Abstract: A post-discharge plasma coating device for a wired substrate comprising an inner tubular electrode on an inner tubular wall for receiving the substrate and a precursor moving axially in a working direction; an outer tubular electrode coaxial with, and surrounding, the inner tubular electrode. The inner and outer electrodes are configured to be supplied with an electrical power source for producing a plasma when a plasma gas is supplied between the electrodes and is thereby excited, the plasma excited gas flowing axially in the working direction and reacting with the precursor in a coating area at the end of the inner tubular wall in the direction. The inner tubular wall extends axially towards the coating area at least until, in various instances beyond, the end of the outer electrode, in the working direction and at least one dielectric tubular wall extends axially between the inner tubular electrode and the outer tubular electrode.

Abstract: In an aseptic filling apparatus, a CIP of the content filling station is performed after rotation of a wheel in the content filling station is stopped, a COP or SOP of the content filling station is performed while the wheel in the content filling station is rotating immediately after the CIP is completed, an SIP of the content filling station is performed with rotation of the wheel in the content filling station being stopped immediately after the COP or SOP is completed, and one or both of the COP and SOP of the other stations is performed in a predetermined order while wheels in the other stations are rotating in a period from the start of the CIP to the end of the SIP.

Abstract: A cleaning apparatus for cleaning of medical machine components of machines such as CPAP machines, nebulizers, PEEP machines, and the like is disclosed herein. The cleaning apparatus comprises a container body. A carousel is configured for placement within the container body. The carousel comprises a support structure. The carousel further comprises a helical ramp attached to the support structure and extending helically from an operative top end of the support structure to an operative bottom end of the support structure along a periphery of the support structure.

Abstract: A method of washing induction cookware having a cookware content, using induction heating and a water jet, and comprising a washing process having the steps of: heating the cookware during a washing cycle; washing the cookware in the washing cycle with a cold-water jet; drying the cookware after the washing cycle; heat sanitization of the cookware; and steam sanitization of the cookware, whereby the washing process is analyzed by a vision system, the washing process is controlled and adjusted by a controller having parameters varying between each of the cookware content; whereby the parameters are derived from an interfaced cooking apparatus and from a manual input and whereby the vision system serves to regulate a water pressure, a water flow, a heating temperature, and time durations between each of the cookware content, with each of the cookware content having a cooking base, a food contact surface, recipe ingredients cooked, a cooking temperature, and a cooking duration.

Abstract: An embodiment of the present invention provides a buff process module. The buff process module includes: a buff table on which a processing target object is mounted; a buff head that holds a buff pad for applying a predetermined process to the processing target object; a buff arm that supports and swings the buff head; a dresser for dressing the buff pad; and a cleaning mechanism that is disposed between the buff table and the dresser and is for cleaning the buff pad.

Abstract: A cleaning module for cleaning a wafer comprises a wafer gripping device configured to support a wafer in a vertical orientation and comprises a catch cup and a gripper assembly. The catch cup comprises a wall that has an annular inner surface that defines a processing region and has an angled portion that is symmetric about a central axis of the wafer gripping device. The gripper assembly comprises a first plate assembly, a second plate assembly, a plurality of gripping pin, and a plurality of loading pin. The gripping pins are configured to grip a wafer during a cleaning process and the loading pins are configured to grip the wafer during a loading and unloading process. The cleaning module further comprises a sweep arm coupled to a nozzle mechanism configured to deliver liquids to the front and back side of the wafer.

Abstract: A device operable to clean an imaging element of a visualization scope comprises a visualization scope engagement body, a cleaning element having a first end portion thereof located adjacent to a distal end of the visualization scope engagement body and a cleaning head attached to the visualization scope engagement body at the distal end thereof. The first end portion of the cleaning element is engaged with the cleaning head. The cleaning head is movable between a deployed configuration relative to the visualization scope engagement body and a retracted configuration relative to the visualization scope engagement body. A centerline longitudinal axis of the visualization scope engagement body extends through the cleaning head when the cleaning head is in the deployed configuration and does not extend through the cleaning head when the cleaning head is in the retracted configuration. The cleaning element is movable for cleaning debris from the imaging element.

Abstract: A cleaning tool for cleaning a glass surface of an accelerator column is disclosed. The cleaning tool includes a shaft including a first end and a second end; a foam body located at the first end of the shaft; and a mounting bracket coupled to the first end of the shaft, the mounting bracket receiving the foam body. An outer circumference of the foam body includes a textured cleaning surface for contacting the glass surface of the accelerator column.

Abstract: A substrate processing apparatus is configured to dry a substrate by replacing a liquid film formed on a top surface of the substrate, which is horizontally held, with a supercritical fluid. The substrate processing apparatus includes a pressure vessel, a cover body and a supporting body. The pressure vessel has therein a drying chamber for the substrate. The cover body is configured to close an opening of the drying chamber. The supporting body is configured to support the substrate horizontally within the drying chamber. The supporting body is fixed to the drying chamber.

