Abstract: In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2 is provided across parts of the beam path in or adjacent to moving components of the apparatus. The laminar flow is faster than the maximum speed of the moving components and the diffusion rate of air thereby minimizing the contamination of the N2 by mixing with air. Laminar flow may be ensured by providing partitions to divide the beam path into separate spaces, by covering rough or non-planar surfaces in components on or adjacent to the laminar flow and by providing aerodynamic members.

Abstract: Systems for analyzing multiple samples in parallel using mass spectrometric preferably coupled with fluid phase separation techniques are provided. A multi-analyzer mass spectrometer includes multiple inlets, multiple mass analyzers, and multiple transducers to conduct mass analyses of multiple samples in parallel. A modular mass analyzer may include a vacuum enclosure, a chassis, and multiple mass analysis modules disposed within the chassis. Modules are preferably disposed in a spatially compact two-dimensional array. A common multi-stage vacuum system may be utilized in conjunction with baffles or partitions disposed within and between modules to maintain differential vacuum conditions within the spectrometer utilizing a minimum number of pumps. Common control inputs may be provided to multiple modules or other components within a multi-analyzer spectrometer.

Abstract: The present invention is a method and apparatus for identifying a mixture of particles using a Fourier transform ion cyclotron resonance mass spectrometer (FT-ICR MS). The particles are first reacted in a charge exchange reaction within the FT-ICR MS chamber using ionic partners that are chosen to discriminate among components of the mixture based on ionization potential. Mass spectra of test runs using different ionic partners may then be compared to identify components based on information gathered about both molecular mass and ionization potential.

Abstract: Electron focussing apparatus includes a cathode plate defining an impact surface on which particles impact, which surface has a finite probability of generating at least one electron for each impacting particle having predetermined characteristics. The apparatus also has an electron receiving element, and respective means for generating electrostatic and magnetic fields in a space extending from the impact surface to the electron receiving element. The means for generating the electrostatic and magnetic fields are configured whereby the E/B2 ratio adjacent the electron receiving element is smaller than adjacent the impact surface, whereby to decrease the radius of curvature of the electron trajectories adjacent the electron receiving element relative to adjacent the impact surface and to thereby focus the electron trajectories in at least one dimension.

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

Abstract: Feedback control system for electrospray nozzle using optical system for monitoring and controlling dynamic or static morphology of the fluid exiting the electrospray nozzle.

Abstract: The invention is a method of irradiating at least one surface of a three-dimensional object (36, 114) with a desired ultraviolet light irradiance flux produced by an ultraviolet light source (22, 102).

Abstract: A source of ions for an analyzer includes a reservoir for containing a liquid, a manifold having a plurality of nozzles, a conduit connecting the reservoir to the manifold and a counter electrode having a potential difference between the counter electrode and the nozzles to enable liquid to be ejected from the nozzles in droplets and to enable ions to be ejected from the droplets.

Abstract: A toothbrush cleaning assembly includes a housing having a bottom wall and a peripheral wall that is attached to and extends upwardly from the bottom wall. An upper edge of the peripheral wall defines an opening extending into the housing. A cover is selectively positioned over the opening for selectively closing the opening. An ultra violet light emitter is mounted in the housing. A power supply is electrically coupled to the light emitter. A panel has a top side and a bottom side. The panel is removably positioned in the housing such that the bottom side abuts the bottom wall. The top side has a plurality of wells extending therein. Toothbrushes may be removably positioned in the wells and the light emitter turned on such that the toothbrushes are exposed to ultraviolet light.

Abstract: A system for detecting fluorescence emitted from a plurality of samples in a sample tray is provided. The system generally includes a plurality of lenses positioned in a linear arrangement, a linear actuator configured to translate the plurality of lenses, an excitation light source for generating an excitation light, an excitation light direction mechanism for directing the excitation light to a single lens of the plurality of lenses at a time so that a single sample holder aligned with the lens is illuminated at a time, and an optical detection system for analyzing light from the sample holders. In certain embodiments, the optical detection system includes a light dispersing element configured to spectrally disperse the light from the sample holder being illuminated, and a lens element configured to receive light from the light dispersing element and direct the light onto a light detection device.

Abstract: The invention provides a sample observation method capable of understanding the three-dimensional shape of a sample in a wider range. The observation method of the invention calculates heights (height differences) in the whole domain of an image, from plural sheets of images of different field-of-view angles, being in focus over the whole image, attained by means of the focal depth expanding function to thereby create a map (Z map) of the height information by each pixel, and displays a three-dimensional image as a bird's-eye view. The method also displays to superpose a Z map attained from image signals reflecting the surface structure on a Z map attained from image signals reflecting the composition information with different colors, which makes it possible to clearly understand the spatial distribution of a substance of unique composition inside the sample.

