5, 2016
    Assignee: Ecolab USA Inc.
    Inventors: Charles Allen Hodge, Erin Jane Dahlquist, Amanda Ruth Blattner
  • Detergent products, methods and manufacture
    Patent number: 9382506
    Abstract: A water-soluble pouch suitable for use in machine dishwashing and which comprises a plurality of compartments in generally superposed or superposable relationship, each containing one or more detergent active or auxiliary components, and wherein the pouch has a volume of from about 5 to about 70 ml and a longitudinal/transverse aspect ratio in the range from about 2:1 to about 1:8, preferably from about 1:1 to about 1:4. The water-soluble pouch allows for optimum delivery of dishwashing detergent. A process for the manufacture of multi-compartment pouches and a pack to contain the pouches are also disclosed.
    Type: Grant
    Filed: February 27, 2014
    Date of Patent: July 5, 2016
    Assignee: The Procter & Gamble Company
    Inventors: Tanguy Marie Louis Alexandre Catlin, Rachid Ben Moussa, Timothy Bernard William Kroese, Charles Rupert Gillham, James Ian Kinloch, David John Smith, Alison Lesley Main, Helen Varley
  • Cleaning liquid for semiconductor device substrates and method of cleaning substrate for semiconductor devices
    Patent number: 9365802
    Abstract: The invention relates to a cleaning liquid for semiconductor device substrates comprising the following components (A) to (D) and a method of cleaning semiconductor device substrates: (A) at least either one of a polycarboxylic acid and a hydroxycarboxylic acid; (B) a sulfonic acid type anionic surfactant; (C) a carboxylic acid type anionic surfactant; and (D) water.
    Type: Grant
    Filed: February 28, 2013
    Date of Patent: June 14, 2016
    Assignee: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Ken Harada, Atsushi Ito, Toshiyuki Suzuki
  • Vehicle-glass cleaning fluid composition comprising anionic surfactant and tartaric acid
    Patent number: 9365804
    Abstract: The present invention relates to a vehicle-glass cleaning fluid composition comprising an alcohol, an anionic surfactant, and tartaric acid as a corrosion inhibitor. The present invention provides a cleaning fluid composition entailing improved metal corrosion prevention, durability for rubbers and plastics, and performance in preventing the noise and wear which occur when there is friction between a wiper blade and glass surface. The cleaning fluid composition of the present invention has outstanding corrosion-preventing properties while also substantially improving test-piece weight-change reduction and abnormal appearance changes, and has a highly outstanding performance in preventing noise and wear due to friction.
    Type: Grant
    Filed: January 31, 2012
    Date of Patent: June 14, 2016
    Assignee: KUKDONG JEYEN COMPANY LIMITED
    Inventors: Jae Yoon Park, Chang Yeol Jo, Hong Ki Lee
  • Bio-based pot and pan pre-soak
    Patent number: 9365805
    Abstract: The present invention is a dimensionally stable solid detergent composition which can be used as a soaking composition. The composition includes a bio-based content of 58% or greater and includes an alkalinity source, a metal protector, a surfactant system, water, a threshold agent, and a polysaccharide hybrid polymer composition. The polymer the polysaccharide hybrid polymer composition includes a polysaccharide residue present in an amount from approximately 5% to 90% by weight of the polysaccharide hybrid polymer composition and a residue of at least one ethylenically unsaturated monomer or salts thereof present in an amount from approximately 10% to 75% by weight of the polysaccharide hybrid polymer composition.
    Type: Grant
    Filed: May 15, 2014
    Date of Patent: June 14, 2016
    Assignee: ECOLAB USA INC.
    Inventors: Amanda Ruth Blattner, Charles Allen Hodge, Carter M. Silvernail
  • Photoresist stripping composition for manufacturing LCD
    Patent number: 9360761
    Abstract: The present invention relates to a photoresist stripping composition for all process of manufacturing LCD, more specifically to a water-borne united photoresist stripping composition, as a weak basic composite comprising a tertiary alkanolamine, water, and an organic solvent. The composition according to the present invention prevents a corrosion of Al and Cu metal wiring in process of manufacturing LCD, has a good capability of removing photoresist, and is applied to all Al process, Cu process, an organic film process, and COA process.
    Type: Grant
    Filed: August 19, 2010
    Date of Patent: June 7, 2016
    Assignee: LTC Co., Ltd.
    Inventor: Ho Sung Choi
  • Method and composition for remedial treatment of parafin, asphaltenes, scale and deposits in oil and gas infrastructure and subterranean formations
    Patent number: 9353609
    Abstract: A method for treating a deposit is disclosed, wherein the deposit comprises a hydrophobic portion and an inorganic portion, the method including but not limited to contacting the deposit with a treating material to form a treated deposit, the treating material comprising peroxygen and surfactant and contacting the treated deposit with an acid. A product resulting from using the method is also disclosed.
