Abstract: Photoreflectance (PR) spectroscopy system and method for accumulating separately a “pump on” light beam and a “pump off light beam reflecting off a sample. The system comprises: (a) a probe source for producing a probe beam, the probe beam is used for measuring spectral reflectivity of a sample, (b) a pump source for producing a pump beam, (c) at least one spectrometer, (d) a first modulation device to allow the pump beam to alternatingly modulate the spectral reflectivity of the sample, so that, a light beam reflecting from the sample is alternatingly a “pump on” light beam and a “pump off light beam, (e) a second modulation device in a path of the light beam reflecting off the sample to alternatingly direct the “pump on” light beam and the “pump off light beam to the at least one spectrometer, and (f) a computer.

Abstract: A laser-based measurement device includes a laser transmitter; a laser receiver; an optical device configured to guide a laser beam emitted by the laser transmitter out of the laser-based measurement device and guide the laser beam reflected by an external environment in the laser receiver; and a driving device including a first magnetic member connected to the optical device and a second magnetic member. The driving device is configured to drive the optical device to vibrate through interaction between the first magnetic member and the second magnetic member, to change a guiding direction of the laser beam passing through the optical device.

Abstract: A manual inspection system and method to inspect for defects in Contact lenses comprising; an image acquisition system with at least two high resolution cameras; Top illumination light head used for acquiring Bright field images; a Backlit illumination module to acquire Dark field images; at least another back lit illumination module to acquire a different type of Bright field images; an interchangeable mechanism to change measurement gauges suitable for a particular product; a rotating wheel embedded with multiple optical filters to cater to different imaging requirements; a first camera to capture the full view of the contact lens at a beam splitter; a second camera suitably mounted on a swivel arm to capture a higher resolution image of a selected defective area as viewed on a projection screen; a glass template or measurement gauge mounted at a suitable position to achieve overlaid images of the lens and the gauge on a projection screen for taking measurements; a flexible template measurement gauge as an

Abstract: A method for optimization of photonic devices is disclosed. The method includes receiving a set of unconstrained latent variables; mapping the set of unconstrained latent variables to a constrained space to generate a constrained device; calculating the permittivity across each element of the constrained device; determining a permittivity-constrained width gradient based at least partially on the permittivity across each element; and optimizing the set of unconstrained latent variables by at least partially using the permittivity-constrained width gradient.

Abstract: An optical system for producing a structured optical beam including a convex lens having a spherical or cylindrical entry surface, an electromagnetic radiation source configured to provide a substantially coherent beam of electromagnetic radiation, and a focusing element arranged along the optical axis of the optical system. The electromagnetic radiation source is arranged to produce an illuminating beam which illuminates the convex lens over a selected illumination fraction of the spherical or cylindrical entry surface and with a corresponding selected focus of the illuminating beam such that the beam traverses a sufficient refractive volume of the convex lens to produce aberrations in the beam emerging from the convex lens such that it comprises a structured optical beam. The system and method allows for generating a structured beam which can propagate over the large distances while maintaining a well-defined cross-section intensity distribution.

Abstract: A method for determining the refractive index profile of a preform when the RIP is not substantially step-index like. (a) The preform deflection function is measured and transformed into a measured RIP. (b) A RI level and radius are assumed for the preform layer being evaluated and a compensation level RIP is calculated. (c) A theoretical deflection function is generated corresponding to the assumed RI level and radius and the generated data are transformed into a fitting RIP. (d) The fitting RIP is compared to the measured RIP and the comparison is evaluated against a predetermined accuracy level for the preform layer being evaluated. (e) Steps (b) and (c) are repeated iteratively until the predetermined accuracy level has been achieved. Steps (b) through (e) are repeated for each preform layer that needs to be compensated. Finally, a measurement artifact compensated refractive index profile is calculated for the preform.

