Patents Examined by Kevin Chung
  • Patent number: 9532755
    Abstract: Disclosed are an X-ray computed tomographic imaging apparatus and a method for same. The X-ray computed tomographic imaging apparatus of the present invention comprises: a tomograph which radiates light onto an object being imaged by tomography, and detects the light passing through the object being imaged by tomography; a magnification rate determining unit which determines the magnification rate of an image of the object being imaged by tomography using the hardware property of the tomograph and/or the size of an input voxel; and a magnification rate controller which moves the tomography in accordance with the determined magnification rate, thereby obtaining images having a high resolution.
    Type: Grant
    Filed: January 13, 2011
    Date of Patent: January 3, 2017
    Assignee: VATECH Co., Ltd.
    Inventors: Sung Il Choi, Hyo Sung Cho
  • Patent number: 9499415
    Abstract: An ultraviolet irradiation device that is used for a fluid to be irradiated having a low ultraviolet ray transmissivity, a spirally wound tube in which the fluid to be irradiated flows is supported and fixed, and an irradiation amount of ultraviolet rays with which the fluid is irradiated is increased. A tube 3 having ultraviolet ray transmitting property is spirally wound on an outer circumferential surface of a support pipe 5, a plurality of ultraviolet lamps 7 are disposed around an axis of the support pipe apart from the tube, an inner case 9 that supports the support pipe and that encloses the plurality of ultraviolet lamps is provided, and a fluid flows in the tube and is irradiated with ultraviolet rays. The tube which is a fluid channel is thereby fixed to the support pipe, so that breakage of the tube and the ultraviolet lamps 7 can be prevented.
    Type: Grant
    Filed: August 14, 2014
    Date of Patent: November 22, 2016
    Assignee: CHIYODA KOHAN CO., LTD
    Inventors: Kenichiro Deguchi, Hiroshi Nakagaki, Satoshi Yamaguchi, Takashi Fujii
  • Patent number: 9490100
    Abstract: The invention relates to a compound objective lens for a Scanning Electron Microscope having a conventional magnetic lens excited by a first lens coil, an immersion magnetic lens excited by a second lens coil, and an immersion electrostatic lens excited by the voltage difference between the sample and the electrostatic lens electrode. For a predetermined excitation of the lens, the electron beam can be focused on the sample using combinations of excitations of the two lens coils. More BSE information can be obtained when the detector distinguishes between BSE's (202) that strike the detector close to the axis and BSE's (204) that strike the detector further removed from the axis. By tuning the ratio of the excitation of the two lens coils, the distance from the axis that the BSE's impinge on the detector can be changed, and the compound lens can be used as an energy selective detector.
    Type: Grant
    Filed: September 9, 2013
    Date of Patent: November 8, 2016
    Assignee: FEI COMPANY
    Inventors: Petr Syta{hacek over (r)}, Petr Hlavenka, Lubomír Tůma
  • Patent number: 9472374
    Abstract: A multiple degree of freedom sample stage or testing assembly including a multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes a plurality of stages including linear, and one or more of rotation or tilt stages configured to position a sample in a plurality of orientations for access or observation by multiple instruments in a clustered volume that confines movement of the multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes one or more clamping assemblies to statically hold the sample in place throughout observation and with the application of force to the sample, for instance by a mechanical testing instrument. Further, the multiple degree of freedom sample stage includes one or more cross roller bearing assemblies that substantially eliminate mechanical tolerance between elements of one or more stages in directions orthogonal to a moving axis of the respective stages.
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: October 18, 2016
    Assignee: HYSITRON, INC.