    Type: Grant
    Filed: May 4, 2012
    Date of Patent: May 31, 2016
    Assignee: NW24 HOLDINGS, LLC
    Inventors: Charles Talley, Keith Weber
  • Processes and compositions for cleaning mixing devices to improve polymer production
    Patent number: 9347026
    Abstract: Processes and compositions for cleaning mixing devices are disclosed that improve the production and quality of thermoplastic polymer resins subsequently produced in the mixing device, while reducing the time needed for cleaning and/or change over. A cleaning mixture comprising polymeric resin pellets having a Rockwell R hardness of 85 to 140 externally coated with an aqueous solution containing sulfonate salts, alkyl aryl sulfonate salts, alkyl sulfate salts, C6 to C36 carboxylic acid salts, or mixtures thereof, is used to purge the mixing device. The surfactant salt is present in the aqueous solution at 0.2 to 30 wt % of the solution, the aqueous solution having a pH of 6.0 to 9.0.
    Type: Grant
    Filed: February 22, 2013
    Date of Patent: May 24, 2016
    Assignee: SABIC GLOBAL TECHNOLOGIES B.V.
    Inventors: Robert Russell Gallucci, Franklin Ehrensbeck
  • Non-amine post-CMP composition and method of use
    Patent number: 9340760
    Abstract: A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions are substantially devoid of amine and ammonium-containing compounds, e.g., quaternary ammonium bases. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.
    Type: Grant
    Filed: June 16, 2014
    Date of Patent: May 17, 2016
    Assignee: ADVANCED TECHNOLOGY MATERIALS, INC.
    Inventors: Jeffrey A. Barnes, Jun Liu, Peng Zhang
  • Compositions of hydrochlorofluoroolefins
    Patent number: 9340758
    Abstract: The present invention relates to solvent/cleaner and heat transfer fluid compositions comprising at least one hydrochlorofluoroolefin (HCFO), 1-chloro-3,3,3-trifluoropropene (HCFO-1233zd), particularly the trans-isomer. The HCFO of the present invention can be used in combination with co-agents including, hydrofluorocarbons (HFCs), hydrofluoroolefins (HFOs), hydrocarbons, ethers including hydrofluoroethers (HFEs), esters, ketones, alcohols, 1,2-transdichloroethylene and mixtures thereof.
    Type: Grant
    Filed: February 21, 2013
    Date of Patent: May 17, 2016
    Assignee: Arkema Inc.
    Inventors: Benjamin Bin Chen, Philippe Bonnet, Maher Y. Elsheikh, Brett L. Van Horn, Laurent Abbas
  • Cleaning liquid composition for electronic device
    Patent number: 9334470
    Abstract: [Purpose] To provide a cleaning liquid composition that has excellent removability for metallic impurities and particulates, does not cause corrosion of Cu, and can clean a semiconductor substrate having copper wiring in a production process for an electronic device such as a semiconductor device. [Solution means] A cleaning liquid composition for cleaning a semiconductor substrate having copper wiring, the cleaning liquid composition containing one or more types of basic compound containing no metal, and one or more types of phosphonic acid-based chelating agent, and having a hydrogen ion concentration (pH) of 8 to 10.
    Type: Grant
    Filed: December 5, 2012
    Date of Patent: May 10, 2016
    Assignee: KANTO KAGAKU KABUSHIKI KAISHA
    Inventors: Yumiko Taniguchi, Kikue Morita, Chiyoko Horike, Takuo Ohwada
  • Dynamic multi-purpose composition for the removal of photoresists and method for its use
    Patent number: 9329486
    Abstract: The disclosure is directed solutions and processes to remove substances from substrates. The substances can include photoresist. The solutions can include dimethylsulfoxide, a quaternary ammonium hydroxide, an alkanolamine, and less than 3% by weight water of a total weight of the solution. The quaternary ammonium hydroxide can include tetramethylammonium hydroxide, dimethyldipropylammonium hydroxide, or methyltriethylammonium hydroxide. Additionally, the solutions can include a secondary solvent. For example, the secondary solvent can include an alcohol. In another example, the secondary solvent can include ethylene glycol. Methods for the preparation and use of the solution to remove substances from substrates are also described.
    Type: Grant
    Filed: February 6, 2014
    Date of Patent: May 3, 2016
    Assignee: Dynaloy, LLC
    Inventors: Michael Tod Phenis, Lauri Johnson, Raymond Chan, Diane Marie Scheele, Kimberly Dona Pollard
  • Synthesis and antiscalant behavior of a novel polyzwitterionic acid
    Patent number: 9309336
    Abstract: A zwitterionic monomer and corresponding cyclopolymerized polyzwitterion (±) (PZ) containing, on each repeating unit, both phosphonate and sulfonate functionalities. Phosphonate ester hydrolysis in PZ gave a pH-responsive polyzwitterionic acid (±) (PZA). The PZA under pH-induced transformation was converted into polyzwitterion/anion (±?) (PZAN) and polyzwitterion/dianion (±=) (PZDAN).
    Type: Grant
    Filed: November 27, 2013
    Date of Patent: April 12, 2016
    Assignees: King Fahd University Of Petroleum and Minerals, King Abdulaziz City for Science and Technology
    Inventors: Shaikh Asrof Ali, Shamsuddeen Abdullahi Haladu