Abstract: A photo mask for extreme ultra violet (EUV) lithography includes a substrate having a front surface and a back surface opposite to the front surface, a multilayer Mo/Si stack disposed on the front surface of the substrate, a capping layer disposed on the multilayer Mo/Si stack, an absorber layer disposed on the capping layer, and a backside conductive layer disposed on the back surface of the substrate. The backside conductive layer is made of tantalum boride.

Abstract: Provided are a curable coloring composition which is suitable for the production of a cured film in cyan color, having good moisture resistance, a color filter, an image sensor, and a method for producing a cured film. The curable coloring composition includes a coloring agent including a phthalocyanine pigment having Al as a central metal, a basic pigment derivative, and a curable compound, in which the coloring agent includes 80% by mass or more of the phthalocyanine pigments, and the content of the phthalocyanine pigment having Al as a central metal among the phthalocyanine pigments is 30% by mass or more.

Abstract: Provided is a radiation-sensitive composition with which a pattern having excellent infrared shielding properties and excellent rectangularity can be formed. In addition, provided are an optical filter, a laminate, a pattern forming method, a solid image pickup element, an image display device, and an infrared sensor. This radiation-sensitive composition includes: a near infrared absorber; a resin; a radically polymerizable compound; and a photoradical polymerization initiator, in which the radiation-sensitive composition has an absorption maximum in a wavelength range of 700 to 1000 nm, a ratio absorbance Amax/absorbance A550 of an absorbance Amax at the absorption maximum to an absorbance A550 at a wavelength of 550 nm is 50 to 500, the resin includes a resin having an acid group, and a mass ratio radically polymerizable compound/resin having an acid group of the radically polymerizable compound to the resin having an acid group is 0.3 to 0.7.

Abstract: An energy-sensitive composition including at least one of a silane compound monomer capable of forming a polysilane compound, a silane compound oligomer and the polysilane compound, and a base generator (B) represented by the following formula (1): in which R1 to R11 each independently represents a hydrogen atom, a halogen atom, a nitro group, an alkyl group, an aryl group, an arylalkyl group or an alkoxy group, R5 and R6 may be connected to each other via a single bond or a divalent linking group, Zq+ represents a q-valent counter cation composed of a base having a pKa of 24 or more, and q represents an integer of 1 or more.

Abstract: A photomask includes a translucent substrate and at least one main feature. The translucent substrate has a recessed region recessed from a first surface of the translucent substrate. The at least one main feature is disposed on the translucent substrate, and protrudes from the first surface of the translucent substrate.

Abstract: An LCD device is disclosed, which may include display panel and a hard coating layer on the display panel from a photo curable resin composition that includes a fluorinated polymer, wherein the fluorinated polymer is included into the photo curable resin composition by about 15 to about 35 wt %.

Abstract: The present disclosure provides a mask plate, an array substrate and, a preparation method thereof. The mask plate may include: at least one first light-transmitting region and at least two second light-transmitting regions arranged on the mask plate and spaced apart; the at least two second light-transmitting regions located at two sides of the at least one first light-transmitting region, respectively; an area of one of the at least two second light-transmitting regions being greater than an area of one of the at least one first light-transmitting region in a direction of a surface of the mask plate.

Abstract: A dispersion composition contains a pigment, a dispersant, and a cyclic or chain-like polyester compound. A curable composition contains the above-described dispersion composition. A light-shielding film, a color filter, and a solid-state imaging device contain the curable composition.

Abstract: Provided is a processing method for a multi-row, multi-column flat lens with an equivalent negative refractive index, which includes: performing photoresist coating, masking and exposure on the photolithography surface; removing photoresist in an unexposed block, and forming a rectangular groove; coating a surface of an exposed block and all surfaces of the rectangular groove with a protective layer, and then coating a side surface of the rectangular groove with a reflective film; removing the protective layer on the surface of the exposed block and the bottom surface of the rectangular groove, then filling up the groove with a filling material, and further processing the front and rear surfaces of the parallel plate in such a manner that a parallel misalignment between the front and rear surfaces thereof is smaller than 1?; and adding a protective window sheet on each of the front and rear surfaces of the new parallel plate.

Abstract: The present specification relates to a method for preparing a colorant composition comprising dissolving a first xanthene-based dye having the same number of positive charges and negative charges and a second xanthene-based dye having more negative charges than positive charges by one or more in a first solvent; and precipitating the dissolved first xanthene-based dye and the dissolved second xanthene-based dye in a second solvent, and a colorant composition, a colorant dispersion, a photosensitive resin composition, a color filter and a liquid crystal display device.

Abstract: Provided are a core-shell dye includes a core including a compound represented by Chemical Formula 1 and a shell surrounding the core, a photosensitive resin composition including the same, and a color filter manufactured using the photosensitive resin composition. (In Chemical Formula 1, each substituent is the same as defined in the specification.