    Inventors: Edward Cyrankowski, Syed Amanulla Syed Asif, Ryan Major, Derek Rasugu, Yuxin Feng
  • Patent number: 9460903
    Abstract: The same sample S is analyzed using an ion-trap (IT) mass spectrometer section 11 in which ions are captured in an ion trap before mass spectrometry and a time-of-flight (TOF) mass spectrometer section 12 in which ions generated from the sample are directly subjected to mass spectrometry. A mass spectrum creator 21 creates an IT mass spectrum and a TOF mass spectrum from the measured results. A glycopeptide detector 23 detects fragment ion peaks related to neutral loss of sugars from the IT mass spectrum as well as peaks corresponding to intact molecular ions from the TOF mass spectrum, and furthermore, detects peaks common to the two spectra as glycopeptide ions. A quantitative analyzer 24 determines relative quantities of glycoforms of the glycopeptide based on the TOF mass spectrum. A structural analyzer 25 analyzes the structure of the glycopeptide using the result of an MSn analysis of the sample S.
    Type: Grant
    Filed: November 25, 2014
    Date of Patent: October 4, 2016
    Assignee: SHIMADZU CORPORATION
    Inventor: Masaki Murase
  • Patent number: 9392678
    Abstract: A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.
    Type: Grant
    Filed: October 16, 2012
    Date of Patent: July 12, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Silvia De Dea, Georgiy O. Vaschenko, Peter Baumgart, Norbert Bowering
  • Patent number: 9378858
    Abstract: There is provided a repair apparatus including a gas field ion source which includes an ion generation section including a sharpened tip, a cooling unit which cools the tip, an ion beam column which forms a focused ion beam by focusing ions of a gas generated in the gas field ion source, a sample stage which moves while a sample to be irradiated with the focused ion beam is placed thereon, a sample chamber which accommodates at least the sample stage therein, and a control unit which repairs a mask or a mold for nano-imprint lithography, which is the sample, with the focused ion beam formed by the ion beam column. The gas field ion source generates nitrogen ions as the ions, and the tip is constituted by an iridium single crystal capable of generating the ions.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: June 28, 2016
    Assignee: Hitachi High-Tech Science Corporation
    Inventors: Fumio Aramaki, Anto Yasaka, Osamu Matsuda, Yasuhiko Sugiyama, Hiroshi Oba, Tomokazu Kozakai, Kazuo Aita
  • Patent number: 9373474
    Abstract: An ion source is provided with a push-out electrode, a pull-out electrode, and a pull-in electrode all for ionizing a sample and accelerating generated ions in a pulsed manner, wherein the push-out electrode and/or the pull-in electrode has a curved surface shape having a depression curved in the direction opposite to the direction of travel of the ions. As a result, a compact ion source capable of temporally and spatially focusing ions and outputting the ions, and a compact time-of-flight mass spectroscope with good detection resolution and detection sensitivity which is provided with the compact ion source can be provided.
    Type: Grant
    Filed: March 26, 2010
    Date of Patent: June 21, 2016
    Assignees: Osaka University, MSI. Tokyo, Inc.
    Inventors: Michisato Toyoda, Jun Aoki, Shinichi Miki
  • Patent number: 9354188
    Abstract: A particle beam device, in particular an electron beam device, is provided having a beam generator for generating a primary particle beam, an objective lens for focusing the primary particle beam onto an object, and a detector for detecting particles emitted by the object. The objective lens has at least one magnetic unit, with the magnetic unit generating at least one first crossover and at least one second crossover. The first crossover is arranged in the objective lens or in a region between the objective lens and the object. The second crossover is arranged at the object. The device permits the examination of the object using particles which have a low energy, with good imaging properties. A method for operating the particle beam device is also provided.
    Type: Grant
    Filed: September 6, 2013
    Date of Patent: May 31, 2016
    Assignee: Carl Zeiss Microscopy GmbH
    Inventor: Michael Albiez
  • Patent number: 9347893
    Abstract: The invention provides methods and apparatus for enhanced PCI and dual-use radiation imaging systems. In one implementation high resolution storage phosphor plate radiation detector (an area detector) is employed for conventional attenuation radiation imaging and/or PCI (including conventional PCI and coded aperture PCI). Slit and slot scan implementations for dual-use systems are introduced. Dedicated single and dual-use slit and slot scan system for conventional attenuation imaging and PCI are described that employ face-on or edge-on detectors. Slit and slot scan systems that employ area detectors are described. Edge-on, structured cell detector designs are described. Applications of edge-on structured cell detectors for CT, Nuclear Medicine, PET, and probe detectors are described.