Abstract: A particle detector formed by a body defining a chamber and housing a light source and a photodetector. A reflecting surface is formed by a first reflecting region and a second reflecting region that have a respective curved shape. The curved shapes are chosen from among portions of ellipsoidal, paraboloidal, and spherical surfaces. The first reflecting region faces the light source and the second reflecting region faces the photodetector. The first reflecting region has an own first focus, and the second reflecting region has an own first focus. The first focus of the first reflecting region is arranged in an active volume of the body, designed for detecting particles, and the photodetector is arranged on the first focus of the second reflecting region.

Abstract: A method is provided for detecting a property of a gas comprising: emitting a light, comprising a plurality of wavelengths covering a plurality of absorption lines of the gas, along a first axis, the light being scattered by particles of the gas resulting in a scattered light, generating a sensor image using a detection arrangement configured to receive the scattered light and comprising: an optical arrangement having an optical plane and being configured to direct the scattered light on to a light sensor, the light sensor having at least one pixel columns, wherein the pixel columns are aligned to an image plane and configured to output a sensor image, wherein the first axis, the optical plane, and the image plane intersect such that a Scheimpflug condition is achieved, determining, from the sensor image, properties of the gas at a plurality of positions along the first axis.

Abstract: An apparatus for measuring a position according to an embodiment includes a light source emitting light to an inner surface of a pipe, a first lens receiving reflected light from which light emitted by the light source is reflected by the inner surface and converting the reflected light into parallel light parallel to an optical axis, a second lens disposed on an optical path of the parallel light and converting the parallel light into a convergent refracted light, an image sensor disposed on an optical path of the refracted light, one or more elastic members disposed between the first lens and the second lens, and a plurality of wheels that are coupled to a side surface of the first lens and are in close contact with the inner surface to be rotated by movement of the moving body.

Abstract: A semiconductor metrology system including a spectrum acquisition tool for collecting, using a first measurement protocol, baseline scatterometric spectra on first semiconductor wafer targets, and for various sources of spectral variability, variability sets of scatterometric spectra on second semiconductor wafer targets, the variability sets embodying the spectral variability, a reference metrology tool for collecting, using a second measurement protocol, parameter values of the first semiconductor wafer targets, and a training unit for training, using the collected spectra and values, a prediction model using machine learning and minimizing an associated loss function incorporating spectral variability terms, the prediction model for predicting values for production semiconductor wafer targets based on their spectra.

Abstract: A inspection method for a cylindrical honeycomb structure including a step of placing a cylindrical honeycomb structure made of ceramics on a rotation stage; a step of irradiating the side surface of the cylindrical honeycomb structure with light having a wavelength of 300 to 500 nm; a step of repeatedly capturing a reflected light from the side surface with a line sensor camera having a pixel resolution of 1 to 25 ?m/pix while the light is irradiated to the side surface and the cylindrical honeycomb structure is rotated around the axis of rotation, with a depth of field of the line sensor camera being adjusted to 0.5 to 5 mm; a step of generating an inspection image of the entire side surface; and a step of determining presence or absence of defects on the side surface based on the inspection image.

Abstract: A system for detecting a light-emitting diode (LED) is provided. The system includes a first transparent substrate and multiple thin film transistors (TFT) disposed on the first transparent substrate and controlled separately, where the multiple TFTs are in one-to-one correspondence with LEDs to-be-detected in terms of location.

Abstract: An optical device comprises an optical filter having a substrate and a multilayer film, and an infrared light emitting and receiving device having a first conductive-type semiconductor layer, an active layer, and a second conductive-type semiconductor layer. The multilayer film has layers with different refractive indexes formed on at least one side of the substrate, in which first and second layers having refractive indexes of 1.2 or more and 2.5 or less, and 3.2 or more and 4.3 or less, respectively, in a wavelength range of 6 ?m to 10 ?m are alternately stacked. The optical filter includes a wavelength range having an average transmittance of 70% or more with a width of 50 nm or more in a wavelength range of 6 ?m to 10 ?m, and has a maximum transmittance of 10% or more in a wavelength range of 12.5 ?m to 20 ?m.

