Abstract: A silver halide photographic material having high sensitivity, reduced in fog and excellent in storage stability is described, which comprises a support having thereon at least one constituent layer containing at least one hydrazone compound having a methine dye residue or an adsorbing group to silver halide through a covalent bond or containing at least one metallocene compound having a methine dye residue through a covalent bond.

Abstract: A core-shell silver bromoiodide emulsion having an inner core portion consisting essentially of silver bromoiodide and an outer shell portion consisting essentially of silver bromoiodide, wherein said inner core portion has a silver iodide content ranging from 30 to 50 mol %, said outer shell portion has a silver iodide content ranging from 1 to 10 mol %, and the average total silver iodide content ranges from 5 to 12 mol %, and wherein the ratio between the area of the X-ray diffraction peak corresponding to said outer shell portion and the area of the X-ray diffraction peak corresponding to said inner core portion is higher than 9:1.

Abstract: Disclosed is a positive-working photoresist composition used in the photolithographic patterning work for the manufacture of various electronic devices such as VLSIs having improved characteristics, in particular, in respect of the halation-preventing effect. In addition to the conventional ingredients of (a) an alkali-soluble novolac resin as a film-forming agent and (b) a naphthoquinonediazide group-containing compound as a photosensitizing agent, the composition is formulated by the admixture of a specific amount of (c) a halation-preventing agent which is a combination of, one, (c1) a 4,4'-bis(dialkylamino) benzophenone compound and, the other, (c2) a compound selected from the group consisting of polyhydroxy benzophenone compounds, amino- and hydroxy-containing benzophenone compounds and 4-pyrazolylazo compounds in a specific weight proportion of (c1):(c2).

Abstract: A silver halide photographic material having the improved storability and anti-stress property is disclosed, which comprises a support having provided thereon at least one light-sensitive silver halide emulsion layer containing a silver halide emulsion, wherein the silver halide emulsion is subjected to a chemical sensitization with a selenium compound, and the emulsion layer or another layer provided on the support contains at least one of the compounds represented by formulas (I), (II) and (III): ##STR1##

Abstract: The present invention relates to a silver halide photographic material comprising a support, at least one silver halide emulsion layer coated thereon, and a hydrophilic colloid layer coated on said at least one silver halide emulsion layer, wherein said hydrophilic colloid layer comprises a combination of (a) at least one surfactant selected from the group consisting of non-ionic polyoxyethylene surfactants and anionic polyoxyethylene surfactants and (b) at least one surfactant selected from the group consisting of non-ionic perfluoroalkylpolyoxyethylene surfactants and polyoxyethylene-modified polysiloxane surfactants.

Abstract: A radiographic element for medical diagnostic imaging is disclosed comprised of a transparent support and first and second silver halide emulsion layer units coated on opposite sides of the film support, each emulsion layer unit being comprised of a silver iodohalide tabular grain emulsion containing less than 5 mole percent iodide, based on silver. An improvement in speed in relation to granularity is obtained by the presence of tabular grains having {111} major faces, containing a maximum surface iodide concentration along their edges, and a lower iodide concentration within their corners than elsewhere along their edges.

Abstract: Quinone diazo compounds having bonded to the diazo ring or directly bonded to a ring of the compound, certain non-metallic atoms that improve the photosensitivity thereof are provided. These quinone diazo compounds are useful as photoactive compounds in photoresist compositions, and particularly positive photoresist composition employed in x-ray or electron beam radiation. Also provided is a method for preparing compounds of the present invention.

Abstract: Disclosed is a silver halide emulsion in which at least 50% of the total projected area of silver halide grains comprises tabular core/shell grains each having {100} planes as main planes and said silver halide grain substantially comprises silver chlorobromide with the halogen composition continuously being varied in the shell part.

Abstract: A new method of forming device isolation regions on a silicon substrate is provided.

Abstract: A silver halide photographic light-sensitive material having at least one silver halide emulsion layer formed on a support, said emulsion layer containing tabular grains having an aspect ratio of 3 or more, which occupy at least 50% of the total projected area of all silver halide grains contained in the emulsion layer. The silver halide grains have been subjected to tellurium sensitization using at least butyl-diisopropylphosphinetelluride as a sensitizer, and also to other chemical sensitization.

Abstract: A radiation-sensitive emulsion is disclosed capable of producing the highest attainable speed compatible with low granularity. The silver halide grains (a) have a mean equivalent circular diameter of less than 0.6 .mu.m; (b) have a face centered cubic crystal lattice structure of the rock salt type; (c) have six {100} faces; (d) contain from 95 to 99.5 mole percent bromide ions and from 0.5 to 5 mole percent iodide ions, based on silver; (e) contain in the face centered cubic crystal lattice structure from 5.times.10.sup.-8 to 1.times.10.sup.-6 mole per silver mole of an iridium dopant comprised of Ir.sup.+3 ions forming coordination bonds with at least five halide ions occupying adjacent crystal lattice positions; and (f) contain in the face centered cubic crystal lattice structure from 1.times.10.sup.-5 to 3.times.10.sup.-4 mole per silver mole of a speed enhancing dopant comprised of divalent Group 8 metal ion chosen from among Fe.sup.+2, Ru.sup.+2 and Os.sup.

Abstract: Photographic emulsions are disclosed in which at least 50 percent of total grain projected area is accounted for by high (>90%) chloride thin (<0.2 .mu.m) high average aspect ratio (>8) tabular grains having {100} major faces each having at least one edge face oriented in an atomic plane differing from that of major faces to improve photographic performance.

