Abstract: Provided is a coloring composition capable of producing a cured film having suppressed color unevenness even in a case where the coloring composition is used after being stored for a long period of time. In addition, provided are a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The coloring composition includes a halogenated zinc phthalocyanine pigment, a maleimide compound, a curable compound other than the maleimide compound, and a solvent, in which the molecular weight of the maleimide compound is 100 to 400, and the content of the maleimide compound is 0.08 to 0.8 parts by mass with respect to 100 parts by mass of the halogenated zinc phthalocyanine pigment.

Abstract: A mask, a manufacturing method thereof, and a patterning method employing the mask. In the mask, a plurality of masks can be combined into one mask. The pattern area (01) of the mask is provided with a first pattern section (10) and a second pattern section (20) which are not overlapped with each other; light of a first wavelength can run through the first pattern section (10) but light of a second wavelength cannot run through the first pattern section; the light of the second wavelength can run thorough the second pattern section (20) but the light of the first wavelength cannot run through the second pattern section; and the light of the first wavelength and the light of the second wavelength can run through the non-pattern area, or any of the light of the first wavelength and the light of the second wavelength cannot run through the non-pattern area. The mask is obtained by combining a plurality of masks.

Abstract: A coloring photosensitive composition includes an oxime ester-based photopolymerization initiator containing a fluorine atom, a polymerizable compound having an ethylenically unsaturated double bond, an alkali-soluble resin, and a colorant, in which in a case where a film having a film thickness after drying of 2.0 ?m is formed using the coloring photosensitive composition, the optical density of the film at a wavelength of 365 nm is 1.5 or more.

Abstract: A color resist material of a color filter and a method for preparing a color resist pattern of a color filter are provided. The color resist material of a color filter includes: a polyfunctional monomer including a divinylbenzene monomer.

Abstract: The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate includes a plurality of gate wirings provided so as to extend parallel to each other on an insulating substrate, and a plurality of source wirings provided so as to extend parallel to each other in a direction intersecting the respective gate wirings. An interlayer insulating film and a gate insulating film are interposed at portions including the intersecting portions of the gate wirings and the source wirings, on a lower side of the source wiring.

Abstract: The invention aims to provide a photosensitive colored resin composition and a heat resistant colored resin film produced therefrom that has the function of absorbing light in the shorter visible wavelength range with high sensitivity to serve effectively as planarizing film, insulation layer, and barrier rib used in organic luminescence apparatuses and display elements and the function of reducing external light reflection. The photosensitive colored resin composition includes an alkali-soluble resin (a), a photosensitive compound (b), and a compound (c) having an absorption maximum in the wavelength range of 400 nm or more and less than 490 nm, the photosensitive compound (b) containing a photosensitive compound (b1), the photosensitive compound (b1) being such that its maximum absorption wavelength in the range of 350 nm or more and 450 nm or less is located within the wavelength range of 350 nm or more and 390 nm or less.

Abstract: A method is disclosed for realizing a liquid crystal tri-dimensional aligned structure, including: providing a first substrate having a first surface; forming a liquid crystal layer in contact to said first surface, said liquid crystal layer including a polymerizable liquid crystal compound; realizing a first aligning formation within said liquid crystal layer by irradiating a first portion of said liquid crystal layer with electromagnetic or electron beam radiation according to a given first pattern, so that said first portion of liquid crystal compound becomes polymerized and said first aligning formation is made of said polymerized liquid crystal compound according to said given first pattern, said first aligning structure defining a first aligning axis; locally orienting optical axes of molecules of said liquid crystal layer along said first aligning axis.

Abstract: A method for preparing a liquid crystal alignment layer, a liquid crystal alignment layer, and a display device. The method for preparing a liquid crystal alignment layer includes: S1, dripping liquid crystals and performing cell-assembling, wherein a liquid alignment material is added to the liquid crystals and the alignment material is curable and includes molecules capable of inducing alignment of liquid crystal molecules; S2, applying an electric field or a magnetic field, wherein the direction of the electric field is approximately the same as a preset direction of the liquid crystal alignment layer, and the direction of the magnetic field is perpendicular to the preset direction of the liquid crystal alignment layer; and S3, performing curing while maintaining the electric field or the magnetic field until the alignment material completes the curing reaction.

Abstract: The present invention relates to a method for preparing a photo-alignment layer. The photo-alignment layer prepared by the preparation method exhibits a high imidization ratio as well as an excellent aligning stability of liquid crystal, chemical resistance and strength, and has an excellent afterimage suppressing effect by an AC driving of a liquid crystal display element.

