Abstract: A lithographic printing plate precursor comprising a support having a hydrophilic surface containing hydrophilic graft polymer chains and a heat-sensitive layer containing at least either of fine particulate polymer and microcapsules, which is excellent in on press developing property, sensitivity and printing durability.

Abstract: The present invention provides a silver halide photographic material that is excellent in photographic speed as well as image graininess and exhibits low residual color even after rapid processing. The silver halide photographic material contains a compound represented by formula (I) and a compound represented by formula (II), as defined.

Abstract: A chemically amplified resist including base resin represented by a general formula [1], a radiation-sensitive acid generator; polystyrene acting as a filler and a solvent dissolving the resin, the acid generator and the filler; wherein a content of the resin is between 10 and 20% in weight with respect to the entire chemically amplified resist, contents of the acid generator and the filler are between 1 and 15% in weight and between 0.5 and 6.0% in weight, respectively, with respect to the resin, and a balance is the solvent.

Abstract: A socket assembly for removably receiving a solder ball of a chip package and methods for forming the same. The socket assembly is a raised construction formed over a substrate and includes a socket, a ball contact structure, and an electrical trace. A relatively thick photoresist layer, which may have a thickness in a range from about 20 microns to about 450 microns, is used in the process of forming the socket assembly. The photoresist layer may have formed therein a patterned opening used as a mold for the socket assembly. Alternatively, the photoresist layer may be an integral and permanent component of the socket assembly. The socket assembly is configured such that a solder ball may be disposed in the socket so as to be electrically connected to the socket assembly. Optionally, the socket assembly includes one or more ball penetration structures for facilitating the establishment of electrical contact and for adapting the socket assembly to solder balls of different dimensions.

Abstract: Acid-catalyzed positive photoresist compositions which are imageable with 193 nm radiation and are developable to form photoresist structures of high resolution and high etch resistance are enabled by the use of a combination of cyclic olefin polymer, photosensitive acid generator and a hydrophobic non-steroidal multi-alicyclic component containing plural acid labile linking groups. The cyclic olefin polymers preferably contain i) cyclic olefin units having polar functional moieties, ii) cyclic olefin units having acid labile moieties that inhibit solubility in aqueous alkaline solutions.

Abstract: An image-forming material is described, comprising on an support an acid-generating agent selected from a sulfonic acid ester of a specific structure generating an acid by the action of heat and the polymer thereof, and a compound causing a light absorption change in the absorption region of from 350 to 700 nm by an intramolecular or intermolecular reaction by the action of an acid. The image-forming material has a high sensitivity and excellent storage stability and gives low haze and good images in the case of performing image formation using a high-output laser light.

Abstract: A radiation-sensitive emulsion comprised of silver halide grains (a) containing greater than 50 mole percent chloride, based on silver, (b) having greater than 50 percent of their surface area provided by {100} crystal faces, and (c) having a central portion accounting for up to 99 percent of total silver and containing (i) a first dopant comprising an iridium coordination complex containing at least one thiazole ligand and (ii) a second dopant comprising an iridium coordination complex containing at least one substituted thiazole ligand. The combined use of first and second iridium dopants in accordance with the invention provides enhanced toe contrast softening, and can also result in improved latent image keeping stability relative to that expected from the individual effects of such dopants.

Abstract: A method has been described for preparing an ultrathin tabular grain emulsion rich in silver bromide, having {111} major faces, wherein tabular grains having a thickness of less than 0.08 &mgr;m exhibit an average aspect ratio of more than 5:1 and account for at least 75% by number of hexagonal grains and a coefficient of variation on average equivalent surface area of less than 0.50. The process is characterized in that during formation, (a) pH is maintained from 0.8 to 10; (b) a gelatino-peptizer is present in a concentration of 0 to 50 g per liter of dispersing medium, and (c) pBr having a value of at least 1.8 is maintained during grain nucleation and pBr is maintained at less than 2.4 during growth provided that a gelatin peptizer which is free from calcium ions and has a methionine content of less than 30 micromoles per gram of gelatino-peptizer is present.

Abstract: Disclosed is a microlens manufacturing method which comprises the step of: positioning a X-ray mask for manufacturing the microlens on an substrate on which a sensitive film is formed, and arranging a rotation axis of the substrate and a central axis of the X-ray mask; applying X-rays to the X-ray mask to expose the sensitive film while fixing the X-ray mask and rotating the substrate; developing the sensitive film to form the microlens; performing an electroplating process on the plating base to form a metal layer; and separating the metal layer from the sensitive film structure and combining the metal layer with a mold frame for injection molding the microlens and manufacturing an injection mold.

Abstract: A composition of a photosensitive silver conductor tape comprising: (1) finely divided inorganic solids comprising (a) finely divided particles of silver solids; (b) finely divided particles of inorganic binder having a glass transition temperature (Tg) of 325-700 ° C., the inorganic solids being dispersed in (2) an organic medium comprising a solution of (c) an organic polymeric binder which is a copolymer, interpolymer or mixture thereof selected from (1) nonacidic comonomers comprising butylmethacrylate or mixtures of butylmethacrylate and C1-10 alkyl acrylates, C1-10 alkyl methacrylates, styrene, substituted styrenes, or combinations thereof and (2) acidic comonomers comprising ethylenically unsaturated carboxylic acids containing moiety that are at least 15 wt. % of the total polymer weight; and having a Tg of 50-150 ° C.