Abstract: Positive photoresist compositions comprising, in an organic solvent, at leasta) one alkali-soluble resin,b) one photosensitive quinone diazide,c) one aromatic hydroxy compound of formula I ##STR1## wherein each R is --H, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 alkoxy,--OCH.sub.2 C.sub.6 H.sub.5, --OC.sub.6 H.sub.5 or --COOC.sub.1 -C.sub.4 alkyl, and R.sub.1 and R.sub.2 are each independently of the other H, C.sub.1 -C.sub.4 alkyl,--C.sub.6 H.sub.5 or a cycloaliphatic 5- or 6-membered ring, a is an integer from 0 to 4, and m and n are each independently of the other 0, 1 or 2, which compound enhances the photosensitivity and/or the rate of development, and optionallyd) additional customary modifiers,are eminently suitable for making relief structures.

Abstract: Changing (varying, irregular) resist thickness on semiconductor wafers having irregular top surface topography or having different island sizes, affects the percent reflectance (and absorption efficiency) of incident photolithographic light, and consequently the critical dimensions of underlying features being formed (e.g., polysilicon gates). A low solvent content resist solution that can be applied as an aerosol provides a more uniform thickness resist film, eliminating or diminishing photoresist thickness variations. A top antireflective coating (TAR) also aids in uniformizing reflectance, despite resist thickness variations. The two techniques can be used alone, or together. Hence, better control over underlying gate size can be effected, without differential biasing.

Abstract: A method and apparatus for transporting thin materials, such as printed circuit boards, through an apparatus for treatment of said boards with an etchant, rinse or other chemical process step, including a transport conveyor having a plurality of rotation members with a specially configured rim for contacting the thin materials and moving them through the apparatus with a longer contact path in each rotation of a rotation member than the circumference of the rotation member.

Abstract: A silver halide emulsion contains silver halide grains in a dispersion medium. Tabular silver halide grains having a thickness of less than 0.5 .mu.m, a diameter of 0.3 .mu.m or more, an aspect ratio of 2 or more, and 10 or more dislocations per grain account for 50% or more of a projected area of all the silver halide grains. The grains are formed in the presence of at least one compound which can oxidize silver atoms.

Abstract: The process for the production of a platelike silver halide emulsion having an AgBrI core of which the iodide content is at least 2.5 mol-% and a first shell of AgBrI surrounding the core, of which the iodide content is 40.+-.4 mol-% and at least one other shell of low iodide content, comprising (a) precipitating a core containing 2 to 20 mol-% of AgI by the double jet method at 30.degree. to 50.degree. C. and pBr 1.2 to 2.3, (b) subjecting the core to physical ripening at 60.degree. to 80.degree. C. and pBr 1.2 to 2.8, (c) growing the grains by adding silver ions and also bromide and iodide ions to the ripened core grains, the bromide and iodide each are added in an amount that the bromide iodide composition falls within the miscibility gap and (d) precipitating at least one other silver halide layer having an iodide content below 20 mol-% leads to an improved grain-to-sensitivity ratio.

Abstract: Photographic processing using an additive represented by formula (I): ##STR1## wherein R.sub.1 is an aliphatic hydrocarbon group, an aryl group, or a heterocyclic ring group; R.sub.2 is hydrogen, an aliphatic hydrocarbon group, an aryl group, or a heterocyclic ring group; L.sub.1, L.sub.2, L.sub.3, L.sub.4 and L.sub.5 are independently an alkylene group; m and n are independently 0 or 1; W.sup.1 and W.sup.2 are independently an alkylene group, an arylene group, aralkylene group or a divalent nitrogen-containing heterocyclic ring group; D is a single bond, --O--, --S-- or --N(R.sub.w), where R.sub.2 is hydrogen, an aliphatic hydrocarbon group or an aryl group; v is 0 or an integer or from 1 to 3; w is an integer of from 1 to 3; and M.sub.1, M.sub.2, M.sub.3 and M.sub.4 are independently hydrogen or a cation.

Abstract: A direct positive type silver halide photographic material is described, which contains at least one compound represented by the following formula (I) and at least one cyanine dye having a pyrazolo[5,1-b]quinazolone nucleus and a cyanine heterocycle nucleus, wherein a carbon atom at 3-position of the pyrazolo[5,1-b]quinazolone nucleus is bonded through a four-methine chain to an atom at the 2-position or 4-position of the cyanine heterocycle nucleus, provided that the 4-position is possible only when the cyanine heterocycle nucleus is a quinoline or pyridine nucleus: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each represents an alkyl group, an aryl group or a heterocyclic group, which may be substituted; V.sub.1, V.sub.2, V.sub.3, V.sub.4, V.sub.5, V.sub.6, V.sub.7 and V.sub.8 each represents a hydrogen atom or a monovalent substituent; L.sub.1, L.sub.2 and L.sub.3 each represents a substituted or unsubstituted methine group; M.sub.1 represents a charge-neutralizing counter ion; and m.sub.

Abstract: A silver halide photographic material comprising a support and at least one light-sensitive emulsion layer provided thereon, wherein the emulsion layer comprises a silver halide emulsion containing silver halide grains formed of silver chlorobromide, silver chloroiodide or silver chloroiodobromide each containing at least 90 mol % of silver chloride, or silver chloride, wherein 10.sup.-7 to 10.sup.-3 mol/mol of silver halide of an iron compound and 10.sup.-7 to 10.sup.-4 mol/mol of silver halide of a sulfur group compound are added to the silver halide grains until physical ripening of the grains is completed. The photographic material is particularly suitable in an image forming method involving exposing the photographic material to laser beams for a short period of time.