Abstract: A method for inspecting a reticle including a reflective layer on a reticle substrate is provided. The method may include loading the reticle on a stage, cooling the reticle substrate to a temperature lower than a room temperature, irradiating a laser beam to the reflective layer on the reticle substrate, receiving the laser beam using a photodetector to obtain an image of the reflective layer, and detect a particle defect on the reflective layer or a void defect in the reflective layer based on the image of the reflective layer.

Abstract: An optical inspection is performed to detect potential defects within integrated circuit devices and a first electron-based inspection of less than all of the potential defects is performed to identify primary actual defects. A process window of manufacturing parameter settings used to manufacture the integrated circuit devices is identified and the integrated circuit devices manufactured using the manufacturing parameter settings inside the process window have less than a threshold number of the primary actual defects. To identify additional actual defects a second electron-based inspection is performed that is limited to selected ones of the potential defects in the integrated circuit devices that were manufactured using the manufacturing parameter settings inside the process window but were uninspected in the first electron-based inspection.

Abstract: An inspection system includes a light source, a mirror, Galvano mirrors, a casing that holds the mirror and the Galvano mirrors inside and includes an attachment portion for attaching an optical element, and a control unit that controls a deflection angle of the Galvano mirrors, wherein the control unit controls the deflection angle so that an optical path optically connected to a semiconductor device is switched between a first optical path passing through the Galvano mirrors and the mirror, and a second optical path passing through the Galvano mirrors and the attachment portion, and controls the deflection angle so that the deflection angle when switching to the first optical path has been performed and the deflection angle when switching to the second optical path has been performed do not overlap.

Abstract: A solid surface wettability determination method is disclosed. A liquid is sprayed on a surface of an object. A light beam is projected toward the surface, wherein the light beam is reflected by the liquid on the surface to generate a reflected light. The reflected light is received by an optical detector, and the optical detector outputs a determining signal related to a wettability of the surface according to the reflected light. A corresponding signal-angle relation is selected from a database according to type of the liquid and material of the object. The contact angle of the liquid on the surface is obtained by applying the determining signal to the corresponding signal-angle relation.

Abstract: Method for detecting a defect in a zone of interest of an optical lens, the method including: an image reception step, during which a plurality of images is received, each image includes a view of the zone of interest in front of a plurality of specific patterns, each specific pattern including a bright area and a dark area, and at least one image received is saturated in light intensity; a sampling step, during which each image of the plurality of images are sampled based on a common sampling pattern; a recombination step, during which a recombined image of the zone of interest is determined based on the common sampling pattern; and a defect detection step, during which a defect is detected in the zone of interest of the optical lens based on an analysis of the recombined image.

Abstract: A method for determining properties of a coating on a transparent film, a method for manufacturing a capacitor film and a device configured to determine properties of a coating on a transparent film are disclosed. In an embodiment a method includes moving the transparent film with the coating on a path which passes between a light source and a sensor, illuminating, by the light source, the coating on the transparent film, detecting, by the sensor, an intensity of transmitted light from the light source and calculating, by a processor, the properties of the coating on the transparent film based on the detected intensity of transmitted light.

Abstract: A biosensor is provided. The biosensor includes a plurality of sensor units. Each of the sensor units includes one or more photodiodes, a first aperture feature disposed above the photodiodes, an interlayer disposed on the first aperture feature, a second aperture feature disposed on the interlayer, and a waveguide disposed above the second aperture feature. The second aperture feature includes an upper grating element and the first aperture feature includes one or more lower grating elements, and a grating period of the upper grating element is less than or equal to a grating period of the one or more lower grating elements. A difference of the absolute values between a first polarizing angle of the upper and lower grating elements in one of the sensor units and a second polarizing angle of the upper and lower grating elements in adjacent one of the sensor units is 90°.