Abstract: A method for forming a flexible transparent conductive film includes steps of: (a) electrospinning a first solution, which contains a polymer, a solvent and a metal ion-containing precursor, to form an polymeric fiber onto a soluble substrate; (b) providing energy to reduce the metal ion-containing precursor of the polymeric fiber, so as to form metal seeds on the polymeric fiber; and (c) placing the polymeric fiber together with the soluble substrate into a second solution, such that the soluble substrate dissolves in the second solution to form an electroless-plating bath and such that the polymeric fiber is subjected to electroless plating to form a metal coating from the metal seeds.

Abstract: A process of pretreatment for selective application of electroless metallization to a surface of a non-conductive material and a solution useful for the pretreatment are provided. The process achieves good coverage in areas to be plated on the surface of non-conductive materials without skip plating or over plating.

Abstract: The present invention relates to method for activating a copper or copper alloy surface for depositing a metal or metal alloy layer by electroless (autocatalytic) plating thereon wherein the formation of undesired voids is suppressed. The copper or copper alloy surface is contacted with palladium ions, at least one phosphonate compound and halide ions followed by electroless (autocatalytic) deposition of a metal such as palladium or a metal alloy such as a Ni—P alloy.

Abstract: Metalized plastic substrates, and methods thereof are provided herein. The method includes providing a plastic having a plurality of accelerators dispersed in the plastic. The accelerators have a formula ABO3, wherein A is one or more elements selected from Groups 9, 10, and 11 of the Periodic Table of Elements, B is one or more elements selected from Groups 4B and 5B of the Periodic Table of Elements, and O is oxygen. The method includes the step of irradiating a surface of plastic substrate to expose at least a first accelerator. The method further includes plating the irradiated surface of the plastic substrate to form at least a first metal layer on the at least first accelerator, and then plating the first metal layer to form at least a second metal layer.

Abstract: A surface-treated mold that includes a mold, a metal layer that is provided on a surface of the mold and contains at least one metal selected from nickel, chromium, tungsten and brass, and a carbon film that is provided on a surface of the metal layer, wherein the metal layer contains carbon, and the carbon concentration in the metal layer is higher between the boundary with the carbon film and the center of the metal layer than that between the boundary with the mold and the center of the metal layer.

Abstract: Aluminum alloy-made piston 1 is provided having, on external circumferential surfaces of both skirt portions 8, 9 of base member 1a, a multilayer solid lubricant coating film including inner coating film 21 and outer coating film 22. Both of the inner and outer coating films contain at least one of polyimide-imide resins, polyimide resins and epoxy resins as a binder resin. The inner coating film is formed of a material containing graphite etc. as a solid lubricant, and applied to the external surfaces of the skirt portions and then irradiated with laser beams by a laser heating apparatus at a temperature rise rate of 11.3-23.9° C./sec. for 10 seconds to be dried. Then, the outer coating film is applied to the top surface thereof, followed by baking treatment. With this, the multilayer solid lubricant coating film is formed in a possibly short total treatment time in a coating film-forming step.

Abstract: A process for stabilizing laser energy density on a target surface during pulsed laser deposition of thin films controls the focused laser spot on the target. The process involves imaging an image-aperture positioned in the beamline. This eliminates changes in the beam dimensions of the laser. A continuously variable attenuator located in between the output of the laser and the imaged image-aperture adjusts the energy to a desired level by running the laser in a “constant voltage” mode. The process provides reproducibility and controllability for deposition of electronic thin films by pulsed laser deposition.

Abstract: The time-averaged ion beam profile of an ion beam for implanting ions on a work piece may be smoothed to reduce noise, spikes, peaks, and the like and to improve dosage uniformity. Auxiliary magnetic field devices, such as electromagnets, may be located along an ion beam path and may be driven by periodic signals to generate a fluctuating magnetic field to smooth the ion beam profile (i.e., beam current density profile). The auxiliary magnetic field devices may be positioned outside the width and height of the ion beam, and may generate a non-uniform fluctuating magnetic field that may be strongest near the center of the ion beam where the highest concentration of ions may be positioned. The fluctuating magnetic field may cause the beam profile shape to change continuously, thereby averaging out noise over time.

Abstract: To manufacture a coating for an article for a semiconductor processing chamber, the article including a body of at least one of Al, Al2O3, or SiC, and a ceramic coating on the body. The ceramic coating includes a compound comprising Y2O3 in a range from about 50 mol % to about 75 mol %, ZrO2 in a range from about 10 mol % to about 30 mol %, and Al2O3 in a range from about 10 mol % to about 30 mol %, wherein the number of nodules per inch is in a range from about 30 nodules to about 45 nodules and the porosity is in a range from about 2.5% to about 3.2%.

Abstract: A component stack is coated such that, during a first coating pass, a first angle (?) is formed between the first stack opening surface and the coating beam and, during a second coating pass, a second angle (?) is formed between the first stack opening surface and the coating beam, wherein the first angle (?) and the second angle (?) are formed in opposite directions relative to the first stack opening surface.

Abstract: A porous discriminating layer is formed on a ceramic support having at least one porous wall by (a) establishing a flow of a gas stream containing highly porous particles through the support to deposit a layer of the highly porous particles of a ceramic or ceramic precursor onto wall(s) of the support and (b) calcining said deposited layer to form the discriminating layer. This method is an inexpensive and effective route to forming a discriminating layer onto the porous wall.