Abstract: A method for producing a conductive film having a substrate and a conductive layer disposed on the substrate has a first step of forming a precursor layer on the substrate, the precursor layer including a metal component or its precursor, a water-insoluble polymer X having a cross-linking group, a water-insoluble polymer Y having a reactive group that reacts with the cross-linking group, and a water-soluble polymer Z different from polymer X and polymer Y; a second step of reacting the cross-linking group in the water-insoluble polymer X with the reactive group in the water-insoluble polymer Y; and a third step of forming the conductive layer by removing the water-soluble polymer Z.

Abstract: A three-dimensional (“3D”) structure for handling fluids, a fluid handling device containing the 3D structure, and a method of making the 3D structure. The method includes providing a composite photoresist material that includes: (a) a first layer devoid of a hydrophobicity agent and (b) at least a second layer comprising the hydrophobicity agent. The composite photoresist material is devoid of an adhesion promotion layer between layers of the composite photoresist material.

Abstract: An infrared absorbing composition which is used for forming an infrared cut filter in a solid image pickup element having the infrared cut filter includes at least one infrared absorber having an absorption maximum at a wavelength of 650 nm or longer which is selected from polymethine colorants.

Abstract: A mask structure is provided. The mask structure includes a plurality of mask units arranged in an array. The mask units includes a first mask configured to form a first transparent electrode in a corresponding area of a surface of the array substrate, and a second mask connected with the first mask, and configured to form a second transparent electrode in a corresponding area of the surface of the array substrate. The first mask and the second mask have different light transmittances, and light transmittance of the second mask is less than light transmittance of the first mask, to allow in different amounts of light.

Abstract: The invention provides a photosensitive resin composition, a color filter, and a liquid crystal display element thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), and a black pigment (E). The compound (B) having an ethylenically unsaturated group contains a compound (B-1) having an acidic group and at least three ethylenically unsaturated groups. The photoinitiator (C) includes a photoinitiator (C-1) represented by formula (1).

Abstract: A photomask blank (1) having: a transparent substrate (10); a first film (11) etched by chlorine/oxygen-based dry etching and made of a material having resistance against fluorine-based dry etching; and a second film (12) formed adjacent to the first film and made of a material which comprises silicon and oxygen or silicon, oxygen, and nitrogen and has an Si—Si bond and which is substantially not etched by chlorine/oxygen-based dry etching, wherein: the photoresist adhesive performance is improved; the resist pattern is stably maintained without degrading, collapsing, or peeling even when a fine resist pattern is formed from a photoresist film; and an excellent shape and dimensional accuracy is obtained in regard to etching of a lower layer film in which the resist pattern is used.

Abstract: An electronic device includes, a light source having a peak emission at a wavelength between about 440 nm to about 480 nm; and a photoconversion layer disposed on the light source, wherein the photoconversion layer includes a first quantum dot which emits red light and a second quantum dot which emits green light, wherein at least one of the first quantum dot and the second quantum dot has a perovskite crystal structure and includes a compound represented by Chemical Formula 1: AB?X3+???Chemical Formula 1 wherein A is a Group IA metal, NR4+, or a combination thereof, B? is a Group IVA metal, X is a halogen, BF4?, or a combination thereof, and ? is 0 to 3.

Abstract: A mask plate and a photo spacer and methods for preparing the same, and a display panel comprising the photo spacer are disclosed. In the mask plate, at least one exposure area is formed, the at least one exposure area comprising a central region and a peripheral region, wherein light transmittance of the central region is greater than light transmittance of the peripheral region.

Abstract: A compound represented by Chemical Formula 1, a photosensitive resin composition including the same, and a color filter manufactured using the photosensitive resin composition are provided. In Chemical Formula 1, each substituent is the same as defined in the specification.

Abstract: A mask plate, a method for manufacturing the mask plate and a usage of the mask plate in manufacturing a display substrate are provided. The mask plate includes a transparent substrate and at least two layers of electrochromic thin film patterns arranged on the transparent substrate. Each of the at least two layers of electrochromic thin film patterns is configured to be capable of being switched between a light-transmissible state and a non-light-transmissible state under an effect of an electric field. The mask plate is capable of forming at least two different mask patterns on the display substrate, which reduces the number of mask plates required for manufacturing the display substrate.

Abstract: A color filter substrate, a display panel and a method of manufacturing color filter substrate are provided. The color filter substrate comprising a first glass substrate and a blocking wall formed on a surface of the first glass substrate which is toward to an array substrate, the blocking wall is a projection structure of the surface of the first glass substrate, and the blocking wall is located in a non-display region. The invention further provides correspondingly display panel and method of manufacturing color filter substrate. The color filter substrate, display panel and method of manufacturing color filter substrate of this disclosure, which using the glass substrate on CF side to be aligning film blocking wall. It could control boundary of the aligning film on CF side, and prevent water vapor pass into inside panel of the aligning film on CF side caused circuit corrosion.