    Type: Grant
    Filed: July 18, 2012
    Date of Patent: May 24, 2016
    Inventors: Robert Sigurd Nelson, William Bert Nelson
  • Patent number: 9324544
    Abstract: The invention relates to time-of-flight mass spectrometers in which individual time-of-flight spectra are measured by detection systems with limited dynamic measurement range and are summed to sum spectra. The invention proposes a method to increase the dynamic range of measurement of the spectrum. To achieve this, those ion signals whose measured values display saturation of the analog-to-digital converter (ADC) are replaced by correction values, particularly if several successive measured values are in saturation. The correction values are obtained from the width of the signals, preferably simply from the number of measured values in saturation.
    Type: Grant
    Filed: March 5, 2013
    Date of Patent: April 26, 2016
    Assignee: Bruker Daltonik GmbH
    Inventor: Oliver Rather
  • Patent number: 9312119
    Abstract: An open electrostatic trap mass spectrometer is disclosed for operation with wide and diverging ion packets. Signal on detector is composed of signals corresponding to multiplicity of ion cycles, called multiplets. Using reproducible distribution of relative intensity within multiplets, the signal can be unscrambled for relatively sparse spectra, such as spectra past fragmentation cell of tandem mass spectrometer, past ion mobility and differential ion mobility separators. Various embodiments are provided for particular pulsed ion sources and pulsed converters such as orthogonal accelerators, ion guides, and ion traps. The method and apparatus enhance the duty cycle of pulsed converters, improve space charge tolerance of the open trap analyzer and extends the dynamic range of time-of-flight detectors.
    Type: Grant
    Filed: December 30, 2010
    Date of Patent: April 12, 2016
    Assignee: LECO Corporation
    Inventor: Anatoly Verenchikov
  • Patent number: 9308394
    Abstract: A particle beam irradiation system having a multi-energy extraction control operation that controls the extraction beam energy in a synchrotron within a short time, such that when the ion beam irradiation is halted, an operating cycle is updated within a short time and a dose rate is improved. To this end, operating control data for each of the devices constituting the synchrotron is constructed by multi-energy extraction control pattern data for controlling extraction of beams of a plurality of energy levels at one operating cycle, and a plurality of sets of deceleration control data that correspond to the extraction control of the beam of the plurality of energy levels. The devices are controlled by using the operating control data.
    Type: Grant
    Filed: July 18, 2013
    Date of Patent: April 12, 2016
    Assignee: HITACHI, LTD.
    Inventors: Hideaki Nishiuchi, Masumi Umezawa, Takuya Nomura, Satoshi Totake, Koji Tobinaga, Tomohisa Imagawa, Seiji Yoshiura, Moemi Takeda
  • Patent number: 9301379
    Abstract: An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.
    Type: Grant
    Filed: March 23, 2012
    Date of Patent: March 29, 2016
    Assignee: GIGAPHOTON INC.
    Inventors: Yukio Watanabe, Miwa Igarashi, Masato Moriya, Hiroaki Nakarai
  • Patent number: 9289624
    Abstract: The present invention relates to a particle therapy apparatus used for radiation therapy. More particularly, this invention relates to a gantry for delivering particle beams which comprises means to analyse the incoming beam. Means are integrated into the gantry to limit the momentum spread of the beam and/or the emittance of the beam.
    Type: Grant
    Filed: April 19, 2012
    Date of Patent: March 22, 2016
    Assignee: ION BEAM APLICATIONS, S.A.
