Abstract: Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.

Abstract: A positioning apparatus includes a first stage, capable of moving in a first direction and a second direction which is orthogonal to the first direction, a second stage, arranged on the first stage and moved with the first stage, and capable of moving in the first direction and the second direction and capable of mounting an object to be adjusted in a position and a rotation, and a driving mechanism, arranged on the first stage, and for moving the second stage relative to the first stage. The driving mechanism includes a first electromagnet which generates first suction power, a second electromagnet, provided opposite to and away from the first electromagnet, which generates second suction power, and a core member, which is held movable between the first and second electromagnets, and moves by being pulled in accordance with the first and/or second suction power.

Abstract: Disclosed is a high field asymmetric waveform ion mobility spectrometer (FAIMS) with optical based detection of selectively transmitted ions. Light from a light source is directed through an optical port in an electrode of the FAIMS. A light detector is provided for receiving light that is one of transmitted and scattered by the selectively transmitted ions within the FAIMS.

Abstract: A mass spectrometer has an ion source (10) with a plurality of atmospheric pressure sample ioniser (20) mounted in a front face (15) thereof. Each sample ioniser (20) extends into a corresponding sample region (30) and the tip of each sample ioniser is mounted at right-angles to a corresponding one of a plurality of entrance cones (50) each having an entrance orifice (40) therein. Each entrance cone (50) in turn opens into an inlet channel having first and second parts (60, 70). The two parts of the inlet channel are separated by an electrical gate (65). The inlet channels corresponding to each entrance cone (50) all merge into a common exit channel (90) to a mass spectrometer. By appropriate operation of the gates (65) dividing the inlet channels, rapid switching between the samples that are analysed in the mass analyser can be achieved.

Abstract: Apparatus and method for placement of workpieces such as silicon wafers in relation to an integrated circuit fabrication tool. A robotic arm mounted in relation to the tool moves workpieces in and out of the tool. A spacer has an exposed spacer surface facing away from the tool. The relative position of this exposed spacer surface is adjustable with respect to the tool. A movable cassette support supports one or more workpieces and is placed in abutting relationship with the spacer surface. It is onto this cassette support surface that a conveyor system such as an overhead transport delivers cassettes containing workpieces such as wafers for subsequent treatment by the tool.

Abstract: A method and apparatus for measuring doses of electron beams that are absorbed by an object subjected to e-beam irradiation. The absorbed dose can be continuously measured during an irradiation process, and adjustment can be made to system parameters in accordance with the measured absorbed dose.

Abstract: The invention provides devices, device configurations and methods for improved sensitivity, detection level and efficiency in mass spectrometry particularly as applied to biological molecules, including biological polymers, such as proteins and nucleic acids. In one aspect, the invention relates to charged droplet sources and their use as ion sources and as components in ion sources. In another aspect, the invention relates to charged droplet traps and their use as ion sources and as elements of ion sources. Further, the invention relates to the use of aerodynamic lenses for high efficiency ion transport to a charge particle analyzer, particularly a mass analyzer. Devices of this invention allow mass spectral analysis of a single charged droplet. The ion sources of this invention can be combined with any charge particle detector or mass analyzer, but are a particularly benefit when used in combination with a time of flight mass spectrometer.

Abstract: The invention relates to the construction and operation of a slit diaphragm pulser for a time-of-flight mass spectrometer with orthogonal injection of the ions to be examined. The invention includes switching three diaphragm potentials during a transition from a filling phase to an acceleration phase in order to maintain a potential along the axis of the injected ion beam at a constant level, to prevent any penetration by the accelerating fields during the filling phase and to obtain extremely high mass resolution in the acceleration phase through a lens effect.

Abstract: An electron beam exposure apparatus for exposing a pattern accurately even if the current of the electron beam is high. The electron beam exposure apparatus 100 includes a mask 30 with a first and second block patterns for shaping the electron beam. Magnification of the first block pattern to a first exposure pattern which is to be exposed by the electron beam having a first current shaped by the first block pattern is different with magnification of the second block pattern to a second exposure pattern which is to be exposed by the electron beam having a second current shaped by the second block pattern.

Abstract: A system including co-axial focused ion beam and an electron beam allows for accurate processing with the FIB using images formed by the electron beam. In one embodiment, a deflector deflects the electron beam onto the axis of the ion beam and deflects secondary particles collected through the final lens toward a detector. In one embodiment, a positively biased final electrostatic lens focuses both beams using the same voltage to allow simultaneous or alternating FIB and SEM operation. In one embodiment, the landing energy of the electrons can be varied without changing the working distance.

Abstract: When an ultraviolet pasteurizer is used in a room free of a person, left and right light shield doors are opened to expose ultraviolet lamps outwardly. When an operation switch on a control panel is then turned on, an operation start timer is actuated, and the ultraviolet lamps are then energized to sterilize surrounding surfaces after elapse of 5 minutes. When the ultraviolet pasteurizer is used in a room occupied by a person, the left and right light shield doors are closed to direct the ultraviolet lamps inwardly until all light shield doors are brought into a substantially triangular prism. When the operation switch on the control panel is then turned on, the ultraviolet lamps and a fan are energized to draw external air from an air inlet. The drawn air passes through an inner radiation chamber defined inwardly of the light shield doors that have been combined into the substantially triangular prism.

