Abstract: A device for clearing obstructions from a medical tube, such as a chest tube, is disclosed in various embodiments. In embodiments, the device features a guide wire that extends from a drainage canister and can be advanced and withdrawn through a medical tube, such as a chest tube, via an actuator. The guide wire is actuated so as to maintain the sterile field within the chest tube and the associated suction pathway. Methods of clearing a medical tube of obstructions using such a device are also disclosed.
Abstract: Pyrolysis methods for disassociating an organic mass, or coating from an article, by placing the article in an air tight processing chamber, circulating a gaseous mixture of ambient air and at least 40% water vapor from an opening, through the processing chamber and out of an exhaust port, and maintaining the processing chamber at a temperature above 650 degrees Fahrenheit for a sufficient time to disassociate the organic material. A batch oven and a continuous processing oven including entrance and exit air closures that utilize the pyrolysis methods are described.
Abstract: The invention relates to a method and an apparatus for applying a fluid (32) to items (14) to be cleaned, which items are continuously or intermittently transported in the conveying direction (12) in an automatic cleaning machine, preferably an automatic pass-through dishwasher. At least two, preferably tubular, spray bodies (26.1, 26.2, 26.3, . . . 26.n) which are spaced apart from one another are arranged in at least one spray plane (22, 24) which is oriented parallel to the conveying direction (12) of the items (14) to be cleaned.
Type:
Grant
Filed:
October 5, 2007
Date of Patent:
August 14, 2012
Assignee:
Meiko Maschinenbau GmbH & Co KG
Inventors:
Stefan Scheringer, Michael Streb, Engelbert Ecker, Thomas Peukert, Bruno Gaus, Joachim Kupetz, Wendelin Hils, Denis Lehmann, Thomas Roederer
Abstract: A floor tool is provided, and includes a handle with first and second opposite ends through which a longitudinal axis of the handle extends, and a mop head coupled to the second end of the handle. In some embodiments, a fluid container is coupled to and carried by the handle at a location between the first and second ends of the handle. The fluid container can have a center of mass offset from the longitudinal axis. In some embodiments, a portion of the handle is located between the fluid container and the first end of the handle, and is offset from the longitudinal axis more than center of mass of the fluid reservoir. The floor tool can also have a valve coupled to the handle and having a gap into which a length of conduit extending from the fluid container can be laterally inserted. A valve-actuating trigger can be coupled to the handle for rotation, such that the trigger pivot point is closer to the second end of the handle than the terminal end of the trigger squeezed by a user.
Type:
Grant
Filed:
April 29, 2008
Date of Patent:
August 14, 2012
Assignee:
Diversey, Inc.
Inventors:
Charles A. Crawford, Andrew M. Bober, Craig Conner, Mark Cors, Nicholas Reback, Daniel Lee
Abstract: Strategies for tool designs and their uses wherein the tools can operate in either closed or open modes of operation. The tools easily transition between open and closed modes on demand. According to one general strategy, environmentally controlled pathway(s) couple the ambient to one or more process chambers. Air amplification capabilities upstream from the process chamber(s) allow substantial flows of air to be introduced into the process chamber(s) on demand. Alternatively, the fluid pathways are easily closed, such as by simple valve actuation, to block egress to the ambient through these pathways. Alternative flows of nonambient fluids can then be introduced into the process chamber(s) via pathways that are at least partially in common with the pathways used for ambient air introduction. In other strategies, gap(s) between moveable components are sealed at least with flowing gas curtains rather than by relying only upon direct physical contact for sealing.
Type:
Grant
Filed:
May 5, 2009
Date of Patent:
August 7, 2012
Assignee:
FSI International, Inc.
Inventors:
Jeffrey M. Lauerhaas, Jimmy D. Collins, Tracy A. Gast, Alan D. Rose
Abstract: Provided are a substrate processing apparatus and a substrate processing method capable of processing of a substrate using a supercritical fluid without exposing the pattern formed on the substrate to an atmospheric environment. The substrate processing apparatus includes a cleaning bath configured to accommodate a substrate and clean the substrate by flowing a cleaning solution, and a processing vessel configured to accommodate the cleaning bath and process the substrate with a supercritical fluid.
Abstract: Apparatus and methods are disclosed for cleaning interiors of passageways in endoscopes or other luminal medical devices by flow of liquid and gas therethrough. The liquid flow may include rivulets, droplets or other liquid entities which move on the internal surfaces of the passageways, and may include a three-phase contact interface between liquid and dry solid and gas.
