Abstract: A mask blank including a phase shift film is provided, wherein the phase shift film has a predetermined transmittance and a predetermined phase difference with respect to exposure light of an ArF excimer laser, and it is relatively easy to detect an etching end point for detecting a boundary between the phase shift film and a transparent substrate upon the EB defect repair. The phase shift film has a function to transmit the exposure light of the ArF excimer laser at a transmittance of not less than 10% and not more than 20%, and a function to generate a phase difference of not less than 150 degrees and not more than 190 degrees between the exposure light transmitted through the phase shift film and the exposure light transmitted through the air for the same distance as a thickness of the phase shift film. The phase shift film is made of a material containing a metal, silicon, nitrogen, and oxygen.

Abstract: The present invention relates to a colored photosensitive resin composition capable of forming a cured film that does not generate uneven wrinkles on its surface at the time of its formation, and a light shielding spacer produced therefrom and used for a liquid crystal display, an organic EL display, or the like.

Abstract: The production of photocatalytic color switching of redox imaging nanomaterials for rewritable media is disclosed. The new color switching system is based on photocatalytic redox reaction enabling reversible and considerably fast color switching in response to light irradiation. In accordance with an exemplary embodiment, the color switching system can include a photocatalyst and an imaging media. With the assistance of photocatalyst, UV light irradiation can rapidly reduce the redox imaging nanomaterials accompany with obvious color changing, while the resulting reduced system can be switched back to original color state through visible light irradiation or heating in air condition. The excellent performance of the new color switching system promises their potential use as an attractive rewritable media to meet increasing needs for sustainability and environmental protection.

Abstract: The present application discloses a method of fabricating a color filter substrate, including forming a black matrix layer including forming a plurality of black matrices on a base substrate thereby defining a plurality of subpixel areas, the plurality of black matrices being formed to have a plurality of pores; dispensing a first color filter material in a plurality of first subpixel areas of the plurality of subpixel areas thereby forming a first color filter material layer, the first color filter material permeating into pores of black matrices adjacent to the plurality of first subpixel areas; and forming a first color filter layer. Subsequent to forming the first color filter layer, the first color filter material remains in at least a first portion of the black matrices adjacent to the plurality of first subpixel areas.

Abstract: The disclosure discloses a method for exposing a transparent substrate, including: fixing relative positions of a first mask, a second mask and the transparent substrate; exposing various regions of the transparent substrate by light with different polarization directions generated by the first mask and the second mask respectively. By the method above, the disclosure can simplify the process, reduce the period and improve efficiency of production.

Abstract: A nanoimprint template is provided, including a main template, a plurality of photoresist micro-structures arranged on the main template, and a fluororubber polymer layer coated on an outer layer of the photoresist micro-structures. The fluororubber polymer layer has a bonding function with the main template, so as to fixedly connect to the surface of the main template. The nanoimprint template can not only protect the photoresist microstructure therein, but also prevent the nanoimprint template from being deformed during operating, thereby improving the process quality. Moreover, the surface oil resistance and corrosion resistance of the nanoimprint template is improved, so that the surface has lower surface energy, which can effectively improve the degumming problem during operating.

Abstract: The present invention relates to a photosensitive composition comprising at least one nanosized fluorescent material and polysiloxane, to a color conversion film, and to a use of the color conversion film in an optical device. The invention further relates to an optical device comprising the color conversion film and a method for preparing the color conversion film and the optical device.

Abstract: A substrate and manufacturing method therefor, a display panel, and a display device. The substrate comprises a substrate base; and a first organic film and a second organic film which are located on the substrate base, wherein the first organic film and second organic film are used as a flat layer, and the refractive index of the first organic film is different from that of the second organic film. The first organic film and the second organic film are constructed such that after incident light obliquely incident on the substrate passes through the first organic film and the second organic film, emergent light of the incident light is deflected to the direction away from the substrate.

Abstract: In a method of manufacturing a one-dimensionally varying optical filter, a substrate is coated to form a stack of layers of two or more different types. The coating may, for example, employ sputtering, electron-beam evaporation, or thermal evaporation. During the coating, the time-averaged deposition rate is varied along an optical gradient direction by generating reciprocation between a shadow mask and the substrate in a reciprocation direction that is transverse to the optical gradient direction. In some approaches, the shadow mask is periodic with a mask period defined along the direction of reciprocation, and the generated reciprocation has a stroke equal to or greater than the mask period along the direction of reciprocation. The substrate and the shadow mask may also be rotated together as a unit during the coating. Also disclosed are one-dimensionally varying optical filters, such as linear variable filters, made by such methods.

Abstract: A photosensitive resin composition, an organic light emitting display device, and method for manufacturing an organic light emitting device, the composition including a photosensitive compound; a solvent; and a silsesquioxane-based copolymer, the silsesquioxane-based copolymer being obtained by copolymerizing a compound represented by the following Chemical Formula 1 with at least one of a compound represented by the following Chemical Formula 2, and a compound represented by the following Chemical Formula 3; R1—R2—Si(R3)3??[Chemical Formula 1] R4—Si(R5)3??[Chemical Formula 2] Si(R6)4.

Abstract: The disclosure provides a color filter substrate and a method thereof, comprising: a substrate, and a plurality of color filters and black matrix formed on the substrate; wherein at least one of the color filters and the black matrix form a partially overlapped structure, and a lateral contour of the film at the structure is a concave curve. By controlling a difference in an energy received by the photosensitive resin during the exposure, the taper angle of the top of the color filter is reduced, and the lateral contour is the concave curve which middle part is a pit, and the position of the concave curve is apt to produce the horns, which can effectively improve the horns bulged in the greater thickness of LCD of the organic thin film overlapped, and using a general FTM mask leads to a substantial reduction in cost, and high process controllability.