Abstract: A method for locating pattern matches in amino acids by use of various and sequential filters capable of determining inner sample pattern matches, inner group pattern matches, and word matching for purposes of further analysis or data mining. Filters include the use of a scoring scheme, comparison of scan numbers versus sequence of common ions to be MS/MS, and daughter ion subtraction for obtaining pattern match candidates.

Abstract: The presence of trace molecules in air may be determined using an ion mobility spectrometer. Such devices may be used in the fields of explosives detection, identification of narcotics, and in applications characterized by the presence of very low airborne concentrations of organic molecules of special interest. The sensitivity of such instruments may depend upon on the method of gas sampling utilized. A virtual wall gas sampling system can greatly improve the sampling efficiency, particularly when the sampling needs to be performed at a distance from the air intake and large volumes need to be sampled. The virtual wall gas sampling system consists of an intake gas flow and a separate group of one or more sheet-like gas flows, which may be either mutually deflected to move with a circular motion or may be formed into a cylindrical bounding surface.

Abstract: The present invention provides a system and method for detecting and repairing defects in semiconductor devices. According to the invention, defects are located using a scanning probe microscope, such as an atomic force microscope or a scanning tunneling microscope, and repaired at locations determined by the scanning probe microscope. The microscope itself, and in particular the detection tip, may be employed to remove the defects. For example, the tip may be used to machine away the defect, to apply an electric field to oxidize the defect, and/or to heat the defect causing it to burn or vaporize. By combining precise defect location capabilities of a scanning probe microscope with defect removal, the invention permits very precise correction of defects such as excess material and foreign particles on semiconductor substrates.

Abstract: A device for influencing an electron beam, especially a deflector unit for an electron beam lithography machine, comprises a plurality of coil formers (12b) each with a bore (16) defining a passage for the beam and each carrying coils (18, 19) operable to generate magnetic fields for deflecting the path of the beam when passing through the passage. Each former is made of a high-strength ceramic material having a high thermal conductivity and low coefficient of thermal expansion so that, with respect to a given output of heat by the associated coils during quasi-continuous operation for repeated beam deflection during pattern writing, the heat is dissipated at such a rate as to preclude thermal expansion of the coils and thus avoid distortion of the magnetic fields generated by the coils.

Abstract: A thermoelectron generating source including a facial main cathode for emitting thermoelectrons by being heated from behind, a filament for heating the main cathode from behind to emit the thermoelectrons, an extraction electrode for extracting the thermoelectrons emitted from the main cathode under an electric field, the extraction electrode being provided near the front of the main cathode, and two deflecting electrodes and disposed on the left and right sides near the front of the extraction electrode to carry the extraction electrode. The potentials of the two deflecting electrodes are kept in a relation VL>VR?0, where the potential of one deflecting electrode is VL and the potential of the other deflecting electrode is VR.

Abstract: The presence of trace molecules in air is often determined using a well-known device called an ion mobility spectrometer. Such devices are commonly utilized in the fields of explosives detection, identification of narcotics, and in applications characterized by the presence of very low airborne concentrations of organic molecules of special interest. The sensitivity of such instruments is dependent on the method of gas sampling utilized. The vortex sampling nozzle consists of an intake gas flow and a separate coaxial heated, emitted gas flow that is deflected to move with a circular motion. A heated vortex sampling nozzle can greatly improve the sampling efficiency for low volatility target molecules, particularly when the sampling needs to be performed at a distance from the air intake and the vapor pressure of the target molecules is very low.

Abstract: An exposure method of drawing a pattern on a substrate using a charged particle beam. The method includes a detection step of placing a calibration substrate having a plurality of marks on a stage and detecting positions of the plurality of marks by a first position detection section using a charged particle beam and by a second position detection section using light while adjusting a position of the stage, and a correction step of correcting a position where the charged particle beam is incident on the substrate on which the pattern is to be drawn in drawing, in accordance with the position of the stage on the basis of the difference between detection results by the charged particle beam and the light in the detection step.

Abstract: An environmental sampler for a mass spectrometer is disclosed that provides for controlled introduction of small amounts of fluids or gases into the vacuum system of the mass spectrometer under severe environmental conditions. Accurate calibration checks of the environmental sampler and mass spectrometer during remote autonomous operation is possible by means of an internal standard reservoir integral with the environmental sampler.

Abstract: In accordance with one specific embodiment of the present invention, the ion optics for use with an ion source have a plurality of electrically conductive grids that are mutually spaced apart and have mutually aligned respective pluralities of apertures through which ions may be accelerated and wherein each grid has an integral peripheral portion. A plurality of moment means are applied to a circumferentially distributed plurality of locations on the peripheral portion of each grid, which is initially flat, thereby establishing an annular segment of a cone as the approximate shape for that peripheral portion and a segment of a sphere as the approximate dished shape for the grid as a whole. The plurality of grids have conformal shapes in that the direction of deformation and the approximate spherical radii are the same.