Abstract: In accordance with some aspects of the present disclosure, a maskless interferometric lithography system for fabricating a three-dimensional (3D) photonic crystal using a multiple two-beam-exposures is disclosed. The system can comprise an illumination system comprising an optical arrangement operable to receive radiation from a radiation source and provide three or more tilted two-beam interference pattern exposures to be combined into a three-dimensional pattern; and a substrate operable to be supported by a substrate table, wherein the substrate comprises a photoresist formed on a top surface of the substrate and operable to receive the three-dimensional pattern and wherein means are provided to adjust the position of the substrate in all six mechanical degrees of freedom.

Abstract: To provide a negative-type photosensitive resin composition that is highly sensitive and capable of formation of a low-taper pattern shape and that is capable of providing a cured film that is excellent in heat resistance. A negative-type photosensitive resin composition contains an (A) alkali-soluble resin, a (B) radical polymerizable compound, and a (C) photo initiator, the negative-type photosensitive resin composition being characterized in that the (A) alkali-soluble resin contains one or more species of resins selected from a (A-1) polyimide, a (A-2) polybenzoxazole, a (A-3) polyimide precursor, a (A-4) polybenzoxazole precursor, a (A-5) polysiloxane, and a (A-6) cardo based resin, and that the (B) radical polymerizable compound contains a compound having five ethylenic unsaturated bond groups in a (B-1) molecule, in an amount within the range of 51 to 99 mass %.

Abstract: The present disclosure relates to a color film substrate, a display panel and a method for detecting a display panel. The CF substrate includes a display region and a peripheral region corresponding to a dummy pixel region around the display region. A black matrix of the color filter substrate includes a light transmitting section in a portion of the peripheral region corresponding to a dummy pixel unit. The light transmitting section includes a first set of light transmitting sections and a second set of light transmitting sections. Each of the first and second set of light transmitting sections is respectively in a portion that extends along a first side and a second side which is opposite to the first side of the display region and corresponds to the dummy pixel unit.

Abstract: Disclosed are a near-infrared absorbing film including a polymer film, a first near-infrared absorbing layer and a second near-infrared absorbing layer on the polymer film. The first near-infrared absorbing layer may be configured to transmit light in a visible region and to selectively absorb at least one part of light in a near-infrared region. The second near-infrared absorbing layer may be disposed on a surface of the first near-infrared absorbing layer. The first near-infrared absorbing layer may include a dye represented by Chemical Formula 1. The second near-infrared absorbing layer may include a copper complex compound. An optical filter may include the near-infrared absorbing film. An electronic device may include the optical filter. In Chemical Formula 1, R1 to R12 are described in the detailed description.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound represented by General Formula (1). In General Formula (1), X represents a sulfur atom or an iodine atom. m represents 1 or 2, in a case where X is a sulfur atom, m is 2, and in a case where X is an iodine atom, m is 1. R1's each independently represent an alkyl group or alkenyl group which may include a heteroatom, an aromatic heterocyclic group, or an aromatic hydrocarbon ring group. Further, in a case where m is 2, two R1's may be bonded to each other to form a ring. R2 represents a divalent linking group. R3 represents a divalent linking group having no aromatic group. Y? represents an anionic moiety. The pKa of the compound represented by General Formula (1) as Y? is protonated is ?2.0 to 1.5.

Abstract: A method of forming three-dimensional shaped microparticles in a microfluidic device includes flowing a mixture of a monomer and photoinitiator in a microfluidic channel having a plurality of pillars disposed therein to define a flow stream having a pre-defined shape and temporarily stopping the same. One or more portions of the flow stream are polymerized by passing polymerizing light through one or more masks and onto the flow stream, the polymerization process forming a plurality of three-dimensional shaped microparticles. The three-dimensional shape of the microparticle may be geometrically complex by using non-rectangular 2D orthogonal shapes for the flow and/or masked light source. The microparticles may include protected regions on which cells can be adhered to and protected from shear forces. The flow stream is restarted to flush out the newly formed microparticles and prepare the device for the next cycle of particle formation.

Abstract: A method of producing preconfigured arrangements of mobile shape-designed particles. The method includes providing a composite structure comprising a substrate and a layer of particle material over a surface of the substrate; lithographically producing a plurality of shaped-designed particles from the layer of particle material such that the plurality of shaped-designed particles remain substantially in a layer proximate the substrate; and at least one of subsequent to or in conjunction with the lithographically producing, immersing the plurality of shaped-designed particles the substrate in a fluid material, at a preselected temperature. The fluid material comprises a depletion agent having particles having sizes and a volume fraction to provide depletion attraction between at least a portion of the shaped-designed particles and the substrate such that the shaped-designed particles remain substantially in the layer proximate the substrate.

Abstract: A dielectric-based reflective color filter includes a substrate layer capable of light reflection; and a dielectric layer formed on the substrate layer. The dielectric layer includes a plurality of dielectric units configured by a first structure extending in a first direction and a second structure intersecting the first structure and extending in a second direction. The plurality of the dielectric units is arranged on the substrate layer so as to be spaced apart from each other.

Abstract: A compound represented by specific chemical formula, a core including the same, a core-shell dye including a shell surrounding the core, a photosensitive resin composition including the same, and a color filter manufactured using the photosensitive resin composition are disclosed.