Abstract: A method and apparatus for measuring the dimensions of features on the surface of a semiconductor device. The method may include passing a first electron beam having a first depth of focus over the semiconductor device and passing a second electron beam having a second depth of focus over the device. Electrical signals generated by the two electron beams may be analyzed singly or in combination to determine the lateral or vertical dimensions of the features at one or more positions relative to the surface of the semiconductor device. In one embodiment, the first and second electron beams are generated sequentially from a single electron gun. In another embodiment, the first and second electron beams are generated sequentially or simultaneously by either two separate electron guns or a single electron gun positioned proximate to two separate electron beam ports.

Abstract: An ion source (50) for an ion implanter is provided, comprising a remotely located vaporizer (51) and an ionizer (53) connected to the vaporizer by a feed tube (62). The vaporizer comprises a sublimator (52) for receiving a solid source material such as decaborane and sublimating (vaporizing) the decaborane. A heating mechanism is provided for heating the sublimator, and the feed tube connecting the sublimator to the ionizer, to maintain a suitable temperature for the vaporized decaborane. The ionizer (53) comprises a body (96) having an inlet (119) for receiving the vaporized decaborane; an ionization chamber (108) in which the vaporized decaborane may be ionized by an energy-emitting element (110) to create a plasma; and an exit aperture (126) for extracting an ion beam comprised of the plasma. A cooling mechanism (100, 104) is provided for lowering the temperature of walls (128) of the ionization chamber (108) (e.g., to below 350° C.

Abstract: Provided are MALDI ion sources, methods of forming ions and mass analyzer systems. In various embodiments, provided are MALDI ion sources configured to irradiate a sample on a sample surface with a pulse of laser energy at angle within 10 degrees or less of the surface normal, and a first ion optics system configured to extract sample ions in a direction within 5 degrees or less of the surface normal. In various embodiments, MALDI ion sources having substantially coaxial sample irradiation and ion extraction are provided. In various embodiments, methods are provided, which produce sample ions by MALDI and extract sample ions using an accelerating electrical field to form an ion beam, such that, the angle of the trajectory at the exit from the accelerating electrical field of sample ions substantially at the center of the ion beam is substantially independent of sample ion mass.

Abstract: An electron beam apparatus has an optical axis, an electron beam source for generating an electron beam directed along the optical axis, and a magnetic field lens having an axis coincident with the optical axis for focusing the electron beam onto a sample which is subjected to a negative voltage so that secondary electrons are emitted from the sample. The magnetic field lens has a conductive cylinder surrounding a part of the optical axis to permit the passage therethrough of an electron beam from the electron beam source. A first detector detects secondary electrons emitted by the sample in a direction away from the optical axis and is disposed at a position generally confronting the conductive cylinder. A second detector is disposed over the conductive cylinder. A Wien filter deflector deflects secondary electrons emitted by the sample toward and for detection by the second detector. The Wien filter deflector is disposed on the optical axis and between the conductive cylinder and the second detector.

Abstract: Multipole rod assemblies for guiding or trapping ions in a mass spectrometer. A multipole rod assembly includes a plurality of modules. Each module includes a shield element, one or more insulating elements coupled to the shield element, and one or more multipole rods mounted on the insulating elements, wherein the modules are coupled together to form the multipole rod assembly such that the multipole rods of the modules define an interior volume for guiding or trapping ions.

Abstract: UV light and a fluid are used in a process for the decontamination of microlithographic projection exposure devices with optical elements or portions thereof, in particular of the surfaces of optical elements. A second UV light source is directed for decontamination, in intervals between exposures, toward at least a portion of the optical elements.

Abstract: In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2 is provided across parts of the beam path in or adjacent to moving components of the apparatus. A variety of structures may be used to provide the laminar flow including a screen, a settling chamber, an angled inlet port and a flow path having increasing cross-sectional area.

Abstract: A mass spectrometry quantitation technique enables high-throughput quantitation of small molecules using a laser-desorption (e.g., MALDI) ion source coupled to a triple-quadrupole mass analyzer. The ions generated from the ion source are collisionally damped/cooled, and then quantitatively analyzed using the triple-quadrupole analyzer operated in the multiple-reaction-monitoring (MRM) mode. Significantly improved measurement sensitivity is obtained by applying laser pulses to the ion source at a high pulse rate of about 500 Hz or higher. This allows the data acquisition to be performed rapidly, and the speed of about one second for each sample point on the ion source target has been achieved.

Abstract: In an ion implantation system including (a) an ion source (b) a mass analyzing portion, (c) an ion acceleration portion, (d) an ion beam focusing/deflecting portion, and (e) an end station chamber for implanting ions onto a semiconductor substrate. The ion source consists of plural ion sources being connected to the same mass analyzing portion in which any one of the plural ion sources is selected. Mass-separated ions from the ion source are led to the acceleration portion, and a stencil mask is arranged approximately to the semiconductor substrate in the end station chamber.