    Inventor: Yves Jongen
  • Patent number: 9287102
    Abstract: Systems and methods disclosed provide for methods of managing polarity switching in an ion mobility spectrometer, and provide for management of the repelling grid voltage, the gating grid voltage, and the fixed grid voltage during polarity switching. Systems and methods also provide for the management of the effect of dielectric relaxation in an insulator proximal to the collector, and provide for a preamplifier coupled to the collector including a switch, and a method of managing the collector output including the switch. Systems and methods consistent with the current disclosure further provide for a method of normalizing ion mobility data by determining fitting coefficients associated with a plurality of measurement data sets, and subtracting the curves determined by the fitting coefficients from the data acquired by the ion mobility spectrometer.
    Type: Grant
    Filed: October 27, 2011
    Date of Patent: March 15, 2016
    Assignee: SMITHS DETECTION MONTREAL INC.
    Inventors: Henryk Zaleski, Mark Piniarski, Simon Feldberg, Jeff Anderson, Oleg Samarin
  • Patent number: 9287083
    Abstract: Provided is a charged particle beam device that is capable of suppressing an field-of-view deviation occurring when observing a tilted image or a left-right parallax-angle image acquired by irradiating a tilted beam on a sample while continuously compensating a focus. By means of an aligner for compensating field-of-view (54) installed between an objective lens (7) that focuses a primary charged particle beam on a surface of the sample (10), and a deflector for controlling tilt angle (53) that tilts the primary charged particle beam, the field-of-view deviation occurring during tilting of the primary charged particle beam is suppressed based on an amount of compensation required by a tilt angle of the deflector for controlling tilt angle (53), lens conditions, and a distance between the objective lens (7) and the sample (10), in conjunction with a focus compensation of the objective lens (7).
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: March 15, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Shinichi Tomita, Wataru Kotake, Sukehiro Ito
  • Patent number: 9281173
    Abstract: An ion processing device includes electrically conductive vacuum manifold segments serially positioned and enclosing a volume along an axis. The segments are electrically isolated from each other and independently addressable by a voltage source. An ion optics device is positioned in the volume. A voltage differential between each manifold segment and the ion optics device is maintained below a maximum value by applying different voltages to respective manifold segments. The voltage differential may be controlled to avoid voltage breakdown in a low-pressure, high-voltage gas environment. The ion optics device may in some cases be an ion mobility drift cell.
    Type: Grant
    Filed: May 30, 2013
    Date of Patent: March 8, 2016
    Assignee: Agilent Technologies, Inc.
    Inventors: Alexander Mordehai, Mark H. Werlich, Ruwan T. Kurulugama, Thomas A. Knotts
  • Patent number: 9281089
    Abstract: A method and apparatus for using a parent radionuclide. The apparatus includes a radiation impervious case, a vial disposed within the case, a stopper with a central bore, the central bore aligned at an oblique angle with respect to the case so that a straight line through the central bore does not pass through any part of the vial and a curved tube that connects the central bore of the stopper and a cap of the vial.
    Type: Grant
    Filed: October 30, 2014
    Date of Patent: March 8, 2016
    Assignee: NorthStar Medical Radioisotopes LLC
    Inventor: Glenn H. Isensee
  • Patent number: 9257259
    Abstract: Provided is an electron beam scanning method for forming an electric field for appropriately guiding electrons emitted from a pattern to the outside of the pattern, and also provided is a scanning electron microscope. When an electron beam for forming charge is irradiated to a sample, a first electron beam is irradiated to a first position (1) and a second position (2) having the center (104) of a pattern formed on the sample as a symmetrical point, and is then additionally irradiated to two central positions (3, 4) between the first and second irradiation position, the two central positions (3, 4) being on the same radius centered on the symmetrical point as are the first and second positions. Further, after that, the irradiation of the first electron beam to the central positions between existing scanning positions on the radius is repeated.
    Type: Grant
    Filed: June 8, 2011
    Date of Patent: February 9, 2016
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kinya Kobayashi, Toshiyuki Yokosuka, Chahn Lee