Type:
Grant
Filed:
September 30, 2008
Date of Patent:
July 24, 2012
Assignee:
Princeton Trade & Technology, Inc.
Inventors:
Mohamed Emam Labib, Ching-Yue Lai, Yacoob Tabani, Ziye Qian, Stanislav S. Dukhin, Joseph J. Murawski
Abstract: Systems and methods for exposing semiconductor workpieces to vapors for through-hole cleaning and/or other processes are disclosed. A representative method includes exposing a semiconductor workpiece to a vapor, with the semiconductor workpiece having an opening extending from a first surface of the workpiece through the workpiece to a second surface facing opposite from the first surface. The opening can include a contaminant, and the method can further include drawing the vapor and the contaminant through at least a portion of the opening and away from the second surface of the semiconductor workpiece.
Abstract: Methods of cleaning plasma processing chamber components include contacting surfaces of the components with a cleaning solution, while avoiding damage of other surfaces or areas of the components by the cleaning solution. An exemplary plasma processing chamber component to be cleaning is an elastomer bonded electrode assembly having a silicon member with a plasma-exposed silicon surface, a backing member, and an elastomer bonding material between the silicon surface and the backing member.
Type:
Grant
Filed:
March 30, 2007
Date of Patent:
July 17, 2012
Assignee:
Lam Research Corporation
Inventors:
Duane Outka, Jason Augustino, Armen Avoyan, Stephen Whitten, Hong Shih, Yan Fang
Abstract: A method of extending storage time prior to cleaning a component of a plasma chamber is provided. The method comprises removing the component from the chamber, covering a thermal spray coating on the component while the surface is exposed to atmospheric air, storing the component, optionally removing the covering, and optionally wet cleaning reaction by-products from the thermal spray coating. Alternatively, instead of, or in addition to covering a thermal spray coating on the component, the component can be placed into a desiccator or dry-box.
Abstract: A cleaning device for a medical implement is disclosed. The cleaning device includes a cap having an opening to an inner cavity, the opening being adapted to receive a site of the medical implement. The cleaning device further includes a compressible cleaning material that contains a cleaning agent prior to receipt of the site of the medical implement, i.e. the cleaning material is pre-loaded with the cleaning agent. The compressible cleaning material is at least partially secured in the inner cavity and adapted to swab and clean the site with the cleaning agent.
Abstract: A portable manual vehicle wash assembly including a base removably attachable to a top exterior surface of a vehicle. A hollow pipe is attached to the base and includes an inlet formed at a first end thereof, and an outlet at a second end thereof. The inlet is adapted to receive an end of a first hose in fluid communication with a water source. The outlet is generally directed away from the exterior surface of the vehicle, and has a swivel member attached thereto. The swivel member is connected to a water emitter, typically in the form of a second hose or a spray nozzle.
Type:
Grant
Filed:
November 26, 2008
Date of Patent:
May 29, 2012
Inventors:
Jerry J. Montoya, Nicomedes A. Trujillo
Abstract: A radiometer is provided. The radiometer includes a sensor and a radiation transparent dome. The radiation transparent dome surrounds the sensor. The radiometer also includes one or more fluid nozzles. The one or more fluid nozzles are adapted to apply a fluid on the radiation transparent dome in order to clean the surface of the radiation transparent dome.
Type:
Grant
Filed:
August 4, 2009
Date of Patent:
May 22, 2012
Assignee:
University Corporation for Atmospheric Research
Inventors:
Steven Semmer, David Richter, Steve Oncley, Anthony Delany, Karl T. Schwenz
Abstract: A filtration system for a dishwasher, and an associated apparatus and method, are provided, comprising a macerator chamber adapted to house a macerator device. The macerator chamber is configured to receive washing fluid for the macerator device to comminute contaminants within the washing fluid. A drain chamber is in fluid communication with the macerator chamber and is configured to receive the washing fluid and comminuted contaminants therefrom via a fluid port therebetween. The drain chamber has a vented member associated therewith, which defines at least one first vent providing fluid communication between the drain chamber and the washing fluid circulation system. The vented member is spaced apart from the fluid port, and is configured to strain the comminuted contaminants from the washing fluid so as to retain the comminuted contaminants within the drain chamber while allowing the washing fluid to pass therethrough to the washing fluid circulation system.
Type:
Grant
Filed:
May 13, 2009
Date of Patent:
May 15, 2012
Assignee:
Electrolux Home Products, Inc.