Abstract: A self-cleaning needleless connector may include a connector body defining a fluid passageway including an inlet and an outlet, a cover disposed over at least the inlet of the connector body, an access point disposed at an inlet end of the cover, where in a first position the inlet is within the cover and in an second position the inlet is extended beyond the cover and configured to receive a male luer, a reservoir containing a cleaning agent, and an abrasive surface located in the cover that is in fluid communication with the cleaning agent, where the abrasive surface and the cleaning agent are configured to contact an exterior surface of the inlet to create friction.

Abstract: High-performance substrate cleaning apparatus, substrate cleaning method, substrate processing apparatus, and substrate drying apparatus are provided. A substrate cleaning apparatus, including: a substrate holding and rotating mechanism that holds and rotates a substrate; a first cleaning mechanism that brings a cleaning tool into contact with the substrate to clean the substrate, cleans the substrate using two-fluid jet, or cleans the substrate using ozone water; and a second cleaning mechanism that cleans the substrate using an ultrasonic cleaning liquid is provided.

Abstract: The present disclosure relates generally to water jet equipment. Specifically, water jet equipment that includes a support frame comprised of a plurality of stackable trolleys that support a plurality of lances as those lances are inserted into and withdrawn from heat exchanger tubes during a cleaning operation of the same. A method of cleaning elongated tubes by positioning and rotating the lances while moving in a first direction is further provided.

Abstract: A reticle cleaning system includes a casing, a reticle holder, and a static charge reducing device. The reticle holder is in the casing and configured to hold a reticle. The static charge reducing device is above the reticle holder and includes a fluid generator, an ionizer, and a static charge sensor. The fluid generator is configured to control a humidity condition in the casing. The ionizer is configured to provide ionized air molecules to the reticle. The static charge sensor is configured to detect a static charge value on the reticle, wherein the ionizer is between the fluid generator and the static charge sensor.

Abstract: A cleaning device for a pair of spectacles, comprising a housing defining a cleaning space, a mounting part for holding the pair of spectacles inside said space, sets of opposing cleaning elements for cleaning opposing faces of glasses of the pair of spectacles, and a drive unit for moving the pair of spectacles and the cleaning elements relative to each other during a cleaning operation. The sets of opposing cleaning elements are positionable relative to each other between an inactive position, that is configured to have at least one of the sets of the cleaning elements lie spaced from at least one of the opposing faces of the respective glasses, and a cleaning position, that is configured to have the sets of opposing cleaning elements lie against both opposing faces of the respective glasses.

Abstract: The invention concerns a device (100) for cleaning the optical surface (162) of at least one optical sensor (160) for a motor vehicle. The cleaning device (100) includes a source (110) for emitting a laser beam and means for guiding the laser beam onto at least a part of the optical surface (162) of an optical sensor (160) so as to clean it.

Abstract: A substrate processing method includes a substrate holding step of holding a substrate having a front surface on which a metal is exposed, an inert gas replacing step of replacing an atmosphere around the front surface of the substrate with an inert gas by supplying an inert gas to a vicinity of the front surface of the substrate, an adjusting step of adjusting a pH of the rinsing liquid so as to form an inactive state in which the metal does not react with the rinsing liquid or so as to form a passive state by allowing the metal to react with the rinsing liquid, and a rinsing liquid supplying step of supplying the rinsing liquid whose pH has been adjusted to the front surface of the substrate after the atmosphere around the front surface of the substrate has been replaced with the inert gas.

Abstract: Dishwasher, in particular household dishwasher, with a washing compartment a control device for carrying out a washing program from a number of washing programs and with an automatic dosing device for automatically dosing a plurality of dosing quantities from a supply a cleaning agent present as a solid in the washing area, the control device for cleaning the automatic dosing device being set up to control the automatic dosing device to switch to a cleaning state and to control the automatic dosing device for cleaning the automatic Dosing device to carry out a specific wash program from the number of wash programs.

Abstract: A method of cleaning a component within a turbine that includes disassembling the turbine engine to provide a flow path to an interior passageway of the component from an access point. The component has coked hydrocarbons formed thereon. The method further includes discharging a flow of cleaning solution towards the interior passageway from the access point, wherein the cleaning solution is configured to remove the coked hydrocarbons from the component.

Abstract: Dishwashing machine comprising: a controller; a spray arm assembly comprising a spray arm having one or more spray holes for spraying a washing load with water, and a pipe for delivering water to the spray arm; a pump for pumping water through the pipe and to the spray arm; the pipe being constructed and arranged to at least partially restrict flow of water from the pump to at least a part of the spray arm dependent on spray arm orientation relative to the pipe, a power consumption of the pump thereby being dependent at least in part on the spray arm orientation relative to the pipe; and the controller being configured to monitor the power consumption of the pump in order to determine rotational information of the spray arm.

Abstract: A method of unclogging ducts in a part made by additive manufacturing, the ducts running from at least one well that opens out into the surface of the part, the method comprising the steps of: fabricating a guide with a body that is designed to fit in the well, the guide having internal channels that extend from a base of the guide that is accessible by a user to an outside wall of the body; cleaning the well and inserting the body of the guide in the well so that channels in the guide open out in register with inlets of ducts that are to be unclogged; and inserting a thin flexible tool, e.g. a metal cable, through the base of the guide into at least one channel therein and causing the tool to penetrate into the duct in register in the part so as to unclog it.