Abstract: Oxime ester compounds of the formula I, II, III, IV or V wherein Z is for example Z1 for is NO2, unsubstituted or substituted C7-C20aroyl or unsubstituted or substituted C4-C20heteroaroyl; provided that at least one Z1 is other than NO2; Z2 is for example unsubstituted or substituted C7-C20aroyl; R1, R2, R3, R4, R5 and R6 for example are hydrogen, halogen, or unsubstituted or substituted C1-C20alkyl, unsubstituted or substituted C6-C20aryl, or unsubstituted or substituted C4-C20heteroaryl; R9, R10, R11, R12 and R13 for example are hydrogen, halogen, OR16, unsubstituted or substituted C1-C20alkyl; provided that R9 and R13 are neither hydrogen nor fluorine; R14 is for example unsubstituted or substituted C6-C20aryl or C3-C20heteroaryl Q is for example C6-C20arylene or C3-C20heteroarylene; Q1 is —C1-C20alkylene-CO—; Q2 is naphthoylene; Q3 is for example phenylene; L is for example O-alkylene-O—; R15 is for example hydrogen or C1-C20alkyl; R20 is for example hydrogen, or unsubstituted or substituted C1-C

Abstract: A thermosetting resin composition for a flattened film or a microlens including: a copolymer having structural units of the following Formulae (1) and (2), wherein R0s are each independently a hydrogen atom or a methyl group, R1 is a single bond or a C1-5 alkylene group, in which the alkylene group may have an ether bond in the main chain, and R2 is an epoxy group or a C5-12 organic group having an epoxy ring; and a solvent.

Abstract: Oxime sulfonate compounds of the formula (I), wherein R1 is O(CO)R4, COOR5 or CONR6R7; n is 1 or 2; R2 for example is C1-C8alkyl, C3-C6cycloalkyl or benzyl; R3 is for example C1-C8alkyl, C3-C6cycloalkyl, C1-C8haloalkyl, C2-C8alkenyl, benzyl, phenyl or naphthyl, which optionally are substituted; R4 is for example C1-C8alkyl, C3-C6cycloalkyl, C1-C8haloalkyl, C2-C8alkenyl, benzyl, phenyl or naphthyl, which optionally are substituted; R5 is for example C3-C20alkyl, C3-C14cycloalkyl, C2-C8alkenyl, C1-C12alkyl which is substituted for example by one or more halogen; or R5 is phenyl or naphthyl, which are unsubstituted; R6 and R7 each independently of one another for example are hydrogen, C1-C12alkyl, C1-C4haloalkyl, phenyl-C1-C4alkyl, C2-C8alkenyl or C3-C6cycloalkyl, phenyl or naphthyl; or R6 and R7, together with the N-atom to which they are attached, form a 5- or 6-membered ring; are suitable as thermal radical initiators.

Abstract: A mask is provided for fabrication of a common electrode on an array substrate and includes a central portion, a first portion, and a second portion. The first portion is connected to the central portion and extends in a first direction. The second portion is connected to the central portion and extends in a second direction. The first direction and the second direction intersect each other. A first notch is formed in an interfacing site of the first portion and the central portion. A second notch is formed in an interfacing site of the second portion and the central portion. The second notch is connected to and in communication with the first notch to collectively form a first recessed zone. The mask helps reduce the potential risk of displaying defects appearing in a liquid crystal display panel using the array substrate.

Abstract: A mask plate is provided. The mask plate includes a first transparent substrate. A first transparent electrode, an electrochromic layer and a second transparent electrode are arranged sequentially on the first transparent substrate. The first transparent electrode is configured to be selectively powered so as to form energized regions with different shapes. A method for manufacturing the mask plate, a device including the mask plate, and a method for using the mask plate are further provided.

Abstract: The present invention relates to a colored photosensitive resin composition and to a light shielding spacer prepared therefrom. The colored photosensitive resin composition comprises an oxime ester fluorene-based compound as a photopolymerization initiator in a small amount, which is capable of forming a cured film that is excellent in terms of such properties as sensitivity, elastic recovery rate, resolution, chemical resistance, exudation resistance, voltage holding ratio, and the like. Accordingly, a light shielding spacer prepared therefrom can be advantageously used for a liquid crystal display, an organic EL display, and the like.

Abstract: A mask, a corresponding spacer structure and a liquid crystal display panel using the same are provided. The mask includes a first opening region and a second opening region. The first opening region and the second opening region respectively have geometric shapes with the ratio of the length to the width or the ratio of the long axis to the short axis being greater than or equal to 1.25, and the area of the first opening region is greater than the area of the second opening region.

Abstract: A phase shift mask includes a substrate, a second phase shift pattern on the substrate, the second phase shift pattern extending to an outermost perimeter of the substrate, the second phase shift pattern being formed of a material that is semi-transmissive to light of a first wavelength and the substrate being substantially transparent to the light of the first wavelength such that the mask transmits about 2 to about 10% of the light of the first wavelength at the second phase shift pattern, and a first phase shift pattern on the substrate, the second phase shift pattern being disposed between the outermost perimeter of the substrate and the first phase shift pattern.

Abstract: A halftone phase shift mask blank comprising a transparent substrate and a halftone phase shift film thereon is provided. The halftone phase shift film includes at least one layer composed of a silicon base material having a transition metal content?3 at %, a Si+N+O content?90 at %, a Si content of 30-70 at %, a N+O content of 30-60 at %, and an O content?30 at %, and having a sheet resistance?1013/?/?. The halftone phase shift film undergoes minimal pattern size variation degradation upon exposure to sub-200 nm radiation, and has chemical resistance and improved processability.