Abstract: Herein described are cementitious products and articles of manufacture comprising a carbon-doped titanium dioxide, having long-term photocatalytic activity. The titanium dioxide contained therein may be obtained by irradiating titanium dioxide under specific conditions of wavelength, in presence of a gas flow comprising an inert gas and an organic compound. The titanium dioxide thus treated acquires a high and stable carbon content, maintaining the specific surface area thereof substantially unaltered. The cementitious products/articles of manufacture containing it have a high and efficient photocatalytic action.

Abstract: A method of refurbishing a surface of a component for an electronic device includes: abrading a surface to be refurbished with an abrasive to remove a coating on the surface and provide an abraded surface; optionally firstly cleaning the abraded surface by contacting with a glass cleaner to provide a firstly cleaned surface; optionally secondly cleaning the firstly cleaned surface by contacting the firstly cleaned surface with a grease remover to provide a secondly cleaned surface; optionally contacting the secondly cleaned surface with an activator to provide an activated surface; and disposing a coating resin on the abraded and optionally activated surface; and curing the coating resin to provide a coated surface to refurbish the surface of the electronic device.

Abstract: A semiconductor wafer electroless plating apparatus includes a platen and a fluid bowl. The platen has a top surface defined to support a wafer, and an outer surface extending downward from a periphery of the top surface to a lower surface of the platen. The fluid bowl has an inner volume defined by an interior surface so as to receive the platen, and wafer to be supported thereon, within the inner volume. A seal is disposed around the interior surface of the fluid bowl so as to form a liquid tight barrier when engaged between the interior surface of the fluid bowl and the outer surface of the platen. A number of fluid dispense nozzles are positioned to dispense electroplating solution within the fluid bowl above the seal so as to rise up and flow over the platen, thereby flowing over the wafer when present on the platen.

Abstract: A process for repairing combined heavy erosion and thermal fatigue cracks and/or other defects, such as large cracks, in a high temperature superalloy component, such as a vane in a turbine section of a gas turbine engine, that does not require mechanical grinding to prepare the defect site. The process includes depositing a loose finely granulated superalloy powder or a low viscosity superalloy slurry in the crack up to a suitable level and then depositing a superalloy putty layer on the superalloy powder or slurry at the top of the crack A braze putty layer is then deposited over the superalloy putty layer and the component is sintered in a vacuum furnace to harden the superalloy putty and powder or slurry to repair the defect.

Abstract: Proposed are a composite material having a high adhesiveness, wherein non-penetrating pores that are formed in a silicone surface layer are filled up with a metal or the like without leaving any voids by using the plating technique and the silicone surface layer is coated with the metal or the like, and a method of producing the composite material. A composite material, which has a high adhesiveness between a second metal or an alloy of the second metal (106a, 106b) and a silicone surface, can be obtained by filling up non-penetrating pores that are formed in the surface of a silicone substrate (100) substantially with a second metal or an alloy of the second metal (106a) with the use of the autocatalytic electroless plating technique wherein a first metal located at the bottom of the non-penetrating pores as described above serves as the starting point, and coating the surface of the silicone substrate (100) with the second metal (106b).

Abstract: A method for forming a titanium oxide film that can be formed on a surface of a base material without a heating step. In Step 0, a surface of a molded product (base material) composed of a cyclic olefin-based resin is irradiated with ultraviolet light in an air atmosphere. In Step 1, the base material is immersed in a mixed liquid of an aqueous solution of titanium chloride and a nitrite ion-containing aqueous solution. A titanium oxide film grows by repeating oxidation of a titanium ion. In Step 2, the base material is pulled out from the mixed liquid, and then washed to stop the reaction. The film thickness can be controlled by controlling this immersion time. In Step 3, the base material after washing is dried at room temperature.

Abstract: A chemical vapor deposition (CVD) method for depositing a thin film on a surface of a substrate is described. The CVD method comprises disposing a substrate on a substrate holder in a process chamber, and introducing a process gas to the process chamber, wherein the process gas comprises a chemical precursor. The process gas is exposed to a non-ionizing heat source separate from the substrate holder to cause decomposition of the chemical precursor. A thin film is deposited upon the substrate.

Abstract: Disclosed is a paving material which is useful to accommodate efficient movement of heavy loads, including but not limited to heavy loads necessitated by large-scale agricultural operations. Also disclosed is a process for producing such a paving material.

Abstract: A method of making a charge dissipative surface of a dielectric polymeric material with tunable (selectable) surface resistivity, comprises the step of controllably carbonizing the surface of the polymeric material in a vacuum environment by bombarding the polymeric surface with an ion beam of rare gas ions, the energy level of the ion source being from 2.5 to 30 keV, in the fluence range 1E16-5E17 ion/cm2 so as to reach a surface resistivity in the static dissipative range of 1E6 to 1E9 ohm/square at room temperature, with a temperature dependence of less than three orders of magnitude between ?150° C. and +150° C., while having no impact on the RF performance of the material, with high RF power handling capability, and with tunable thermo-optical properties of the surface, including negligible impact on the thermo-optical properties and RF performance of the material, if required by applications.