Abstract: This invention is directed to a precursor for preparing a resist pattern by heat mode imaging, the precursor comprising a heat sensitive composition, the solubility of which in an aqueous alkaline developer is arranged to increase in heated areas, and a means for increasing the resistance of non-heated areas of the heat sensitive composition to dissolution in an aqueous alkaline developer (the “developer resistance means”), wherein said developer resistance means comprises one or more compounds selected from the group consisting of: (A) compounds which include a poly(alkylene oxide) unit; (B) siloxanes; and (C) esters, ethers and amides of polyhydric alcohols, wherein said heat-sensitive composition comprises an aqueous alkaline developer soluble polymeric substance (i.e. the “active polymer”) and a compound which reduces the aqueous alkaline developer solubility of the polymeric substance (i.e.

Abstract: Imagable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as pendent groups on the polymer backbone. Certain infra-red absorbing groups may also act to insolubilize the polymer in a developer, until it is imagewise exposed to infra-red radiation. Imagewise application of heat, resulting from imagewise exposure of the precursor to infra-red radiation, renders the polymer layer more soluble in the developer than prior to exposure to the infra-red radiation.

Abstract: A method for treating a photosensitive lithographic printing plate, which comprises exposing the photosensitive lithographic printing plate to laser light, developing with a developer containing an alkali metal silicate and then carrying out post-exposure treatment, said photosensitive lithographic printing plate being prepared by forming a photopolymerizable photosensitive layer having a film thickness of from 1.2 to 4 g/m2 and further forming a protective layer having a film thickness of from 2 to 8 g/m2 on a support having a centerline average height (Ra) of at least 0.35 &mgr;m.

Abstract: A system and method is disclosed for coating a conventional wafer or a spherical shaped semiconductor substrate with liquid material such as photoresist by utilizing a “drop on demand” piezo driven dispense nozzle, a bubble-jet dispense nozzle, or a continuous piezo jet with charging electrodes. The proposed system and method will greatly reduce, and in some cases virtually eliminate, the waste of photoresist in the process.

Abstract: A silver halide photographic emulsion in which tabular grains each having an equivalent-circle diameter of 0.6 &mgr;m or more, a thickness of 0.3 &mgr;m or less, and an aspect ratio of 2 or more account for 70% or more in number of all the grains contained therein, wherein each of the tabular grains has a multilayered structure including two or more layers, at least one of the layers contains 1 to 20 mol % of a chloride with respect to the silver amount contained in the at least one of the layers, and each of the tabular grains contains a metal complex represented by formula (C-1) or (C-2) below: [M1(CN)6-aLa]n  (C-1) [M2(CN)4-bLb]m  (C-2) wherein M1 represents Fe, Ru, Re, Os, Ir, or Pt; M2 represents Pt or Au; L represents a ligand except for CN; a represents 0, 1, or 2; b represents 0, 1, or 2; n represents 2-, 3-, or 4-; and m represents 1- or 2-.

Abstract: A method and apparatus for baking a film onto a substrate. A film, such as a layer of photoresist, is disposed on a first surface of a substrate while a second surface is exposed to a liquid bath. The liquid bath is maintained at a pre-selected temperature. Exposure of the substrate to the liquid bath allows the film on the opposite surface to bake. The liquid bath is then re-circulated to maintain a constant and uniform temperature gradient across the substrate.

Abstract: Disclosed is a silver halide photographic emulsion which comprises silver halide particles containing a polynuclear metal complex in which an organic compound is contained as a bridging ligand, wherein 50% or more of a projected area of the particles is occupied by tabular particles having a particle thickness of 0.3 &mgr;m or less. This photographic emulsion is high in sensitivity, as well as give high contrast and good graininess. Also disclosed are a light-sensitive material for photographing of high image quality, which contains the photographic emulsion, and a simple method for forming a color image wherein the light-sensitive material is used.

Abstract: According to the present invention there is provided a heat-sensitive material for making lithographic plates comprising in the order given on a support an IR-sensitive oleophilic layer and a cross-linked hydrophilic layer comprising an inorganic pigment and a hardener, characterized in that the ratio of said inorganic pigment over the hardener is comprised between 75/25 and 25/75 by weight.

Abstract: Thermally imageable elements useful as lithographic printing plates, and methods for forming an image using the thermally imageable elements are disclosed. The element contains a support with a hydrophilic surface, an underlayer over the hydrophilic surface, and a top layer over the underlayer. The top layer contains a polymeric material, such as a novolac resin, a resol resin, or a mixture thereof, but does not require a compound that functions as a solubility-suppressing component for the polymeric material. Consequently, the top layer is free of materials that function as solubility-suppressing components for the polymeric material. In one embodiment, the element, preferably the underlayer, absorbs infrared radiation. Following thermal exposure, the element is developed with an aqueous alkaline developer having a pH of at least 7 to about 11, typically about 10.

Abstract: A photoresist laminate includes a substrate (such as PET film having a thickness of between about 0.002-0.003 inches) with first and second faces, a first film layer, and a second layer. The first film layer is a photoresist material (radiation sensitive) which is soluble or dispersible in water but which will harden upon sufficient exposure to radiation so as to become substantially insoluble or non-dispersible. The first film layer may be of any conventional photoresist material (e.g. having a thickness of about 0.002-0.009 inches) and is operatively disposed on the substrate first face (either directly connecting it or connected to a membrane support layer which in turn is directly connected to the substrate first face). The second layer is of a material and thickness so that it substantially prevents sticking of the first film layer to other surfaces, while not significantly interfering with the radiation sensitivity thereof.