Inventors:
Virgil J. Francisco, Mark D. Montgomery, Ashish A. Verma, David E. House
Abstract: Process for decontaminating, cleaning a solid organic substrate contaminated by solid radioactive particulate inorganic contaminants, in which: the said solid substrate is brought into contact with an extraction medium, devoid of water, comprising: dense pressurized CO2; at least one nonhalogenated surface-active compound chosen from block copolymers of poly(ethylene oxide) PEO and poly(propylene oxide) PPO, such as (EO)x-(PO)y diblock copolymers, (EO)x-(PO)y-(EO)x triblock copolymers and (PO)x-(EO)y-(PO)x, triblock copolymers, where x and y are integers from 2 to 80 with x other than y; and polydi(1 to 6C)alkylsiloxanes, such as polydimethylsiloxane (PDMS); and at least one complexing agent chosen from tributyl phosphate (TBP), crown ethers, tributylphosphine oxide, triphenylphosphine oxide and tri(n-octyl)phosphine oxide; the solid substrate and/or the extraction medium is/are subjected, simultaneously with the contacting operation, to a mechanical action.
Type:
Grant
Filed:
February 23, 2007
Date of Patent:
May 8, 2012
Assignees:
Commissariat a l'Energie Atomique, Areva NC
Inventors:
Bruno Fournel, Julien Galy, Frédéric Barth, Patrick Lacroix-Desmazes, Serge Lagerge, Sophie Dussolliet, Jérôme Blancher
Abstract: A washing machine that is capable of providing a stable washing mode even when a washing-related device is abnormal during a washing operation is disclosed. When a steam generation unit, which generates high-temperature steam into a drum, is abnormal, the operation of the steam generation unit is interrupted, and an operation for driving a washing heater mounted in a tub is performed, or an operation for driving a drying unit, which supplies high-temperature dry hot air into the drum, is performed. A steam substituting algorithm is provided when the steam generation unit is abnormal during the operation using the high-temperature steam. Consequently, the interruption of the washing operation due to the abnormal steam injection function is prevented, and therefore, the reliability of the product is improved while the inconvenience of use is minimized.
Type:
Grant
Filed:
March 23, 2006
Date of Patent:
May 1, 2012
Assignee:
LG Electronics Inc.
Inventors:
Phal Jin Lee, Dong Won Kang, Kwang Cheol Park
Abstract: The method for controlling the movement of the horizontal brush of a vehicle washing system, provides for a first and a second vector velocity control mode of the brush and an alternating logic between the first and the second control mode, the first control mode being based on the control of the absorption current of the rotation motor of the brush, the second control mode being based on the geometric limitation of the plunge of the brush.
Type:
Grant
Filed:
May 21, 2008
Date of Patent:
April 24, 2012
Assignee:
Ceccato S.p.A.
Inventors:
Marcelo Elvio De Silvio, Maurizio Signore
Abstract: A car wash system for large vehicles, such as trucks and busses, in which the arrival of a vehicle initiates a process of directing hot water from a supply tank through a relatively long supply line to a spray system. Water standing in the supply line is prevented for a time from going to the spray nozzles and, instead, is directed back to the source. This allows the temperature in the line to reach a predetermined desired value before washing is started. Water is recirculated at a faster rater than it is dispensed once the desired temperature has been reached.
Type:
Grant
Filed:
October 31, 2007
Date of Patent:
April 24, 2012
Assignee:
Belanger, Inc.
Inventors:
Michael J. Belanger, Tom E. Weyandt, Curtis S. Prater, David L. Togneti
Abstract: A process is provided for treating a semiconductor wafer at a target wafer temperature. This process includes the following steps: a) determining the target wafer temperature of the semiconductor wafer during a given wafer treatment process step; b) providing a treatment chamber having at least one semiconductor wafer disposed therein; c) dispensing water vapor into the treatment chamber in an amount to provide the chamber with an atmospheric environment having a dew point sufficiently close to the target wafer temperature to provide a temperature regulating effect; and d) initiating the given wafer treatment process step when the atmospheric environment of the treatment chamber is at the dew point of step c).
Abstract: A method for controlling operation of a washing machine is provided. The method may include performing heated washing courses at different temperatures while also selectively controlling an operating rate of a driving motor to enhance sterilizing effects on items being washed while protecting against damage to the items being washed. Performing these heated washing courses may include selecting an infant clothes oriented washing program from a plurality of washing programs, and performing a washing operation in accordance with one of a plurality of operating modes associated with the selected infant clothes oriented washing program, including controlling at least one of a washing course temperature or an operating rate of a driving motor of the washing machine.